Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
01/2007
01/25/2007US20070018249 Extended drain metal oxide semiconductor transistor and manufacturing method thereof
01/25/2007US20070018245 Fringing field induced localized charge trapping memory
01/25/2007US20070018244 Gate Electrode structures and methods of manufacture
01/25/2007US20070018243 Semiconductor element and method of manufacturing the same
01/25/2007US20070018242 Power semiconductor device
01/25/2007US20070018241 Early contact, high cell density process
01/25/2007US20070018240 Electronic device including discontinuous storage elements
01/25/2007US20070018239 Sea-of-fins structure on a semiconductor substrate and method of fabrication
01/25/2007US20070018238 Semiconductor device
01/25/2007US20070018237 Non-volatile memory device having fin-type channel region and method of fabricating the same
01/25/2007US20070018236 Semiconductor device and manufacturing method thereof
01/25/2007US20070018235 Nonvolatile semiconductor memory device including improved gate electrode
01/25/2007US20070018234 Electronic device including gate lines, bit lines, or a combination thereof
01/25/2007US20070018233 Semiconductor device and control method therefor
01/25/2007US20070018232 Nonvolatile storage array with continuous control gate employing hot carrier injection programming
01/25/2007US20070018231 Nonvolatile semiconductor memory device, semiconductor device and manufacturing method of nonvolatile semiconductor memory device
01/25/2007US20070018230 Eeprom and methods of fabricating the same
01/25/2007US20070018229 Electronic device including discontinuous storage elements and a process for forming the same
01/25/2007US20070018228 Non-volatile memory with carbon nanotubes
01/25/2007US20070018227 Three-gate transistor structure
01/25/2007US20070018226 Nonvolatile semiconductor memory
01/25/2007US20070018225 Integrated Stacked Capacitor and Method of Fabricating Same
01/25/2007US20070018223 Dram including a vertical surround gate transistor
01/25/2007US20070018222 Electronic device including discontinuous storage elements
01/25/2007US20070018221 Programmable structure including discontinuous storage elements and spacer control gates in a trench
01/25/2007US20070018220 Semiconductor device, gate electrode and method of fabricating the same
01/25/2007US20070018219 Unit cell structure, method of manufacturing the same, non-volatile semiconductor device having the unit cell structure and method of manufacturing the non-volatile semiconductor device
01/25/2007US20070018218 Fin field effect transistor memory cell, fin field effect transistor memory cell arrangement and method for producing the fin field effect transistor memory cell
01/25/2007US20070018217 Semiconductor device and manufacturing method of the same
01/25/2007US20070018216 Electronic device including discontinuous storage elements
01/25/2007US20070018211 High dielectric constant spacer for imagers
01/25/2007US20070018210 Switch mode power amplifier using MIS-HEMT with field plate extension
01/25/2007US20070018209 Semiconductor circuit device and simulation method of the same
01/25/2007US20070018208 Depletable cathode low charge storage diode
01/25/2007US20070018207 Split gate storage device including a horizontal first gate and a vertical second gate in a trench
01/25/2007US20070018206 Surround gate access transistors with grown ultra-thin bodies
01/25/2007US20070018205 STRUCTURE AND METHOD FOR IMPROVED STRESS AND YIELD IN pFETS WITH EMBEDDED SiGe SOURCE/DRAIN REGIONS
01/25/2007US20070018204 High-frequency device including high-frequency switching circuit
01/25/2007US20070018202 High performance mosfet comprising stressed phase change material and method of fabricating the same
01/25/2007US20070018198 High electron mobility electronic device structures comprising native substrates and methods for making the same
01/25/2007US20070018195 Semiconductor structure and method
01/25/2007US20070018194 Driving circuit
01/25/2007US20070018193 Initial-on SCR device for on-chip ESD protection
01/25/2007US20070018189 Light emitting diode
01/25/2007US20070018188 Thin film transistor sunstrate of a horizontal electric filed type and method of darkening deflective pixel in the same
01/25/2007US20070018183 Roughened high refractive index layer/LED for high light extraction
01/25/2007US20070018182 Light emitting diodes with improved light extraction and reflectivity
01/25/2007US20070018180 Vertical electrode structure of gallium nitride based light emitting diode
01/25/2007US20070018179 Vertical conducting power semiconducting devices made by deep reactive ion etching
01/25/2007US20070018178 Vertical electrode structure of gallium nitride based light emitting diode
01/25/2007US20070018172 Crystals of phenylalanine derivatives and production methods thereof
01/25/2007US20070018171 Semiconductor device and a method for production thereof
01/25/2007US20070018170 Organic light emitting display device
01/25/2007US20070018169 Liquid crystal display device and fabrication method thereof
01/25/2007US20070018168 Thin film transistor substrate, display device, and method of fabricating the same
01/25/2007US20070018167 Semiconductor integrated circuit and method of fabricating same
01/25/2007US20070018166 Stacked transistors and process
01/25/2007US20070018165 Electro-optical device and method for manufacturing the same
01/25/2007US20070018164 Semiconductor Device and Manufacturing Method Thereof
01/25/2007US20070018163 Semiconductor device
01/25/2007US20070018162 Thin film transistor substrate and manufacturing method thereof
01/25/2007US20070018161 Thin film transistor substrate and method for fabricating the same
01/25/2007US20070018160 Display for displaying product-specific information on display screen
01/25/2007US20070018159 Array substrate and display device having the same
01/25/2007US20070018157 Methods of forming phase change storage cells for memory devices
01/25/2007US20070018156 Dual panel type organic electroluminescent device
01/25/2007US20070018153 Thick light emitting polymers to enhance oled efficiency and lifetime
01/25/2007US20070018152 Organic electroluminescent device, manufacturing method therefor, and electronic devices therewith
01/25/2007US20070018151 Short-channel transistors
01/25/2007US20070018150 Self-emission panel and method of manufacturing same
01/25/2007US20070018148 Phase change memory with U-shaped chalcogenide cell
01/25/2007US20070017907 Laser treatment device, laser treatment method, and semiconductor device fabrication method
01/25/2007DE19713656B4 Leistungshalbleitermodul The power semiconductor module
01/25/2007DE19604890B4 Lichtkippdiode Lichtkippdiode
01/25/2007DE112004002678T5 2-Transistoren-Schmelzsicherungselement mit einzelner Polysiliziumschicht 2 transistors fuse element with single polysilicon layer
01/25/2007DE10321466B4 Trench-Speicherkondensator und Verfahren zu dessen Herstellung Trench storage capacitor and process for its preparation
01/25/2007DE102005063332A1 High speed diode contain vertically arranged seqeuntial heavily doped N-zones and weakly doped P-zone in semiconductor body starting from its rear side
01/25/2007DE102005032454A1 Detaching transfer film from semiconductor substrate and for its transfer by dry chemical etching, preferably by gas phase etching using specified doping
01/25/2007DE102004004863B4 Resistiv arbeitende Speicherzelle Resistive working memory cell
01/25/2007DE10082909B4 Nichtflüchtige ferroelektrische Speicherzelle, nichtflüchtiger ferroelektrischer Speicher und Verfahren zu seiner Herstellung A non-volatile ferroelectric memory cell, non-volatile ferroelectric memory and method for its preparation
01/25/2007CA2612132A1 Semiconductor device including a channel with a non-semiconductor monolayer and associated methods
01/25/2007CA2612127A1 Semiconductor device including a strained superlattice between at least one pair of spaced apart stress regions and associated methods
01/25/2007CA2612123A1 Semiconductor device including a strained superlattice and overlying stress layer and related methods
01/25/2007CA2612118A1 Semiconductor device including a strained superlattice layer above a stress layer and associated methods
01/24/2007EP1746661A1 Power semiconductor device
01/24/2007EP1746660A2 PNPN Semiconductor device and method for driving same
01/24/2007EP1746659A2 Transistor and semiconductor device
01/24/2007EP1746658A1 Organic light emitting display device
01/24/2007EP1746641A1 Group iii nitride semiconductor device and epitaxial substrate
01/24/2007EP1745517A2 Insulated gate semiconductor device
01/24/2007EP1745516A1 Electromechanical nanotube tunneling device comprising source, drain and gate
01/24/2007EP1745515A1 Tuneable semiconductor device
01/24/2007EP1745512A1 Nrom device
01/24/2007EP1476900B1 Method for forming an oxide layer on a gaas-based semiconductor structure
01/24/2007EP1461816B1 Mems device having contact and standoff bumps and related methods
01/24/2007EP1331671B1 Point contact array and electronic circuit comprising the same
01/24/2007EP1232116B1 Silicon nanoparticle and method for producing the same
01/24/2007EP1181712B1 Low-resistance vdmos semiconductor component
01/24/2007EP1040521B1 Method of operating a silicon oxide insulator (soi) semiconductor having selectively linked body
01/24/2007EP0864537B1 Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same