Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2008
07/23/2008CN101228290A Calibration device for vacuum evaporation plating
07/23/2008CN101228289A Calibration device for vacuum evaporation plating
07/23/2008CN101228288A Injection type plasma processing apparatus and method thereof
07/23/2008CN101226987A Phase change layer and method of manufacturing the same and phase change memory device comprising phase change layer and methods of manufacturing and operating phase change memory device
07/23/2008CN101225507A Curved surface cutting track obtaining method based on STL file
07/23/2008CN101225506A Method for monitoring ion implantation state
07/23/2008CN101225505A Substrate holder, film forming method and device using the same
07/23/2008CN101225504A Magnetron sputtering curved surface spraying three-dimensional trajectory intelligent control method
07/23/2008CN101225503A Sputtering film plating device
07/23/2008CN101224648A Hard coating film for forming tool and forming tool
07/23/2008CN101224576A Teaching track optimized controlling method of magnetic-controlled spraying robot
07/23/2008CN101224496A Manufacture method of sputtering targets
07/23/2008CN100405537C Plasma reaction device
07/23/2008CN100405529C Gas phase deposition equipment
07/23/2008CN100404858C Symmetrically arranged vacuum obtaining system
07/23/2008CN100404724C Ion implantation process method for surface of metal material embedded to human body
07/22/2008US7402779 Effusion cell and method for use in molecular beam deposition
07/22/2008US7402228 Manufacturing method and apparatus of phase shift mask blank
07/22/2008US7402226 Damaging the surface of sintered Nd Fe B or Pr Fe B magnet by applying mechanical processing to cause a magnetic characteristic of the magnet to deteriorate; and restoring surface by sputtering a rare earth metal or alloy into fine particles or vapor, allowing product to diffuse and permeate the magnet
07/22/2008US7402206 Method of synthesizing a compound of the formula Mn+1AXn, film of the compound and its use
07/22/2008US7401643 Heat exchange foam
07/17/2008WO2008084865A1 Material for transparent conductive film
07/17/2008WO2008084863A1 Process for producing molybdenum-based sputtering target plate
07/17/2008WO2008084639A1 Multilayer film forming method and multilayer film forming apparatus
07/17/2008WO2008055201A3 Tin oxide-based sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein
07/17/2008WO2008054965A3 Chemically and physically tailored structured thin film assemblies for corrosion prevention or promotion
07/17/2008WO2007124879A3 Homogeneous pvd coating device and method
07/17/2008US20080171214 High strength vacuum deposited nitinol alloy films and method of making same
07/17/2008US20080171180 Process For The Formation Of Miniaturized Getter Deposits And Getter Deposits So Obtained
07/17/2008US20080171132 Evaporation apparatus and method of making an organic layer
07/17/2008US20080169523 Element having a refractive index that varies between its optical axis and its periphery, over an annular part; tablet in front of the semiconductor sensor or a lens in front of the semiconductor sensor
07/17/2008US20080169198 Ion milling; laminating; trimming
07/17/2008US20080169189 Apparatus And Method for RF Plasma Enhanced Magnetron Sputter Deposition
07/17/2008US20080169186 Magnetron sputtering apparatus and method of manufacturing semiconductor device
07/17/2008US20080169185 Electrochromic devices and methods
07/17/2008US20080169021 Method of making TCO front electrode for use in photovoltaic device or the like
07/17/2008DE112006002367T5 Vakuumfilmbildungseinrichtung und Vakuumfilmbildungsverfahren Vacuum film-forming apparatus and vacuum film-forming method
07/17/2008DE102007002027A1 Method for tempering the surfaces in a fuel injector comprises implanting catalytically active ions into the surfaces
07/16/2008EP1944388A1 Magnet structure for magnetron sputtering system, cathode electrode unit and magnetron sputtering system
07/16/2008EP1944387A1 System and method for restoring or regenerating an article
07/16/2008EP1944386A1 Transparent conductive film and method for producing the same
07/16/2008EP1944122A1 Holding apparatus, assembly system, sputtering apparatus, machining method and machining apparatus
07/16/2008EP1943370A2 Reactive sputter deposition processes and equipment
07/16/2008EP1943008A2 Method of preventing analyte alteration in diagnostic apparatuses involving contact of liquid and electrode
07/16/2008EP1358363B1 Diamond coatings on reactor wall and method of manufacturing thereof
07/16/2008EP0989914B1 Multilayer metalized composite on polymer film product and process
07/16/2008CN101223296A In sm oxide sputtering target
07/16/2008CN101222036A Negative electrode for nonaqueous electrolyte secondary battery, its manufacturing method, and nonaqueous electrolyte secondary battery using the same
07/16/2008CN101222019A Electrolyte thin film (AgI)x(AgPO3)1-x based on amorphous solid and its preparing method
07/16/2008CN101221830A Electrically conducting transparent film and its preparing process
07/16/2008CN101221359A Metallic material reflection type micro-optical element processing method based on hot press printing technology
07/16/2008CN101220480A Corrosion resistant Al-Mg alloy protecting film and preparation thereof
07/16/2008CN101220466A Method for manufacturing gallium nitride nano-wire with tungsten auxiliary heat anneal
07/16/2008CN101220460A Target device for sputtering
07/16/2008CN101220459A Antistatic film, spacer using it, and image display device
07/16/2008CN101220458A AI-based alloy sputtering target and process for producing the same
07/16/2008CN101220457A Sputtering targets and methods for fabricating sputtering targets having multiple materials
07/16/2008CN101220456A Method for plating stainless steel protective cover on NdFeB magnet surface with magnetic controlled electrical arc ion
07/16/2008CN101220455A Method for manufacturing low ultraviolet optics attrition aluminum oxide thin film
07/16/2008CN101220454A Method for manufacturing surface antimicrobial, abrasion-proof metal/ceramic nano-multilayer film
07/16/2008CN101220453A Full density Co-W magnetic sputter targets
07/16/2008CN101220452A Novel mask system of organic electroluminescent device and method for manufacturing the same
07/16/2008CN101220434A Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys
07/16/2008CN101219777A Method of forming oxide based nano structures
07/16/2008CN100402695C Physical vapor deposition method for direct developing Nano metal wire in single component
07/16/2008CN100402694C Integrated circuit device and fabrication using metal-doped chalcogenide materials
07/16/2008CN100402693C Production method of heating crucible, deposite device and electroluminescence device
07/15/2008US7400096 Large area plasma source
07/15/2008US7399716 Precursor for hafnium oxide layer and method for forming hafnium oxide film using the precursor
07/15/2008US7399539 DWDD-type magneto-optic recording medium including buffer regions between recording track regions and method of producing the same
07/15/2008US7399501 Gas sensor manufacturing process
07/15/2008US7399497 Method for forming film, method of manufacturing electronic device, film forming system, electronic device, and electronic apparatus
07/15/2008US7399388 Plasma enhanced chemical vapor deposition of a silica glass dielectric film; repetitious exposure of a substrate to a reaction mixture of silane and oxygen gases, purging and evacuation of the reaction chamber
07/15/2008US7399387 Incline surface; particle emission; disk target
07/15/2008US7399386 Magnetic recording medium, method of manufacturing the same and magnetic recording apparatus
07/15/2008US7399385 Alternating current rotatable sputter cathode
07/10/2008WO2008083304A2 Method of making inorganic or inorganic/organic hybrid films
07/10/2008WO2008082186A1 Method for manufacturing nanowire by using stress-induced growth
07/10/2008WO2008082020A1 Surface treating method for cutting tools
07/10/2008WO2008081841A1 Cocrpt-based sputtering target and method for production thereof
07/10/2008WO2008081650A1 Highly corrosion-resistant members and processes for production thereof
07/10/2008WO2008081585A1 Sputtering target and method for production thereof
07/10/2008WO2008080835A2 Layer formation by magnetron
07/10/2008WO2008080249A2 Apparatus for gas handling in vacuum processes
07/10/2008WO2008080244A1 Method for the production of a directional layer by means of cathode sputtering, and a device for carrying out the method
07/10/2008WO2008030474A3 Automated layer by layer spray technology
07/10/2008WO2007130903A3 Hollow cathode sputtering target
07/10/2008WO2007108952A3 High throughput deposition apparatus with magnetic support
07/10/2008US20080166596 Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys
07/10/2008US20080166580 Coated cemented carbide endmill
07/10/2008US20080166574 Insulating material capable of withstanding cyclically varying high temperatures
07/10/2008US20080166551 Transparent conductive film and method for producing the same
07/10/2008US20080166548 Coating material for thermal barrier coating having excellent corrosion resistance and heat resistance and method of producing the same
07/10/2008US20080166502 Metal film pattern forming method
07/10/2008US20080166501 Pulsed Laser Deposition Method
07/10/2008US20080166470 Enhanced Bonding Layers on Native Oxide Surfaces
07/10/2008US20080166287 Layered Structure
07/10/2008US20080164147 Film Forming Apparatus
07/10/2008US20080164146 Sputtering Target with an Insulating Ring and a Gap Between the Ring and the Target
07/10/2008US20080164144 Plasma Processing Apparatus And Method Of Producing Semiconductor Thin Film Using The Same