Patents for C23F 1 - Etching metallic material by chemical means (16,062)
07/2011
07/13/2011EP2342738A2 Use of surfactant/defoamer mixtures for enhanced metals loading and surface passivation of silicon substrates
07/13/2011EP1712658B1 Method for surface treatment of metal material
07/13/2011CN201896196U Automatic copper chloride corrosion device
07/13/2011CN102124149A Method for removing brazing residues from aluminum articles
07/13/2011CN102124145A Method for surface treatment of copper and copper
07/13/2011CN102121106A Polycrystalline silicon carbon head material separation corrosion solution and separation method
07/12/2011US7977128 Etchant for etching double-layered copper structure and method of forming array substrate having double-layered copper structures
07/12/2011US7976717 Method of forming polarization reversal area, apparatus thereof and device using it
07/12/2011US7976714 Single SOI wafer accelerometer fabrication process
07/12/2011US7976673 RF pulsing of a narrow gap capacitively coupled reactor
07/12/2011US7976672 Plasma generation apparatus and work processing apparatus
07/12/2011US7976634 Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
07/12/2011US7976632 Vacuum processing apparatus
07/12/2011US7975901 Bonding apparatus and wire bonding method
07/12/2011US7975646 Device for depositing a coating on an internal surface of a container
07/12/2011US7975366 Method of manufacturing a magnetic write head mold for neck height equalization
07/07/2011WO2011019222A3 Etchant composition for forming copper interconnects
07/07/2011US20110165382 Method for the fabrication of periodic structures on polymers using plasma processes
07/07/2011US20110164237 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
07/07/2011US20110163068 Multibeam System
07/07/2011US20110163064 Carrier for manufacturing printed circuit board, method of manufacturing the same and method of manufacturing printed circuit board using the same
07/07/2011US20110162803 Chamber with uniform flow and plasma distribution
07/07/2011US20110162802 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
07/07/2011US20110162800 Reconfigurable multi-zone gas delivery hardware for substrate processing showerheads
07/07/2011US20110162799 Plasma processing apparatus and electrode used therein
07/07/2011US20110162798 Methods and apparatus for tuning matching networks
07/07/2011US20110162797 Method and apparatus for photomask plasma etching
07/07/2011US20110162702 Quasi-pyramidal textured surfaces using phase-segregated masks
07/06/2011EP2341167A1 Method for surface treatment of copper and copper
07/06/2011EP2013378B1 Exhaust system
07/06/2011CN1989587B Blocker plate bypass to distribute gases in a chemical vapor deposition system
07/06/2011CN1673410B Showerhead mounting to accommodate thermal expansion
07/06/2011CN102117850A Solar battery with micro-nano composite structure and production method thereof
07/06/2011CN102117841A Semiconductor substrate with surface texture for solar cell and manufacturing method thereof
07/06/2011CN102117738A Method for rounding vertex angle of silicon wafer by using polymer containing fluorocarbon
07/06/2011CN102116176A Patterned turbomachine component and method of forming a pattern on a turbomachine component
07/06/2011CN102115890A Total recycling method of PCB (printed circuit board) nitric acid type tin-lead stripping waste liquid
07/06/2011CN102115889A Regenerated solution of alkaline copper etching solution and method for increasing etching speed thereof
07/06/2011CN102115888A Etching method and PCB manufacture method using the etching method
07/06/2011CN102115887A Surface treatment method and electronic product shell adopting same
07/06/2011CN101619457B Corrosive agent and corrosion method of HfSiON high-K gate dielectric material
07/06/2011CN101460397B Potassium monopersulfate solutions
07/06/2011CN101336312B Pulsed-continuous etching
07/06/2011CN101038863B Method and apparatus for processing workpiece
07/05/2011US7972467 Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
07/05/2011US7972444 Workpiece support with fluid zones for temperature control
07/05/2011US7972443 Metering of particulate material and vaporization thereof
06/2011
06/30/2011WO2011078625A2 Aluminum surface treatment method capable of adjusting the surface adhesion characteristics of water drops
06/30/2011WO2011078335A1 Etchant and method for manufacturing semiconductor device using same
06/30/2011US20110160823 Implantable leads with a low coefficient of friction material
06/30/2011US20110159691 Method for fabricating fine patterns of semiconductor device utilizing self-aligned double patterning
06/30/2011US20110159415 Etching apparatus and method for fabricating alternating phase shift mask using the same
06/30/2011US20110159134 Method of producing a mold for imprint lithography, and mold
06/30/2011US20110159070 Biomaterials and implants for enhanced cartilage formation, and methods for making and using them
06/30/2011US20110158894 Method and device for cnt length control
06/30/2011US20110157010 Electromechanical display devices and methods of fabricating the same
06/30/2011US20110155693 Substrate treatment method, coating treatment apparatus, and substrate treatment system
06/30/2011US20110155690 Polishing method
06/30/2011US20110155322 Plasma processing apparatus
06/30/2011US20110155297 Method of applying an adhesive layer on thincut semiconductor chips of a semiconductor wafer
06/30/2011US20110155050 Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same
06/30/2011US20110155001 Metallized Retroreflective Sheeting with Increased Daytime Brightness
06/29/2011CN201883149U Waste micro-etching liquor regeneration and copper recovery device
06/29/2011CN201883148U Wafer bearing chamber of corrosion machine table
06/29/2011CN102110724A Solar cell having double-sided micro/nano composite structure and preparation method thereof
06/29/2011CN102108557A Method for preparing monocrystalline silicon suede
06/29/2011CN102108512A Chemical etching liquid for metals and etching method
06/29/2011CN101610641B Wet process system and wet processing method
06/29/2011CN101205614B Chemical etching liquor for aluminium and aluminum alloy
06/29/2011CN101205613B Aluminum alloy chemical etching liquor
06/28/2011US7967995 Multi-layer/multi-input/multi-output (MLMIMO) models and method for using
06/28/2011US7967944 Method of plasma load impedance tuning by modulation of an unmatched low power RF generator
06/28/2011US7967930 Plasma reactor for processing a workpiece and having a tunable cathode
06/28/2011US7967911 Apparatus and methods for chemical vapor deposition
06/23/2011WO2011074601A1 Composition for etching ruthenium-based metal and method for preparing same
06/23/2011WO2011074589A1 Etchant and method for manufacturing semiconductor device using same
06/23/2011US20110151673 Plasma etching method, plasma etching device, and method for producing photonic crystal
06/23/2011US20110151605 Method for fabricating color filter using surface plasmon and method for fabricating liquid crystal display device
06/23/2011US20110149361 Micro-mirror with electrode spacer
06/23/2011US20110147896 Cluster jet processing method, semiconductor element, microelectromechanical element, and optical component
06/23/2011US20110147345 Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp
06/23/2011US20110147341 Etching solution for titanium-based metal, tungsten-based metal, titanium/tungsten-based metal or their nitrides
06/23/2011US20110146910 Plasma processing apparatus
06/23/2011US20110146515 Printing plate for gravure printing, method of manufacturing the same, and method of forming printing pattern using the printing plate
06/23/2011US20110146231 Tiered Porosity Flashback Suppressing Elements for Monopropellant or Pre-Mixed Bipropellant Systems
06/22/2011EP2335275A1 Method for chemically treating a substrate
06/22/2011EP1115584B1 Method of manufacturing enhanced finish sputtering targets
06/22/2011DE102004053336B4 Wässrige Ätzmittellösung für Nickel, Chrom, Nickel-Chrom-Legierungen und/oder Palladium sowie Verwendung zur Herstellung von Leiterplatten Aqueous etchant for nickel, chromium, nickel-chromium alloys, and / or palladium as well as use for the preparation of printed circuit boards
06/22/2011CN201873755U System for etching printed circuit board (PCB)
06/22/2011CN102102227A Preparation method of hydrophobic light trapping structure on silicon surface
06/22/2011CN102102208A Display liquid for layered display of titanium layer and titanium nitride layer of semiconductor chip and preparation and application thereof
06/22/2011CN102102207A Method for cleaning silicon chip before polycrystal etching
06/22/2011CN102102206A Metal etching liquid composition and etching method
06/22/2011CN102102205A Surface etching method of magnesium-lithium alloy
06/22/2011CN101596598B Preparation method of whole continuous nano-porous copper
06/22/2011CN101498002B Surface-treating method for metal, treated metal surface and printed wiring substrate
06/21/2011US7964509 Mass production method of semiconductor integrated circuit device and manufacturing method of electronic device
06/21/2011US7964109 Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution
06/21/2011US7964058 Processing system and method for chemically treating a substrate
06/21/2011US7963248 Plasma generator, substrate treating apparatus including the same and substrate treating method
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