Patents
Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710)
08/2003
08/06/2003EP1296800A4 Polishing pad with built-in optical sensor
08/05/2003US6602123 Finishing pad design for multidirectional use
07/2003
07/31/2003US20030143930 Apparatus and method for front side chemical mechanical planarization (cmp) of semiconductor workpieces
07/31/2003US20030143925 Polishing pad window for a chemical-mechanical polishing tool
07/31/2003US20030143911 Cleaning tool, method for making same
07/29/2003US6599765 Apparatus and method for providing a signal port in a polishing pad for optical endpoint detection
07/24/2003WO2003059573A1 Polishing method and polishing device
07/24/2003US20030139125 Surface finishing pad
07/24/2003US20030136508 Multilayer; polyethylene backings; heating, pressing
07/23/2003EP1329287A1 Grinding of clothing
07/23/2003EP1329286A1 Grinding of clothing
07/22/2003US6596388 Method of introducing organic and inorganic grafted compounds throughout a thermoplastic polishing pad using a supercritical fluid and applications therefor
07/22/2003US6595845 Outer-diameter blade, inner-diameter blade, core drill and processing machines using same ones
07/22/2003US6595844 Outer-diameter blade, inner-diameter blade, core drill and processing machines using same ones
07/22/2003US6595843 Buffing tools and methods of making
07/22/2003US6595842 Abrasive pad and method of making same
07/22/2003US6595839 Surface treatment tool
07/22/2003US6595833 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates with metal compound abrasives
07/17/2003WO2003058698A1 Polishing pad, process for producing the same, and method of polishing
07/17/2003US20030134584 Tool carrier
07/17/2003US20030132207 Method for fabricating chemical mechanical polshing pad using laser
07/16/2003EP1326728A1 Device and method for machining a workpiece
07/16/2003EP1326508A2 Unitary brush having abrasive coated bristles and method of making the same
07/15/2003US6592443 Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
07/15/2003US6592442 Aluminum hub with outwardly opening peripheral slots
07/15/2003US6592438 CMP platen with patterned surface
07/10/2003DE20305995U1 Polishing wheel with upper side and underside, middle polishing area enclosed by edge part, round holes arranged in ring
07/09/2003EP1326267A1 Abrasive cloth, polishing device and method for manufacturing semiconductor device
07/09/2003EP1240075B1 Method for protecting underwater surfaces against pollution due to fouling, and brush and coating agent used therewith
07/08/2003US6589106 Polyvinyl chloride, adhesive, flocked fibers
07/08/2003US6589101 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates with metal compound abrasives
07/03/2003WO2003054097A1 Polishing pad
07/03/2003US20030124958 Burnishing pad, burnishing machine equipped with burnishing pad and burnishing method
07/03/2003US20030121213 Lapping medium and method of generating the same
06/2003
06/26/2003US20030119437 Sanding wallboard; abrasive disk on foam substrate
06/26/2003US20030119432 Abrasive belt material for grinding/polishing/cutting tools
06/26/2003US20030119425 Turning tool for grooving polishing pad, apparatus and method of producing polishing pad using the tool, and polishing pad produced by using the tool
06/25/2003EP1320443A1 Polishing pad having an advantageous micro-texture
06/24/2003US6582289 Flap disc
06/24/2003US6582283 Polishing pads for chemical mechanical planarization
06/24/2003US6582282 Chemical mechanical polishing with multiple polishing pads
06/19/2003US20030114096 Surface treating member having a fastener
06/19/2003US20030114088 Fixed abrasive polishing pad
06/19/2003US20030114084 Method and apparatus for polishing substrates
06/19/2003US20030114079 Rigid plate assembly with polishing pad and method of using
06/19/2003US20030110609 Subpad support with a releasable subpad securing element and polishing apparatus including the subpad support
06/18/2003EP1318891A1 Polishing pad comprising particulate polymer and crosslinked polymer binder
06/17/2003US6579604 Method of altering and preserving the surface properties of a polishing pad and specific applications therefor
06/17/2003US6579159 Chemical planar head dampening system
06/12/2003US20030109209 Polishing pad
06/12/2003US20030109197 Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
06/12/2003US20030109196 Endpoint detection system for wafer polishing
06/10/2003US6575825 CMP polishing pad
06/10/2003US6575823 Polishing pad and method for in situ delivery of chemical mechanical polishing slurry modifiers and applications thereof
06/10/2003US6575094 A support of a PS plate which has excellent ability to withstand repeated printing, and in which defects in appearance, such as dirtying and the like, do not occur. Also provided are a method of manufacturing the lithographic
06/05/2003WO2003045631A1 Polishing pad comprising particles with a solid core and polymeric shell
06/05/2003WO2002100593A3 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same
06/05/2003US20030104768 Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
06/05/2003DE20304860U1 Machine driven grinding tool comprising plate, grinding cloth and support segments, has grinding cloth segments specially oriented on top of plate segments
06/04/2003EP1316991A1 Method of polishing semiconductor wafer
06/03/2003US6572439 Customized polishing pad for selective process performance during chemical mechanical polishing
05/2003
05/29/2003US20030100250 Pads for CMP and polishing substrates
05/29/2003US20030100244 Polishing pad comprising particles with a solid core and polymeric shell
05/28/2003EP1313594A1 Polishing tool
05/28/2003EP1024924A4 Apparatus and method for cleaning and finishing
05/27/2003US6568998 Using planarizing medium having relatively hard polishing pad and planarizing liquid including colloidal particles formed from silicon dioxide, manganese oxide, and cerium oxide
05/22/2003US20030096559 Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates
05/15/2003WO2003039812A1 Method of fabricating a polishing pad having an optical window
05/15/2003US20030092371 Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus
05/15/2003US20030092370 Sanding strip
05/15/2003US20030092368 Surface treatment tool
05/14/2003EP1309424A2 Abrasive pad for cmp
05/13/2003US6561886 Device for retaining abrasive pad on lap in eyeglass lens making apparatus
05/13/2003US6561873 Method and apparatus for enhanced CMP using metals having reductive properties
05/08/2003WO2003038882A1 Method and pad for polishing wafer
05/08/2003WO2003038862A2 Pads for cmp and polishing substrates
05/08/2003WO2003037565A2 Polishing pads and manufacturing methods
05/08/2003US20030087593 Device for processing flat workpieces
05/08/2003US20030084774 Method of fabricating a polishing pad having an optical window
05/07/2003EP1308243A1 Polishing method
05/07/2003EP1308241A1 Brushing apparatus with reciprocating roll
05/06/2003US6558236 Method and apparatus for chemical mechanical polishing
05/06/2003US6557608 Method for attaching web based polishing materials together on a polishing tool
05/02/2003EP1306162A1 Polishing sheet and method of manufacturing the sheet
05/02/2003EP1305139A2 Fluid dispensing fixed abrasive polishing pad
05/01/2003WO2002100598A3 Grinding wheel, intermediate product and method for producing a grinding wheel of this type
05/01/2003US20030083003 Polishing pads and manufacturing methods
04/2003
04/24/2003US20030077436 Method of altering and preserving the surface properties of a polishing pad and specific applications therefor
04/23/2003EP1303381A2 Grooved polishing pads and methods of use
04/23/2003EP1177071B1 Grinding disc with backup pad
04/23/2003CN1413158A Method for protecting underwater surfaces against pollution due to fouling, and brush and coating agent used terewith
04/17/2003WO2003032379A1 Polishing pad for cmp, method for polishing substrate using it and method for producing polishing pad for cmp
04/16/2003EP1301312A1 Cleaning tool, method for making same
04/16/2003EP0912294B1 Nonwoven abrasive articles
04/15/2003US6547655 Flame-resistant buffing wheel and method
04/15/2003US6547652 Linear CMP tool design using in-situ slurry distribution and concurrent pad conditioning
04/15/2003US6547644 Metathesis ring-opening polymerization; polishing glass sheet
04/15/2003US6547643 Surface polishing applicator system and method
04/10/2003WO2003028519A1 Method for sanitation of covered floors, floor maintenance agents and associated cleaning pads
04/09/2003EP1299210A1 Polishing pad grooving method and apparatus
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