Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
06/2010
06/17/2010US20100148251 Semiconductor device and method for manufacturing the same
06/17/2010US20100148250 Metal oxide semiconductor device
06/17/2010US20100148249 Method Of Manufacturing A Memory Device
06/17/2010US20100148248 Semiconductor device having gate trenches and manufacturing method thereof
06/17/2010US20100148247 Semiconductor device
06/17/2010US20100148246 Power mosfet device structure for high frequency applications
06/17/2010US20100148245 Electronic device including a trench and a conductive structure therein
06/17/2010US20100148244 Semiconductor element and electrical apparatus
06/17/2010US20100148243 Semiconductor device and method for fabricating the same
06/17/2010US20100148242 Semiconductor device
06/17/2010US20100148241 Semiconductor device and method of manufacturing the same
06/17/2010US20100148240 Semiconductor device and manufacturing method thereof
06/17/2010US20100148239 Gate structure of semiconductor device and methods of forming word line structure and memory
06/17/2010US20100148238 Non-volatile memory and fabricating method thereof
06/17/2010US20100148237 Non-volatile semiconductor storage device and method of manufacturing the same
06/17/2010US20100148234 Subresolution silicon features and methods for forming the same
06/17/2010US20100148232 Surface treatment of hydrophobic ferroelectric polymers for printing
06/17/2010US20100148229 Insulating resin composition
06/17/2010US20100148228 Semiconductor and manufacturing method of the same
06/17/2010US20100148227 Electronic device including an insulating layer having different thicknesses and a conductive electrode and a process of forming the same
06/17/2010US20100148224 Power junction field effect power transistor with highly vertical channel and uniform channel opening
06/17/2010US20100148223 Semiconductor device and method of manufacturing the same
06/17/2010US20100148222 Gas sensor having a field-effect transistor
06/17/2010US20100148217 Graded high germanium compound films for strained semiconductor devices
06/17/2010US20100148215 IGBT Having One or More Stacked Zones Formed within a Second Layer of the IGBT
06/17/2010US20100148214 Semiconductor device internally having insulated gate bipolar transistor
06/17/2010US20100148213 Tunnel device
06/17/2010US20100148212 Method for producing group iii nitride semiconductor crystal, group iii nitride semiconductor substrate, and semiconductor light- emitting device
06/17/2010US20100148204 Light-Emitting Element and Display Device
06/17/2010US20100148195 Method for improved growth of semipolar (al,in,ga,b)n
06/17/2010US20100148188 Laser-induced flaw formation in nitride semiconductors
06/17/2010US20100148187 Semiconductor device
06/17/2010US20100148186 Vertical junction field effect transistors having sloped sidewalls and methods of making
06/17/2010US20100148184 Gan-based field effect transistor
06/17/2010US20100148183 Method of Forming a Carbon Nanotube-Based Contact to Semiconductor
06/17/2010US20100148182 Thin flim transistor substrate and manufacturing method thereof
06/17/2010US20100148181 Nanocrystal silicon layer structures formed using plasma deposition technique, methods of forming the same, nonvolatile memory devices having the nanocrystal silicon layer structures, and methods of fabricating the nonvolatile memory devices
06/17/2010US20100148180 Thin film transistor array panel with common bars of different widths
06/17/2010US20100148179 Semiconductor Device and Method of Manufacturing the Same
06/17/2010US20100148178 Thin film transistor and display device
06/17/2010US20100148176 Thin film transistor display panel and manufacturing method thereof
06/17/2010US20100148175 Thin film transistor and display device
06/17/2010US20100148174 GaN Epitaxial Wafer and Semiconductor Devices, and Method of Manufacturing GaN Epitaxial Wafer and Semiconductor Devices
06/17/2010US20100148171 Semiconductor device and method of manufacturing semiconductor device
06/17/2010US20100148170 Field effect transistor and display apparatus
06/17/2010US20100148169 Thin-film transistor substrate and method of fabricating the same
06/17/2010US20100148168 Integrated circuit structure
06/17/2010US20100148155 Thin film transistor, method of forming the same and flat panel display device having the same
06/17/2010US20100148153 Group III-V devices with delta-doped layer under channel region
06/17/2010US20100148152 Electrically controlled catalytic nanowire growth
06/17/2010US20100148148 Fabrication method of a light-emitting element and the light-emitting element
06/17/2010US20100148144 Semiconducting nanoparticles with surface modification
06/17/2010US20100148040 Geiger-mode photodiode with integrated and adjustable quenching resistor, photodiode array, and manufacturing method thereof
06/17/2010US20100147370 Multiple stack deposition for epitaxial lift off
06/17/2010US20100147369 Solar cell having nanodiamond quantum wells
06/17/2010DE112004001441B4 Verfahren zur Herstellung Asymmetrischer Seitenwand-Abstandshalter eines Halbleiterbauelements A process for the preparation of asymmetric sidewall spacers of a semiconductor device
06/17/2010DE10358046B4 Bipolartransistor mit erhöhtem Basisanschlussgebiet und Verfahren zu seiner Herstellung Bipolar transistor with increased base connection region and method for its manufacture
06/17/2010DE102009006802B3 Verfahren und Halbleiterbauelement mit Einstellung der Austrittsarbeit in einer Gateelektrodenstruktur mit großem ε nach der Transistorherstellung unter Anwendung von Lanthanum The method and semiconductor device including adjustment of the work function in a gate electrode structure with large ε after the transistor production using lanthanum
06/17/2010DE102009001552A1 Bipolartransistor mit selbstjustiertem Emitterkontakt Self-aligned bipolar transistor with emitter contact
06/17/2010DE102008054575A1 Electronic module has crystalline semiconductor substrate with integrated circuit and discrete component is electrically connected with integrated circuit
06/17/2010DE102008049733B3 Transistor mit eingebettetem Si/Ge-Material mit geringerem Abstand zum Kanalgebiet und Verfahren zur Herstellung des Transistors Transistor with embedded Si / Ge material with a lesser distance from the channel region and methods of making the transistor
06/17/2010DE102008030864B4 Halbleiterbauelement als Doppelgate- und Tri-Gatetransistor, die auf einem Vollsubstrat aufgebaut sind und Verfahren zur Herstellung des Transistors A semiconductor device as Doppelgate- and tri-gate transistor constructed on a solid substrate and methods for producing the transistor
06/17/2010DE10056873B4 Verfahren zur Herstellung einer Gateelektrode eines Feldeffekttransistors mit verringertem Gatewiderstand A method of manufacturing a gate electrode of a field effect transistor with reduced gate resistance
06/17/2010DE10024266B4 Verfahren zur Herstellung eines mikromechanischen Bauelements A process for producing a micromechanical component
06/16/2010EP2197034A2 Field effect transistor and display apparatus
06/16/2010EP2197033A1 Organic thin film transistor and organic thin film light-emitting transistor
06/16/2010EP2197025A1 Method for manufacturing a power semiconductor device
06/16/2010EP2197023A1 Semiconductor substrate and semiconductor device
06/16/2010EP2195866A2 Nanowire electronic devices and method for producing the same
06/16/2010EP2195850A1 Oxide semiconductor thin-film transistor
06/16/2010EP2195849A1 Oxide semiconductor device including insulating layer and display apparatus using the same
06/16/2010EP2195847A1 Semiconductor module
06/16/2010EP2195838A2 Semiconductor device and wire bonding method
06/16/2010EP2195829A1 Profile engineered thin film devices and structures
06/16/2010EP1042810B1 Formation of control and floating gates of semiconductor non-volatile memories
06/16/2010CN201508838U Power heterojunction bipolar transistor with high thermal stability
06/16/2010CN1976007B Semiconductor device and method of manufacturing semiconductor device
06/16/2010CN1973385B Functional molecule apparatus
06/16/2010CN1914737B Semiconductor element and its manufacturing method and liquid-crystal display device and its manufacturing method
06/16/2010CN1913163B Thin film transistor substrate and method of manufacturing the same
06/16/2010CN1905212B Transistor and method for forming the same
06/16/2010CN1862789B Film transistor array panel including multi-layered thin films, and method of manufacturing the panel
06/16/2010CN1758443B High voltage operating field effect transistor, and bias circuit therefor and high voltage circuit thereof
06/16/2010CN1749834B Liquid crystal display device and manufacturing method therefor
06/16/2010CN1656607B Compound semiconductor and compound insulator, and manufacturing method and use thereof
06/16/2010CN1573483B Thin film transistor substrate and method of manufacturing the same
06/16/2010CN1555064B Nonvolatile semiconductor memory device
06/16/2010CN1552101B Trench DMOS transistor having lightly doped source structure
06/16/2010CN101743637A Small gauge pressure sensor using wafer bonding and electrochemical etch stopping
06/16/2010CN101743630A Mos transistors for thin soi integration and methods for fabricating the same
06/16/2010CN101743629A Semiconductor device provided with thin film transistor and method for manufacturing the semiconductor device
06/16/2010CN101743628A Process for producing organic semiconductor element, organic semiconductor element, and organic semiconductor device
06/16/2010CN101743627A Methods of forming improved epi fill on narrow isolation bounded source/drain regions and structures formed thereby
06/16/2010CN101743626A Method for fabricating a 3-D integrated circuit using a hard mask of silicon-oxynitride on amorphous carbon
06/16/2010CN101743623A Laminate structure, electronic device, and display device
06/16/2010CN101743616A Manufacturing method of semiconductor device
06/16/2010CN101740641A Semiconductor device
06/16/2010CN101740640A Pellet electrode type diode
06/16/2010CN101740639A Polycrystalline silicon electric resistance and manufacturing method thereof
06/16/2010CN101740638A Floating gate flash memory device adopting T-shaped gate structure and manufacturing technology thereof