Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2005
09/29/2005US20050212053 Super-junction semiconductor element and method of fabricating the same
09/29/2005US20050212049 Semiconductor device and process for producing the same
09/29/2005US20050212048 Integrated switch device
09/29/2005US20050212047 Thin film transistor substrate and manufacturing method thereof
09/29/2005US20050212043 Semiconductor device and manufacturing method thereof
09/29/2005US20050212042 Semiconductor device with structure for improving breakdown voltage
09/29/2005US20050212041 Novel process method of source drain spacer engineering to improve transistor capacitance
09/29/2005US20050212040 Semiconductor device having gate sidewall structure in silicide process and producing method of the semiconductor device
09/29/2005US20050212039 Angled implant for shorter trench emitter
09/29/2005US20050212038 Leakage control in semiconductor apparatus and fabricating method
09/29/2005US20050212037 Semiconductor memory cell, method for fabricating it and semiconductor memory device
09/29/2005US20050212036 Semiconductor memory device and method of manufacturing the same
09/29/2005US20050212035 Semiconductor storage device and manufacturing method thereof
09/29/2005US20050212034 Nonvolatile semiconductor memory device and manufacturing method thereof
09/29/2005US20050212033 Memory device with high dielectric constant gate dielectrics and metal floating gates
09/29/2005US20050212032 Fabrication of conductive lines interconnecting first conductive gates in nonvolatile memories having second conductive gates provided by conductive gate lines, wherein the adjacent conductive gate lines for the adjacent columns are spaced from each other, and non-volatile memory structures
09/29/2005US20050212031 Semiconductor device and method for manufacturing same
09/29/2005US20050212030 Semiconductor capacitor and mosfet fitted therewith
09/29/2005US20050212029 Semiconductor device and method for manufacturing same
09/29/2005US20050212028 Semiconductor device
09/29/2005US20050212027 Vertical device with optimal trench shape
09/29/2005US20050212026 Trench capacitors with insulating layer collars in undercut regions and method of fabricating the same
09/29/2005US20050212025 Memory device and method of fabricating the same
09/29/2005US20050212024 Memory device with an active material embedded in an insulating material
09/29/2005US20050212023 Semiconductor memory device, and fabrication method thereof
09/29/2005US20050212021 Metal-insulator-metal capacitors
09/29/2005US20050212020 Semiconductor device and manufacturing method thereof
09/29/2005US20050212019 Ferroelectric memory device
09/29/2005US20050212018 Conductive lines buried in insulating areas
09/29/2005US20050212017 Vehicle actuated gate apparatus
09/29/2005US20050212015 Metal gate semiconductor device and manufacturing method
09/29/2005US20050212014 Semiconductor device and semiconductor sensor
09/29/2005US20050212013 Gate circuit and delay circuit
09/29/2005US20050212009 Semiconductor device having electrostatic destruction protection circuit using thyristor as protection element
09/29/2005US20050212006 GaN-based III - V group compound semiconductor light emitting device and method of fabricating the same
09/29/2005US20050212001 Method for achieving low defect density AlGaN single crystal boules
09/29/2005US20050211999 Doping of gallium nitride by solid source diffusion and resulting gallium nitride structures
09/29/2005US20050211991 Light-emitting apparatus and illuminating apparatus
09/29/2005US20050211988 Method for production of a layer of silicon carbide or a nitride of a group III element on a suitable substrate
09/29/2005US20050211987 Semiconductor device, manufacturing method thereof and manufacturing apparatus therefor
09/29/2005US20050211985 Thin film transistor, thin film transistor substrate, and methods for manufacturing the same
09/29/2005US20050211983 Display device and manufacturing method of the same
09/29/2005US20050211982 Strained silicon with reduced roughness
09/29/2005US20050211980 Device and method for detecting stress migration properties
09/29/2005US20050211979 IC package, inspection method of IC package mounting body, repairing method of IC package mounting body, and inspection pin for IC package mounting body
09/29/2005US20050211977 Organic semiconductor device and method of producing the same
09/29/2005US20050211976 Organic field-effect transistor, flat panel display device including the same, and a method of manufacturing the organic field-effect transistor
09/29/2005US20050211975 Thin film transistor and semiconductor device using the same
09/29/2005US20050211970 Metal nano-objects, formed on semiconductor surfaces, and method for making said nano-objects
09/29/2005US20050211953 Polishing slurries and methods for chemical mechanical polishing
09/29/2005US20050211952 Compositions and methods for chemical mechanical planarization of tungsten and titanium
09/29/2005US20050211951 Compositions and methods for polishing copper
09/29/2005US20050211950 Chemical-mechanical polishing composition and method for using the same
09/29/2005US20050211929 Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device
09/29/2005US20050211928 Charged-particle-beam lithographic system
09/29/2005US20050211927 Method and apparatus for processing a micro sample
09/29/2005US20050211925 Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method
09/29/2005US20050211924 Ion implantation apparatus and ion implanting method
09/29/2005US20050211920 Positioning device and method of initializing a positioning device
09/29/2005US20050211919 System and method for patterning a flexible substrate in a lithography tool
09/29/2005US20050211918 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices
09/29/2005US20050211901 Method for determining the substitutional carbon content in monocrystalline or polycrystalline silicon
09/29/2005US20050211900 Device for maintaining an object under vacuum and methods for making same, use in non-cooled infrared sensors
09/29/2005US20050211896 Pt coating initiated by indirect electron beam for resist contact hole metrology
09/29/2005US20050211867 Acceleration clamp assist
09/29/2005US20050211750 Method of creating solder bar connections on electronic packages
09/29/2005US20050211746 Bonding apparatus
09/29/2005US20050211703 Ceramic susceptor and a method of cleaning the same
09/29/2005US20050211697 Multi-zone reflecting device for use in flash lamp processes
09/29/2005US20050211695 Adjustable exhaust flow for thermal uniformity
09/29/2005US20050211694 Method and apparatus for rapid temperature change and control
09/29/2005US20050211691 Heating device
09/29/2005US20050211682 Laser processing
09/29/2005US20050211681 Charged-particle beam system
09/29/2005US20050211678 Method for the connection of two wafers, and a wafer arrangement
09/29/2005US20050211672 Etch-processing apparatus
09/29/2005US20050211671 Oxygen plasma treatment for a nitride surface to reduce photo footing
09/29/2005US20050211670 Providing a nickel-containing layer overlying a substrate;introducing gas comprising a carbonyl gas and a hydrogen halide gas;forming plasma from said process gas; etching nickel-containing layer by exposing nickel-containing layer to plasma
09/29/2005US20050211668 Methods of processing a substrate with minimal scalloping
09/29/2005US20050211666 Method of processing a workpiece
09/29/2005US20050211592 Glass substrate package
09/29/2005US20050211564 Method and composition to enhance wetting of ECP electrolyte to copper seed
09/29/2005US20050211560 applying cothodic potentials to electroconductive layers formed on substrate having depression patterns, then dipping in a solution that is in contact with an anode, to form films; electrochemistry; electrodepostion
09/29/2005US20050211551 Apparatus and methods for electrochemical processing of microelectronic workpieces
09/29/2005US20050211549 Method and system for target lifetime
09/29/2005US20050211545 Ionized physical vapor deposition (iPVD) process
09/29/2005US20050211531 Apparatus of conveying LCD's substrate
09/29/2005US20050211515 Anti-vibration mount apparatus, exposure apparatus, and device manufacturing method
09/29/2005US20050211465 Electronic parts packaging structure and method of manufacturing the same
09/29/2005US20050211464 connecting microcircuits patterns such as tape carrier packages, flexible printed circuit, liquid crystal displays or printed circuit board using dielectric thermoplastic resins and anisotropic electroconductive adhesive including conductive particles
09/29/2005US20050211416 Heat sink with fins and a method for manufacturing the same
09/29/2005US20050211386 Processing system and method for chemically treating a substrate
09/29/2005US20050211385 Method and apparatus for controlling spatial temperature distribution
09/29/2005US20050211384 Thermally sprayed member, electrode and plasma processing apparatus using the electrode
09/29/2005US20050211383 Magnetron plasma-use magnetic field generation device
09/29/2005US20050211380 Plasma etching apparatus
09/29/2005US20050211378 Filter, substrate treatment apparatus and substrate treatment method
09/29/2005US20050211377 Multiple zone carrier head with flexible membrane
09/29/2005US20050211375 Method of manufacturing a semiconductor device
09/29/2005US20050211279 supplying cleaning gases into the enclosure through nozzles at the sidewalls of the enclosure, to fill the space between an upper and lower electrodes, then projecting and controlling gas amount, in response to the thickness of polymer deposits on the walls
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