Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2010
08/18/2010CN101233655B Anisotropic conductive film and method for producing same
08/18/2010CN101231159B Method of measuring topology of functional liquid droplet in pixel, and topology measuring apparatus of functional liquid in pixel
08/18/2010CN101211775B Semiconductor device and method for forming pattern in the same
08/18/2010CN101211769B Grids structure manufacture method
08/18/2010CN101207146B Image sensor and manufacturing method thereof
08/18/2010CN101207024B Semiconductor memory and forming method thereof
08/18/2010CN101206331B Liquid crystal display device and method for manufacturing the same
08/18/2010CN101197252B Apparatus for attaching substrates and gap control unit thereof
08/18/2010CN101174547B Wafer processing method
08/18/2010CN101164150B Method and device for transferring a chip to a contact substrate
08/18/2010CN101162689B Focus ring and plasma processing apparatus
08/18/2010CN101156508B Electronic component manufacturing apparatus
08/18/2010CN101154665B Semiconductor device having reduced standby leakage current and increased driving current and method for manufacturing the same
08/18/2010CN101142669B Formation and treatment of a SiGe structure
08/18/2010CN101123175B Semiconductor wafer holding method, semiconductor wafer holding apparatus and semiconductor wafer holding structure
08/18/2010CN101118842B Method for joining adhesive tape to semiconductor wafer, method for separating protective tape from semiconductor wafer, and apparatuses using the methods
08/18/2010CN101106072B Direct water-repellent gluing method of two substrates used in electronics, optics or optoelectronics
08/18/2010CN101071784B Probing apparatus and probing method
08/18/2010CN101071764B Probing apparatus and probing method
08/18/2010CN101065843B Method for manufacturing an electronics module
08/18/2010CN101060325B Storage medium for storing unit information bank and method of designing semiconductor integrated circuit
08/18/2010CN101047115B Substrate processing apparatus and substrate transferring method
08/18/2010CN101044258B Plasma sputtering film deposition method and equipment
08/18/2010CN101043041B Active matrix substrate, liquid crystal display device, and method of manufacturing liquid crystal display device
08/18/2010CN101030559B Method of manufacturing flash memory device
08/18/2010CN101006576B Integrated low-K hard mask
08/18/2010CN101006021B Large-size glass substrate for photomask and making method, and mother glass exposure method
08/17/2010USRE41538 Method for making integrated circuit including interconnects with enhanced electromigration resistance using doped seed layer and integrated circuits produced thereby
08/17/2010USRE41511 Semiconductor device having a thin-film circuit element provided above an integrated circuit
08/17/2010USRE41509 High voltage vertical conduction superjunction semiconductor device
08/17/2010USRE41506 Offset measuring mechanism and offset measuring method in a bonding apparatus
08/17/2010US7779323 Multiple-capture DFT system for detecting or locating crossing clock-domain faults during self-test or scan-test
08/17/2010US7778721 Small lot size lithography bays
08/17/2010US7778533 Semiconductor thermal process control
08/17/2010US7777864 Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same
08/17/2010US7777861 Methods, systems, and computer program products for printing patterns on photosensitive surfaces
08/17/2010US7777610 Radio frequency identification apparatuses
08/17/2010US7777409 Semiconductor device including a flexible support
08/17/2010US7777354 Integrated circuit package system with leaded package
08/17/2010US7777346 Semiconductor integrated circuit device and a method of manufacturing the same
08/17/2010US7777343 Semiconductor device and manufacturing method thereof
08/17/2010US7777337 Semiconductor device having damascene interconnection structure that prevents void formation between interconnections
08/17/2010US7777336 Metal line of semiconductor device and method for forming the same
08/17/2010US7777335 Wiring structure having a wiring-terminal-connecting adhesive comprising silicone particles
08/17/2010US7777323 Semiconductor structure and method for forming the same
08/17/2010US7777317 Card and manufacturing method
08/17/2010US7777312 Semiconductor device and a method of manufacturing the same and a mounting structure of a semiconductor device
08/17/2010US7777309 Amplifier chip mounted on a lead frame
08/17/2010US7777305 Nitride semiconductor device and manufacturing method thereof
08/17/2010US7777302 Method of controlling grain size in a polysilicon layer and in semiconductor devices having polysilicon structure
08/17/2010US7777299 Integrated circuit devices including passive device shielding structures and methods of forming the same
08/17/2010US7777295 Semiconductor structure and method of manufacture
08/17/2010US7777294 Semiconductor device including a high-breakdown voltage MOS transistor
08/17/2010US7777293 Semiconductor integrated circuit, D-A converter device, and A-D converter device
08/17/2010US7777288 Integrated circuit device and fabrication method therefor
08/17/2010US7777286 Monolithic semiconductor microwave switch array
08/17/2010US7777284 Metal-oxide-semiconductor transistor and method of forming the same
08/17/2010US7777281 Non-volatile transistor memory array incorporating read-only elements with single mask set
08/17/2010US7777279 Semiconductor device capable of avoiding latchup breakdown resulting from negative variation of floating offset voltage
08/17/2010US7777278 Lateral semiconductor component with a drift zone having at least one field electrode
08/17/2010US7777276 FinFET transistor and circuit
08/17/2010US7777273 MOSFET having recessed channel
08/17/2010US7777272 Non-volatile memory device and semiconductor package including the same
08/17/2010US7777267 Manufacture method and structure of a nonvolatile memory
08/17/2010US7777264 Random access memory device utilizing a vertically oriented select transistor
08/17/2010US7777260 Solid-state imaging device
08/17/2010US7777259 Multi-well CMOS image sensor and methods of fabricating the same
08/17/2010US7777258 Recessed gate transistor structure and method of forming the same
08/17/2010US7777257 Bipolar Schottky diode and method
08/17/2010US7777256 Mask ROM device, semiconductor device including the mask ROM device, and methods of fabricating mask ROM device and semiconductor device
08/17/2010US7777255 Bipolar transistor with raised base connection region and process for the production thereof
08/17/2010US7777252 III-V hemt devices
08/17/2010US7777232 Display device and electronic device using the same
08/17/2010US7777231 Thin film transistor and method for fabricating same
08/17/2010US7777230 Display device
08/17/2010US7777226 Polycrystalline silicon thin film, fabrication method thereof, and thin film transistor without directional dependency on active channels fabricated using the same
08/17/2010US7777223 Semiconductor device
08/17/2010US7777222 Nanotube device structure and methods of fabrication
08/17/2010US7777210 Laser irradiation method in which a distance between an irradiation object and an optical system is controlled by an autofocusing mechanism and method for manufacturing semiconductor device using the same
08/17/2010US7777136 Multi-layered interconnect structure using liquid crystalline polymer dielectric
08/17/2010US7776993 Underfilling with acid-cleavable acetal and ketal epoxy oligomers
08/17/2010US7776766 Trench filling method
08/17/2010US7776765 Tantalum silicon oxynitride high-k dielectrics and metal gates
08/17/2010US7776764 Adding monomer to water dispersion containing anionic or cationic surfactant and single walled carbon nanotubes; agitating and addition polymerizing styrene, methyl (meth)acrylate, vinyl chloride, propylene, vinylpyrrolidone and/or tetrafluoroethylene; semiconductors; emulsion polymerization
08/17/2010US7776763 In-situ formation of oxidized aluminum nitride films
08/17/2010US7776762 Zirconium-doped tantalum oxide films
08/17/2010US7776761 Method of fabricating semiconductor device having multiple gate insulating layer
08/17/2010US7776760 Systems and methods for nanowire growth
08/17/2010US7776758 Methods and devices for forming nanostructure monolayers and devices including such monolayers
08/17/2010US7776757 Method of fabricating high-k metal gate devices
08/17/2010US7776756 Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
08/17/2010US7776755 high k dielectric material layer (HK), solves problem of the prior art etching process that generates heavy polymeric residue, which is difficult to remove; two etching processes; making metal gate stacks of a semiconductor device; NMOSFETs (N-type metal-oxide-semiconductor field-effect-transistor)
08/17/2010US7776754 Semiconductor device manufacturing method and chemical fluid used for manufacturing semiconductor device
08/17/2010US7776753 Method of fabricating semiconductor devices employing at least one modulation doped quantum well structure and one or more etch stop layers for accurate contact formation
08/17/2010US7776752 Method of etching for multi-layered structure of semiconductors in group III-V and method for manufacturing vertical cavity surface emitting laser device
08/17/2010US7776751 forming a metal silicide for use, for example, in an electrode of an MOS transistor; solar cells; minimize the number of steps and can form a desired compound in a low temperature environment
08/17/2010US7776750 Semiconductor device and method for forming a pattern in the same with double exposure technology
08/17/2010US7776749 Methods of forming semiconductor constructions
08/17/2010US7776748 Selective-redeposition structures for calibrating a plasma process
08/17/2010US7776747 Semiconductor device and method for forming pattern in the same
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