Patents for C09G 1 - Polishing compositions (7,846)
12/2014
12/17/2014CN103342965B 一种用于不锈钢金属制品的超精抛光蜡 Ultra-fine polishing wax for stainless steel products
12/17/2014CN103127874B 抛光液分散助剂、含有该分散助剂的抛光液及制备方法和应用 Polishing dispersion additives containing polishing liquid and preparation method and application of the dispersion aid
12/17/2014CN102941528B 具有高精度超光滑表面的铝合金材料及抛光盘、抛光液和抛光方法 Aluminum alloy material with high precision and ultra-smooth surface polishing, polishing liquid and polishing methods
12/17/2014CN102785160B 一种离型纸用压花辊及其制备方法 One kind of release paper with embossing roll and its preparation method
12/17/2014CN102210012B 研磨剂、研磨方法和半导体集成电路装置的制造方法 Method for producing an abrasive, a polishing method and a semiconductor integrated circuit device
12/16/2014US8911643 Polishing liquid and polishing method
12/16/2014US8911560 Streak-free formulations for cleaning and coating hard surfaces
12/16/2014US8911541 Aqueous floor polishing composition
12/11/2014US20140363973 Cmp polishing liquid and polishing method
12/10/2014CN104194654A 一种鞋油 One kind of shoe polish
12/10/2014CN104194653A 一种木质手把件的护理油膏的制作方法 A method of making wooden hand pieces care ointment
12/10/2014CN104194652A 一种用于机械设备的无腐蚀的抛光液 Corrosion-free polishing solution for mechanical equipment
12/10/2014CN104194651A 皮革光亮剂制作方法 Leather brightener production methods
12/10/2014CN104194650A 一种抛光液 A polishing liquid
12/10/2014CN104194649A 一种用于金属零件的抛光液 A polishing solution for metal parts
12/10/2014CN104194648A 一种机械设备不锈钢材料抛光剂及其制备方法 A mechanical device polishes stainless steel material and method
12/10/2014CN104194647A 一种加工蓝宝石专用钻石研磨液和研磨膏及它们的制备方法 A process for sapphire and diamond slurry special pastes and their preparation
12/10/2014CN104194646A 一种稀土铈基抛光浆生产方法 Rare earth cerium-based polishing slurry production methods
12/10/2014CN104194645A 用于去除待修模具中残铝的清模饼及其制备和使用方法 To be repaired for the removal of residual aluminum mold clean mold cake preparation and use
12/10/2014CN104194644A 一种低价电材料机械抛光液 A low-cost electric material mechanical polishing liquid
12/10/2014CN104191340A 基于非牛顿流体剪切增稠与电解复合效应的超精密加工装置 Based on the non-Newtonian fluid shear thickening effect electrolytic composite ultra-precision machining equipment
12/10/2014CN103525314B 高效金刚石润滑冷却抛光液及制备方法和应用 Efficient diamond polishing liquid cooling and lubricating preparation method and application
12/10/2014CN103509470B 用于超精密抛光的核壳结构复合料浆的制备方法 Preparation of core-shell structure of ultra-precision polishing slurry for complex
12/10/2014CN103146307B 一种化学机械抛光用纳米抛光液 A chemical mechanical polishing with a polishing liquid nano
12/10/2014CN102766406B 一种去除半导体硅片表面缺陷的抛光组合物及其制备方法 A method of removing the defective semiconductor wafer surface polishing composition and its preparation method
12/10/2014CN102403212B 硅通孔晶片的抛光方法和用于该方法的抛光组合物 TSV wafer polishing method and a polishing composition used in the process of
12/10/2014CN102363713B 稳定的化学机械抛光组合物以及抛光基板的方法 Stable chemical mechanical polishing composition and method of polishing a substrate,
12/09/2014US8906252 CMP compositions selective for oxide and nitride with high removal rate and low defectivity
12/09/2014US8906123 CMP slurry/method for polishing ruthenium and other films
12/04/2014US20140357545 Mermaid Spit
12/02/2014US8901002 Polishing slurry for metal films and polishing method
12/02/2014US8901001 Slurry composition and method of fabricating damascene structure using the same
12/02/2014US8900477 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
12/02/2014US8900473 Polishing solution for CMP, and method for polishing substrate using the polishing solution for CMP
12/02/2014US8900335 CMP polishing slurry and method of polishing substrate
11/2014
11/27/2014US20140349484 Polishing composition
11/27/2014US20140349483 Cmp compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivity
11/27/2014US20140346140 Cmp compositions selective for oxide and nitride with high removal rate and low defectivity
11/27/2014US20140346138 Polishing composition for magnetic disk substrate
11/25/2014US8894733 Method for recycling cerium oxide abrasive
11/20/2014US20140342562 Polishing composition
11/20/2014US20140342561 Polishing composition
11/20/2014US20140342560 Polishing composition
11/18/2014US8889555 Polishing agent for copper polishing and polishing method using same
11/18/2014US8888559 Wet sanding compositions
11/13/2014US20140335763 Polishing liquid composition for magnetic disk substrate
11/13/2014US20140335762 Polishing composition, and polishing method and substrate production method using same
11/11/2014US8883034 Composition and method for polishing bulk silicon
11/11/2014US8883031 CMP polishing liquid and polishing method
11/06/2014US20140326701 Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of borophosphosilicate glass (bpsg) material in the presence of a cmp composition comprising anionic phosphate or phosphonate
11/04/2014US8877643 Method of polishing a silicon wafer
11/04/2014US8876926 Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof
10/2014
10/30/2014US20140322913 Polishing composition
10/30/2014US20140319411 Semiconductor wafer polishing liquid composition
10/23/2014US20140315386 Metal Compound Coated Colloidal Particles Process for Making and Use Therefor
10/23/2014US20140312264 Colloidal Sol And Method Of Making Same
10/21/2014US8865013 Method for chemical mechanical polishing tungsten
10/21/2014US8864862 Coated abrasive grains, method and for the production thereof as well as the use thereof for producing abrasives
10/21/2014US8864860 Polishing composition
10/16/2014US20140308879 Additive for polishing agent, and polishing method
10/16/2014US20140308814 Chemical mechanical polishing methods and systems including pre-treatment phase and pre-treatment compositions
10/16/2014US20140308155 Method for polishing alloy material and method for producing alloy material
10/16/2014US20140305901 Additive mixture and composition and method for polishing glass substrates
10/14/2014US8859429 Polishing agent for copper polishing and polishing method using same
10/14/2014US8859428 Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
10/14/2014US8858819 Method for chemical mechanical planarization of a tungsten-containing substrate
10/09/2014US20140302753 Polishing composition
10/09/2014US20140302752 Composition for polishing purposes, polishing method using same, and method for producing substrate
10/02/2014WO2014156381A1 Polishing composition
10/02/2014US20140295738 Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the same
09/2014
09/30/2014US8845915 Abrading agent and abrading method
09/25/2014WO2014148399A1 Polishing composition, method for producing polishing composition, and kit for preparing polishing composition
09/25/2014DE102013204949A1 Lederpflege- und imprägniermittel Leather Care and impregnating agent
09/23/2014US8841216 Method and composition for chemical mechanical planarization of a metal
09/23/2014US8841215 Polishing agent, compound semiconductor manufacturing method, and semiconductor device manufacturing method
09/23/2014US8840798 Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same
09/23/2014CA2664207C Film forming compositions containing mixtures of benzoic acid esters
09/18/2014US20140273458 Chemical Mechanical Planarization for Tungsten-Containing Substrates
09/18/2014US20140263184 Cmp compositions with low solids content and methods related thereto
09/18/2014US20140263170 Methods of polishing sapphire surfaces
09/18/2014US20140263167 Polishing composition and polishing method using same, and substrate manufacturing method
09/17/2014EP2779217A2 Chemical mechanical planarization for tungsten-containing substrates
09/17/2014EP2776523A1 Additive mixture and composition and method for polishing glass substrates
09/16/2014US8834589 Polishing composition for magnetic disk substrate
09/11/2014US20140251950 Polishing composition
09/10/2014EP2773712A1 Furniture polish composition
09/09/2014US8828874 Chemical mechanical polishing of group III-nitride surfaces
09/09/2014US8828266 CMP slurry composition and polishing method using the same
09/04/2014US20140248823 Composition and method for polishing glass
09/04/2014US20140248776 Composition for polishing compound semiconductor
09/02/2014US8821750 Metal polishing slurry and polishing method
08/2014
08/28/2014US20140242798 Polishing composition
08/28/2014US20140242750 Polishing slurry, and polishing method
08/26/2014US8815110 Composition and method for polishing bulk silicon
08/13/2014CN103980819A 高分散超细氧化铝抛光液的制备方法 Preparation of highly dispersed ultrafine alumina polishing solution
08/13/2014CN103977830A 可见光活性掺杂纳米二氧化钛的制法及可见光光催化光触媒上光乳液的制法 Visible activity of doped titania nanoparticles prepared by and visible light photocatalyst coating emulsion catalytic system of law
08/12/2014US8801959 Stable, concentratable silicon wafer polishing composition and related methods
08/07/2014US20140220779 Surface selective polishing compositions
08/07/2014US20140220299 Single-crystal silicon-carbide substrate and polishing solution
08/06/2014CN103965791A 一种实现废稀土抛光粉清洁化快速再生的方法 Rare earth polishing powder clean way to achieve rapid regeneration of waste
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