Patents
Sitemap › B24 - Grinding; Polishing › B24D - Tools for grinding, buffing or sharpening › B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710)
04/2003
04/09/2003CN2543664Y Abrasive cloth polishing wheel
04/08/2003US6544373 Polishing pad for a chemical mechanical polishing process
04/08/2003US6544107 Composite polishing pads for chemical-mechanical polishing
04/08/2003US6544104 Polishing pad and polisher
04/03/2003WO2003026850A1 Abrasive tool with coiled band saw blade and method for making same
04/02/2003EP1297927A2 Polishing apparatus
04/02/2003EP1296803A1 Method of making a surface treating article and such a surface treating article
04/02/2003EP1296800A1 Polishing pad with built-in optical sensor
04/02/2003CN1407606A Grinding pad
04/02/2003CN1407605A Device for eliminating stress by machining
04/01/2003US6540593 Fixed abrasive polishing pad
04/01/2003US6540590 Chemical mechanical polishing apparatus and method having a rotating retaining ring
03/2003
03/27/2003US20030060140 Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
03/27/2003US20030060139 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates with metal compound abrasives
03/27/2003US20030060138 Polishing pad for semiconductor wafer and polishing process using thereof
03/26/2003EP1295680A2 Polishing pad for semiconductor wafer
03/26/2003EP1294968A1 Method of making nonwoven fabric for buffing applications
03/26/2003EP1294536A2 Base-pad for a polishing pad
03/26/2003EP1294532A1 Burr removal apparatus
03/26/2003EP0912293B1 Method of making a foraminous abrasive article
03/25/2003US6537190 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
03/25/2003US6537144 Method and apparatus for enhanced CMP using metals having reductive properties
03/25/2003US6537137 Methods for chemical-mechanical polishing of semiconductor wafers
03/25/2003US6537136 Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
03/25/2003US6537133 Method for in-situ endpoint detection for chemical mechanical polishing operations
03/20/2003US20030054735 Pad for chemical mechanical polishing
03/19/2003EP1293292A1 A device for processing flat workpieces
03/19/2003EP1292428A1 A multi-zone grinding and/or polishing sheet
03/18/2003US6533645 Substrate polishing article
03/13/2003US20030049995 Flexible abrasive product and method of making and using the same
03/13/2003US20030049117 Automated barrel panel transfer and processing system
03/12/2003EP1291133A1 Industrial brush
03/12/2003EP1015176B1 Improved polishing pads and methods relating thereto
03/11/2003US6530830 Sanding disc
03/05/2003CN1400636A Composite grinding pad for grinding semiconductor wafer and its production method
03/04/2003US6527628 Method for producing frost glass product
03/04/2003US6527626 Fixed abrasive polishing pad
03/04/2003US6527625 Chemical mechanical polishing apparatus and method having a soft backed polishing head
03/04/2003US6527621 Pad retrieval apparatus for chemical mechanical planarization
02/2003
02/27/2003WO2003017348A1 Chemical mechanical polishing pad having holes and/or grooves
02/27/2003WO2003017347A1 Chemical mechanical polishing pad having wave-shaped grooves
02/27/2003DE20217188U1 Polishing disc comprising foam material, for e.g. lacquered surfaces of motor vehicles, contains open channel in its top side
02/26/2003EP1285729A2 Rotary roll brush
02/26/2003EP1284842A1 Polishing pads for chemical mechanical planarization
02/26/2003EP1284841A1 Grooved polishing pads for chemical mechanical planarization
02/25/2003US6524164 Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
02/25/2003US6523215 Polishing pad and system
02/20/2003US20030036343 Machining strain removal apparatus
02/20/2003US20030035940 Via thermoplastic foam polymers; for semiconductor wafer or integrated circuits; smoothness
02/20/2003US20030034131 Chemical mechanical polishing pad having wave shaped grooves
02/19/2003EP1009588B1 Polishing pad and method for making polishing pad with elongated microcolumns
02/19/2003CN2536351Y Emery cloth impellers
02/18/2003US6520847 Polishing pad having a grooved pattern for use in chemical mechanical polishing
02/18/2003US6520834 Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates
02/13/2003WO2003012846A1 Chemical mechanical polishing pad with micro-holes
02/13/2003WO2003011522A1 Method for fabricating polishing pad using laser beam and mask
02/13/2003WO2003011520A1 Method for fabricating chemical mechanical polishing pad using laser
02/13/2003US20030032378 Polishing surface constituting member and polishing apparatus using the polishing surface constituting member
02/13/2003US20030031876 Thermal management with filled polymeric polishing pads and applications therefor
02/13/2003DE20216054U1 Grinding machine control rotates brush wheel to contact grinding wheel to clean it
02/11/2003US6518188 Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
02/11/2003US6517426 Composite polishing pad for chemical-mechanical polishing
02/11/2003US6517425 Fixed abrasive polishing pad
02/11/2003US6517423 Polishing device
02/11/2003US6517417 Polishing pad with a transparent portion
02/06/2003WO2003009965A2 Cutlery polishing apparatus
02/06/2003WO2002000391A9 Burr removal apparatus
02/06/2003US20030027500 Polishing pads for chemical mechanical planarization
02/06/2003US20030027496 Method and apparatus for probe tip cleaning and shaping pad
02/05/2003EP1281477A1 Polishing pads
02/04/2003US6514363 Surface treating articles and method of making same
02/04/2003US6514301 Foam semiconductor polishing belts and pads
02/04/2003US6514130 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
01/2003
01/30/2003WO2003009362A1 Polishing element, cmp polishing device and productionj method for semiconductor device
01/30/2003WO2003008151A1 Fixed abrasive articles with wear indicators
01/30/2003US20030022611 Method for attaching web based polishing materials together on a polishing tool
01/30/2003US20030022604 Abrasive product and method of making and using the same
01/30/2003US20030021980 Method of altering and preserving the surface properties of a polishing pad and specific applications therefor
01/30/2003US20030019570 Polishing pad for a chemical mechanical polishing process
01/29/2003CN1099939C 抛光垫及抛光装置 Polishing pad and polishing equipment
01/23/2003WO2002018101A3 Chemical mechanical polishing (cmp) head, apparatus, and method and planarized semiconductor wafer produced thereby
01/22/2003EP1276594A1 Method for attaching a fastener to a surface treating member, and such an article having a fastener
01/21/2003US6508698 Grinding or cleaning device for a textile machine
01/16/2003US20030013384 Method and apparatus for chemical mechanical polishing
01/15/2003CN1391506A Conditioner for polishing pad and method for manufacturing the same
01/15/2003CN1098746C Chemical mechanical polishing apparatus and method of chemical mechanical polishing
01/14/2003US6506277 Abrasive sheet dispenser and method of use
01/14/2003US6506100 Grinding tool, processing machine with a grinding tool, use of a grinding tool and method for processing a work piece
01/09/2003WO2003002299A2 Carrier head with porose retainer ring
01/09/2003US20030008601 Porous grinding tool and method for grinding a roll
01/08/2003EP1272312A1 Sanding strip
01/02/2003US20030003857 Polishing pad, and method and apparatus for polishing
01/02/2003US20030003846 Material for use in carrier and polishing pads
01/02/2003US20030000062 Rotary tool for surface machining and method for its manufacture
01/02/2003EP1117507B1 Grinding tool
12/2002
12/31/2002US6500060 Rotary polishing discs and arbors therefor
12/31/2002US6500057 Drywall abrasive sanding disk, sanding pad, and method
12/31/2002US6500053 Polishing pads and methods relating thereto
12/27/2002WO2002102552A1 Buffing machine
12/26/2002US20020197946 Multi-phase polishing pad
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