Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2006
06/29/2006US20060138531 Method for fabricating vertical CMOS image sensor
06/29/2006US20060138530 Non-volatile memory cell having a silicon-oxide-nitride-oxide-silicon gate structure and fabrication method of such cell
06/29/2006US20060138527 Semiconductor devices, and electronic systems comprising semiconductor devices
06/29/2006US20060138526 Semiconductor device and method of manufacturing the same
06/29/2006US20060138525 Method of fabricating a floating gate for a nonvolatile memory
06/29/2006US20060138522 Flash memory devices comprising pillar patterns and methods of fabricating the same
06/29/2006US20060138518 Semiconductor device with silicon-germanium gate electrode and method for manufacturing thereof
06/29/2006US20060138515 Semiconductor device and fabricating method of the same
06/29/2006US20060138511 Methods of manufacturing a capacitor including a cavity containing a buried layer
06/29/2006US20060138510 Method for forming a stroage cell capacitor compatible with high dielectric constant materials
06/29/2006US20060138508 Insulating film and electronic device
06/29/2006US20060138506 Semiconductor memory device and method for manufacturing the same
06/29/2006US20060138502 Field-effect transistor with spin-dependent transmission characteristics and non-volatile memory using same
06/29/2006US20060138501 Semi-conductor dielectric component with a praseodymium oxide dielectric
06/29/2006US20060138500 CMOS image sensor and method for fabricating the same
06/29/2006US20060138499 Solid-state image sensor, method of manufacturing the same, and camera
06/29/2006US20060138495 Method and apparatus for collecting photons in a solid state imaging sensor
06/29/2006US20060138494 Photodiode in CMOS image sensor and fabricating method thereof
06/29/2006US20060138491 Method for fabricating CMOS image sensor
06/29/2006US20060138483 CMOS image sensor and method for manufacturing the same
06/29/2006US20060138482 CMOS image sensor and method of fabricating the same
06/29/2006US20060138481 Solid-state imaging device and method for manufacturing the same
06/29/2006US20060138477 Asymmetric recessed gate MOSFET and method for manufacturing the same
06/29/2006US20060138476 Dc amplifier and semiconductor integrated circuit therefor
06/29/2006US20060138475 Method of manufacturing a semiconductor device and semiconductor device obtained by means of such a method
06/29/2006US20060138472 CMOS image sensor
06/29/2006US20060138463 Semiconductor integrated circuit devices including SRAM cells and flash memory cells and methods of fabricating the same
06/29/2006US20060138462 Method of making a semiconductor device
06/29/2006US20060138461 Electrode wiring substrate and display device
06/29/2006US20060138456 Insulating gate AlGaN/GaN HEMT
06/29/2006US20060138455 Silicon carbide on diamond substrates and related devices and methods
06/29/2006US20060138454 Semiconductor device using a nitride semiconductor
06/29/2006US20060138449 Gallium nitride based light-emitting device
06/29/2006US20060138446 Algainn based optical device and fabrication method thereof
06/29/2006US20060138436 Light emitting diode package and process of making the same
06/29/2006US20060138432 Semiconductor light emitting device and method of manufacturing the same
06/29/2006US20060138427 Hybrid Circuit and Electronic Device Using Same
06/29/2006US20060138425 Methods of forming semiconductor constructions
06/29/2006US20060138423 Thin-film transistor, thin-film transistor sheet and their manufacturing method
06/29/2006US20060138422 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
06/29/2006US20060138418 Organic light emitting display and method of fabricating the same
06/29/2006US20060138417 Liquid crystal display device and fabricating method thereof
06/29/2006US20060138411 Semiconductor wafer with a test structure, and method
06/29/2006US20060138408 Multifunctional linker molecules for tuning electronic charge transport through organic-inorganic composite structures and uses thereof
06/29/2006US20060138407 Method for manufacturing semiconductor device having super junction construction
06/29/2006US20060138406 OFET structures with both n- and p-type channels
06/29/2006US20060138399 resist-removing solution for low-k film and a cleaning solution for via holes or capacitors; solutions comprising hydrogen fluoride (HF) and at least one member selected from organic acids and organic solvents (e.g. acetic acid, hexanol, lauryl alcohol, propylene glcol, glycerin, diethylene glycol)
06/29/2006US20060138368 Apparatus and method for inspecting semiconductor wafers for metal residue
06/29/2006US20060138366 Methods and systems for lithography process control
06/29/2006US20060138338 Mask blanks inspection tool
06/29/2006US20060138322 Backside imaging through a doped layer
06/29/2006US20060138189 Apparatus and method for splitting substrates
06/29/2006US20060138110 Processing a memory link with a set of at least two laser pulses
06/29/2006US20060138109 Processing a memory link with a set of at least two laser pulses
06/29/2006US20060138108 Processing a memory link with a set of at least two laser pulses
06/29/2006US20060138107 Processing a memory link with a set of at least two laser pulses
06/29/2006US20060138106 Processing a memory link with a set of at least two laser pulses
06/29/2006US20060138096 Processing a memory link with a set of at least two laser pulses
06/29/2006US20060138087 Copper containing abrasive particles to modify reactivity and performance of copper CMP slurries
06/29/2006US20060138086 Planarizing the silica with an aqueous mixture of a carboxy polymer, abrasive, polyvinylpyrrolidone, and optionally a cationic compound, phthalic acid or salts, and a zwitterionic compound; followed by cleaning with a aqueous quaternary ammonium compound, phthalic acid, carboxy polymer and abrasive
06/29/2006US20060138085 Plasma etching method with reduced particles production
06/29/2006US20060138080 Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern
06/29/2006US20060138078 Semiconductor device fabrication method
06/29/2006US20060138076 Method for making a planar suspended microstructure, using a sacrificial layer of polymer material and resulting component
06/29/2006US20060138050 Method and apparatus for metal removal by ION exchange
06/29/2006US20060137994 Method of wafer processing with edge seed layer removal
06/29/2006US20060137974 Wafer electroplating apparatus
06/29/2006US20060137822 Lateral temperature equalizing system for large area surfaces during processing
06/29/2006US20060137820 Plasma processing apparatus
06/29/2006US20060137819 Biased retaining ring
06/29/2006US20060137727 Ultrasonic washing apparatus and ultrasonic washing method
06/29/2006US20060137723 Workpiece processing using ozone gas and solvents
06/29/2006US20060137721 Liquid processing apparatus and liquid processing method
06/29/2006US20060137712 Cleaning apparatus and method for electronic device
06/29/2006US20060137710 Method for controlling corrosion of a substrate
06/29/2006US20060137709 Film formation apparatus and method of using the same
06/29/2006US20060137610 Plasma processing apparatus with insulated gas inlet pore
06/29/2006US20060137607 Combination of showerhead and temperature control means for controlling the temperature of the showerhead, and deposition apparatus having the same
06/29/2006US20060137606 High density plasma chemical vapor deposition apparatus for manufacturing semiconductor
06/29/2006US20060137600 Lightly doped silicon carbide wafer and use thereof in high power devices
06/29/2006US20060137598 Hydrodynamic cavitation crystallization device and process
06/29/2006US20060137597 Microfluidic device with diffusion between adjacent lumens
06/29/2006US20060137457 Pressure sensors circuits
06/29/2006US20060137430 Liquid flow proximity sensor for use in immersion lithography
06/29/2006DE69635227T2 Kontakträger zum bestücken von substraten mit federkontakten Contact carrier of fitting substrates with spring contacts
06/29/2006DE4115227B4 CCD-Bildwandler mit vier Taktsignalen CCD image sensor with four clock signals
06/29/2006DE202005020719U1 Schlaucheinsatzeinheit für ein Getränkeabgabesystem und Getränkeabgabesystem Cartridge unit for a beverage dispensing system and beverage dispensing system
06/29/2006DE19963674B4 Verfahren zur Ausbildung eines Oxynitridgatedielektrikums, Oxynitridgatedielektrikum und darauf angeordneter Gatestapel A method of forming a Oxynitridgatedielektrikums, Oxynitridgatedielektrikum and arranged thereon gate stack
06/29/2006DE19916599B4 Ferroelektrischer SWL-Speicher und Schaltung zum Ansteuern desselben The same SWL ferroelectric memory circuit for driving and
06/29/2006DE19829863B4 Verfahren zum Herstellen einer Halbleitervorrichtung A method of manufacturing a semiconductor device
06/29/2006DE19754462B4 Halbleitervorrichtungen Semiconductor devices
06/29/2006DE19724472B4 Halbleiterbauteil mit einer Verdrahtung und Verfahren zum Herstellen des Halbleiterbauteils A semiconductor device comprising a wiring and method for manufacturing the semiconductor device
06/29/2006DE19525081B4 Verfahren und Vorrichtung zum Testen der Funktion von Mikrostrukturelementen Method and device for testing the function of microstructure elements
06/29/2006DE112004001585T5 Zaunfreies Ätzen einer Iridium-Barriere mit einem steilen Böschungswinkel Fence Free etching an iridium-barrier with a steep angle of repose
06/29/2006DE112004001583T5 Klebefolie und Verfahren zur Bildung eines Metallfilms unter Verwendung derselben Adhesive film and method of forming a metal film using the same
06/29/2006DE112004001402T5 System zum Prozessieren eines Behandlungsobjekts System for processing a treatment object
06/29/2006DE112004001117T5 Halbleiterbauelement und Verfahren zur Herstellung A semiconductor device and method for producing
06/29/2006DE10261035B4 Fotomasken-Reparaturverfahren und Vorrichtung Photomask repair method and apparatus
06/29/2006DE10214175B4 Mittels Feldeffekt steuerbares Halbleiterbauelement und Verfahren zu dessen Herstellung By means of field-effect-controllable semiconductor component and process for its preparation
06/29/2006DE102005059224A1 Halbleitervorrichtung und Herstellungsverfahren dafür A semiconductor device and manufacturing method thereof