Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2010
07/13/2010US7754014 Gas-purged vacuum valve
07/13/2010CA2487199C Method for repairing components using environmental bond coatings and resultant repaired components
07/13/2010CA2393294C Haze-resistant transparent film stacks
07/08/2010WO2010076862A1 Magnetic field control for uniform film thickness distribution in sputtering apparatus
07/08/2010WO2010076486A1 Method for manufacturing a connector element including a substrate on which a layer of gold is deposited
07/08/2010WO2010076422A1 Method for assembling two substrates in a vacuum at a negative temperature, and machine for implementing said method
07/08/2010WO2010076421A2 Cathode spraying module
07/08/2010WO2010076419A1 Machine for the vacuum deposition of materials into thin layers by cathode spraying
07/08/2010WO2010056057A3 Deposition material supply apparatus and substrate treatment apparatus having the same
07/08/2010WO2010055441A3 Improved substrate temperature control by using liquid controlled multizone substrate support
07/08/2010US20100174245 System for pretreating the lumen of a catheter
07/08/2010US20100173487 Semiconductor apparatus and method of manufacturing the semiconductor apparatus
07/08/2010US20100173482 Method and apparatus for fabricating ib-iiia-via2 compound semiconductor thin films
07/08/2010US20100173233 Photomask blank, photomask, and methods of manufacturing the same
07/08/2010US20100173176 Recording Media Having a Nanocomposite Protection Layer and Method of Making Same
07/08/2010US20100173174 Process for producing magnetic device, apparatus for producing magnetic device, and magnetic device
07/08/2010US20100173099 Method and apparatus for carbon fiber fixed on a substrate
07/08/2010US20100171272 Piston ring
07/08/2010US20100171082 HIGH QUALITY DOPED ZnO THIN FILMS
07/08/2010US20100170787 Filtered Cathodic Arc Deposition Method and Apparatus
07/08/2010US20100170786 Refurbished sputtering target and method for making the same
07/08/2010US20100170785 High-strength sputtering target for forming protective film for optical recording medium
07/08/2010US20100170781 Filtered Cathodic Arc Deposition Method and Apparatus
07/08/2010US20100170780 Magnet bar support system
07/08/2010US20100170696 Sputtering target, transparent conductive film and transparent electrode
07/08/2010US20100170437 Dynamic Film Thickness Control System/Method and its Utilization
07/08/2010US20100170434 Method for controlling the volume of a molecular beam
07/08/2010DE112008001930T5 Sputtergerät Sputtering
07/08/2010DE112008001359T5 Filmfördergerät und Rolle-zu-Rolle-Vakuumbeschichtungsverfahren Movie conveyor and roll-to-roll vacuum coating processes
07/08/2010DE10305109B4 Bauteil mit einer elektrisch hochisolierenden Schicht und Verfahren zu dessen Herstellung Component with an electrically highly insulating layer and process for its preparation
07/08/2010DE102008064183A1 In-Line-Vakuumbeschichtungsanlage In-line vacuum coating system
07/07/2010EP2204674A1 Reflective film, reflective film laminate, led, organic el display, and organic el illuminating device
07/07/2010EP2204470A1 A method of making a coated cutting tool and a coated cutting tool
07/07/2010EP2204469A1 Magnetron unit, magnetron sputtering apparatus and method for manufacturing electronic device
07/07/2010EP2204468A1 Device for projecting an image on a surface and device for moving said image
07/07/2010EP2204467A1 Method and apparatus for depositing mixed layers
07/07/2010EP2204461A1 High-purity ytterbium, sputtering target made of high-purity ytterbium, thin film containing high-purity ytterbium, and method for producing high-purity ytterbium
07/07/2010CN201520801U Leakproof component of film plating equipment
07/07/2010CN201520718U Substrate holding device
07/07/2010CN1814857B Method of sputtering protective coating on semiconductor substrate
07/07/2010CN101772989A Method for manufacturing organic electroluminescence device
07/07/2010CN101772587A Method for masking cooling holes and device for using in a masking process for masking cooling holes
07/07/2010CN101770971A Wafer bearing device
07/07/2010CN101769649A Selective composite coating for absorbing solar light and thermal
07/07/2010CN101769648A Selective coating for absorbing solar light and heat
07/07/2010CN101768747A Method for carrying out surface activating treatment on surface of titanium alloy
07/07/2010CN101768741A High-performance multi-layered membrane structure-borne noise surface wave device and preparation method thereof
07/07/2010CN101768740A Method for processing surface of touch control element
07/07/2010CN101768729A Method for preparing light absorption layer of CIGS (copper indium gallium selenide) thin film solar cell by magnetron sputtering method
07/07/2010CN101768728A Method for preparing doped ZnO-based film through magnetron sputtering
07/07/2010CN101768727A Complex vacuum deposition device
07/07/2010CN101768726A Continuous winding magnetic control sputtering vacuum coating device
07/07/2010CN101768725A Continuous preparation method of selective solar absorbing film
07/07/2010CN101768724A Method for preparing film on stainless steel
07/07/2010CN101768723A Large-size target ultrasonic treatment device and treatment method thereof
07/07/2010CN101768722A Preparation method of hydrogen-containing nano-structure CNx gradient film
07/07/2010CN101768721A Method for depositing boron carbon nitrogen film on stainless steel substrate
07/07/2010CN101768720A Method for preparing amorphous carbon coating on surface of medical stainless steel knife saw
07/07/2010CN101768719A Ti-Ni shape memory alloy glasses manufacturing process
07/07/2010CN101768718A Target with metal glass coating and composite material prepared from target
07/07/2010CN101768684A High temperature titanium alloy and surface modification method thereof
07/07/2010CN101103134B Sb-Te based alloy powder for sintering and sintered sputtering target prepared by sintering said powder, and method for preparing Sb-Te based alloy powder for sintering
07/07/2010CN101044259B Plasma sputtering film deposition method and equipment
07/06/2010US7750645 Method of wafer level transient sensing, threshold comparison and arc flag generation/deactivation
07/06/2010US7750644 System with multi-location arc threshold comparators and communication channels for carrying arc detection flags and threshold updating
07/06/2010US7750344 Doped aluminum oxide dielectrics
07/06/2010US7749622 Multilayer film-coated substrate and process for its production
07/06/2010US7749621 photoabsorption band in the visible region of the electromagnetic spectrum on a glass ribbon; oxides contains essentially titanium and other vanadium, manganese, magnesium, scandium, yttrium, niobium, molybdenum, ruthenium, lead, nickel, rhenium and mixtures thereof
07/06/2010US7749594 Cutting tool with wear resistant coating and method of making the same
07/06/2010US7749406 hot isotactic pressing; electroconductivity; for touch-screen applications, barrier thin films in liquid crystal displays and optical thin films
07/06/2010US7749364 Coater having interrupted conveyor system
07/06/2010US7749361 sputtering copper seed layer where sputtering target includes a first dopant reactive with copper and a second dopant unreactive with copper; examples of first dopant include titanium, magnesium, aluminum; examples of second dopant include palladium, tin, indium, iridium, and silver; integrated circuits
07/06/2010US7749353 High aspect ratio etch using modulation of RF powers of various frequencies
07/06/2010CA2563044C Apparatus for directing plasma flow to coat internal passageways
07/06/2010CA2479702C System and method for making thin-film structures using a stepped profile mask
07/06/2010CA2444479C Method for the production of endo-osseous implants or medical prostheses by means of the technique of ion implantation
07/01/2010WO2010075337A1 Polymer compositions for metal coating, articles made therefrom and process for same
07/01/2010WO2010074251A1 Method of manufacturing magnetic recording medium and apparatus for manufacturing magnetic recording medium
07/01/2010WO2010074250A1 Sputtering apparatus and method of producing magnetic storage medium
07/01/2010WO2010074171A1 Sputtering target and method of film formation
07/01/2010WO2010074076A1 Substrate processing method and substrate processing apparatus
07/01/2010WO2010073964A1 Process for producing regenerated target
07/01/2010WO2010073935A1 Method for measuring thickness of metal film, and method and apparatus for processing substrate
07/01/2010WO2010073904A1 Semiconductor storage element manufacturing method and sputter device
07/01/2010WO2010073797A1 Transparent electroconductive laminate and transparent touch panel
07/01/2010WO2010073781A1 Transparent conductive laminate and transparent touch panel comprising same
07/01/2010WO2010073711A1 Sputtering equipment, sputtering method and method for manufacturing an electronic device
07/01/2010WO2010073669A1 Film formation device and substrate fabrication method using same
07/01/2010WO2010073666A1 Gas supplying apparatus, vacuum processing apparatus and method for manufacturing electronic device
07/01/2010WO2010073518A1 Sputtering apparatus
07/01/2010WO2010073517A1 Sputtering apparatus
07/01/2010WO2010073438A1 Vacuum deposition apparatus and method for adjusting temperature
07/01/2010WO2010073433A1 Semiconductor device and method for manufacturing same
07/01/2010WO2010073330A1 Sputtering apparatus
07/01/2010WO2010073323A1 Sputtering apparatus and film forming method
07/01/2010WO2010073307A1 Sputtering system and film deposition method
07/01/2010WO2010072850A1 Arc evaporator amd method for operating the evaporator
07/01/2010WO2010072686A1 In-line vacuum coating system
07/01/2010WO2010053687A3 Thermal spray coatings for semiconductor applications
07/01/2010WO2010044936A9 Erosion-and impact-resistant coatings