| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/08/2005 | US6852263 An epoxy resin formulation with suppression in the generation of bowing and high relilability, containing an epoxy resin and phenol-novolak resin as curing agent; curing |
| 02/08/2005 | US6852253 Thickness of substrate subject to growth made larger than or equal to 200 mu m and curvature thereof made smaller than or equal to 0.03 cm-1, curvature caused by difference in thermal expansion coefficients of the base and substrate |
| 02/08/2005 | US6852242 Cleaning of multicompositional etchant residues |
| 02/08/2005 | US6852240 Method of manufacturing a ferroelectric capacitor configuration |
| 02/08/2005 | US6852209 Insoluble electrode for electrochemical operations on substrates |
| 02/08/2005 | US6852194 Increasing the number of films to be deposited and decreasing the thickness thereof. |
| 02/08/2005 | US6852187 Method and apparatus for separating member |
| 02/08/2005 | US6852173 Use of high vapor pressure liquid with cryogenic cleaning to aid in removal of foreign materials from semiconductor surfaces |
| 02/08/2005 | US6852168 Reactor for depositing thin film on wafer |
| 02/08/2005 | US6852161 Method of fabricating group-iii nitride semiconductor crystal, method of fabricating gallium nitride-based compound semiconductor, gallium nitride-based compound semiconductor, gallium nitride-based compound semiconductor light-emitting device, and light source using the semiconductor light-emitting device |
| 02/08/2005 | US6852136 Method for manufacturing tantalum oxy nitride capacitors |
| 02/08/2005 | US6852019 Substrate holding apparatus |
| 02/08/2005 | US6852012 Cluster tool systems and methods for in fab wafer processing |
| 02/08/2005 | US6852009 Polishing formulation for polishing semiconductor wafer consists of a silicon dioxide, a base selected from inorganic salt of alkali metal, an ammonum salt, piperazine and ethylenediamine, at least one chelating agent free of EDTA |
| 02/08/2005 | US6852007 Robotic method of transferring workpieces to and from workstations |
| 02/08/2005 | US6852004 CMP machine dresser and method for detecting the dislodgement of diamonds from the same |
| 02/08/2005 | US6851939 For forming deposition film of high quality on which adhesion force between a substrate and a metal film |
| 02/08/2005 | US6851913 Transport system |
| 02/08/2005 | US6851873 Method and apparatus for removing organic films |
| 02/08/2005 | US6851872 Substrate processing apparatus and substrate processing method |
| 02/08/2005 | US6851705 Dual output inflator with independent gas storage vessels |
| 02/08/2005 | US6851598 Electronic component with a semiconductor chip and method for producing the electronic component |
| 02/08/2005 | US6851436 Substrate processing using a fluid re-circulation system in a wafer scrubbing system |
| 02/08/2005 | US6851435 Method and apparatus for localized liquid treatment of the surface of a substrate |
| 02/08/2005 | US6851432 Aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water for removal of |
| 02/08/2005 | US6851384 Remote plasma apparatus for processing substrate with two types of gases |
| 02/08/2005 | US6851184 Method for manufacturing a printed circuit board |
| 02/08/2005 | US6851170 Method and apparatus for alignment of carriers, carrier handlers and semiconductor handling equipment |
| 02/08/2005 | US6851152 Substrate cleaning apparatus |
| 02/08/2005 | US6851151 Brush drive assembly in a substrate processing brush box |
| 02/08/2005 | CA2320064C Method of making microwave, multifunction modules using fluoropolymer composite substrates |
| 02/08/2005 | CA2214123C Capacitor structure for an integrated circuit and method of fabrication thereof |
| 02/08/2005 | CA2173222C Ultra high density, non-volatile ferromagnetic random access memory |
| 02/03/2005 | WO2005010997A2 Nonplanar device with stress incorporation layer and method of fabrication |
| 02/03/2005 | WO2005010996A1 Semiconductor device |
| 02/03/2005 | WO2005010995A1 Electronic element, integrated circuit and process for fabricating the same |
| 02/03/2005 | WO2005010993A1 Electronic assembly having a die with rounded corner edge portions and a method of fabricating the same |
| 02/03/2005 | WO2005010992A1 A single device equivalent to cmos |
| 02/03/2005 | WO2005010986A1 In-print method and in-print device |
| 02/03/2005 | WO2005010984A2 Pecvd silicon-rich oxide layer for reduced uv charging in an eeprom |
| 02/03/2005 | WO2005010983A2 Memory cell and method for producing a memory |
| 02/03/2005 | WO2005010982A1 Pmos transistor strain optimization with raised junction regions |
| 02/03/2005 | WO2005010981A2 Array of nanoscopic mosfet transistors and fabrication |
| 02/03/2005 | WO2005010980A1 Bellows-supporting structure and movable stage device |
| 02/03/2005 | WO2005010979A1 Laminating method and laminating device |
| 02/03/2005 | WO2005010978A1 Method and apparatus for performing metrology dispatching based upon fault detection |
| 02/03/2005 | WO2005010977A1 Methods of controlling properties and characteristics of a gate insulation layer based upon electrical test data, and system for performing same |
| 02/03/2005 | WO2005010976A1 A programmable multi-chip module |
| 02/03/2005 | WO2005010975A1 Planar magnetic tunnel junction substrate having recessed alignment marks |
| 02/03/2005 | WO2005010974A1 Field effect transistor and method for manufacturing same |
| 02/03/2005 | WO2005010973A1 Method for the self-adjusted reduction in size of structures |
| 02/03/2005 | WO2005010972A1 Improvements in the use of silyating agents |
| 02/03/2005 | WO2005010971A2 Ultaviolet curing processes for advanced low-k materials |
| 02/03/2005 | WO2005010970A1 Substrate processing apparatus and substrate processing method |
| 02/03/2005 | WO2005010969A1 Gas reaction system and semiconductor processing apparatus |
| 02/03/2005 | WO2005010968A1 Two-dimensional patterning method, electronic device using same, and magnetic device fabricating method |
| 02/03/2005 | WO2005010967A2 Device and method for machining the rear side of semiconductor chips |
| 02/03/2005 | WO2005010966A1 Method for polishing wafer |
| 02/03/2005 | WO2005010965A2 METHOD AND STRUCTURE OF STRAIN CONTROL OF SiGe BASED PHOTODETECTORS AND MODULATORS |
| 02/03/2005 | WO2005010964A2 Silicon crystallization using self-assembled monolayers |
| 02/03/2005 | WO2005010959A1 Development processing device and development processing method |
| 02/03/2005 | WO2005010958A1 Fabrication of a feram capacitor using a noble metal hardmask |
| 02/03/2005 | WO2005010957A1 Semiconductor pasted bonding body and production method therefor, and light emitting element and production method therefor |
| 02/03/2005 | WO2005010956A2 Endeffectors for handling semiconductor wafers |
| 02/03/2005 | WO2005010955A2 Method and apparatus for real-time in-situ ion implantation with closed loop control |
| 02/03/2005 | WO2005010954A1 Multi-staged heating system for fabricating microelectronic devices |
| 02/03/2005 | WO2005010950A2 Ultrasonic assisted etch using corrosive liquids |
| 02/03/2005 | WO2005010949A2 Solution to thermal budget |
| 02/03/2005 | WO2005010947A2 Cleaning masks |
| 02/03/2005 | WO2005010946A2 DEPOSITION OF SiGe ON SILICON-ON-INSULATOR STRUCTURES AND BULK SUBSTRATES |
| 02/03/2005 | WO2005010945A2 Failure analysis methods and systems |
| 02/03/2005 | WO2005010944A2 Fet channel having a strained lattice structure along multiple surfaces |
| 02/03/2005 | WO2005010936A2 Edge bead control method and apparatus |
| 02/03/2005 | WO2005010935A2 Method and system for electronic spatial filtering of spectral reflectometer optical signals |
| 02/03/2005 | WO2005010934A2 Three-dimensional integrated circuit structure and method of making same |
| 02/03/2005 | WO2005010933A2 Micromirrors with mechanisms for enhancing coupling of the micromirrors with electrostatic fields |
| 02/03/2005 | WO2005010930A2 Method for forming high resolution electronic circuits |
| 02/03/2005 | WO2005010927A2 Anisotropic electroconductive film and method for the production thereof |
| 02/03/2005 | WO2005010926A2 Procede de fabrication de film conducteur anisotrope |
| 02/03/2005 | WO2005010895A1 Liquid composition for ferroelectric thin film formation and process for producing ferroelectric thin film |
| 02/03/2005 | WO2005010892A1 Polymer memory device formed in via opening |
| 02/03/2005 | WO2005010891A1 Ferroelectric and high dielectric constant integrated circuit capacitors with three-dimensional orientation for high density memories, and method of making the same |
| 02/03/2005 | WO2005010616A1 Positive photosensitive resin composition |
| 02/03/2005 | WO2005010566A2 A micromirror having reduced space between hinge and mirror plate of the micromirror |
| 02/03/2005 | WO2005010518A1 Rolled electrode array and its method for manufacture |
| 02/03/2005 | WO2005010245A1 Method of manufacturing diamond substrates |
| 02/03/2005 | WO2005010244A1 Silicon carbide product, method for producing same, and method for cleaning silicon carbide product |
| 02/03/2005 | WO2005010243A1 Process for producing silicon single crystal substrate, method of measuring resistance characteristics and method of warranting resistance characteristics |
| 02/03/2005 | WO2005010240A2 Low temperature methods for hermetically sealing reservoir devices |
| 02/03/2005 | WO2005010077A1 Silicon-containing polymer, process for rpoducing the same, heat-resistant resin composition, and heat-resistant film |
| 02/03/2005 | WO2005009684A1 Method for epiready surface treatment on sic thin films |
| 02/03/2005 | WO2005009633A1 System and method of dry contract cleaning for removing particles from semiconductor wafers |
| 02/03/2005 | WO2005009595A1 Unit for separating gas |
| 02/03/2005 | WO2004109770A3 Through wafer via process and amplifier with through wafer via |
| 02/03/2005 | WO2004107352A3 Use of voids between elements in semiconductor structures for isolation |
| 02/03/2005 | WO2004105117A3 Production of an optoelectronic component that is encapsulated in plastic, and corresponding methods |
| 02/03/2005 | WO2004102635A9 Methods for preserving strained semiconductor layers during oxide layer formation |
| 02/03/2005 | WO2004097881A3 Beam uniformity and angular distribution measurement system |
| 02/03/2005 | WO2004095525A3 Gate electrode for mos transistors |
| 02/03/2005 | WO2004088739A3 Real-time in-line testing of semiconductor wafers |