Patents for C09G 1 - Polishing compositions (7,846)
03/2014
03/26/2014CN103666277A Acid polishing agent and application thereof to polishing of different crystals
03/26/2014CN103666276A Chemical-mechanical polishing solution
03/26/2014CN103013349B Atomizing type stain removal leather lustering agent and preparation method thereof
03/26/2014CN103013348B Antistatic leather glazing agent
03/26/2014CN102925060B Preparation method of marble composite polishing powder
03/26/2014CN102898952B Metallic grinding and polishing agent for valves and preparation method thereof
03/26/2014CN102268225B Permanent-suspension diamond grinding liquid
03/26/2014CN101665663B Chemical mechanical polishing solution
03/26/2014CN101654598B Chemical mechanical polishing solution
03/19/2014CN103642398A Polishing liquid for stainless steel material and use thereof
03/19/2014CN103642397A Water-soluble light polishing agent used for plastics
03/19/2014CN103639884A Button polishing method
03/19/2014CN102676063B Method and special polishing liquid for reworking and repairing solid welding wires
03/19/2014CN102441819B Chemical and mechanical polishing method for sulfur phase-change material
03/19/2014CN101423746B Polishing composition for hard disk substrate
03/13/2014WO2014037059A1 Method and blasting means for producing a satinized finish on an aluminium substrate
03/13/2014US20140073707 Compositions comprising a fluorosurfactant and a fluoro-free hydrotrope
03/12/2014CN103627328A Oily diamond grinding fluid
03/12/2014CN103627327A Polishing composition containing hybrid abrasive for nickel-phosphorous coated memory disks
03/12/2014CN103624635A Cutter surface processing technology
03/12/2014CN102775958B Cerium oxide polishing material for stone grinding tool and preparation method thereof
03/12/2014CN102643613B Grinding liquid for sapphire substrate and preparation method of grinding liquid
03/12/2014CN102201337B Method of polishing substrate comprising polysilicon and at least one of silicon oxide and silicon nitride
03/12/2014CN101928520B Grinding composite for planarization metal layer
03/12/2014CN101921543B Nonaqueous organic composition and application thereof
03/12/2014CN101802116B Polishing composition and method utilizing abrasive particles treated with aminosilane
03/05/2014CN103614083A Automobile cleaning water wax and preparation method thereof
03/05/2014CN103614082A Hyperfine cleaning polishing solution used for LED industry
03/05/2014CN103614081A Silicon chip CMP preparation
03/05/2014CN103614080A High hardness polishing solution
03/05/2014CN102453442B Aeroengine turbine guide vane polishing protection wax and polishing method
02/2014
02/27/2014WO2014006526A3 Chemical mechanical polishing composition comprising non-ionic surfactant and carbonate salt
02/26/2014CN102061132B Chemical mechanical polishing composition and methods relating thereto
02/26/2014CN101684393B Chemical mechanical polishing sizing agent
02/26/2014CN101550317B Chemical mechanical polishing solution for polishing polysilicon
02/20/2014US20140051250 Cmp polishing fluid, method for manufacturing same, method for manufacturing composite particle, and method for polishing base material
02/19/2014EP2697330A2 Compositions and methods for selective polishing of silicon nitride materials
02/19/2014CN103589344A Method for preparing alumina polishing solution
02/19/2014CN102604543B Preparation method of high-stability nano cerium dioxide aqueous slurry for polishing solution
02/19/2014CN102031063B Rare earth polishing powder and production method thereof
02/13/2014US20140042359 Process for preparing aqueous colloidal silica sols of high purity from alkali metal silicate solutions
02/13/2014DE102011013982A1 Verfahren zum chemisch-mechanischen Polieren eines Substrats mit einer Polierzusammensetzung, die zur Erhöhung der Siliziumoxidentfernung angepasst ist. A method for chemical mechanical polishing of a substrate with a polishing composition which is adapted to increase the Siliziumoxidentfernung.
02/13/2014DE102011013981A1 Verfahren zum Polieren eines Substrats, das Polysilizium, Siliziumoxid und Siliziumnitrid umfasst Includes methods for polishing a substrate, the polysilicon, silicon oxide and silicon nitride,
02/13/2014DE102011013979A1 Verfahren zum Polieren eines Substrats, das Polysilizium und mindestens eines von Siliziumoxid und Siliziumnitrid umfasst Includes methods for polishing a substrate, the polysilicon and at least one of silicon oxide and silicon nitride,
02/13/2014DE102011013978A1 Verfahren zum Polieren eines Substrats, das Polysilizium und mindestens eines von Siliziumnitrid umfasst Includes methods for polishing a substrate, the polysilicon and silicon nitride of at least one of
02/12/2014CN103571340A Preparation method of color emulsion type shoe polish
02/12/2014CN103571339A Preparation method of emulsion type shoe polish
02/12/2014CN103571338A Color emulsion-type shoe polish
02/12/2014CN103571337A Emulsion-type shoe polish
02/12/2014CN103571336A Recycling and utilizing method of waste polishing powder
02/12/2014CN103571335A Rare earth polishing powder and preparation method thereof
02/12/2014CN103571334A 氧化铈抛光粉及其制备方法 Cerium oxide polishing powder and its preparation method
02/12/2014CN103571333A CMP (Chemical-Mechanical Polishing) polishing liquid with mixed grinding materials for alkaline sapphire substrate and preparation method thereof
02/12/2014CN102965029B Decontaminating and brightening agent for leather
02/12/2014CN102643614B Efficient glass polishing powder and preparation method thereof
02/05/2014CN103555208A Shoe polish
02/05/2014CN103555207A Grinding liquid for grinding and polishing
02/05/2014CN103555206A Rare earth polishing powder and preparation method thereof
02/05/2014CN102585705B CMP (chemical mechanical polishing) liquid with high polishing rate for sapphire supporting base and application thereof
01/2014
01/30/2014US20140030897 Polishing composition and polishing method using the same
01/30/2014US20140026340 Surface cleaning article and process for making the same
01/29/2014EP2688966A1 A chemical mechanical polishing (cmp) composition comprising two types of corrosion inhibitors
01/29/2014CN103540266A Shoe cream
01/29/2014CN102585707B Preparation method of cerium-based mixed rare earth polishing powder
01/29/2014CN102559064B Cerium-zirconium praseodymium sosoloid and preparation method thereof
01/23/2014US20140020305 Magnetorheological fluid for ultrasmooth polishing
01/22/2014CN103526208A Aluminum ware lightening cream and method for lightening aluminum ware
01/22/2014CN103525570A Granite abrasive washing and polishing agent and preparation method thereof
01/22/2014CN103525314A High-efficiency diamond lubricating cooling polishing solution and preparation method and application thereof
01/22/2014CN103525313A Silverware brightening method
01/22/2014CN101768412B CMP slurry composition for barrier polishing for manufacturing copper interconnects, polishing method using the composition, and semiconductor device manufactured by the method
01/16/2014US20140013674 High Purity Silica Sol and its Production Method
01/15/2014CN103509473A Car cleaning and maintenance liquid
01/15/2014CN103509472A Cerium-based mixed rare earth polishing powder and preparation method thereof
01/15/2014CN103509471A Preparation method of nano-SiO2 polishing solution
01/15/2014CN103509470A Preparation method for super-precise polished core-shell structure composite slurry
01/15/2014CN103509469A Liquid high-power polishing agent
01/15/2014CN103509468A Chemical-mechanical polishing liquid for planarization of silicon through hole
01/15/2014CN103506928A 超硬半导体材料抛光方法 Superhard polishing method of semiconductor materials
01/09/2014WO2014008356A1 Abrasive article for lower speed grinding operations
01/09/2014US20140011362 Chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and an aromatic compound comprising at least one acid group
01/09/2014US20140011361 Chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and a carbonate salt
01/09/2014US20140011360 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor device
01/09/2014US20140008567 Chemical mechanical polishing slurry
01/08/2014EP2682441A1 A chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and an aromatic compound comprising at least one acid group
01/08/2014EP2682440A1 A chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and a carbonate salt
01/08/2014CN103497733A Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
01/08/2014CN103497688A Chemical mechanical polishing method for phase-change material
01/08/2014CN103497687A Polishing liquid with luminous abrasive particles, and fluid mechanics research system and method
01/08/2014CN103497340A Preparation method of water-soluble polystyrene-silicon dioxide core-shell type composite particle
01/08/2014CN103495929A Grinding and polishing method of metal strip
01/08/2014CN102586783B Corrosion inhibitor, preparation method thereof and chemico-mechanical polishing composition
01/08/2014CN102516887B Polishing solution and plasma polishing process
01/08/2014CN102516875B Polishing solution based on polishing process of metal Co and application thereof
01/02/2014US20140004703 Chemical mechanical polishing (cmp) composition comprising a polymeric polyamine
01/02/2014US20140001153 Polishing slurry and polishing method thereof
01/01/2014EP2679663A1 Streak-free formulations for cleaning and coating hard surfaces
01/01/2014CN103484026A High-efficiency ceramic polishing solution and preparation method thereof
01/01/2014CN103484025A Self-stop GST (Ge2Sb2Te5) chemical mechanical polishing solution as well as preparation method and application thereof
01/01/2014CN103484024A Chemico-mechanical polishing liquid for silicon dioxide dielectric materials and preparing method thereof
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 ... 79