Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2010
07/01/2010WO2010040032A3 Methods for preparation of znte nanocrystals
07/01/2010WO2010040011A3 Vapor phase epitaxy system
07/01/2010WO2010039936A3 Use of surfactant/defoamer mixtures for enhanced metals loading and surface passivation of silicon substrates
07/01/2010WO2010039689A3 Fluid delivery mechanism for vaccum wafer processing system
07/01/2010WO2010039629A3 Method of patterning a metal on a vertical sidewall of an excavated feature, method of forming an embedded mim capacitor using same, and embedded memory device produced thereby
07/01/2010WO2010039520A3 Methods for simultaneously forming n-type and p-type doped regions using non-contact printing processes
07/01/2010WO2010039207A3 Semiconductor structure with an electric field stop layer for improved edge termination capability
07/01/2010WO2010038972A3 Source gas supply apparatus
07/01/2010WO2010036707A3 Adjustable thermal contact between an electrostatic chuck and a hot edge ring by clocking a coupling ring
07/01/2010WO2010036657A3 Methods for fabricating faceplate of semiconductor apparatus
07/01/2010WO2010036621A3 Defect-free junction formation using octadecaborane self-amorphizing implants
07/01/2010WO2010033889A3 Poly(arylene ether) composition and a covered conductor with flexible covering wall and large size conductor
07/01/2010WO2010033761A3 Self-diagnostic semiconductor equipment
07/01/2010WO2010033448A3 Improved thin film scribe process
07/01/2010WO2010030102A3 Electrostatic chuck (esc) comprising a double buffer layer (dbl) to reduce thermal stress
07/01/2010WO2010028304A3 Cmp system with wireless endpoint detection system
07/01/2010WO2009076299A3 Implementation of advanced endpoint functions within third party software by using a plug-in approach
07/01/2010US20100169042 System for measuring a shape, method for measuring a shape, and computer program product
07/01/2010US20100168909 Substrate Processing Apparatus
07/01/2010US20100168908 Transport method and transport apparatus
07/01/2010US20100168895 Mask verification method, method of manufacturing semiconductor device, and computer readable medium
07/01/2010US20100168892 Method and system for synchronizing chamber down times by controlling transport sequencing in a process tool
07/01/2010US20100168889 Substrate treatment apparatus, substrate treatment method and storage medium
07/01/2010US20100168327 Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same
07/01/2010US20100167556 Three degree of movement mover and method for controlling a three degree of movement mover
07/01/2010US20100167555 Method in depositing metal oxide materials
07/01/2010US20100167554 Methods forming high dielectric target layer
07/01/2010US20100167553 Organosilane polymer with improved gap-filling property for semiconductor device and coating composition using the same
07/01/2010US20100167552 Methods for particle removal during integrated circuit device fabrication
07/01/2010US20100167551 Dual path gas distribution device
07/01/2010US20100167550 Method for manufacturing semiconductor
07/01/2010US20100167549 Substrate processing method
07/01/2010US20100167548 Method for forming fine pattern using quadruple patterning in semiconductor device
07/01/2010US20100167547 Polishing liquid
07/01/2010US20100167546 Method and Composition for Chemical Mechanical Planarization of A Metal or A Metal Alloy
07/01/2010US20100167545 Method and Composition for Chemical Mechanical Planarization of A Metal
07/01/2010US20100167544 Door assembly for substrate processing chamber
07/01/2010US20100167543 Method for manufacturing semiconductor device
07/01/2010US20100167542 Methods of Titanium Deposition
07/01/2010US20100167541 Method of manufacturing semiconductor device, cleaning method and cleaning control apparatus
07/01/2010US20100167540 Film Forming Method, Plasma Film Forming Apparatus and Storage Medium
07/01/2010US20100167539 Method for insulating wires of semiconductor device
07/01/2010US20100167538 Method for removing native oxide remaining on a surface of a semiconductor device during manufacturing
07/01/2010US20100167537 Partitioning features of a single ic layer onto multiple photolithographic masks
07/01/2010US20100167536 Method for removing hardened polymer residue
07/01/2010US20100167535 Cleaning agent for semiconductor device and method for producing semiconductor device using the cleaning agent
07/01/2010US20100167534 Method for fabricating a semiconductor chip device having through-silicon-via (tsv)
07/01/2010US20100167533 Method of fabricating semiconductor integrated circuit device
07/01/2010US20100167532 Method of high aspect ratio plug fill
07/01/2010US20100167531 Semiconductor device and method for manufacturing the same
07/01/2010US20100167530 Method for forming metal line of semiconductor device
07/01/2010US20100167529 Method for Manufacturing Semiconductor Device
07/01/2010US20100167528 Low resistance metal silicide local interconnects and a method of making
07/01/2010US20100167527 Method of depositing tungsten film with reduced resistivity and improved surface morphology
07/01/2010US20100167526 Method for improving electromigration lifetime of copper interconnection by extended post anneal
07/01/2010US20100167525 Semiconductor device and method of manufacture thereof
07/01/2010US20100167524 Method for fabricating metal interconnection of semiconductor device
07/01/2010US20100167523 Semiconductor device and method of fabricating the same
07/01/2010US20100167522 Structures and methods for improving solder bump connections in semiconductor devices
07/01/2010US20100167521 Semiconductor Processing Methods
07/01/2010US20100167520 Resist feature and removable spacer pitch doubling patterning method for pillar structures
07/01/2010US20100167519 Post high-k dielectric/metal gate clean
07/01/2010US20100167518 Cross-contamination control for semiconductor process flows having metal comprising gate electrodes
07/01/2010US20100167517 Cross-contamination control for processing of circuits comprising mos devices that include metal comprising high-k dielectrics
07/01/2010US20100167516 Semiconductor device and manufacturing method thereof
07/01/2010US20100167515 Method for fabricating flash memory device
07/01/2010US20100167514 Post metal gate vt adjust etch clean
07/01/2010US20100167513 Dual alignment strategy for optimizing contact layer alignment
07/01/2010US20100167512 Methods for Nanostructure Doping
07/01/2010US20100167511 Methods for simultaneously forming doped regions having different conductivity-determining type element profiles
07/01/2010US20100167510 Methods of using a set of silicon nanoparticle fluids to control in situ a set of dopant diffusion profiles
07/01/2010US20100167509 Method for producing a buried n-doped semiconductor zone in a semiconductor body and semiconductor component
07/01/2010US20100167508 Method for introducing impurities and apparatus for introducing impurities
07/01/2010US20100167507 Plasma doping apparatus and plasma doping method
07/01/2010US20100167506 Inductive plasma doping
07/01/2010US20100167505 Methods for reducing loading effects during film formation
07/01/2010US20100167504 Methods of Fabricating Nanostructures
07/01/2010US20100167503 Methods and systems of transferring, docking and processing substrates
07/01/2010US20100167502 Nanoimprint enhanced resist spacer patterning method
07/01/2010US20100167501 Separation of semiconductor devices
07/01/2010US20100167500 Method of recycling an epitaxied donor wafer
07/01/2010US20100167499 Method for making a stressed structure designed to be dissociated
07/01/2010US20100167498 Substrate level bonding method and substrate level package
07/01/2010US20100167497 Use of field oxidation to simplify chamber fabrication in microfluidic devices
07/01/2010US20100167496 Method for forming device isolation layer of semiconductor device and non-volatile memory device
07/01/2010US20100167495 Semiconductor device manufacturing method, semiconductor device and wafer
07/01/2010US20100167494 Selective Etching Method and Method for Forming an Isolation Structure of a Memory Device
07/01/2010US20100167493 Method of manufacturing semiconductor device
07/01/2010US20100167492 Semiconductor device and method of manufacturing the same
07/01/2010US20100167491 Method for fabricating flash memory device
07/01/2010US20100167490 Method of Fabricating Flash Memory Device
07/01/2010US20100167489 Mim capacitor and method of fabricating the same
07/01/2010US20100167488 Integrated circuit comprising a gradually doped bipolar transistor and corresponding fabrication process
07/01/2010US20100167487 Mask rom devices and methods for forming the same
07/01/2010US20100167486 Method of fabricating transistor for semiconductor device
07/01/2010US20100167485 Contact Barrier Structure and Manufacturing Methods
07/01/2010US20100167484 Gate line edge roughness reduction by using 2P/2E process together with high temperature bake
07/01/2010US20100167483 Method for fabricating pmos transistor
07/01/2010US20100167482 Semiconductor device manufacturing method
07/01/2010US20100167481 Manufacturing process of a vertical-conduction misfet device with gate dielectric structure having differentiated thickness and vertical-conduction misfet device thus manufacture
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