Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2010
06/23/2010CN101752270A Method of forming stacked IC semiconductor crystal grain
06/23/2010CN101752269A Integrated circuit structure and its forming method
06/23/2010CN101752268A Method of making integrated circuits
06/23/2010CN101752267A Chip scale package structure of CMOS (complementary metal-oxide-semiconductor) image sensor and packaging method
06/23/2010CN101752266A Chip scale package structure of CMOS (complementary metal-oxide-semiconductor) image sensor and packaging method
06/23/2010CN101752265A Assembling method and assembling tool for memory and radiating plate
06/23/2010CN101752264A Radiating semiconductor sealing structure and making method thereof
06/23/2010CN101752263A Automatic separator for semiconductor elements
06/23/2010CN101752262A Circuit board technique
06/23/2010CN101752261A Semiconductor process and silicon baseplate and chip packaging structure formed by applying same
06/23/2010CN101752260A Method for manufacturing oxide semiconductor active layer of thin film transistor
06/23/2010CN101752259A Process of forming an electronic device including a trench and a conductive structure therein
06/23/2010CN101752258A Method of forming semiconductor structure
06/23/2010CN101752257A Method for preparing ZnO nanowire suspended back gate field-effect transistor
06/23/2010CN101752256A Method for preparing ZnO multi-channel nanowire field-effect transistor
06/23/2010CN101752255A Manufacture method of p-channel metal oxide semiconductor (PMOS) transistor and grid doping method
06/23/2010CN101752254A Ion implantation zone forming method, MOS transistor and manufacture method thereof
06/23/2010CN101752253A Manufacture method of metal oxide semiconductor (MOS) transistor
06/23/2010CN101752252A Forming method of longitudinal P-shaped district in CoolMOS structure
06/23/2010CN101752251A Fully-automatic aligning high-pressure N-shaped DMOS device and manufacturing method thereof
06/23/2010CN101752250A Method for preparing ZnO nanowire field-effect transistor
06/23/2010CN101752249A Method for positioning ZnO nanowire to field effect tube substrate by adopting nanometer optical tweezer technology
06/23/2010CN101752248A Thyristor core manufacturing process
06/23/2010CN101752247A Method for automatically collimating and forming Zener diode
06/23/2010CN101752246A Semiconductor wafer, semiconductor chip, and method and apparatus for processing wafer
06/23/2010CN101752245A Production method and oxidization system of semiconductor device
06/23/2010CN101752244A Process for producing materials for electronic device
06/23/2010CN101752243A Method for removing silicon dioxide film on front chemical vapor deposition layer
06/23/2010CN101752242A Method for manufacturing insulation layer and method for manufacturing semiconductor device using the same
06/23/2010CN101752241A Large-area GaAs substrate etching process
06/23/2010CN101752240A Group iii nitride semiconductor substrate production method, and group iii nitride semiconductor substrate
06/23/2010CN101752239A Polishing method for reducing liquid corrosion pits on chemical and mechanical polished surface of silicon substrate material
06/23/2010CN101752238A Method for forming semiconductor element
06/23/2010CN101752237A Formation of high-K gate stacks in semiconductor devices
06/23/2010CN101752236A Atomic layer deposition Al2O3/HfO2 method for regulating energy band offset between GaAs semiconductor and gate dielectric
06/23/2010CN101752235A Method for forming and processing high-K gate dielectric layer and method for forming transistor
06/23/2010CN101752234A Electronic element with through hole and manufacturing method for film transistor element
06/23/2010CN101752233A Method for in-place dopyed polysilicon gate
06/23/2010CN101752232A Experimental method for realizing multi-ion injection condition on silicon wafer
06/23/2010CN101752231A Ion injection method of bag-shaped injection region and manufacture method of MOS (Metal Oxide Semiconductor) transistor
06/23/2010CN101752230A Method for manufacturing microcrystalline silicon films for thin film transistor and the device thereof
06/23/2010CN101752229A Ion injection method of a bag-shaped injection region and manufacture method of MOS (Metal Oxide Semiconductor) transistor
06/23/2010CN101752228A Photolithography
06/23/2010CN101752227A Manufacturing method of shallow groove isolation structure for MOS capacitance
06/23/2010CN101752226A Electrical inductance in integrated circuit and manufacturing method
06/23/2010CN101752225A Multistage etching and filling method of ultra-deep groove
06/23/2010CN101752224A Component cleaning method
06/23/2010CN101752223A Method and apparatus for manufacturing semiconductor device
06/23/2010CN101752222A Foreign substance removing apparatus and foreign substance removing method
06/23/2010CN101752221A Vacuum vessel, vacuum vessel manufacturing method, vacuum processing apparatus, and electronic device manufacturing method
06/23/2010CN101752220A Loading lock device and vacuum processing system
06/23/2010CN101752219A Method and apparatus for separating protective tape from semiconductor wafer
06/23/2010CN101752218A Substrate inspecting method, substrate inspecting device and storage medium
06/23/2010CN101752217A Film for manufacturing semiconductor device and method of manufacturing the same
06/23/2010CN101752216A Method of manufacturing semiconductor device, exposure device, and recording medium
06/23/2010CN101752215A Method for the treatment of a semiconductor wafer
06/23/2010CN101752214A Semiconductor processing cavity part and production method thereof, as well as semiconductor processing equipment
06/23/2010CN101752213A Low temperature heat-treatment process for eliminating water mist on silicon chip surface
06/23/2010CN101752212A Wafer surface oxidation film removal method
06/23/2010CN101752211A Method for preparing nano-wire containing inorganic/organic heterojunction
06/23/2010CN101752210A Method for reducing residual charge of plasma etching process
06/23/2010CN101752209A Method for reducing spherical defect and device
06/23/2010CN101752208A Semiconductor high-voltage terminal structure and production method thereof
06/23/2010CN101752207A Method for eliminating hydrogen bromide concentrated residues in dry etching
06/23/2010CN101752206A Method for improving grinding particle residue
06/23/2010CN101752205A Method for shrinking line-shaped pattern character size
06/23/2010CN101752204A Method for separating chip and rubber film and chip removal method
06/23/2010CN101752203A Preparation method of inclined groove
06/23/2010CN101752087A Polyvinylidene fluoride (PVDF) organic polymer thin film capacitor
06/23/2010CN101752023A Nanocable production method taking alumina as wrapping layer
06/23/2010CN101752002A Aluminum copper oxide based memory devices and methods for manufacture
06/23/2010CN101751592A Method and circuit for setting and reading unique identification code of chip on silicon wafer in batch
06/23/2010CN101751013A Auxiliary distribution system and auxiliary distribution method for semiconductor manufacturing production
06/23/2010CN101750977A System and method for controlling semiconductor manufacturing equipment using user interface
06/23/2010CN101750916A Composition for photoresist stripper and method of fabricating thin film transistor array substrate
06/23/2010CN101750900A Method for determining photoetching procedure causing low yield rate in the unit of exposure area
06/23/2010CN101750879A Exposure mask and method for manufacturing semiconductor device using the same
06/23/2010CN101750874A Extreme ultraviolet photomask and methods and apparatuses for manufacturing the extreme ultraviolet photomask
06/23/2010CN101750835A Fabrication line of electrophoretic display deivce and method of fabricating electrophoretic display deivce
06/23/2010CN101750825A Array substrate for display device and method for fabricating the same
06/23/2010CN101750822A Display substrate and methode of manufacturing the same
06/23/2010CN101750819A Array substrate for transflective liquid crystal display device and manufacturing method thereof
06/23/2010CN101750814A Liquid crystal display device and manufacturing method thereof
06/23/2010CN101750277A Solder collecting device for reliability testing of semiconductor element and method thereof
06/23/2010CN101750038A Test wafer for edge detection and wafer edge detection method
06/23/2010CN101749949A Circle substrate firing furnace
06/23/2010CN101749881A Cooling apparatus and cooling method
06/23/2010CN101748459A Method for depositing copper film on semiconductor wafer super-uniformly
06/23/2010CN101748458A Electroplating system
06/23/2010CN101748405A Transparent conducting film and preparation method thereof, solar battery and flat panel display device
06/23/2010CN101748390A Heating device and semiconductor processing device
06/23/2010CN101748389A Film deposition apparatus, film deposition method, semiconductor device fabrication apparatus and susceptor for use in the same
06/23/2010CN101748387A Film deposition apparatus
06/23/2010CN101748383A Silicon compounds for producing SiO2-containing insulating layers on chips
06/23/2010CN101748378A Film-forming carrier board and production method of solar batteries
06/23/2010CN101748374A Method for growing high density and fine self-assembled Ge quantum dot with ion beam sputtering technology
06/23/2010CN101748002A Fluorine-containing composition and application thereof
06/23/2010CN101747842A Chemical-mechanical polishing solution
06/23/2010CN101746717A methods of forming carbon nanotubes
06/23/2010CN101746605A System for keeping and supplying substrate
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