Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2010
06/24/2010WO2010071868A2 Wiresaw apparatus and method for continuous removal of magnetic impurities during wiresaw cutting
06/24/2010WO2010071834A2 Method to enhance charge trapping
06/24/2010WO2010071638A1 Method and apparatus for laser-processing a semiconductor photovoltaic apparatus
06/24/2010WO2010071633A1 Semiconductor structure having an elog on a thermally and electrically conductive mask
06/24/2010WO2010071629A1 A system for placing electronic devices in a restricted space of a printed circuit board
06/24/2010WO2010071609A2 System and processing of a substrate
06/24/2010WO2010071594A1 A nanostructured device
06/24/2010WO2010071574A1 Stretchable high-frequency electronics
06/24/2010WO2010071389A1 Dielectric fluid composition containing vegetable oils and free of antioxidants
06/24/2010WO2010071278A1 Wafer transfer unit and probe station including the same
06/24/2010WO2010071275A1 Control unit for adjusting a wafer angle in a probe apparatus
06/24/2010WO2010071274A1 Apparatus for holding a wafer
06/24/2010WO2010071201A1 Film removal method, photoelectric conversion device manufacturing method, photoelectric conversion device, and film removal device
06/24/2010WO2010071183A1 Method for manufacturing semiconductor device
06/24/2010WO2010071174A1 Method for initializing magnetoresistive element, and magnetoresistive element
06/24/2010WO2010071160A1 Active matrix substrate manufacturing method and liquid crystal display device manufacturing method
06/24/2010WO2010071159A1 Insulated gate transistor, active matrix substrate, liquid crystal display unit, and method of production of same
06/24/2010WO2010071134A1 Photo-curing material manufacturing method, and photo-curing material and article
06/24/2010WO2010071101A1 System for processing of substrate, method of processing of substrate, and storage medium that stores program
06/24/2010WO2010071100A1 Positive-type photosensitive polyimide resin composition
06/24/2010WO2010071086A1 Low expansion glass substrate for reflection type mask and method for processing same
06/24/2010WO2010071084A1 Semiconductor device and manufacturing method therefor
06/24/2010WO2010071081A1 Top coat composition
06/24/2010WO2010071074A1 Ion implantation apparatus, ion implantation method, and semiconductor device
06/24/2010WO2010071036A1 Plasma light source and plasma light generation method
06/24/2010WO2010071034A1 Method for manufacturing transistor
06/24/2010WO2010071031A1 Wiring structure, semiconductor element, wiring substrate, display panel, and display device
06/24/2010WO2010071029A1 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
06/24/2010WO2010071015A1 Semiconductor device
06/24/2010WO2010071005A1 Method for cleaning object and system for cleaning object
06/24/2010WO2010070981A1 Method and apparatus for manufacturing semiconductor device
06/24/2010WO2010070947A1 Resin paste for die bonding, method for producing semiconductor device, and semiconductor device
06/24/2010WO2010070896A1 Vacuum processing apparatus and vacuum transfer apparatus
06/24/2010WO2010070863A1 Epitaxial substrate for electronic devices and manufacturing method therefor
06/24/2010WO2010070845A1 Sputtering device and sputtering method
06/24/2010WO2010070832A1 Sintered complex oxide and sputtering target comprising same
06/24/2010WO2010070826A1 Method for forming through electrode, and semiconductor device
06/24/2010WO2010070824A1 Semiconductor device, method for manufacturing semiconductor device, and switch circuit
06/24/2010WO2010070819A1 Cleaning agent for electronic materials
06/24/2010WO2010070806A1 Semiconductor device, flip-chip mounting method and flip-chip mounting apparatus
06/24/2010WO2010070802A1 Method for manufacturing optical matrix device
06/24/2010WO2010070785A1 Resist material and method for pattern formation using the resist material
06/24/2010WO2010070782A1 Semiconductor device and method for manufacturing same
06/24/2010WO2010070562A2 Device for treating disc-like articles and method for oparating same
06/24/2010WO2010070377A1 Strain engineered composite semiconductor substrates and methods of forming same
06/24/2010WO2010070320A1 Semiconductor device with integrated antenna and manufacturing method therefor
06/24/2010WO2010070240A1 Method for lowering the pressure in a charge-discharge lock and associated equipment
06/24/2010WO2010070186A1 Method for manufacturing a component by etching
06/24/2010WO2010070103A1 Method for the collective production of electronic modules for surface mounting
06/24/2010WO2010070077A1 Optoelectronic semiconductor component and method for the manufacture thereof
06/24/2010WO2010069861A1 A method of thinning a structure
06/24/2010WO2010069642A1 Component having a via, and a method for producting a component such as this
06/24/2010WO2010069497A1 Wafer chuck for euv lithography
06/24/2010WO2010069438A1 Infrared radiator arrangement for high-temperature vacuum processes
06/24/2010WO2010069077A1 Face-to-face (f2f) hybrid structure for an integrated circuit
06/24/2010WO2010049846A3 Semiconductor chip, method of manufacturing a semiconductor chip, and method of testing a semiconductor chip
06/24/2010WO2010049087A3 A semiconductor device including a reduced stress configuration for metal pillars
06/24/2010WO2010048161A8 Techniques for atomic layer deposition
06/24/2010WO2010042290A3 Methods of utilizing block copolymer to form patterns
06/24/2010WO2010042237A3 Method and apparatus for simplified startup of chemical vapor deposition of polysilicon
06/24/2010WO2010042183A3 Method and apparatus for circuit simulation
06/24/2010WO2010034824A3 Method for performing parallel stochastic assembly
06/24/2010WO2010027841A3 High speed deposition of materials having low defect density
06/24/2010WO2010027232A3 Paste and manufacturing methods of a solar cell using the same
06/24/2010WO2010011476A4 Deposition methods and releasing stress buildup
06/24/2010WO2010005979A3 Display apparatus and methods for manufacture thereof
06/24/2010WO2010005540A4 Clamped monolithic showerhead electrode
06/24/2010WO2009066464A9 Nitride semiconductor and nitride semiconductor crystal growth method
06/24/2010US20100160589 Method of manufacturing semiconductor device, acid etching resistance material and copolymer
06/24/2010US20100160143 Semiconductor processing apparatus comprising a solid solution ceramic of yttrium oxide and zirconium oxide
06/24/2010US20100159785 In-plane switching mode liquid crystal display device
06/24/2010US20100159712 Method of determining a target mesa configuration of an electrostatic chuck
06/24/2010US20100159711 Precursor addition to silicon oxide cvd for improved low temperature gapfill
06/24/2010US20100159710 Semiconductor manufacturing apparatus, liquid container, and semiconductor device manufacturing method
06/24/2010US20100159709 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method
06/24/2010US20100159708 Method for forming required pattern on semiconductor substrate by thermal reflow technique
06/24/2010US20100159707 Gas distribution system having fast gas switching capabilities
06/24/2010US20100159706 Method of plasma etching ga-based compound semiconductors
06/24/2010US20100159705 Method of plasma etching ga-based compound semiconductors
06/24/2010US20100159704 Method for etching a sample
06/24/2010US20100159703 Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
06/24/2010US20100159702 Manufacturing method of semiconductor device
06/24/2010US20100159701 Exposure mask and method for manufacturing semiconductor device using the same
06/24/2010US20100159700 Method for Fabricating Cylinder Type Capacitor
06/24/2010US20100159699 Sandblast etching for through semiconductor vias
06/24/2010US20100159698 Combination, Method, and Composition for Chemical Mechanical Planarization of A Tungsten-Containing Substrate
06/24/2010US20100159697 Method for manufacturing semiconductor device
06/24/2010US20100159696 Microlens mask of image sensor and method for forming microlens using the same
06/24/2010US20100159695 Method of fabricating display device
06/24/2010US20100159694 Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics
06/24/2010US20100159693 Method of Forming Via Recess in Underlying Conductive Line
06/24/2010US20100159692 Attachment using magnetic particle based solder composites
06/24/2010US20100159691 Photosensitive resin composition and laminate
06/24/2010US20100159690 Method of manufacturing semiconductor device that uses both a normal photomask and a phase shift mask for defining interconnect patterns
06/24/2010US20100159689 Semiconductor devices having contact plugs with stress buffer spacers and methods of fabricating the same
06/24/2010US20100159688 Device fabrication
06/24/2010US20100159687 Semiconductor device having electrode and manufacturing method thereof
06/24/2010US20100159686 Semiconductor device and method of manufacturing the same
06/24/2010US20100159685 Eliminating Poly Uni-Direction Line-End Shortening Using Second Cut
06/24/2010US20100159684 Metal High-K (MHK) Dual Gate Stress Engineering Using Hybrid Orientation (HOT) CMOS