Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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05/09/2012 | CN102446738A Plasma etching device |
05/09/2012 | CN102446737A Substrate processing method and substrate processing apparatus |
05/09/2012 | CN102446736A Method for removing oxidation film on edge of wafer by using corrosive liquid prepared by hydrogen fluoride (HF) and glacial acetic acid |
05/09/2012 | CN102446735A Sapphire wafer dividing method |
05/09/2012 | CN102446734A Grid electrode structure and method |
05/09/2012 | CN102446733A Power device with high-voltage radio-frequency lateral diffusion structure and production method of power device |
05/09/2012 | CN102446732A Grid reworking process capable of improving stability of multi-time exposure |
05/09/2012 | CN102446731A Method for reducing oxide gate loss by changing removing order of polysilicon gate hard film |
05/09/2012 | CN102446730A Method for forming nickel silicide with microwave annealing |
05/09/2012 | CN102446729A High-k gate stack with superior integrity and controlled undercut, formed through wet chemistry |
05/09/2012 | CN102446728A Method of modifying insulating film |
05/09/2012 | CN102446727A Etching method of etching hard mask layer containing silicon nitride |
05/09/2012 | CN102446726A Method for forming metal gate |
05/09/2012 | CN102446725A Cascaded grid production method |
05/09/2012 | CN102446724A Method for manufacturing gate electrode |
05/09/2012 | CN102446723A Method for reducing line width of silicon gate by utilizing ultraviolet rays to irradiate photoresist |
05/09/2012 | CN102446722A Method for preventing failure of photoresist in dual stress silicon nitride process |
05/09/2012 | CN102446721A Method for realizing stepped doping concentration distribution by multi-energy ion implantation |
05/09/2012 | CN102446720A Method for preparing storage unit |
05/09/2012 | CN102446719A Method for increasing writing speed of floating body dynamic random access memory |
05/09/2012 | CN102446718A Method for reducing hot carrier implantation damage of semiconductor device |
05/09/2012 | CN102446717A Method for reducing damage of semiconductor device caused during hot carrier injection |
05/09/2012 | CN102446716A Method for reducing damage of semiconductor device caused during hot carrier injection |
05/09/2012 | CN102446715A Systems and methods for forming semiconductor materials by atomic layer deposition |
05/09/2012 | CN102446714A Method for improving multi-exposure stability of aluminum metal layer |
05/09/2012 | CN102446713A Method for repeatedly photoetching copper interconnected groove structure for multiple times |
05/09/2012 | CN102446712A Method for increasing double patterning process windows |
05/09/2012 | CN102446711A Method for manufacturing insulating layer in MIM (metal-insulator-metal) capacitor |
05/09/2012 | CN102446710A Method for manufacturing multilayer metal-silicon nitride-metal capacitor |
05/09/2012 | CN102446709A Production method of metal-silicon nitride-metal capacitor |
05/09/2012 | CN102446708A Semiconductor multi-project or multi-product wafer process |
05/09/2012 | CN102446707A Method and apparatus for treating silicon substrate |
05/09/2012 | CN102446706A Composite wafer having graphite core and method for manufacturing same |
05/09/2012 | CN102446705A Method for forming semiconductor device |
05/09/2012 | CN102446704A Dual patterning method |
05/09/2012 | CN102446703A Dual patterning method |
05/09/2012 | CN102446702A Wet processing method and pull back method |
05/09/2012 | CN102446701A Method for improving defect of silicon spikes of edge of silicon wafer with etched deep groove |
05/09/2012 | CN102446700A Method for improving silicon substrate and obtained silicon substrate |
05/09/2012 | CN102446688A Two-dimensional scanning method for controlling uniform implantation of ions |
05/09/2012 | CN102446687A Two-dimensional scanning device for controlling uniform ion implantation |
05/09/2012 | CN102446684A Structure of parallel beam limiting diaphragm based on ion implantation |
05/09/2012 | CN102446488A 半导体器件 Semiconductor devices |
05/09/2012 | CN102445862A Improved wafer developing method |
05/09/2012 | CN102445838A Method for reforming photo-resist pattern |
05/09/2012 | CN102445835A Optical proximity correction modeling method of SRAM source and drain dimension |
05/09/2012 | CN102445834A Optical modeling proximity correction method of SRAM (Static Random Access Memory) grid dimension |
05/09/2012 | CN102445802A Array substrate used for liquid crystal display device and method for fabricating same |
05/09/2012 | CN102445801A Liquid crystal display panel and manufacturing method thereof |
05/09/2012 | CN102445711A THz-wave detector |
05/09/2012 | CN102445144A Calibrating method and device for online membrane thickness measuring system |
05/09/2012 | CN102445076A Heat teratment apparatus |
05/09/2012 | CN102443395A Compound for wet etching silicon dioxide |
05/09/2012 | CN102442550A Transfer device, processing system, control method of transfer device |
05/09/2012 | CN102442492A Cassette for Loading Substrate |
05/09/2012 | CN102441843A Internal cleaning structure for CMP (Chemical Mechanical Polishing) machine station and method thereof |
05/09/2012 | CN102441840A System and method for wafer back-grinding control |
05/09/2012 | CN102441838A Processing apparatus |
05/09/2012 | CN102441826A Device for the double-sided processing of flat workpieces and method for the simultaneous double-sided material removal processing of a plurality of semiconductor wafers |
05/09/2012 | CN102441741A Use of aliphatic hydrocarbons and paraffins as solvent in silver sintering pastes |
05/09/2012 | CN102157351B Chip pickup and placement control method |
05/09/2012 | CN102110593B Method for improving stability of polysilicon thin-film resistor |
05/09/2012 | CN102061438B Method for treating metal surface by using heated carbon monoxide |
05/09/2012 | CN102019582B Polishing process of 8-inch polished wafers doped with silicon lightly |
05/09/2012 | CN102005480B High-voltage low-on-resistance LDMOS device and manufacturing method thereof |
05/09/2012 | CN101964343B Semiconductor device |
05/09/2012 | CN101941673B Micro electro mechanical system wafer-level vacuum packaging method |
05/09/2012 | CN101930948B Method for producing nitride read-only memory |
05/09/2012 | CN101930936B Method of manufacturing semiconductor package and method of manufacturing substrate for the semiconductor package |
05/09/2012 | CN101916727B Preparation method of SOI (Silicon on Insulator) high-voltage power device |
05/09/2012 | CN101908510B Semiconductor device with heat-radiating and packaging structure and manufacturing method thereof |
05/09/2012 | CN101894844B Ferroelectric dynamic random memory based on metal oxide vapor phase deposition and preparation method thereof |
05/09/2012 | CN101887845B Method for preparing nanometer super capacitor |
05/09/2012 | CN101882668B Display device |
05/09/2012 | CN101866876B Process for manufacturing contact hole |
05/09/2012 | CN101859723B Method for exchanging substrates and substrate processing device |
05/09/2012 | CN101849277B Quantum well intermixing |
05/09/2012 | CN101847588B Semiconductor process |
05/09/2012 | CN101846889B Exposure apparatus |
05/09/2012 | CN101840920B Semiconductor structure and forming method thereof |
05/09/2012 | CN101840882B Shallow slot isolation method |
05/09/2012 | CN101823989B Polymer for resist, resist composition, pattern forming method and material compound for resist polymer |
05/09/2012 | CN101819947B Method of forming integrated circuit structure |
05/09/2012 | CN101807532B Ultra-thin chip inversely packaging method and packaged body |
05/09/2012 | CN101789491B Phase-change memory cell structure, preparation method thereof and preparation method of phase-change memory arrays |
05/09/2012 | CN101771014B Wafer-level package structure and package method thereof |
05/09/2012 | CN101752227B Manufacturing method of shallow groove isolation structure for MOS capacitance |
05/09/2012 | CN101750277B Solder collecting device for reliability testing of semiconductor element and method thereof |
05/09/2012 | CN101730374B Plasma system |
05/09/2012 | CN101728295B Gas filling bearing piece, gas filling bearing piece set and gas filling equipment |
05/09/2012 | CN101711354B Method for detecting surface defects on a substrate and device using said method |
05/09/2012 | CN101685788B Front open type wafer box with latch and airtight structure |
05/09/2012 | CN101681843B Method of manufacturing semiconductor device |
05/09/2012 | CN101677067B Copper core layer multilayer packaging substrate manufacturing method |
05/09/2012 | CN101663354B Resin composition and molded article obtained from the composition |
05/09/2012 | CN101656203B Method and system for manufacturing multi-gate transistor |
05/09/2012 | CN101650532B Liquid processing apparatus, liquid processing method |
05/09/2012 | CN101650530B Coating and developing device and method |
05/09/2012 | CN101641219B Method to form a pattern of functional material on a substrate using a mask material |
05/09/2012 | CN101640169B Preparation method of nano patterned substrate used for nitride epitaxial growth |