Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2014
07/29/2014US8790490 Plasma processing apparatus and method
07/29/2014US8790489 Substrate processing apparatus and substrate processing method
07/29/2014US8790479 Manufacturing method of functional film
07/29/2014US8790464 Control for and method of pulsed gas delivery
07/29/2014US8790463 Substrate processing apparatus and semiconductor device producing method
07/29/2014US8789493 Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch
07/24/2014WO2014112953A1 Methods of low temperature preparation of one or more layers of graphene on a metallic substrate for anti-corrosion and anti-oxidation applications
07/24/2014WO2014111492A1 Methods for obtaining hydrophilic fluoropolymers
07/24/2014US20140206137 Deposition system for thin film formation
07/24/2014US20140206136 Antimony compounds useful for deposition of antimony-containing materials
07/24/2014US20140205769 Cascaded plasma reactor
07/24/2014US20140205768 Process and hardware for deposition of complex thin-film alloys over large areas
07/24/2014US20140205742 Real time process control of the polymer dispersion index
07/24/2014US20140202388 Shower head unit and chemical vapor deposition apparatus
07/24/2014US20140202382 Deposition apparatus
07/24/2014DE102013200846A1 Gleitelement, insbesondere Kolbenring, mit einer Beschichtung Sliding element, in particular piston ring with a coating
07/24/2014DE102013100535A1 Object holding and orientation device for holding object e.g. substrate in vacuum chamber, has fixing mechanism that is arranged in spherical contact surfaces to releasably fix microscope slide and object positioning unit to each other
07/23/2014EP2756876A1 System for tungsten hexafluoride recovery and reuse
07/23/2014EP2756110A1 Cutting insert and method for production thereof
07/23/2014EP2755927A1 Photocatalytic material and glazing or photovoltaic cell comprising said material
07/23/2014CN203728962U 一种分子束外延大规模生产设备中的衬底托板 A molecular beam epitaxy substrate pallets in large-scale production equipment
07/23/2014CN203728925U 石墨模具涂层加工设备 Graphite mold coating processing equipment
07/23/2014CN103947301A 等离子产生源及具备它的真空等离子处理装置 Plasma generation source and with its vacuum plasma processing apparatus
07/23/2014CN103946957A 使用铝烷基的前驱物的金属薄膜沉积 A metal thin film of aluminum alkyl deposited precursor
07/23/2014CN103946605A 活塞环 Piston Ring
07/23/2014CN103946418A 用于处理成批的衬底的原子层沉积反应器及其方法 Processing batches of substrates in the atomic layer deposition reactor and method for
07/23/2014CN103946173A 在玻璃基板上形成氧化硅涂层的方法 The method of forming a silicon oxide coating on a glass substrate
07/23/2014CN103943717A 一种采用管式pecvd制备太阳能电池叠层减反射膜的方法 A tube-type solar cell stack using antireflection film preparation method pecvd
07/23/2014CN103943465A 氧化硅薄膜制备方法 Method for preparing a silicon oxide film
07/23/2014CN103938187A 大面积薄膜沉积pecvd电极结构及设备 Large area thin film deposition apparatus and the electrode structure pecvd
07/23/2014CN103938186A 托盘、mocvd反应腔和mocvd设备 Tray, mocvd reaction chamber and mocvd equipment
07/23/2014CN103938185A 一种管状零件内孔涂层的制备方法 Within a tubular part of the preparation of porous coating
07/23/2014CN103938184A 一种制备管状零件内孔涂层的装置 A hole in the preparation of the coating apparatus tubular parts
07/23/2014CN103938183A 一种制备高质量ZnO材料的方法 A method of preparing high quality ZnO material
07/23/2014CN103938182A 硼氮共掺纳米基定向金刚石薄膜的制备方法 Boron-nitrogen co-doped 纳米基 directional diamond film preparation
07/23/2014CN103938181A 一种硅基氮氧化合物薄膜的制备方法 A method for preparing a silicon oxynitride film
07/23/2014CN103938180A 一种厚度可控的纳米碳膜的制备 Preparing a controlled thickness of the carbon nano
07/23/2014CN103938179A 沉积非晶硅膜的方法 The method of depositing an amorphous silicon film
07/23/2014CN103938178A 直接在Si衬底上自催化生长InAsSb纳米线的方法 Catalytic Growth of InAsSb method since nanowires directly on Si substrate
07/23/2014CN103938177A 可用氯气在线清洗的非钎焊mocvd喷头 Available chlorine-line cleaning of non-soldering nozzle mocvd
07/23/2014CN103938176A 一种二维半导体合金、其制备方法及用途 A two-dimensional semiconductor alloys, their preparation and use
07/23/2014CN103938047A 一种连续可调带隙层状MoS<sub>2x</sub>Se<sub>2(1-x)</sub>合金薄片及其制备方法 A continuous tunable bandgap layered MoS <sub> 2x </ sub> Se <sub> 2 (1-x) </ sub> alloy sheet and its preparation method
07/23/2014CN103935988A 一种石墨烯薄膜的转移方法 Transfer method of graphene films
07/23/2014CN102978587B 一种平板式pecvd设备及其气路接孔结构 A flat type pecvd equipment and pneumatic jacks structure
07/23/2014CN102828162B 一种FeSe超导薄膜的制备方法 Preparation method of FeSe superconducting thin films
07/23/2014CN102301043B 外延碳化硅单晶基板及其制造方法 An epitaxial silicon carbide single crystal substrate and a method of manufacturing
07/23/2014CN102197460B 化合物半导体制造装置、化合物半导体制造方法以及化合物半导体制造用型架 A compound semiconductor manufacturing apparatus, a method of manufacturing a compound semiconductor and the compound semiconductor manufacturing shaped frame
07/23/2014CN101469416B 用于处理衬底的设备 Apparatus for processing a substrate
07/22/2014US8785821 Substrate processing apparatus with heater element held by vacuum
07/22/2014US8785333 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
07/22/2014US8785312 Conductive layers for hafnium silicon oxynitride
07/22/2014US8784997 Metallurgically bonded stainless steel
07/22/2014US8784951 Method for forming insulation film using non-halide precursor having four or more silicons
07/22/2014US8784950 Method for forming aluminum oxide film using Al compound containing alkyl group and alkoxy or alkylamine group
07/22/2014US8784948 Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
07/22/2014US8784937 Glass substrates having carbon nanotubes grown thereon and methods for production thereof
07/22/2014US8784936 Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
07/22/2014US8784935 Hot melt adhesive system and method using machine readable information
07/22/2014US8784565 Manufacturing apparatus for depositing a material and an electrode for use therein
07/22/2014US8784564 Film coating apparatus
07/22/2014US8784563 Gas mixer and manifold assembly for ALD reactor
07/22/2014US8784562 Carbon nanotube production process and carbon nanotube production apparatus
07/22/2014US8783673 Workpiece carrier device
07/22/2014US8783294 Exhaust machine
07/17/2014US20140199788 Floating substrate monitoring and control device, and method for the same
07/17/2014US20140199550 Systems and methods for enhancing mobility of atomic or molecular species on a substrate at reduced bulk temperature using acoustic waves, and structures formed using same
07/17/2014US20140199470 Polymer composition on substrate and surface modification method
07/17/2014US20140197134 Systems and methods for plasma processing of microfeature workpieces
07/17/2014US20140196664 System and method for tungsten hexafluoride recovery and reuse
07/17/2014DE102013113502A1 CVD-Beschichtete Polykristalline c-BN-Schneidwerkzeuge CVD-coated polycrystalline CBN cutting tools
07/17/2014DE102012022268B4 Verfahren zur Herstellung eines Kolbenrings sowie danach hergestellter Kolbenring A process for producing a piston ring and piston ring produced thereafter
07/16/2014EP2755454A1 Plasma generation device, cvd device and plasma treatment particle generation divice
07/16/2014EP2755453A1 Plasma generator and cvd device
07/16/2014EP2755228A1 Sic epitaxial wafer and method for manufacturing same
07/16/2014EP2754738A1 Substrate for epitaxial growth, and crystal laminate structure
07/16/2014EP2754731A1 Film-forming material, sealing film using same, and use of sealing film
07/16/2014EP2754645A1 Glass substrate having alkali barrier layer attached thereto, and glass substrate having transparent conductive oxide film attached thereto
07/16/2014CN203715722U 一种pecvd工件架及其电极板 One kind pecvd workpiece holder and the electrode plate
07/16/2014CN203715721U 一种化学气相沉积装置及旋转轴 A chemical vapor deposition apparatus and the rotation axis
07/16/2014CN203715720U 一种用于反应源瓶的试验装置 A test device for the reaction source bottle
07/16/2014CN103930985A 真空处理装置 The vacuum processing apparatus
07/16/2014CN103930970A 用于内联化学气相沉积的方法和系统 For inline chemical vapor deposition method and system
07/16/2014CN103930596A 混合型脉冲等离子体处理系统 Mixed pulsed plasma processing system
07/16/2014CN103930595A 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备 Passivation for drug packaging, pH protective or lubricating coating, a coating method and a device
07/16/2014CN103930594A 通过定向流动的蒸汽相化学渗透致密化三维多孔基材的装载设备 Directional flow through the vapor phase chemical infiltration densification three-dimensional porous substrate loading equipment
07/16/2014CN103930590A 用于通过蒸发处理将光学涂层液体合成物沉积在光学物品上的支持件 For processing by evaporating the liquid composition is deposited on the optical coating on the optical article of the support member
07/16/2014CN103930431A 新型第4b族金属有机化合物及其制备 The new section 4b metal compounds and their preparation
07/16/2014CN103930234A 由含镍的钨硬质合金制成且具有Al<sub>2</sub>O<sub>3</sub>表面涂层的摩擦搅拌焊接工具 Carbide is made of nickel-containing tungsten and having Al <sub> 2 </ sub> O <sub> 3 </ sub> surface coating friction stir welding tool
07/16/2014CN103928704A 锂离子电池及其制造方法 Lithium-ion battery and its manufacturing method
07/16/2014CN103928378A 双层传片腔体 Double-pass piece cavity
07/16/2014CN103928307A 晶体管的形成方法、高k栅介质层的形成方法 The method for forming a transistor, a method of forming high-k gate dielectric layer,
07/16/2014CN103924257A 石墨烯纳米带及其制备方法 Graphene nanoribbons and its preparation method
07/16/2014CN103924223A 应用于cvd成膜工艺的膜厚流量建模方法及膜厚调节方法 Film thickness and the thickness of the applied flow modeling method for regulating the film formation process cvd
07/16/2014CN103924222A 一种测量化学气相沉积炉的原料蒸发量的方法 A method for measuring the amount of starting material was evaporated in a chemical vapor deposition furnace
07/16/2014CN103924221A 一种可用于金属有机化学气相沉积设备的高功率加热器 Which can be used metal-organic chemical vapor deposition equipment of high power heater
07/16/2014CN103924220A 成膜方法和成膜装置 Film forming method and film forming apparatus
07/16/2014CN103924219A 可自动补充mo源的装置 Can automatically replenish mo source device
07/16/2014CN103924218A 可持续供应mo源的装置 Sustainable supply source means mo
07/16/2014CN103924217A 化学气相沉积设备 Chemical vapor deposition apparatus
07/16/2014CN103924216A 等离子发生器混气管路 Mixing plasma generator gas line
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