| Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710) |
|---|
| 06/05/2002 | EP0921906B1 Abrasive construction for semiconductor wafer modification |
| 06/05/2002 | EP0876242B1 A polishing pad and a method for making a polishing pad with covalently bonded particles |
| 06/05/2002 | CN1352588A Abrasive processing apparatu sand method for employing encoded abrasive product |
| 06/04/2002 | US6398630 Planarizing machine containing web-format polishing pad and web-format polishing pads |
| 06/04/2002 | US6398626 Polishing apparatus |
| 05/30/2002 | WO2002002279A3 Grooved polishing pads and methods of use |
| 05/30/2002 | US20020065031 Unitary brush having abrasive coated bristles and method of making the same |
| 05/30/2002 | US20020065030 Grinding tool |
| 05/23/2002 | WO2002014018A3 Abrasive pad for cmp |
| 05/23/2002 | US20020061717 Lap having a layer conformable to curvatures of optical surfaces on lenses and a method for finishing optical surfaces |
| 05/21/2002 | US6390910 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates |
| 05/16/2002 | WO2002038338A2 Composite abrasive particles and method of manufacture |
| 05/16/2002 | US20020058469 Polishing pad having an advantageous micro-texture and methods relating thereto |
| 05/16/2002 | US20020058464 Fixed abrasive polishing pad |
| 05/14/2002 | US6387312 Molding a polishing pad having integral window |
| 05/08/2002 | EP1007283A4 Mosaic polishing pads and methods relating thereto |
| 05/08/2002 | DE10052055A1 Vorrichtung und Verfahren zum Bearbeiten eines Werkstücks Apparatus and method for machining a workpiece |
| 05/07/2002 | US6383066 Multilayered polishing pad, method for fabricating, and use thereof |
| 05/07/2002 | US6383065 Catalytic reactive pad for metal CMP |
| 05/07/2002 | CA2220820C Barrel polishing apparatus |
| 05/02/2002 | WO2002034469A1 Polishing tool and a composition for producing said tool |
| 04/30/2002 | US6380092 Gas phase planarization process for semiconductor wafers |
| 04/30/2002 | US6379238 Finishing and abrasive tool |
| 04/30/2002 | US6378157 Foam surface conditioning pad |
| 04/25/2002 | WO2002032627A1 Rotary finishing tool and method of making the same |
| 04/25/2002 | WO2002032609A1 Device and method for machining a workpiece |
| 04/25/2002 | WO2002032255A1 Power brush |
| 04/25/2002 | WO2002032254A2 Unitary brush having abrasive coated bristles and method of making the same |
| 04/25/2002 | US20020049027 Fixed abrasive polishing pad |
| 04/24/2002 | EP0998372B1 Cutting edge rounding method and apparatus |
| 04/24/2002 | EP0930955B1 Polishing pad contour indicator for mechanical or chemical-mechanical planarization |
| 04/23/2002 | US6375559 Polishing system having a multi-phase polishing substrate and methods relating thereto |
| 04/18/2002 | WO2002031874A1 Abrasive cloth, polishing device and method for manufacturing semiconductor device |
| 04/18/2002 | US20020045416 Power brush |
| 04/18/2002 | DE10050073A1 Grinder wheel has central support clamped onto shaft, with annular peripheral surface, grinder-blades, and convex curvature |
| 04/17/2002 | CN1345264A Polishing body, polisher, plishing method and method for producing semiconductor device |
| 04/16/2002 | US6371842 Patterned abrading articles and methods of making and using same |
| 04/16/2002 | US6371837 Method of refining a surface |
| 04/11/2002 | WO2002028598A1 Method for conditioning polishing pads |
| 04/11/2002 | WO2002028597A1 Method and apparatus for electrochemical planarization of a workpiece |
| 04/11/2002 | WO2002002274A3 Base-pad for a polishing pad |
| 04/11/2002 | US20020042200 Using multilayer polymer pad |
| 04/10/2002 | EP1035949B1 Foam buffing pad of individual string-like members and method of manufacture thereof |
| 04/09/2002 | US6368202 Rotary finishing tool and method of making the same |
| 04/09/2002 | US6368200 Polishing pads from closed-cell elastomer foam |
| 04/03/2002 | EP0918596B1 Method for the deburring of items, particularly items of metal, and use of the method |
| 04/02/2002 | US6364757 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates |
| 04/02/2002 | US6364749 CMP polishing pad with hydrophilic surfaces for enhanced wetting |
| 03/28/2002 | WO2002024415A1 Polishing pad having an advantageous micro-texture |
| 03/28/2002 | US20020037695 Scored polishing pad and methods relating thereto |
| 03/28/2002 | US20020037694 Soft polishing disc with holes and method of manufacturing the same |
| 03/27/2002 | EP1189730A1 Abrasive processing apparatus and method employing encoded abrasive product |
| 03/26/2002 | US6362107 Polishing pad and polishing device |
| 03/26/2002 | US6361832 Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines |
| 03/26/2002 | US6361403 Abrasive member, abrasive disc provided with same, and polishing process |
| 03/26/2002 | US6361400 Methods for predicting polishing parameters of polishing pads, and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization |
| 03/21/2002 | WO2002022309A1 Polishing pad comprising particulate polymer and crosslinked polymer binder |
| 03/21/2002 | DE10042109A1 Polierwerkzeug Polishing tool |
| 03/20/2002 | CN1341049A Polishing pad and process for forming same |
| 03/20/2002 | CN1081111C Coated brasive products |
| 03/19/2002 | US6358130 Polishing pad |
| 03/19/2002 | US6358122 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates with metal compound abrasives |
| 03/19/2002 | US6358114 Method and apparatus for optical polishing |
| 03/14/2002 | US20020031990 Polishing pad, polishing method, and polishing machine for mirror-polishing semiconductor wafers |
| 03/14/2002 | US20020031984 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates |
| 03/13/2002 | EP1186379A2 Device for surface grinding and sanding |
| 03/13/2002 | CN2481458Y Steel wire wheel machine with fast clamp device |
| 03/12/2002 | US6354930 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates |
| 03/12/2002 | US6354925 Composite polishing pad |
| 03/12/2002 | US6354915 Hydrophilic polishing material; sufficiently thin to generally improve predictability and polishing performance. polishing surface comprising a plurality of nanoasperities |
| 03/07/2002 | WO2002018102A1 Polishing tool |
| 03/07/2002 | WO2002018101A2 Chemical mechanical polishing (cmp) head, apparatus, and method and planarized semiconductor wafer produced thereby |
| 03/06/2002 | EP1183132A1 Stacked polishing pad having sealed edge |
| 03/06/2002 | CN1080164C Method and apparatus for optical polishing |
| 03/05/2002 | US6352471 Abrasive brush with filaments having plastic abrasive particles therein |
| 02/28/2002 | WO2002016079A1 Cmp device and production method for semiconductor device |
| 02/28/2002 | US20020023326 Method of making nonwoven fabric for buffing applications |
| 02/28/2002 | DE10038415A1 Method for correcting geometry of optical lens or mirrors, involves correcting pre-fabricated work pieces after inspecting their surface geometry |
| 02/27/2002 | CN1337898A Fluid dispensing fixed abrasive polishing pad |
| 02/26/2002 | US6350180 Methods for predicting polishing parameters of polishing pads, and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization |
| 02/26/2002 | US6349446 Quick release buffing pad assembly |
| 02/21/2002 | WO2002015246A1 Method of polishing semiconductor wafer |
| 02/21/2002 | WO2002014018A2 Abrasive pad for cmp |
| 02/21/2002 | US20020022445 Substrate cleaning apparatus |
| 02/21/2002 | US20020022444 Sanding screen element holder |
| 02/21/2002 | US20020020495 Apparatus and methods for chemical-mechanical polishing of semiconductor wafers |
| 02/21/2002 | CA2416549A1 Abrasive pad for cmp |
| 02/20/2002 | CN1336861A Improved polishing pads and methods relating thereto |
| 02/19/2002 | US6347977 Method and system for chemical mechanical polishing |
| 02/14/2002 | WO2002013248A1 Chemical-mechanical polishing apparatus, polishing pad, and method for manufacturing semiconductor device |
| 02/14/2002 | US20020018848 Multilayer polishing pad for microelectronics |
| 02/13/2002 | CN1335799A A polishing machine and method |
| 02/13/2002 | CN1335423A Making process of polishing metal wool felt |
| 02/12/2002 | US6346032 Fluid dispensing fixed abrasive polishing pad |
| 02/07/2002 | WO2002009910A1 Abrasive pad |
| 02/07/2002 | WO2002002278A8 Method of making a surface treating article and such a surface treating article |
| 02/07/2002 | US20020016142 Coating for a smoothing and/or polishing element, particularly a grinding wheel, grinding wheel provided with said coating, process for obtaining said coating and process for realising said grinding wheel |
| 02/07/2002 | US20020013988 Burr removal apparatus |
| 02/07/2002 | DE10035977A1 Verfahren und Vorrichtung zur Bearbeitung von Werkstück-Oberflächen Method and apparatus for machining workpiece surfaces |
| 02/06/2002 | EP1177862A2 Coating for a polishing wheel, particularly for polishing stone material and method for manufacturing the same |