Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
02/2007
02/08/2007US20070032073 Method of substrate processing and apparatus for substrate processing
02/08/2007US20070032053 Method of producing silicon carbide semiconductor substrate, silicon carbide semiconductor substrate obtained thereby and silicon carbide semiconductor using the same
02/08/2007US20070032052 Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors, and fabricating such devices
02/08/2007US20070032051 Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors, and fabricating such devices
02/08/2007US20070032049 Process for manufacturing a semiconductor device
02/08/2007US20070032042 Peeling method
02/08/2007US20070032023 Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors, and fabricating such devices
02/08/2007US20070032016 Protective layer in memory device and method therefor
02/08/2007US20070032009 Semiconductor devices having strained dual channel layers
02/08/2007US20070032001 Semiconductor device having a trench isolation and method of fabricating the same
02/08/2007US20070031987 Method of operating image sensor
02/08/2007US20070031588 Organic EL device and its manufacture method
02/08/2007US20070030423 Liquid crystal display device
02/08/2007US20070029669 Integrated circuit with low-stress under-bump metallurgy
02/08/2007US20070029654 Electronic parts packaging structure and method of manufacturing the same
02/08/2007US20070029645 High permeability layered films to reduce noise in high speed interconnects
02/08/2007US20070029642 Heating and cooling of substrate support
02/08/2007US20070029640 III- V group compound semiconductor device
02/08/2007US20070029639 Edge intensive antifuse and method for making the same
02/08/2007US20070029638 Semiconductor device and methods of protecting a semiconductor device
02/08/2007US20070029637 Image sensor for reduced dark current
02/08/2007US20070029636 Semiconductor Device and Manufacturing Method Thereof
02/08/2007US20070029635 Semiconductor processing methods, semiconductor constructions, and electronic systems
02/08/2007US20070029634 High speed diode
02/08/2007US20070029633 Shottky diode and method for fabricating the same
02/08/2007US20070029630 Integrated circuits with contemporaneously formed array electrodes and logic interconnects
02/08/2007US20070029628 Semiconductor device and method of manufacturing the same
02/08/2007US20070029627 Reducing the dielectric constant of a portion of a gate dielectric
02/08/2007US20070029626 Semiconductor device, and method of fabricating the same
02/08/2007US20070029625 Non-volatile memory semiconductor device having an oxide-nitride-oxide (ONO) top dielectric layer
02/08/2007US20070029624 Fin-type field effect transistor
02/08/2007US20070029623 Dual-gate field effect transistor
02/08/2007US20070029622 Flash memory device and method of fabricating the same
02/08/2007US20070029621 Semiconductor integrated circuit device
02/08/2007US20070029620 Low-cost high-performance planar back-gate cmos
02/08/2007US20070029619 Semiconductor devices having a recessed active edge and methods of fabricating the same
02/08/2007US20070029618 Dual-gate device and method
02/08/2007US20070029617 Semiconductor device and manufacturing method thereof
02/08/2007US20070029616 Semiconductor integrated circuit device and method of fabricating the same
02/08/2007US20070029610 Non-volatile memory and fabricating method thereof
02/08/2007US20070029609 Array substrate having enhanced aperture ratio, method of manufacturing the same and display device having the same
02/08/2007US20070029608 Offset spacers for CMOS transistors
02/08/2007US20070029607 Dense arrays and charge storage devices
02/08/2007US20070029606 Phase change material, phase change random access memory including the same, and methods of manufacturing and operating the same
02/08/2007US20070029605 Semiconductor device and a method of manufacturing the same
02/08/2007US20070029604 Using thin undoped TEOS with BPTEOS ILD or BPTEOS ILD alone to improve charge loss and contact resistance in multi-bit memory devices
02/08/2007US20070029603 Method of fabricating cell of nonvolatile memory device with floating gate
02/08/2007US20070029602 Non-volatile memory device and fabricating method thereof
02/08/2007US20070029601 SONOS memory cell having high-K dielectric
02/08/2007US20070029600 Nanowire based non-volatile floating-gate memory
02/08/2007US20070029599 Semiconductor device
02/08/2007US20070029598 Semiconductor device manufacturing method and semiconductor device
02/08/2007US20070029597 High-voltage semiconductor device
02/08/2007US20070029596 Semiconductor device including transistor with composite gate structure and transistor with single gate structure, and method for manufacturing the same
02/08/2007US20070029595 Semiconductor device and manufacturing method therefor
02/08/2007US20070029594 Ferroelectric capacitor and its manufacturing method and ferroelectric memory device
02/08/2007US20070029593 Bismuth ferrite films and devices grown on silicon
02/08/2007US20070029592 Oriented bismuth ferrite films grown on silicon and devices formed thereby
02/08/2007US20070029588 Formation of low leakage thermally assisted radical nitrided dielectrics
02/08/2007US20070029587 Mos varactor with segmented gate doping
02/08/2007US20070029586 Multi-channel transistor structure and method of making thereof
02/08/2007US20070029584 Method and apparatus for bending electrostatic switch
02/08/2007US20070029583 Organic semiconductor sensor device
02/08/2007US20070029579 CMOS image sensor and method for fabricating the same
02/08/2007US20070029578 Non-volatile semiconductor memory device and process of manufacturing the same
02/08/2007US20070029577 Field effect transistor and method of manufacturing the same
02/08/2007US20070029574 Strained semiconductor devices
02/08/2007US20070029573 Vertical-channel junction field-effect transistors having buried gates and methods of making
02/08/2007US20070029569 Packages for semiconductor light emitting devices utilizing dispensed encapsulants and methods of packaging the same
02/08/2007US20070029567 Element having microstructure and manufacturing method thereof
02/08/2007US20070029554 Light-emitting device and manufacturing method thereof
02/08/2007US20070029553 Methods of fabricating strained semiconductor-on-insulator field-effect transistors and related devices
02/08/2007US20070029552 Liquid crystal display panel and fabricating method thereof
02/08/2007US20070029551 Thin film transistor substrate using a horizontal electric field
02/08/2007US20070029550 Liquid crystal display apparatus
02/08/2007US20070029547 Process for forming organic layers, organic electronic devices,and transistors
02/08/2007US20070029546 Resistive memory cell, method for forming the same and resistive memory array using the same
02/08/2007US20070029545 Pixel having an organic light emitting diode and method of fabricating the pixel
02/08/2007US20070029544 Interconnected high speed electron tunneling devices
02/08/2007US20070029543 Semiconductor device
02/08/2007US20070029540 Semiconductor device
02/08/2007US20070029539 Light-emitting element array and display apparatus
02/08/2007US20070029526 A europium silicate-based orange phosphor having the formula (Sr1-xMx)yEuzSiO5, wherein M is at least one of a divalent metal selected from the group consisting of Ba, Mg, Ca, and Zn; ligh emitting diodes (LED)
02/08/2007US20070028962 Low molecular weight conjugated nitrogen compounds and devices fabricated using the same
02/08/2007DE3943833B4 MOS Vorrichtung MOS device
02/08/2007DE19953178B4 Millimeterband-Halbleiterschaltkreis Millimeter-band semiconductor circuit
02/08/2007DE19517975B4 CMOS-Schaltungsplättchen mit Polysilizium-Feldringstruktur CMOS circuit die with polysilicon field ring structure
02/08/2007DE10357409B4 Verfahren zur Herstellung eines Doppelheterostruktur-Bipolartransistors für hohe Betriebsspannungen A method for producing a double heterostructure bipolar transistor for high operating voltages
02/08/2007DE10351100B4 Verfahren zur Herstellung eines vertikalen PNP-Transistors aus einem Halbleiterwerkstoff und vertikaler bipolarer PNP-Transitor A method for producing a vertical PNP transistor made of a semiconductor material and a vertical PNP bipolar transitor
02/08/2007DE10342547B4 Verfahren zum Herstellen einer integrierten Schaltungseinrichtung mit Durchkontaktierungselementen und Anschlusseinheiten A method of manufacturing an integrated circuit device with feedthrough terminal units and
02/08/2007DE10330359B4 Verfahren zur Herstellung von InP-basierten Heterostruktur-Bipolartransistoren auf der Grundlage von III/V-Halbleitern A process for the production of InP-based heterostructure bipolar transistors on the basis of III / V semiconductors
02/08/2007DE102005035699A1 Semiconductor component with charge compensating structure has vertical drift zone surrounded by charge compensation trench having anisotropic material of alternating conductance
02/08/2007DE102005030886B3 Schaltungsanordnung mit einem Transistorbauelement und einem Freilaufelement Circuit arrangement having a transistor device, and a freewheeling element
02/08/2007DE102004057237B4 Verfahren zum Herstellen von Kontaktlöchern in einem Halbleiterkörper sowie Transistor mit vertikalem Aufbau A method for producing contact holes in a semiconductor body, as well transistor with a vertical structure
02/08/2007DE10141877B4 Halbleiterbauteil und Konvertereinrichtung Semiconductor device and converter means
02/07/2007EP1750296A2 Ion implantation mask and method for manufacturing the mask and a SiC semiconductor device using the mask
02/07/2007EP1749343A2 Schottky device
02/07/2007EP1749316A2 Perylene n-type semiconductors and related devices
02/07/2007EP1749311A1 Separately strained n-channel and p-channel transistors
02/07/2007EP1749310A1 Substrate for electronic application comprising a flexible support and method for production thereof