Patents for G03C 1 - Photosensitive materials (26,817)
05/2010
05/05/2010CN201449513U 图像记录材料 The image recording material
05/05/2010CN201445129U Film bag storage hanger rack
05/05/2010CN1987640B Silver halide light sensitive material
04/2010
04/29/2010US20100104976 Oxime derivative, photopolymerizable composition, color filter, and process for producing the same
04/29/2010US20100102321 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film
04/28/2010CN101699349A Sensitive photographic material
04/27/2010US7704676 block terpolymer for use in photocurable compositions, flexographic printing plates or hot melt adhesives; improved radiation sensitivity, as well as melt viscosity
04/27/2010US7704675 Photosensitive recording layer of sensityzing dye, polymerization initiator, polymerizable compound, binder polymer, protective oxygen barrier layer; backcoat layer of epoxy resin; infrared absorber; scratches prevented without interleaving slip sheets
04/27/2010US7704673 Forming a first hard mask layer over a substrate;forming an acid layer over the first hard mask layer;depositing a photoresist layer over the acid layer; patterning the photoresist layer to form a pattern; transferring the pattern to the first hard mask layer below the acid layer
04/27/2010US7704667 Dyes and use thereof in imaging members and methods
04/27/2010US7704666 Laser induced thermal imaging apparatus and laser induced thermal imaging method
04/27/2010US7704651 Radiographic image conversion panel and production method thereof
04/27/2010CA2397673C Method for obtaining a photochromic latex
04/22/2010WO2010045140A1 Composition, process of preparation and method of application and exposure for light imaging paper
04/22/2010WO2010045137A1 Imaging particulate composition, paper and process, and imaging of paper using dual wavelength light
04/22/2010US20100099043 Positive Photosensitive Resin Composition
04/22/2010US20100096670 Semiconductor device with interface circuit and method of configuring semiconductor devices
04/22/2010CA2740695A1 Composition, process of preparation and method of application and exposure for light imaging paper
04/22/2010CA2740694A1 Imaging particulate composition, paper and process, and imaging of paper using dual wavelength light
04/21/2010CN1707357B Photothermographic material and image forming method
04/21/2010CN1538423B Optical recording material, optical recording medium and its manufacturing method, optical recording method and reproducing method
04/20/2010US7700259 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
04/20/2010US7700258 electromagnetic radiation development; optical disks
04/15/2010US20100093950 Polymeric material, containing a latent acid
04/13/2010US7696292 Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution
04/13/2010US7695898 Photothermographic material and image formation method
04/08/2010US20100086694 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
04/07/2010EP2172752A1 Multiple area indicator
04/07/2010CN1542549B Photo resist transfer printing device and method
04/01/2010US20100081088 Resist composition, method of forming resist pattern, compound and acid generator including the same
04/01/2010US20100081087 Composition for formation of antireflection film and pattern formation method using the same
03/2010
03/31/2010EP1379918B1 Imageable element comprising graft polymer
03/31/2010CN101689017A Color forming compositions with a fluoran leuco dye having a latent developer
03/31/2010CN101685252A Image-forming material
03/30/2010US7687781 External light shielding film and optical filter for display apparatus having the same
03/30/2010US7687229 Silver halide color photographic light-sensitive material and image forming method
03/30/2010US7687223 Underlayer coating forming composition for lithography containing cyclodextrin compound
03/25/2010WO2010033433A1 Generation of contact masks for inkjet printing on solar cell substrates
03/25/2010US20100071574 Lithographic printing plate precursor and printing method using the same
03/24/2010CN101681090A Non-transparent microvoided biaxially stretched film, its use in synthetic paper and an image recording element comprising same
03/24/2010CN101681089A Non-transparent microvoided axially stretched film, production process therefor and process for obtaining a transparent pattern therewith
03/24/2010CN100595679C Automatic developing apparatus and process for forming image using the same
03/23/2010US7682780 silver halide emulsion layer containing tabular silver halide particles, on both sides of a transparent support, core of the particle having less than 3% of particle volume, free of Rh or Ir, shell having particle volume 97-99 % and containins Rh or Ir; high sensitivity
03/18/2010WO2010029332A1 Multi-coloured codes
03/18/2010WO2010029329A1 Energy activated compositions
03/18/2010US20100069512 Process for preparing an oil-in-water emulsion stabilised with recombinant collagen-like material and products prepared
03/17/2010CN101675383A 高分辨率3d投影系统 High resolution 3d projection system
03/17/2010CN101670719A Three-dimensional bronzing method
03/16/2010US7678945 High yield acid catalyzed displacement etherification of 4-hydroxyphenylmethylcarbinol with methanol using ion exchange resin; synthesis of raw material for condensation polymerization production of uniquely linear, low molecular weight polymer
03/16/2010US7678941 Polyoxyalkylene ammonium salts and their use as antistatic agents
03/16/2010US7678527 Methods and compositions for providing photoresist with improved properties for contacting liquids
03/16/2010US7678462 Spin-on-glass anti-reflective coatings for photolithography
03/16/2010US7678455 Comprises polythiophene and polystyrenesulfonic acid; improved antistatic property unaffected by changes in humidity, transparency, water resistance, and scratch resistance
03/16/2010US7678299 Stock solution for production of nonlinear-optical materials, nonlinear-optical material, and nonlinear-optical device
03/11/2010US20100062369 Positive resist composition, method of forming resist pattern, and polymeric compound
03/11/2010US20100062368 Low outgassing photoresist compositions
03/10/2010EP1546221B1 Fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
03/10/2010EP1445257B1 2h-1-benzopyran compounds for use in a photochromic material
03/09/2010US7674847 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof
03/09/2010US7674575 Silver halide photosensitive material for color-photography and image formation method using the same
03/04/2010US20100055910 Exposure mask and method for forming semiconductor device using the same
03/02/2010US7670753 Subbing layer between support and photosensitive layer contains a maleamic acid (co)polymer, in which at least one hydrogen atom on a nitrogen atom is substituted with an onium group; exposure based on digital signals, which generates no stains in the non-image area; development latitude
03/02/2010US7670514 Method of producing optical disk-use original and method of producing optical disk
02/2010
02/25/2010WO2010020770A1 Polydialkylsiloxane-bridged bi-photochromic molecules
02/25/2010US20100047725 Developing method and developing unit
02/25/2010US20100047724 Base component which exhibits increased solubility in an alkali developing solution under the action of acid, an acid generator, and organic solvent having a boiling point of at least 150 degrees C.; hole-like resist pattern can be formed with a high level of resolution and minute dimensions
02/25/2010US20100047719 Image recording method
02/25/2010US20100045905 Curable composition, color filter, and manufacturing method of the same
02/24/2010CN100592206C Resist for forming pattern and method for forming pattern using the same
02/24/2010CN100592205C Tinted photosensitive resin composition
02/23/2010US7666572 Resist top coat composition and patterning process
02/16/2010USRE41128 Comprise polymer (e.g., epoxy cresol novolac resins) bonded with chromophore (4-hydroxybenzoic acid, trimellitic anhydride); compositions can be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which prevent reflection during photoresist exposure
02/16/2010US7662896 Reducing surface tension using a polymer containing perfluorobutanesulfonamide in repeating units such N-methyl-perfluorobutanesulfonylethyl acrylate, which is lower cost and less bioaccumulative than corresponding perfluorooctyl surfactants
02/16/2010US7662537 Sensitive to the light in near-infrared region and provides images directly on the plate by laser beam irradiation
02/16/2010US7662490 Near-infrared shield and display front plate
02/11/2010DE112008001138T5 Farbbildende Zusammensetzungen mit einem Fluoran-Leuco-Farbstoff mit einem latenten Entwickler Color forming compositions having a fluoran leuco dye having a latent developer
02/10/2010EP1963896B1 Photochromic materials having electron-withdrawing substituents
02/09/2010US7659050 High resolution silicon-containing resist
02/09/2010US7659048 photoresists; tackiness without complete dryness; printing plates
02/09/2010US7659046 Water-developable infrared-sensitive printing plate
02/09/2010CA2299754C Hydroxy-substituted n-alkoxy hindered amines
02/03/2010CN201397446Y Novel image film
02/03/2010CN101639622A Method for producing thin photosensory blueprint paper
02/02/2010US7655380 Polymeric material containing a latent acid, i.e. a compound which is not an acid but which can be converted to an acid by the influence of laser irradiation
02/02/2010US7655377 Antireflection film and exposure method
02/02/2010US7655174 Combination of high viscosity and slower acting low viscosity resins, curable toughener, initiator and stabilizer; rapid homogeneous droplet merging and curing; tensile strength, ductility; computer controlled piezoelectric printing of three dimensional multilayer articles
01/2010
01/28/2010WO2010011899A1 Holographic storage medium and method for gated diffusion of photoactive monomer
01/28/2010US20100021844 Negative-working imageable elements and method of use
01/27/2010CN100585487C Material for increasing absorptive red light of anti-halo dye and its preparing method
01/26/2010US7653279 Optically oriented three-dimensional polymer microstructures
01/26/2010US7651831 Acrylic terpolymer with fluorosulfonamide-containing unit e.g. 2-trifluoromethanesulfonylaminoethyl methacrylate, a second unit having pendant acid labile group, and a third unit having a lactone moiety, and an acid generator; good etch resistance and dissolution properties; use making semiconductors
01/26/2010US7651830 Patterned photoacid etching and articles therefrom
01/26/2010US7651829 Positive resist material and pattern formation method using the same
01/26/2010US7651561 Laser-supported treatment (inscription, patterns) of glass surfaces; applying a film coated with a dried solution of a silver compound, binder(s), and reducing agent;treatment effects diffusion of silver ions into glass and reduction to silver clustersforming images; stability; weatherproofing
01/26/2010CA2416016C Novel photochromic polymers and methods of synthesizing same
01/21/2010WO2009143482A3 Negative tone molecular glass resists and methods of making and using same
01/19/2010US7648821 Method of forming flexible electronic circuits
01/19/2010US7648820 Polycarbosilanes with chromogen and transparent moieties crosslinked by glycouril, alcohols, hydroxybenzyl, phenol, hydroxymethylbenzyl, cyclohexanoyl, propanol, fluorocarbon alcohols, vinyl ethers, and epoxides; semiconductors; lithography
01/19/2010US7648818 contecting polymeric resist layer to an onium derivatizing agent in which at least one light field or dark field is modified, preferential removal of dark-field or light field regions with CO2 solution, which may be used to form patterned regions on substrates such as microelectronic substrates
01/19/2010US7648811 Imaging member of conductive substrate, photogenerating material, and binder comprising a branched polyarylene ether copolymer; wear resistance; ink jet printing, printed circuits, lithography, microelectronics
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