Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/1988
02/16/1988US4725722 Automatic focusing method and apparatus utilizing contrasts of projected pattern
02/16/1988US4725566 Self-insulated; small distance separation
02/16/1988US4725565 Mixing gallium arsenide powder with donor and heating in tube furnace
02/16/1988US4725564 Method of manufacturing a semiconductor device, in which a dopant is diffused from its oxide into a semiconductor body
02/16/1988US4725562 Without short circuiting
02/16/1988US4725561 Process for the production of mutually electrically insulated monocrystalline silicon islands using laser recrystallization
02/16/1988US4725560 Silicon oxynitride storage node dielectric
02/16/1988US4725333 Metal-glass laminate and process for producing same
02/16/1988US4725112 Buried undercut mesa-like waveguide
02/16/1988US4724963 Wafer processing cassette
02/16/1988US4724874 For use with processing equipment
02/16/1988US4724621 Wafer processing chuck using slanted clamping pins
02/16/1988US4724619 Single wafer centrifugal dryer
02/16/1988US4724611 Method for producing semiconductor module
02/16/1988EP0231207A4 Contrast enhancement layer.
02/16/1988CA1232981A1 Apparatus for imaging a mask pattern on a substrate
02/16/1988CA1232980A1 Sputtering apparatus and method
02/16/1988CA1232979A1 Method for fabricating semiconductor devices
02/16/1988CA1232978A1 Process for minimizing distortion in multilayer ceramic substrates
02/16/1988CA1232977A1 Semiconductor device comprising insulated gate field effect transistors
02/16/1988CA1232976A1 Field effect transistor with elongated ohmic contacts
02/16/1988CA1232975A1 Noncontact full-line dynamic ac tester for integrated circuits
02/16/1988CA1232972A1 Equal density distribution process
02/16/1988CA1232953A1 Circuit for generating a substrate bias
02/11/1988WO1988001102A1 Semiconductor devices having improved metallization
02/11/1988WO1988001101A1 Process for the production of bipolar devices
02/11/1988WO1988001100A1 Fabrication technique of a semiconductor structure
02/11/1988WO1988001060A1 Integrated circuits and method of testing same
02/11/1988WO1988000985A1 Process for photochemical vapor deposition of oxide layers at enhanced deposition rates
02/10/1988EP0255718A2 Use of amphiphilic amide compounds in Z-type Langmuir-Blodgett films
02/10/1988EP0255589A2 A wireable circuit cell for a vlsi circuit
02/10/1988EP0255585A2 Schottky diode and ohmic contact metallurgy
02/09/1988US4724531 Gate array with bidirectional symmetry
02/09/1988US4724530 Five transistor CMOS memory cell including diodes
02/09/1988US4724517 Microcomputer with prefixing functions
02/09/1988US4724510 Electrostatic wafer clamp
02/09/1988US4724475 Semiconductor device
02/09/1988US4724328 Lithographic apparatus for the production of microstructures
02/09/1988US4724325 Adhesion cooling for an ion implantation system
02/09/1988US4724322 Method for non-contact xyz position sensing
02/09/1988US4724300 Temperature control in vacuum
02/09/1988US4724223 Method of making electrical contacts
02/09/1988US4724222 Holding semiconductor piece to be lithographically patterened
02/09/1988US4724221 Diffusion of impuritites perpendicular to surface of epitaxial layer
02/09/1988US4724220 Masking, photon bombardment
02/09/1988US4724219 Radiation melting of semiconductor surface areas through a remote mask
02/09/1988US4724218 Method of forming a semiconductor device having several gate levels
02/09/1988US4724171 Process for protecting polished silicon surfaces
02/09/1988US4724106 Process for forming organic film
02/09/1988US4724030 Adhesive aided transfer of chips
02/09/1988US4724021 Applying and firing two different layers of dispersed dielectric solid and glass particles
02/09/1988US4723978 Forming organoglass by treating silsesquiokane ladder polymer with oxygen plasma
02/09/1988US4723799 Wafer carrier transport system interface
02/09/1988US4723508 Plasma CVD apparatus
02/09/1988US4723507 Isolation passageway including annular region
02/09/1988US4723363 Injection of organic halosilane
02/09/1988CA1232568A1 Process for fabricating an optical device
02/09/1988CA1232497A1 Stripped gold plating process
02/05/1988EP0174950A4 Wafer scale package system and header and method of manufacture thereof.
02/04/1988DE3625873A1 solder glass, and process for the production of a solder connection between silicon substrates
02/03/1988EP0255489A2 Nonvolatile, semiconductor memory device
02/03/1988EP0255454A2 Apparatus for chemical vapor deposition
02/03/1988EP0255416A1 Double channel heterojunction semiconductor device, its use in a field effect transistor, and its use in a negative transductance device
02/03/1988EP0255344A1 Production technique of a semiconductor structure
02/03/1988EP0255298A2 Means and methods for heating semiconductor ribbons and wafers with microwaves
02/03/1988EP0255247A2 Hot chuck assembly for integrated circuit wafers
02/03/1988EP0255167A2 Method of removing undesired particles from a surface of a substrate
02/03/1988EP0255159A2 Process for making structures including E2PROM nonvolatile memory cells with self-aligned layers of silicon and associated transistors
02/03/1988EP0255125A2 Integrated circuit having two circuit blocks therein independently energized through different power supply terminals
02/03/1988EP0255037A2 A method for forming polyimide film by chemical vapor deposition
02/03/1988EP0255023A1 Zirconia toughening of glass-ceramic materials
02/03/1988EP0254980A1 Integrated sense amplifier circuit
02/03/1988EP0254973A1 Method for making twin tub integrated devices, in particular twin tub CMOS devices
02/03/1988EP0254919A2 A conveyor system including a buffer store
02/03/1988EP0254871A2 Reverse dark field alignment system for scanning lithographic aligner
02/03/1988EP0254853A2 Lithographic method employing thermally stable photoresists with high sensitivity forming a hydogen-bonded network
02/03/1988EP0160701B1 Lpe growth on group iii-v compound semiconductor substrates containing phosphorus
02/03/1988EP0083716B1 Process for forming iii-v semiconductor mesfet devices, having self-aligned raised source and drain regions
02/03/1988CN87103187A Semiconductor light-controlled variable capacitor
02/03/1988CN85104935B Semiconductor integrated circuit and a method for designing circuit pattern thereof
02/02/1988USH422 Apparatus for inverting articles and method for using same
02/02/1988US4723197 Semiconductors; lateral interconnects
02/02/1988US4723194 Structure of capacitor circuit
02/02/1988US4723156 EPROM device and a manufacturing method thereof
02/02/1988US4723086 Coarse and fine motion positioning mechanism
02/02/1988US4723082 Signal transfer circuit for use in laminated multilayer electric circuit
02/02/1988US4723062 Hydrogen containing silicon nitride film over area to be cut with a laser beam
02/02/1988US4722913 Doped semiconductor vias to contacts
02/02/1988US4722912 Method of forming a semiconductor structure
02/02/1988US4722911 Vapor phase epitaxy using complex premixing system
02/02/1988US4722910 Partially self-aligned metal contact process
02/02/1988US4722909 Integrated circuits; gates of different conductivity on the same substrate
02/02/1988US4722908 Fabrication of a bipolar transistor with a polysilicon ribbon
02/02/1988US4722883 Process for producing fine patterns
02/02/1988US4722882 Dry etching using etch resistant photoresist
02/02/1988US4722878 Photomask material
02/02/1988US4722856 Continuous transportation and compression by surface fluid flow
02/02/1988US4722752 Apparatus and method for rinsing and drying silicon wafers
02/02/1988US4722659 Semiconductor wafer carrier transport apparatus
02/02/1988US4722441 Package structure for semiconductors