Patents for G03B 27 - Photographic printing apparatus (25,157)
01/2011
01/04/2011US7864296 Exposure apparatus, setting method, and exposure method having the same
01/04/2011US7864295 Lithographic apparatus and device manufacturing method utilizing data filtering
01/04/2011US7864294 Focus sensitive lithographic apparatus, systems, and methods
01/04/2011US7864293 Exposure apparatus, exposure method, and producing method of microdevice
01/04/2011US7864292 Lithographic apparatus and device manufacturing method
01/04/2011US7864291 Exposure apparatus and device manufacturing method
01/04/2011US7862961 photomasks; lithography; film protects mask, and film frame between holds film spaced away from surface; extreme ultraviolet radiation
12/2010
12/30/2010US20100328641 Pellicle frame and lithographic pellicle
12/30/2010US20100328640 Polarization state measurement apparatus and exposure apparatus
12/30/2010US20100328639 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
12/30/2010US20100328638 Led light source, its manufacturing method, and led-based photolithography apparatus and method
12/30/2010US20100328637 Exposure apparatus, exposing method and device fabricating method
12/30/2010US20100328636 Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus
12/30/2010US20100328635 Pellicle
12/30/2010US20100328634 Lithographic apparatus and a method of operating the apparatus
12/29/2010WO2010151618A1 Hologram, hologram data generation method, and exposure apparatus
12/29/2010EP2267537A1 Lithographic apparatus
12/29/2010EP2267536A1 Lithographic apparatus
12/29/2010EP2267531A2 Method to vary dimensions of a substrate during nano-scale manufacturing
12/29/2010CN201689270U Overturning device for dual-surface magnified printing of photo printing machine
12/28/2010US7859647 Lithographic apparatus and device manufacturing method
12/28/2010US7859646 Interferometric method for improving the resolution of a lithographic system
12/28/2010US7859644 Lithographic apparatus, immersion projection apparatus and device manufacturing method
12/28/2010US7859643 Apparatus for moving curved-surface mirror, exposure apparatus and device manufacturing method
12/28/2010US7859642 Apparatus and method for exposing edge of substrate
12/28/2010US7859641 Optical element module
12/23/2010US20100323461 Lithographic Method and Arrangement
12/23/2010US20100323303 Liquid immersion member, exposure apparatus, exposing method, and device fabricating method
12/23/2010US20100323302 Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus
12/23/2010US20100323283 Optical compensation devices, systems, and methods
12/23/2010US20100323171 Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic Process
12/23/2010US20100321667 Cleaning method, exposure method, and device manufacturing method
12/23/2010US20100321666 Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
12/23/2010US20100321665 Lithographic apparatus and device manufacturing method
12/23/2010US20100321664 Coil, positioning device, actuator, and lithographic apparatus
12/23/2010US20100321663 Apparatus and process for exposing a printing form having a cylindrical support
12/23/2010US20100321662 Actuator System, Lithographic Apparatus, and Device Manufacturing Method
12/23/2010US20100321661 Method for operating an illumination system of a microlithographic projection exposure apparatus
12/23/2010US20100321660 Method and apparatus for reducing down time of a lithography system
12/23/2010US20100321659 Illumination Arrangement
12/23/2010US20100321658 Exposure head and image forming apparatus
12/23/2010US20100321657 Lithographic projection apparatus and method of compensating perturbation factors
12/23/2010US20100321656 Transmission mask with differential attenuation to improve iso-dense proximity
12/23/2010US20100321655 Exposure system, control apparatus of exposure apparatus, and method of manufacturing device
12/23/2010US20100321654 Method of Overlay Measurement, Lithographic Apparatus, Inspection Apparatus, Processing Apparatus and Lithographic Processing Cell
12/23/2010US20100321653 Lithographic apparatus
12/23/2010US20100321652 Lithographic apparatus and device manufacturing method
12/23/2010US20100321651 Lithographic apparatus and device manufacturing method
12/23/2010US20100321650 Lithographic apparatus and device manufacturing method
12/23/2010US20100321649 Optical element
12/23/2010US20100321648 Substrate transfer method and apparatus
12/22/2010CN1670493B Improved color photodetector array
12/21/2010US7855777 Exposure apparatus and method for manufacturing device
12/21/2010US7855776 Methods of compensating lens heating, lithographic projection system and photo mask
12/21/2010US7855735 Method of operating camera timing module
12/21/2010US7854491 Printer having driven printhead sealing arrangement
12/16/2010WO2010143744A1 Transport apparatus and exposure apparatus
12/16/2010US20100316943 Illumination optical system, exposure apparatus, and device manufacturing method
12/16/2010US20100315617 Wafer stage
12/16/2010US20100315616 Illumination device of a microlithographic projection exposure apparatus, and microlithographic projection exposure method
12/16/2010US20100315615 Measurement Apparatus and Method
12/16/2010US20100315614 Source-mask optimization in lithographic apparatus
12/16/2010US20100315613 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
12/16/2010US20100315612 Radiation Beam Modification Apparatus and Method
12/16/2010US20100315611 Exposure method, exposure apparatus, photomask and method for manufacturing photomask
12/16/2010US20100315610 Lithographic apparatus and device manufacturing method
12/16/2010US20100315609 Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
12/16/2010US20100315608 Method for contact copying of holograms and holographic prints
12/15/2010EP2261966A2 A chucking system to hold a substrate and a lithographic system including the chucking system
12/15/2010CN201673363U Drawing paper drying device of wet blueprinting machine
12/15/2010CN201673362U Novel developing device of wet printing machine
12/15/2010CN101361358B System and method for album preparation
12/14/2010US7852477 Calculation method and apparatus of exposure condition, and exposure apparatus
12/14/2010US7852460 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
12/14/2010US7852459 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
12/14/2010US7852458 Exposure apparatus
12/14/2010US7852457 Lithographic apparatus and device manufacturing method
12/14/2010US7852456 Exposure apparatus, exposure method, and method for producing device
12/14/2010US7852033 Driving control apparatus and method, and exposure apparatus
12/09/2010US20100311242 Methods for fabricating semiconductor devices
12/09/2010US20100310994 Stage device, method for controlling stage device, exposure apparatus using same, and device manufacturing method
12/09/2010US20100310993 Transporting method, transporting apparatus, exposure method, and exposure apparatus
12/09/2010US20100310992 Device and method for exposing a photo material
12/09/2010US20100310972 Performing double exposure photolithography using a single reticle
12/09/2010US20100310836 Lithographic method and arrangement
12/09/2010US20100309451 Positioning device, lithographic apparatus using same, and device manufacturing method
12/09/2010US20100309450 Filter device for the compensation of an asymmetric pupil illumination
12/09/2010US20100309449 Illumination system for a microlithographic projection exposure apparatus
12/09/2010US20100309448 Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device
12/09/2010US20100309447 lithographic apparatus, a projection system and a device manufacturing method
12/09/2010US20100309446 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material
12/09/2010US20100309445 Gas Gauge Compatible With Vacuum Environments
12/09/2010US20100308439 Dual wavelength exposure method and system for semiconductor device manufacturing
12/08/2010CN1706732B Method and apparatus for providing and transferring cassettes for printing plates
12/08/2010CN1488998B Optical etching device and manufacturing method
12/08/2010CN101466049B Image signal processing apparatus and method, image projecting system and method
12/08/2010CN101464621B Stereo digital jigsaw imaging lens moving apparatus and method thereof
12/08/2010CN101002140B Apparatus and method for maintaining immersion fluid in the gap under the projection lens in a lithography machine
12/07/2010US7847983 Image reading apparatus
12/07/2010US7847921 Microlithographic exposure method as well as a projection exposure system for carrying out the method
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