Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2012
12/20/2012WO2012173698A1 Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control
12/20/2012WO2012173693A1 Complementary bipolar inverter
12/20/2012WO2012173438A2 Apparatus for fabricating ingot
12/20/2012WO2012173409A2 Apparatus for fabricating ingot
12/20/2012WO2012173380A2 Three-dimensional flash memory using fringing effect and method for manufacturing same
12/20/2012WO2012173325A1 Adhesive film for a semiconductor package
12/20/2012WO2012173282A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
12/20/2012WO2012173279A1 Nonvolatile magnetic element and nonvolatile magnetic device
12/20/2012WO2012173238A1 Semiconductor device manufacturing method and semiconductor device
12/20/2012WO2012173235A1 Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern
12/20/2012WO2012173215A1 Pattern forming method, method for manufacturing electronic device by using the same, and electronic device
12/20/2012WO2012173187A1 Electronic component bonding material, composition for bonding, bonding method, and electronic component
12/20/2012WO2012173173A1 Method for evaluating metal contamination in semiconductor sample and method for manufacturing semiconductor substrate
12/20/2012WO2012173122A1 Plasma etching method
12/20/2012WO2012173108A1 Electrically conductive oxide and method for producing same, and oxide semiconductor film
12/20/2012WO2012173086A1 Semiconductor device and method for manufacturing same
12/20/2012WO2012173067A1 Semiconductor device manufacturing method, semiconductor device, semiconductor device manufacturing apparatus, and storage medium
12/20/2012WO2012173064A1 Method for producing amorphous oxide thin film and thin film transistor
12/20/2012WO2012173035A1 Semiconductor device and manufacturing method thereof
12/20/2012WO2012173008A1 Laser processing device and laser processing method
12/20/2012WO2012172988A1 Silicon carbide semiconductor device and method for manufacturing silicon carbide semiconductor device
12/20/2012WO2012172985A1 Manufacturing method for active matrix substrate, active matrix substrate, display device, and television receiver provided with display device
12/20/2012WO2012172983A1 Polishing composition
12/20/2012WO2012172965A1 Silicon carbide semiconductor device and method for manufacturing same
12/20/2012WO2012172959A1 Adhesive sheet, and method for manufacturing electronic component
12/20/2012WO2012172957A1 Retention device and retention method
12/20/2012WO2012172933A1 Nitride semiconductor device and method for manufacturing same
12/20/2012WO2012172927A1 Tunneling current circuit
12/20/2012WO2012172920A1 Substrate support apparatus and vapour-phase deposition apparatus
12/20/2012WO2012172911A1 Wafer separation device
12/20/2012WO2012172910A1 Method and device for producing wafer
12/20/2012WO2012172904A1 Power device, and method for producing power device
12/20/2012WO2012172898A1 Strongly correlated oxide field effect element
12/20/2012WO2012172875A1 Semiconductor device and method for manufacturing semiconductor device
12/20/2012WO2012172868A1 Method for removing pressure-sensitive adhesive, and pressure-sensitive adhesive
12/20/2012WO2012172860A1 Inorganic polysilazane, silica film-forming coating liquid containing same, and method for forming silica film
12/20/2012WO2012172854A1 Bonding method and production method
12/20/2012WO2012172825A1 Power module and power conversion circuit
12/20/2012WO2012172774A1 Method for manufacturing semiconductor device
12/20/2012WO2012172755A1 Sheet, mold, and manufacturing method thereof
12/20/2012WO2012172753A1 Semiconductor device and method for manufacturing same
12/20/2012WO2012172746A1 Semiconductor device and method for manufacturing the same
12/20/2012WO2012172742A1 Semiconductor device and method for producing same
12/20/2012WO2012172725A1 Semiconductor device and method for producing same
12/20/2012WO2012172724A1 Method for cleaning semiconductor wafer
12/20/2012WO2012172714A1 Display device, thin-film transistor used in display device, and method for producing thin-film transistor
12/20/2012WO2012172705A1 Illumination optical assembly, exposure device, and device manufacture method
12/20/2012WO2012172617A1 Thin-film transistor and method of manufacturing thin-film transistor
12/20/2012WO2012172304A1 Method and device for manufacturing a barrier layer on a flexible substrate
12/20/2012WO2012172247A1 Method for chemically passivating a surface of a product made of a iii-v semiconductor, and the product obtained using such a method
12/20/2012WO2012172226A1 Process for producing a photovoltaic cell having a selective emitter
12/20/2012WO2012172073A1 Method for providing a prediction model for crack detection and method for crack detection on a semiconductor structure
12/20/2012WO2012171742A1 Method for producing a semiconductor component comprising a conductor layer in the semiconductor body and semiconductor component
12/20/2012WO2012171736A1 Optoelectronic semiconductor body and method for producing an optoelectronic semiconductor body
12/20/2012WO2012171726A2 Copper filled opening with a cap layer
12/20/2012WO2012171665A1 Electronic device
12/20/2012WO2012171633A1 Apparatus and method for positioning an electronic component and/or a carrier relative to a discharging device
12/20/2012WO2012171437A1 Shearing force test device
12/20/2012WO2012171323A1 Semiconductor structure and manufacturing method thereof
12/20/2012WO2012171298A1 Scrubbing device for wafer
12/20/2012WO2012171235A1 Atmospheric pressure plasma device and process for manufacturing same
12/20/2012WO2012171095A1 Method and apparatus for generating a display data stream for transmission to a remote display
12/20/2012WO2012148716A3 Varying coefficients and functions for polishing control
12/20/2012WO2012148641A3 Uv assisted silylation for recovery and pore sealing of damaged low k films
12/20/2012WO2012148621A3 Apparatus and methods for microwave processing of semiconductor substrates
12/20/2012WO2012148228A3 Ultra small led and method for manufacturing same
12/20/2012WO2012144733A3 Texture-etchant composition for a crystalline silicon wafer, and texture-etching method
12/20/2012WO2012134764A3 Methods and apparatus for optimization of inspection speed by generation of stage speed profile and selection of care areas for automated wafer inspection
12/20/2012WO2012125681A3 Method to mitigate through-silicon via-induced substrate noise
12/20/2012WO2012125580A3 Non-volatile anti-fuse memory cell
12/20/2012WO2012124913A3 Noble group iv-b organometallic compound, and method for preparing same
12/20/2012WO2012122392A3 Post-planarization densification
12/20/2012WO2012111963A3 Substrate film and method for manufacturing same
12/20/2012WO2012067992A3 Conductive pads defined by embedded traces
12/20/2012US20120323008 Group 11 mono-metallic precursor compounds and use thereof in metal deposition
12/20/2012US20120322273 Coating film forming method and coating film forming apparatus
12/20/2012US20120322272 Semiconductor device and method for fabricating semiconductor device
12/20/2012US20120322271 Identification of dies on a semiconductor wafer
12/20/2012US20120322270 Powered grid for plasma chamber
12/20/2012US20120322269 Methods of Fabricating Substrates
12/20/2012US20120322268 Method of forming a pattern
12/20/2012US20120322267 Method of patterning a substrate
12/20/2012US20120322266 Methods of Forming Semiconductor Constructions
12/20/2012US20120322265 Poly opening polish process
12/20/2012US20120322264 Aqueous polishing agent and graft copolymers and their use in a process for polishing patterned and unstructured metal surfaces
12/20/2012US20120322263 Methods of etching single crystal silicon
12/20/2012US20120322262 N-Metal Film Deposition With Initiation Layer
12/20/2012US20120322261 Methods for Via Structure with Improved Reliability
12/20/2012US20120322260 Through-silicon via forming method
12/20/2012US20120322259 Defect free deep trench method for semiconductor chip
12/20/2012US20120322258 MODULATED DEPOSITION PROCESS FOR STRESS CONTROL IN THICK TiN FILMS
12/20/2012US20120322257 Method of filling a deep etch feature
12/20/2012US20120322256 Manufacturing Method of a High Performance Metal-Oxide-Metal
12/20/2012US20120322255 Metal Bump Formation
12/20/2012US20120322254 Method of manufacturing semiconductor device and substrate processing apparatus
12/20/2012US20120322253 Method for reducing interfacial layer thickness for high-k and metal gate stack
12/20/2012US20120322252 Semiconductor memory device comprising three-dimensional memory cell array
12/20/2012US20120322251 Borderless Contacts For Semiconductor Devices
12/20/2012US20120322250 N-Metal Film Deposition With Initiation Layer
12/20/2012US20120322249 Manufacturing method of semiconductor structure
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