| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/08/2005 | US6852648 Semiconductor device having a low dielectric constant dielectric material and process for its manufacture |
| 02/08/2005 | US6852647 Removable amorphous carbon CMP stop |
| 02/08/2005 | US6852645 High temperature interface layer growth for high-k gate dielectric |
| 02/08/2005 | US6852644 Atmospheric robot handling equipment |
| 02/08/2005 | US6852643 Method for using ammonium fluoride solution in a photoelectrochemical etching process of a silicon wafer |
| 02/08/2005 | US6852642 Gas assisted method for applying resist stripper and gas-resist stripper combinations |
| 02/08/2005 | US6852641 Method of spiking mixed acid liquid in reactor |
| 02/08/2005 | US6852640 Method for fabricating a hard mask |
| 02/08/2005 | US6852639 Etching processing method for a material layer |
| 02/08/2005 | US6852638 Selective base etching |
| 02/08/2005 | US6852637 Method of etching a mask layer and a protecting layer for metal contact windows |
| 02/08/2005 | US6852636 Insitu post etch process to remove remaining photoresist and residual sidewall passivation |
| 02/08/2005 | US6852635 Method for bottomless deposition of barrier layers in integrated circuit metallization schemes |
| 02/08/2005 | US6852634 Low cost method of providing a semiconductor device having a high channel density |
| 02/08/2005 | US6852633 Method for operating chemical mechanical polishing (“CMP”) tool for the manufacture of semiconductor devices |
| 02/08/2005 | US6852632 Method of polishing a multi-layer substrate |
| 02/08/2005 | US6852631 Copper polish slurry for reduced interlayer dielectric erosion and method of using same |
| 02/08/2005 | US6852630 Electroetching process and system |
| 02/08/2005 | US6852628 Method of insulating interconnects, and memory cell array with insulated interconnects |
| 02/08/2005 | US6852627 Conductive through wafer vias |
| 02/08/2005 | US6852626 Film deposition method and apparatus |
| 02/08/2005 | US6852625 Package substrate manufactured using electrolytic leadless plating process, and method for manufacturing the same |
| 02/08/2005 | US6852624 Electroless plating process, and embedded wire and forming process thereof |
| 02/08/2005 | US6852623 Method for manufacturing zinc oxide semiconductors |
| 02/08/2005 | US6852622 Device and method for protecting against oxidation of a conductive layer in said device |
| 02/08/2005 | US6852621 Semiconductor device and manufacturing method therefor, circuit board, and electronic equipment |
| 02/08/2005 | US6852620 Semiconductor device with self-aligned junction contact hole and method of fabricating the same |
| 02/08/2005 | US6852619 Dual damascene semiconductor devices |
| 02/08/2005 | US6852618 Combined barrier layer and seed layer |
| 02/08/2005 | US6852617 Semiconductor device fabrication method |
| 02/08/2005 | US6852616 Semiconductor device and method for producing the same |
| 02/08/2005 | US6852615 Ohmic contacts for high electron mobility transistors and a method of making the same |
| 02/08/2005 | US6852614 Method of manufacturing semiconductor having group II-group VI compounds doped with nitrogen |
| 02/08/2005 | US6852613 High permeability thin films and patterned thin films to reduce noise in high speed interconnections |
| 02/08/2005 | US6852612 Semiconductor device and method for fabricating the same |
| 02/08/2005 | US6852611 ROM embedded DRAM with dielectric removal/short |
| 02/08/2005 | US6852610 Semiconductor device and method for manufacturing the same |
| 02/08/2005 | US6852609 Method of forming a polycrystalline silicon layer |
| 02/08/2005 | US6852608 Production method for semiconductor chip |
| 02/08/2005 | US6852607 Wafer level package having a side package |
| 02/08/2005 | US6852606 Method for forming isolation layer of semiconductor device and semiconductor device |
| 02/08/2005 | US6852605 Method of forming an inductor with continuous metal deposition |
| 02/08/2005 | US6852604 Manufacturing method of semiconductor substrate |
| 02/08/2005 | US6852603 Fabrication of abrupt ultra-shallow junctions |
| 02/08/2005 | US6852602 Semiconductor crystal film and method for preparation thereof |
| 02/08/2005 | US6852601 Heat treatment method that includes a low negative pressure |
| 02/08/2005 | US6852600 Strained silicon MOSFET having silicon source/drain regions and method for its fabrication |
| 02/08/2005 | US6852599 Method for fabricating MOS transistors |
| 02/08/2005 | US6852598 Method for the fabrication of a DMOS transistor |
| 02/08/2005 | US6852597 Method for fabricating power semiconductor device having trench gate structure |
| 02/08/2005 | US6852596 Electronic memory circuit and related manufacturing method |
| 02/08/2005 | US6852595 Method of manufacturing a flash memory cell |
| 02/08/2005 | US6852594 Two-step source side implant for improving source resistance and short channel effect in deep sub-0.18μm flash memory technology |
| 02/08/2005 | US6852593 Haze-free BST films |
| 02/08/2005 | US6852592 Methods for fabricating semiconductor devices |
| 02/08/2005 | US6852591 Method of forming CMOS imager with storage capacitor |
| 02/08/2005 | US6852590 Deep trench capacitor and method of fabricating the same |
| 02/08/2005 | US6852589 Method to modify 0.25 μm 1T-RAM by extra resist protect oxide (RPO) blocking |
| 02/08/2005 | US6852588 Methods of fabricating semiconductor structures comprising epitaxial Hf3Si2 layers |
| 02/08/2005 | US6852587 Method for fabricating a semiconductor device |
| 02/08/2005 | US6852585 Semiconductor circuit arrangement and a method for producing same |
| 02/08/2005 | US6852584 Method of trimming a gate electrode structure |
| 02/08/2005 | US6852583 Method for the production and configuration of organic field-effect transistors (OFET) |
| 02/08/2005 | US6852582 Carbon nanotube gate field effect transistor |
| 02/08/2005 | US6852581 Methods of manufacturing a semiconductor device having increased gaps between gates |
| 02/08/2005 | US6852580 Method of fabricating semiconductor device |
| 02/08/2005 | US6852579 Method of manufacturing a semiconductor integrated circuit device |
| 02/08/2005 | US6852577 Method for forming a low temperature polysilicon CMOS thin film transistor |
| 02/08/2005 | US6852576 Method for forming structures in finfet devices |
| 02/08/2005 | US6852575 Method of forming lattice-matched structure on silicon and structure formed thereby |
| 02/08/2005 | US6852574 Method of forming a leadframe for a semiconductor package |
| 02/08/2005 | US6852572 Method of manufacturing semiconductor device |
| 02/08/2005 | US6852571 Method of manufacturing stacked semiconductor device |
| 02/08/2005 | US6852570 Method of manufacturing a stacked semiconductor device |
| 02/08/2005 | US6852569 Method of fabricating multilayer ceramic substrate |
| 02/08/2005 | US6852567 Method of assembling a semiconductor device package |
| 02/08/2005 | US6852566 Self-aligned rear electrode for diode array element |
| 02/08/2005 | US6852565 CMOS image sensor with substrate noise barrier |
| 02/08/2005 | US6852564 Semiconductor device and method of fabricating the same |
| 02/08/2005 | US6852562 Low-cost method of forming a color imager |
| 02/08/2005 | US6852560 Fabrication of a microchip-based electrospray device |
| 02/08/2005 | US6852559 Transistor of semiconductor device, and method for manufacturing the same |
| 02/08/2005 | US6852555 Method in the fabrication of organic thin-film semiconducting devices |
| 02/08/2005 | US6852553 Semiconductor device fabrication method and semiconductor device fabrication apparatus |
| 02/08/2005 | US6852551 Method of forming a ferroelectric film and fabrication process of a semiconductor device having a ferroelectric film |
| 02/08/2005 | US6852549 Ferroelectric thin film processing for ferroelectric field-effect transistor |
| 02/08/2005 | US6852474 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 02/08/2005 | US6852473 Anti-reflective coating conformality control |
| 02/08/2005 | US6852472 Removal of defect particles that may be created during polysilicon hard mask etching, and that are embedded within the polysilicon layer, is disclosed. Oxide is first grown in the polysilicon layer exposed through the patterned hard mask |
| 02/08/2005 | US6852471 Exposure control for phase shifting photolithographic masks |
| 02/08/2005 | US6852467 Positive resist composition |
| 02/08/2005 | US6852466 For producing well-resolved images |
| 02/08/2005 | US6852454 Multi-tiered lithographic template and method of formation and use |
| 02/08/2005 | US6852453 Fabrication method for semiconductor hole |
| 02/08/2005 | US6852421 Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images |
| 02/08/2005 | US6852390 Ultraphobic surface for high pressure liquids |
| 02/08/2005 | US6852373 Method for depositing a silicon-containing dielectric material on copper |
| 02/08/2005 | US6852371 Metal processing for impurity gettering in silicon |
| 02/08/2005 | US6852370 Composition for film formation and material for insulating film formation |
| 02/08/2005 | US6852299 Having uniform mesopores, that is applicable to catalyst carrier, adsorbent, light functional material, electron functional material |