Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2012
07/04/2012CN102543727A Silicon-germanium heterojunction bipolar transistor (SiGe HBT) structure, pseudo buried layer structure and manufacturing method for SiGe HBT
07/04/2012CN102543726A Manufacture method for high-voltage silicon germanium heterojunction bipolar transistor
07/04/2012CN102543725A Method for manufacturing high-speed silicon-germanium heterojunction bipolar transistor (SiGe HBT)
07/04/2012CN102543724A Process for manufacturing Zener diode at low temperature
07/04/2012CN102543723A Method for manufacturing grid controlled diode semiconductor device
07/04/2012CN102543722A High-voltage transient voltage suppressor chip and production process
07/04/2012CN102543721A Table-board manufacture technology for lead-free diode
07/04/2012CN102543720A Silicon two-way transient voltage suppression diode and manufacture method thereof
07/04/2012CN102543719A Manufacture method of uniaxial strain silicon germanium on insulator (SGOI) wafer on aluminum nitride (AIN) embedded insulating barrier based on mechanical bending table
07/04/2012CN102543718A Method for decreasing warp and bow of silicon carbide wafer
07/04/2012CN102543717A Metal layer structure of semiconductor device as well as manufacturing method of metal layer structure and semiconductor device using metal layer structure
07/04/2012CN102543716A Method for forming salicide block layer
07/04/2012CN102543715A Production method of nitrogen-free dielectric antireflective film
07/04/2012CN102543714A Method for improving uniformity of chemical-mechanical planarization process at top of opened polycrystal gratings
07/04/2012CN102543713A Method for etching oxide silicon grid compensating isolation region
07/04/2012CN102543712A Novel gate graph dimension shrinkage method
07/04/2012CN102543711A Method for generating porous silicon by eroding surface of silicon wafer for solar battery
07/04/2012CN102543710A Liquid processing apparatus
07/04/2012CN102543709A Method for the simultaneous material-removing processing of both sides of at least three semiconductor wafers
07/04/2012CN102543708A Wafer splitting apparatus and wafer splitting process
07/04/2012CN102543707A Formation of a channel semiconductor alloy by forming a hard mask layer stack and applying a plasma-based mask patterning process
07/04/2012CN102543706A Integration process for different polycrystalline silicon gate electrode thicknesses
07/04/2012CN102543705A Polycrystalline silicon gate electrode integration process for high-pressure devices and low-pressure devices
07/04/2012CN102543704A Forming method of grid oxide layer
07/04/2012CN102543703A Manufacturing method of nanocrystalline flash memory grid
07/04/2012CN102543702A Formation method of metal gate
07/04/2012CN102543701A Method for preparing metal silicide
07/04/2012CN102543700A Method for forming aluminum metal gate
07/04/2012CN102543699A Method for forming metal gate
07/04/2012CN102543698A Manufacturing method of metal gate electrode
07/04/2012CN102543697A Method for manufacturing tunnel oxide layer window in electrically erasable programmable read only memory (EEPROM)
07/04/2012CN102543696A Manufacture method for semiconductor device
07/04/2012CN102543695A Preparation method of self-aligned low-resistance gate in RFLDMOS (radio frequency laterally diffused metal oxide semiconductor) device
07/04/2012CN102543694A High-temperature drive-in process of Bipolar-CMOS-DMOS device
07/04/2012CN102543693A Method for preparing germanium-based pseudo gallium arsenide (GaAs) substrate
07/04/2012CN102543692A Method for forming nitride film
07/04/2012CN102543691A Preparation method of silicon-on-insulator (SOI) material
07/04/2012CN102543690A Method for optimizing metal half contact structure by level de-pinning on local surface of N-type semi-conductor
07/04/2012CN102543689A Substrate processing apparatus, method of manufacturing substrate, and method of manufacturing semiconductor device
07/04/2012CN102543688A Spacer double patterning for lithography operations
07/04/2012CN102543687A Etching method and etching device for mask layer and etching method for interlayer dielectric layer
07/04/2012CN102543686A Process for photoetching polyimide on semiconductor substrate
07/04/2012CN102543685A Substrate processing device and method
07/04/2012CN102543684A Graphic structure design integrated with measurement of line width and alignment precision
07/04/2012CN102543683A Reprocessing method for photoetching process
07/04/2012CN102543682A Method for forming multistage deep step
07/04/2012CN102543681A Method for removing gold-containing metal from back of chip
07/04/2012CN102543680A Method for reducing cracking phenomena of double front metal dielectric substance layers
07/04/2012CN102543679A Method for cleaning a semiconductor wafer composed of silicon directly after a process of polishing of the semiconductor wafer
07/04/2012CN102543678A Method for cleaving a substrate
07/04/2012CN102543677A Manufacturing process of cellular silicon wafer
07/04/2012CN102543676A Method of forming patterns of semiconductor device
07/04/2012CN102543675A Method for processing glass substrate
07/04/2012CN102543674A Method for removing residue from metal surface
07/04/2012CN102543673A Wafer structure and manufacturing method of alignment mark of same
07/04/2012CN102543672A Method for removing natural silicon oxide layer and method for forming self-aligned silicide
07/04/2012CN102543671A Manufacture method for semiconductor wafer
07/04/2012CN102543670A Planarization method for PMD (Pre-Metal Dielectric) layer
07/04/2012CN102543669A Semiconductor device manufacturing method
07/04/2012CN102543668A Preparation method of suspension fin
07/04/2012CN102543667A Forming method of graph of aligned layer on silicon chip
07/04/2012CN102543666A Polycrystalline silicon processing method
07/04/2012CN102543665A Improved rapid thinning method of gallium arsenide substrate
07/04/2012CN102543664A Diode lead forming device
07/04/2012CN102543663A Automatic lead molding device
07/04/2012CN102543662A Hot disc and silicon chip heating system applying same
07/04/2012CN102543661A Wafer manufacturing method
07/04/2012CN102543644A Upper electrode for reaction cavity of dry etching equipment
07/04/2012CN102543214A Method for on-line monitoring of quality of ONO (Oxide-Nitride-Oxide) film in SONOS (Silicon Oxide Nitride Oxide Semiconductor) memory process
07/04/2012CN102541398A Method, device and system for adjusting process formula step sequence
07/04/2012CN102541102A Processing apparatus
07/04/2012CN102541090A Precise positioning control system for platform movement
07/04/2012CN102540911A Control device and control method for equipment
07/04/2012CN102540776A Stripping liquid for removing residual photoresist in semiconductor technology
07/04/2012CN102540775A Method for removing photoresist of silicide protection layer
07/04/2012CN102540770A Developing method, developing device and coating developing processing system having the developing device
07/04/2012CN102540755A Exposure apparatus, exposure method, and method of making panel substrate for display
07/04/2012CN102540749A Photoetching method
07/04/2012CN102540732A Method for judging one-time photoetching result during semiconductor production
07/04/2012CN102540726A Orthotype photosensitive resin composition, hard coating film and forming method thereof, interlayer insulated film, and display device
07/04/2012CN102540724A Positive photosensitive resin composition, a photosensitive resin layer prepared by using the same, and a semiconductor device including the photosensitive resin layer
07/04/2012CN102540710A Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device
07/04/2012CN102540706A Method for extending effective use time of photoresist
07/04/2012CN102540605A Thin-film transistor array substrate, method of manufacturing the same, and liquid crystal display device
07/04/2012CN102540604A Method for fabricating array substrate for FFS mode liquid crystal display device
07/04/2012CN102540602A Display device and method of manufacturing the same
07/04/2012CN102540600A 液晶显示装置及其制造方法 The liquid crystal display device and manufacturing method
07/04/2012CN102540596A Liquid crystal display and manufacturing method thereof
07/04/2012CN102540595A Array substrate, manufacturing method thereof and liquid crystal panel
07/04/2012CN102540536A Flat display and method of fabricating same
07/04/2012CN102540534A Electronic paper display substrate, manufacturing method thereof and electronic paper display
07/04/2012CN102540524A Method for preventing electrostatic breakdown, manufacturing method of array substrate and display back panel
07/04/2012CN102540415A Projection lithographic objective
07/04/2012CN102539448A Development residue detecting method
07/04/2012CN102539324A Detection device used for testing welding pulling force of patch type diode
07/04/2012CN102537373A Valve for vacuum process
07/04/2012CN102534768A Method for preparing silicon-based gallium arsenide material
07/04/2012CN102534615A Film-forming method for forming silicon oxide film on tungsten film or tungsten oxide film
07/04/2012CN102534550A Deposition method for silicon dioxide thin film of grid sidewall
07/04/2012CN102534548A Aminovinylsilane for CVD and ALD SIO2 films
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