Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
08/2006
08/02/2006CN1812688A Plasma generator
08/02/2006CN1812687A Atmospheric radio-frequency discharging high-speed cold plasma array generator
08/02/2006CN1812686A Atmospheric discharging cold plasma generator and array based on contraction and enlargement channel structure
08/02/2006CN1812685A Plasma processing device
08/02/2006CN1812684A Plasma reactor overhead source power electrode
08/02/2006CN1812683A Plasma reactor for improving plasma uniformity and device damage reduction
08/02/2006CN1812682A Plasma processing device
08/02/2006CN1812681A Method and apparatus to confine plasma and to enhance flow conductance
08/02/2006CN1812048A Enhanced process and profile simulator algorithms
08/02/2006CN1812010A Inductive coupling coil and inductive coupling plasma apparatus thereof
08/02/2006CN1268178C Plasma generation system
08/02/2006CN1268177C Method of making electronic materials
08/02/2006CN1267965C Plasma processing system with dynamic gas distribution control
08/02/2006CN1267769C Plasma chamber
08/02/2006CN1267235C Digital controlled cutting composite spray gun device capable of using on random curve groove opening
08/01/2006US7084832 Plasma production device and method and RF driver circuit with adjustable duty cycle
08/01/2006US7084572 Plasma-accelerator configuration
08/01/2006US7084369 Harmonic multiplexer
08/01/2006US7084367 a shielding cup having a body with an outer surface, a first end connectable to a torch, and a second end connectable to a shield; a thermally responsive coating is formed on the shielding cup and provides an indication of the temperature of the shielding cup
08/01/2006US7083701 Device and method for plasma processing, and slow-wave plate
07/2006
07/27/2006US20060166183 Preparation of coatings through plasma polymerization
07/27/2006US20060166011 low-k material layer (carbon doped silica)is formed by a plasma enhanced chemical vapor deposition, wherein a reaction gas, a cleaning gas, a high-frequency power and a low-frequency power are used; turning off the reaction gas and the low-frequency power after the low-k material layer is formed; etching
07/27/2006US20060166006 Article or transparent component having liquid repellent layer, optical lens having liquid repellent layer and production process thereof, and projection type display apparatus using the lens
07/27/2006US20060165914 Continuous method for producing inorganic nanotubes
07/27/2006US20060165913 Method of reducing number of particals on low-k material layer
07/27/2006US20060165898 Controlling flame temperature in a flame spray reaction process
07/27/2006US20060165873 Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
07/27/2006US20060165555 System, method, and apparatus for an intense ultraviolet radiation source
07/27/2006US20060165207 Commutator, gazelectrode, a method of electroplating and method ofinitiating cold fusion
07/27/2006US20060163201 Plasma processing system and plasma treatment process
07/27/2006US20060163059 Sputtering cathode, production method and corresponding cathode
07/27/2006US20060162863 Semiconductor plasma-processing apparatus and method
07/27/2006US20060162661 Mixing energized and non-energized gases for silicon nitride deposition
07/27/2006US20060162656 Reduced volume, high conductance process chamber
07/27/2006DE102005002006A1 Device for producing three-dimensional structures of materials in the micro- or nano-meter region in micro-electronics production comprises a vacuum chamber containing a media chamber, a reaction chamber and a coupling unit
07/26/2006EP1682692A2 Low temperature deposition of silicone nitride
07/26/2006EP1481112B1 Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
07/26/2006EP1016122B1 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
07/26/2006EP0809719A4 Apparatus and method for a reliable return current path for sputtering processes
07/26/2006CN1809911A A high density plasma reactor
07/26/2006CN1266988C Industrial apparatus for plasma capable of generating random streamer discharge and application thereof
07/25/2006US7081710 Elementary plasma source and plasma generation apparatus using the same
07/20/2006WO2006075691A1 Plasma source, ion source and method of ion generation
07/20/2006WO2006075570A1 Plasma generating apparatus
07/20/2006WO2006075008A1 Microplasma array
07/20/2006US20060158381 Slot array antenna and plasma processing apparatus
07/20/2006US20060157449 Plasma processing apparatus and a plasma processing method
07/20/2006DE202004021022U1 Set-up for surface treatment of bulk goods in plasma zone at atmospheric pressure, used in reactor technology, has conveyor base plate simultaneously as component of plasma producer and coated with oxide or glass layer
07/20/2006DE202004021021U1 Arrangement for surface processing of particles in a plasma zone at atmospheric pressure has plasma generator connected to transporting unit
07/20/2006DE102005002142A1 Mikroplasmaarray Microplasma array
07/20/2006DE102004063832A1 Anordnung zur Erzeugung eines gepulsten Laserstrahls hoher Durchschnittsleistung Arrangement for generating a pulsed laser beam of high average power
07/19/2006EP1681465A2 Systems and methods for plasma propulsion
07/19/2006EP1680948A2 Device for controlling the electronic temperature in an ecr plasma
07/19/2006CN1806314A Impurity doping method, impurity doping apparatus and semiconductor device produced by using same
07/19/2006CN1806066A Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads
07/19/2006CN1803322A Plasma cleansing apparatus that eliminates organic and oxidative contaminant and may effectively dissipate heat and eliminate exhaust gas and integrated system for the same
07/19/2006CN1265684C Atmospheric plasma method and device for treating electricity conducting materials
07/18/2006US7079323 Surface treatment method and optical part
07/18/2006US7079085 Antenna structure for inductively coupled plasma generator
07/18/2006US7078862 plasma generating chamber, an antenna for generating plasma, a first and second electrode in the chamber, both antenna and second electrode facing first electrode; power supply for applying a voltage between the first electrode and the second electrode to extract particles from the generated plasma
07/18/2006US7078802 Method for bonding heat sinks to overmold material and resulting structure
07/18/2006US7078356 Low K interlevel dielectric layer fabrication methods
07/18/2006US7078074 Using silicones; surface treatment; controlling pressure of container ; sealing
07/18/2006CA2197763C Apparatus for and method of forming uniform thin coatings on large substrates
07/13/2006WO2006073568A2 MULTI-LAYER HIGH QUALITY GATE DIELECTRIC FOR LOW-TEMPERATURE POLY-SILICON TFTs
07/13/2006WO2006073152A1 Plasma processing method
07/13/2006US20060153995 Method for fabricating a dielectric stack
07/13/2006US20060153750 Plasma generating electrode and plasma reactor
07/13/2006US20060152163 Plasma generating electrode, plasma generation device, and exhaust gas purifying apparatus
07/13/2006US20060152162 Beam plasma source
07/13/2006US20060151447 Method and apparatus for alignment of components of a plasma arc torch
07/13/2006US20060151002 Method of CVD chamber cleaning
07/13/2006US20060150914 Plasma process device
07/13/2006US20060150913 Low-frequency bias power in HDP-CVD processes
07/12/2006EP1679388A1 Method of thermal spraying
07/12/2006EP1678826A2 Method and apparatus for initiating a pulsed arc discharge for nanopowder synthesis
07/12/2006CN1802881A Amorphous carbon layer for heat exchangers
07/12/2006CN1802724A High frequency plasma jet source and method for irradiating a surface
07/12/2006CN1802723A System and method for inductive coupling of an expanding thermal plasma
07/12/2006CN1802066A Plasma processing apparatus
07/11/2006US7075713 High efficiency collector for laser plasma EUV source
07/11/2006US7075396 Superconducting coil system
07/11/2006US7075095 Plasma accelerator system
07/11/2006US7074720 Plasma treating apparatus, plasma treating method and method of manufacturing semiconductor device
07/11/2006US7074461 plasma enhanced chemical vapor deposition of bis-trimethylsilylmethane and an oxygen retaining gas, such as oxygen, ozone, nitrous oxide, or hydrogen peroxide, in the presence of hydrogen; carbon loss in the SiOC film during post processing is minimized due to the supplied hydrogen
07/11/2006US7073508 Method and device for registration and immobilization
07/06/2006WO2006070838A1 Plasma generating electrode and plasma reactor
07/06/2006WO2006070107A1 Device for gaseous plasma sterilization
07/06/2006US20060147739 Plasma polymerized methyl acrylate as an adhesion layer and moisture barrier organic interlayer for potassium bromide-salt optics
07/06/2006US20060147648 Generating atmospheric glow discharge plasma (APG), wherein plurality of electrodes are arranged defining a discharge space for forming said plasma; stable uniform low-temperature glow discharge plasma at high operating frequencies of AC-voltage with outstanding surface treatment capabilities
07/06/2006US20060147634 Anodizing the titanium substrate by applying a hydrophobic coating ofhydrofluoric acid electrolylte and applying a voltage to grow titanium oxide nanotubesnanotubes to provide a rough surface to aircraft wings to prevent ice, and oil, and grease from adhering; protective coatings
07/06/2006US20060144517 Plasma producing apparatus and doping apparatus
07/06/2006DE102004060068A1 Mikrowellenplasmaquelle Microwave plasma source
07/06/2006CA2594004A1 Device for gaseous plasma sterilization
07/05/2006EP1676665A2 Method and system of conserving plasma torch consumable
07/05/2006EP1676469A1 Method for making an infused composite
07/05/2006EP1676306A2 Synergetic sp-sp2-sp3 carbon materials and deposition methods thereof
07/05/2006EP1507892B1 High-power microwave window
07/05/2006EP0841838B1 Plasma treatment apparatus and plasma treatment method
07/05/2006CN2793564Y Reactive furnace for pyrolyzing organic waste under high-temperature with steam plasma