Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2010
05/18/2010US7719082 Memory device and storage apparatus
05/18/2010US7719081 Semiconductor device and method of manufacturing the same
05/18/2010US7719080 Semiconductor device with a conduction enhancement layer
05/18/2010US7719078 Semiconductor device and method of producing the same
05/18/2010US7719077 Method for the production of a semiconductor component
05/18/2010US7719069 Three terminal magnetic sensor having a collector region electrically isolated from a carrier substrate body
05/18/2010US7719067 Devices having vertically-disposed nanofabric articles and methods of making the same
05/18/2010US7719063 Semiconductor integrated circuit having plural transistors
05/18/2010US7719060 Tensile strain source using silicon/germanium in globally strained silicon
05/18/2010US7719059 Fin field effect transistor arrangement and method for producing a fin field effect transistor arrangement
05/18/2010US7719050 Low power electrically alterable nonvolatile memory cells and arrays
05/18/2010US7719048 Heating element for enhanced E2PROM
05/18/2010US7719046 Apparatus and method for trench transistor memory having different gate dielectric thickness
05/18/2010US7719044 Platinum-containing integrated circuits and capacitor constructions
05/18/2010US7719035 Low contact resistance CMOS circuits and methods for their fabrication
05/18/2010US7719032 Electronic device and its manufacturing method
05/18/2010US7719031 Heterojunction biploar transistor and method for manufacturing same
05/18/2010US7719027 Intergrated circuit utilizing down bond to define the function of the die and the implementing method thereof
05/18/2010US7719021 Light efficient LED assembly including a shaped reflective cavity and method for making same
05/18/2010US7719007 Flexible electroluminescent capacitive sensor
05/18/2010US7719005 Structure and method for monitoring and characterizing pattern density dependence on thermal absorption in a semiconductor manufacturing process
05/18/2010US7718994 Array substrates for use in liquid crystal displays and fabrication methods thereof
05/18/2010US7718991 Lighting device and method of making
05/18/2010US7718930 Loading table and heat treating apparatus having the loading table
05/18/2010US7718925 Substrate heat treatment apparatus
05/18/2010US7718591 contain one or more non-ammonium producing, non-HF producing fluoride salt (non ammonium, quaternary ammonium fluoride salt) in suitable solvent matrix; having improved compatibility with microelectronic substrates characterized by sensitive porous and low-high-kappa dielectrics and copper metallization
05/18/2010US7718554 Focused laser beam processing
05/18/2010US7718553 Method for forming insulation film having high density
05/18/2010US7718552 Nanostructured titania
05/18/2010US7718551 Method for forming photoresist layer
05/18/2010US7718550 Method for low temperature growth of inorganic materials from solution using catalyzed growth and re-growth
05/18/2010US7718549 Method of making a polymer device
05/18/2010US7718548 Selective copper-silicon-nitride layer formation for an improved dielectric film/copper line interface
05/18/2010US7718547 Semiconductor device and method for manufacturing the same
05/18/2010US7718546 Method for fabricating a 3-D integrated circuit using a hard mask of silicon-oxynitride on amorphous carbon
05/18/2010US7718545 Fabrication process
05/18/2010US7718544 Method of forming silicon-containing insulation film having low dielectric constant and low diffusion coefficient
05/18/2010US7718543 Two step etching of a bottom anti-reflective coating layer in dual damascene application
05/18/2010US7718542 Low-k damage avoidance during bevel etch processing
05/18/2010US7718541 Method of processing resist, semiconductor device, and method of producing the same
05/18/2010US7718540 Pitch reduced patterns relative to photolithography features
05/18/2010US7718539 Method for photomask fabrication utilizing a carbon hard mask
05/18/2010US7718538 Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates
05/18/2010US7718537 Method for manufacturing a CBRAM semiconductor memory
05/18/2010US7718536 Planarization process for pre-damascene structure including metal hard mask
05/18/2010US7718535 Slurry compositions and CMP methods using the same
05/18/2010US7718534 Planarization of a heteroepitaxial layer
05/18/2010US7718533 Inverted variable resistance memory cell and method of making the same
05/18/2010US7718532 Method of forming a high-k film on a semiconductor device
05/18/2010US7718531 Method for forming catalyst nanoparticles for growing elongated nanostructures
05/18/2010US7718530 Method for manufacturing semiconductor device
05/18/2010US7718529 Inverse self-aligned spacer lithography
05/18/2010US7718528 Photoactive adhesion promoter in a SLAM
05/18/2010US7718527 Method for forming cobalt tungsten cap layers
05/18/2010US7718526 Fabrication method of semiconductor integrated circuit device
05/18/2010US7718525 Metal interconnect forming methods and IC chip including metal interconnect
05/18/2010US7718524 Method of manufacturing semiconductor device
05/18/2010US7718523 Solder attach film and method of forming solder ball using the same
05/18/2010US7718522 Method and apparatus for plating a semiconductor package
05/18/2010US7718521 Semiconductor device and method for manufacturing the same
05/18/2010US7718520 Semiconductor integrated circuit device and related method
05/18/2010US7718519 Method for manufacturing silicon carbide semiconductor element
05/18/2010US7718518 Low temperature doped silicon layer formation
05/18/2010US7718517 Single-shot semiconductor processing system and method having various irradiation patterns
05/18/2010US7718516 Method for epitaxial growth of (110)-oriented SrTiO3 thin films on silicon without template
05/18/2010US7718515 Method for fabricating semiconductor device
05/18/2010US7718514 Method of forming a guard ring or contact to an SOI substrate
05/18/2010US7718513 Forming silicided gate and contacts from polysilicon germanium and structure formed
05/18/2010US7718512 Integrated circuit wafer with inter-die metal interconnect lines traversing scribe-line boundaries
05/18/2010US7718511 Processing method for wafer
05/18/2010US7718510 Laser processing method and semiconductor chip
05/18/2010US7718509 Method for producing bonded wafer
05/18/2010US7718508 Semiconductor bonding and layer transfer method
05/18/2010US7718507 Bonded wafer and method of producing the same
05/18/2010US7718506 Isolation structure for MOS transistor and method for forming the same
05/18/2010US7718505 Method of forming a semiconductor structure comprising insulating layers with different thicknesses
05/18/2010US7718504 Semiconductor device having align key and method of fabricating the same
05/18/2010US7718503 SOI device and method for its fabrication
05/18/2010US7718502 Semiconductor apparatus including a thin-metal-film resistor element and a method of manufacturing the same
05/18/2010US7718501 Method for the production of MOS transistors
05/18/2010US7718500 Formation of raised source/drain structures in NFET with embedded SiGe in PFET
05/18/2010US7718499 Method of fabricating a semiconductor device
05/18/2010US7718498 Semiconductor device and method of producing same
05/18/2010US7718497 Method for manufacturing semiconductor device
05/18/2010US7718496 Techniques for enabling multiple Vt devices using high-K metal gate stacks
05/18/2010US7718495 Methods of forming integrated circuitry, methods of forming memory circuitry, and methods of forming field effect transistors
05/18/2010US7718494 Method for forming high-drain-voltage tolerance MOSFET transistor in a CMOS process flow with double well dose approach
05/18/2010US7718493 Method for forming semiconductor device
05/18/2010US7718492 Non-volatile memory cell circuit with programming through band-to-band tunneling and impact ionization gate current
05/18/2010US7718491 Method for making a NAND Memory device with inversion bit lines
05/18/2010US7718490 Nonvolatile semiconductor storage device and manufacturing method therefor
05/18/2010US7718489 Double-gate FETs (field effect transistors)
05/18/2010US7718488 Process of fabricating flash memory with enhanced program and erase coupling
05/18/2010US7718487 Method of manufacturing ferroelectric layer and method of manufacturing electronic instrument
05/18/2010US7718486 Structures and methods for fabricating vertically integrated HBT-FET device
05/18/2010US7718485 Interlayer dielectric under stress for an integrated circuit
05/18/2010US7718484 Method of forming a dielectic film that contains silicon, oxygen and nitrogen and method of fabricating a semiconductor device that uses such a dielectric film
05/18/2010US7718483 Method of manufacturing non-volatile semiconductor memory
05/18/2010US7718482 CD gate bias reduction and differential N+ poly doping for CMOS circuits
05/18/2010US7718481 Semiconductor structure and method of manufacture
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