Patents for C09G 1 - Polishing compositions (7,846) |
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03/26/2014 | CN103666277A Acid polishing agent and application thereof to polishing of different crystals |
03/26/2014 | CN103666276A Chemical-mechanical polishing solution |
03/26/2014 | CN103013349B Atomizing type stain removal leather lustering agent and preparation method thereof |
03/26/2014 | CN103013348B Antistatic leather glazing agent |
03/26/2014 | CN102925060B Preparation method of marble composite polishing powder |
03/26/2014 | CN102898952B Metallic grinding and polishing agent for valves and preparation method thereof |
03/26/2014 | CN102268225B Permanent-suspension diamond grinding liquid |
03/26/2014 | CN101665663B Chemical mechanical polishing solution |
03/26/2014 | CN101654598B Chemical mechanical polishing solution |
03/19/2014 | CN103642398A Polishing liquid for stainless steel material and use thereof |
03/19/2014 | CN103642397A Water-soluble light polishing agent used for plastics |
03/19/2014 | CN103639884A Button polishing method |
03/19/2014 | CN102676063B Method and special polishing liquid for reworking and repairing solid welding wires |
03/19/2014 | CN102441819B Chemical and mechanical polishing method for sulfur phase-change material |
03/19/2014 | CN101423746B Polishing composition for hard disk substrate |
03/13/2014 | WO2014037059A1 Method and blasting means for producing a satinized finish on an aluminium substrate |
03/13/2014 | US20140073707 Compositions comprising a fluorosurfactant and a fluoro-free hydrotrope |
03/12/2014 | CN103627328A Oily diamond grinding fluid |
03/12/2014 | CN103627327A Polishing composition containing hybrid abrasive for nickel-phosphorous coated memory disks |
03/12/2014 | CN103624635A Cutter surface processing technology |
03/12/2014 | CN102775958B Cerium oxide polishing material for stone grinding tool and preparation method thereof |
03/12/2014 | CN102643613B Grinding liquid for sapphire substrate and preparation method of grinding liquid |
03/12/2014 | CN102201337B Method of polishing substrate comprising polysilicon and at least one of silicon oxide and silicon nitride |
03/12/2014 | CN101928520B Grinding composite for planarization metal layer |
03/12/2014 | CN101921543B Nonaqueous organic composition and application thereof |
03/12/2014 | CN101802116B Polishing composition and method utilizing abrasive particles treated with aminosilane |
03/05/2014 | CN103614083A Automobile cleaning water wax and preparation method thereof |
03/05/2014 | CN103614082A Hyperfine cleaning polishing solution used for LED industry |
03/05/2014 | CN103614081A Silicon chip CMP preparation |
03/05/2014 | CN103614080A High hardness polishing solution |
03/05/2014 | CN102453442B Aeroengine turbine guide vane polishing protection wax and polishing method |
02/27/2014 | WO2014006526A3 Chemical mechanical polishing composition comprising non-ionic surfactant and carbonate salt |
02/26/2014 | CN102061132B Chemical mechanical polishing composition and methods relating thereto |
02/26/2014 | CN101684393B Chemical mechanical polishing sizing agent |
02/26/2014 | CN101550317B Chemical mechanical polishing solution for polishing polysilicon |
02/20/2014 | US20140051250 Cmp polishing fluid, method for manufacturing same, method for manufacturing composite particle, and method for polishing base material |
02/19/2014 | EP2697330A2 Compositions and methods for selective polishing of silicon nitride materials |
02/19/2014 | CN103589344A Method for preparing alumina polishing solution |
02/19/2014 | CN102604543B Preparation method of high-stability nano cerium dioxide aqueous slurry for polishing solution |
02/19/2014 | CN102031063B Rare earth polishing powder and production method thereof |
02/13/2014 | US20140042359 Process for preparing aqueous colloidal silica sols of high purity from alkali metal silicate solutions |
02/13/2014 | DE102011013982A1 Verfahren zum chemisch-mechanischen Polieren eines Substrats mit einer Polierzusammensetzung, die zur Erhöhung der Siliziumoxidentfernung angepasst ist. A method for chemical mechanical polishing of a substrate with a polishing composition which is adapted to increase the Siliziumoxidentfernung. |
02/13/2014 | DE102011013981A1 Verfahren zum Polieren eines Substrats, das Polysilizium, Siliziumoxid und Siliziumnitrid umfasst Includes methods for polishing a substrate, the polysilicon, silicon oxide and silicon nitride, |
02/13/2014 | DE102011013979A1 Verfahren zum Polieren eines Substrats, das Polysilizium und mindestens eines von Siliziumoxid und Siliziumnitrid umfasst Includes methods for polishing a substrate, the polysilicon and at least one of silicon oxide and silicon nitride, |
02/13/2014 | DE102011013978A1 Verfahren zum Polieren eines Substrats, das Polysilizium und mindestens eines von Siliziumnitrid umfasst Includes methods for polishing a substrate, the polysilicon and silicon nitride of at least one of |
02/12/2014 | CN103571340A Preparation method of color emulsion type shoe polish |
02/12/2014 | CN103571339A Preparation method of emulsion type shoe polish |
02/12/2014 | CN103571338A Color emulsion-type shoe polish |
02/12/2014 | CN103571337A Emulsion-type shoe polish |
02/12/2014 | CN103571336A Recycling and utilizing method of waste polishing powder |
02/12/2014 | CN103571335A Rare earth polishing powder and preparation method thereof |
02/12/2014 | CN103571334A 氧化铈抛光粉及其制备方法 Cerium oxide polishing powder and its preparation method |
02/12/2014 | CN103571333A CMP (Chemical-Mechanical Polishing) polishing liquid with mixed grinding materials for alkaline sapphire substrate and preparation method thereof |
02/12/2014 | CN102965029B Decontaminating and brightening agent for leather |
02/12/2014 | CN102643614B Efficient glass polishing powder and preparation method thereof |
02/05/2014 | CN103555208A Shoe polish |
02/05/2014 | CN103555207A Grinding liquid for grinding and polishing |
02/05/2014 | CN103555206A Rare earth polishing powder and preparation method thereof |
02/05/2014 | CN102585705B CMP (chemical mechanical polishing) liquid with high polishing rate for sapphire supporting base and application thereof |
01/30/2014 | US20140030897 Polishing composition and polishing method using the same |
01/30/2014 | US20140026340 Surface cleaning article and process for making the same |
01/29/2014 | EP2688966A1 A chemical mechanical polishing (cmp) composition comprising two types of corrosion inhibitors |
01/29/2014 | CN103540266A Shoe cream |
01/29/2014 | CN102585707B Preparation method of cerium-based mixed rare earth polishing powder |
01/29/2014 | CN102559064B Cerium-zirconium praseodymium sosoloid and preparation method thereof |
01/23/2014 | US20140020305 Magnetorheological fluid for ultrasmooth polishing |
01/22/2014 | CN103526208A Aluminum ware lightening cream and method for lightening aluminum ware |
01/22/2014 | CN103525570A Granite abrasive washing and polishing agent and preparation method thereof |
01/22/2014 | CN103525314A High-efficiency diamond lubricating cooling polishing solution and preparation method and application thereof |
01/22/2014 | CN103525313A Silverware brightening method |
01/22/2014 | CN101768412B CMP slurry composition for barrier polishing for manufacturing copper interconnects, polishing method using the composition, and semiconductor device manufactured by the method |
01/16/2014 | US20140013674 High Purity Silica Sol and its Production Method |
01/15/2014 | CN103509473A Car cleaning and maintenance liquid |
01/15/2014 | CN103509472A Cerium-based mixed rare earth polishing powder and preparation method thereof |
01/15/2014 | CN103509471A Preparation method of nano-SiO2 polishing solution |
01/15/2014 | CN103509470A Preparation method for super-precise polished core-shell structure composite slurry |
01/15/2014 | CN103509469A Liquid high-power polishing agent |
01/15/2014 | CN103509468A Chemical-mechanical polishing liquid for planarization of silicon through hole |
01/15/2014 | CN103506928A 超硬半导体材料抛光方法 Superhard polishing method of semiconductor materials |
01/09/2014 | WO2014008356A1 Abrasive article for lower speed grinding operations |
01/09/2014 | US20140011362 Chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and an aromatic compound comprising at least one acid group |
01/09/2014 | US20140011361 Chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and a carbonate salt |
01/09/2014 | US20140011360 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor device |
01/09/2014 | US20140008567 Chemical mechanical polishing slurry |
01/08/2014 | EP2682441A1 A chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and an aromatic compound comprising at least one acid group |
01/08/2014 | EP2682440A1 A chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and a carbonate salt |
01/08/2014 | CN103497733A Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate |
01/08/2014 | CN103497688A Chemical mechanical polishing method for phase-change material |
01/08/2014 | CN103497687A Polishing liquid with luminous abrasive particles, and fluid mechanics research system and method |
01/08/2014 | CN103497340A Preparation method of water-soluble polystyrene-silicon dioxide core-shell type composite particle |
01/08/2014 | CN103495929A Grinding and polishing method of metal strip |
01/08/2014 | CN102586783B Corrosion inhibitor, preparation method thereof and chemico-mechanical polishing composition |
01/08/2014 | CN102516887B Polishing solution and plasma polishing process |
01/08/2014 | CN102516875B Polishing solution based on polishing process of metal Co and application thereof |
01/02/2014 | US20140004703 Chemical mechanical polishing (cmp) composition comprising a polymeric polyamine |
01/02/2014 | US20140001153 Polishing slurry and polishing method thereof |
01/01/2014 | EP2679663A1 Streak-free formulations for cleaning and coating hard surfaces |
01/01/2014 | CN103484026A High-efficiency ceramic polishing solution and preparation method thereof |
01/01/2014 | CN103484025A Self-stop GST (Ge2Sb2Te5) chemical mechanical polishing solution as well as preparation method and application thereof |
01/01/2014 | CN103484024A Chemico-mechanical polishing liquid for silicon dioxide dielectric materials and preparing method thereof |