Patents
Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710)
12/2002
12/26/2002US20020197941 Flexible adapter for use with rotary tools
12/24/2002US6498101 Planarizing pads, planarizing machines and methods for making and using planarizing pads in mechanical and chemical-mechanical planarization of microelectronic device substrate assemblies
12/24/2002US6497613 Methods and apparatus for chemical mechanical planarization using a microreplicated surface
12/19/2002WO2002100599A1 Quick release buffing pad assembly
12/19/2002WO2002100598A2 Grinding wheel, intermediate product and method for producing a grinding wheel of this type
12/19/2002WO2002100595A1 Polishing sheet and method of manufacturing the sheet
12/19/2002WO2002100593A2 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same
12/19/2002WO2001068322A9 Window portion with an adjusted rate of wear
12/19/2002US20020193059 Stacked polishing pad having sealed edge
12/19/2002CA2441419A1 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same
12/18/2002EP1266724A1 Grinding disc, intermediate product and manufacturing method of such a grinding disc
12/17/2002CA2226269C Brush attachment for grinder
12/17/2002CA2087901C A method and apparatus for manufacturing a flexible abrasive hone
12/12/2002WO2001092620A9 Method of making nonwoven fabric for buffing applications
12/12/2002US20020187737 Supporting disk for a surface grinding wheel and surface grinding wheel
12/11/2002EP1263548A1 Window portion with an adjusted rate of wear
12/11/2002EP1173309B1 Abrasive flap disc
12/11/2002CN1384534A Polish tool and its use method and device
12/10/2002US6491576 Grinding tool
12/10/2002US6490750 Power brush
12/05/2002WO2002096603A1 Abrasive disc and fastener
12/05/2002US20020182993 Polishing device
12/05/2002US20020182992 Grinding tool
12/05/2002US20020182986 Polishing pad with wear indicator for profile monitoring and controlling and method and apparatus for polishing using said pad
12/05/2002US20020182983 Grinding wheel for polishing and polishing method employing it
12/05/2002US20020182980 Method for protecting underwater surfaces against pollution due to fouling, and brush and coating agent used therewith
12/05/2002DE10125990A1 Polishing disc with spongy peripheral edge is gripped between two rigid support discs with central sleeve and tensioning shaft
12/04/2002EP1262283A1 Bayonet-type locking arrangement for a consumable grinding disk and a supporting plate
12/04/2002EP1073542B1 Chemical mechanical polishing with multiple polishing pads
12/03/2002US6488575 Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines
12/03/2002US6488570 Method relating to a polishing system having a multi-phase polishing layer
11/2002
11/28/2002US20020177391 Abrasive article
11/27/2002EP1260316A1 Grinding wheel for polishing and polishing method employing it
11/27/2002EP1112145B1 Polishing pad for a semiconductor substrate
11/26/2002US6485356 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates with metal compound abrasives
11/26/2002US6485354 Polishing pad with built-in optical sensor
11/21/2002WO2002057071A3 Catalytic reactive pad for metal cmp
11/21/2002US20020173244 Polishing tool and polishing method and apparatus using same
11/21/2002US20020173231 Polishing pad for semiconductor wafer and laminated body for polishing of semiconductor wafer equipped with the same as well as method for polishing of semiconductor wafer
11/21/2002US20020173171 Pattern over impervious film; confining fluid flow; pattern reproduction
11/20/2002EP1258315A2 Apparatus for finishing plate-like, coated workpieces
11/20/2002EP1257386A1 Polishing pad with a transparent portion
11/20/2002EP1126950B1 Apparatuses and methods for polishing semiconductor wafers
11/20/2002EP1035945A4 Manufacturing a memory disk or semiconductor device using an abrasive polishing system, and polishing pad
11/20/2002EP1019221B1 Abrasive disk
11/14/2002WO2002090051A1 Industrial brush
11/14/2002WO2001023141A9 Polishing pad
11/12/2002US6478977 Polishing method and apparatus
11/12/2002US6478914 Method for attaching web-based polishing materials together on a polishing tool
11/12/2002US6477926 Polishing pad
11/08/2002CA2358217A1 Finishing and abrasive tool
11/07/2002US20020164933 Method for producing frost glass product
11/07/2002US20020164928 Method and apparatus for conditioning a polishing pad
11/06/2002EP1097026B1 Polishing pads for a semiconductor substrate
11/06/2002EP1011922B1 Polishing pad for a semiconductor substrate
10/2002
10/30/2002EP1252973A1 Polishing pad for a semiconductor wafer which has light transmitting properties
10/30/2002EP1131186B1 Lapping and polishing device
10/29/2002US6471575 Brush roll and its brush device
10/24/2002WO2002083757A1 Polyurethane composition and polishing pad
10/24/2002WO2002006010A9 Polishing device
10/24/2002US20020155801 Polishing pads and methods relating thereto
10/24/2002DE10211342A1 Polishing tool used for polishing semiconductor wafers comprises a support and/or support part and a polishing material made from a felt containing abrasive grains and/or grinding grains
10/22/2002US6468138 Porous grinding tool and method for grinding a roll
10/17/2002WO2002081149A1 Polishing pad and system
10/16/2002EP1249309A1 Support for abrasive discs and abrasive disc comprising said support
10/15/2002US6464576 Stacked polishing pad having sealed edge
10/15/2002US6464559 Device for retaining abrasive pad on lap in eyeglass lens making apparatus
10/10/2002US20020146973 Composite polishing pad for chemical-mechanical polishing
10/10/2002US20020144985 Method of manufacturing a polishing pad using a beam
10/10/2002US20020144372 Polishing pad and system
10/10/2002US20020144371 Polishing pad and system
10/09/2002EP1247615A2 Machining device to process the edges of cutting tools
10/09/2002EP1037729B1 Backup pad for abrasive articles, and method of use
10/08/2002US6462305 Method of manufacturing a polishing pad using a beam
10/08/2002US6461226 Wafer is polished against an outer portion of a polishing pad; next, the wafer is polished against an inner portion of the polishing pad. the inner portion of the polishing pad has a second hardness that is less than the first hardness.
10/08/2002US6461224 Off-diameter method for preparing semiconductor wafers
10/03/2002WO2002077705A1 Methods and apparatus for polishing and planarization
10/03/2002US20020142712 Back-up plate for double-sided buffing pad
10/02/2002CN1091673C Polishing device having pad which has grooves and holes
10/01/2002US6458023 Multi characterized chemical mechanical polishing pad and method for fabricating the same
10/01/2002US6457932 Automated barrel panel transfer and processing system
09/2002
09/26/2002WO2002074494A1 Sanding disc for smoothing drywalls
09/26/2002WO2002074490A1 Fixed abrasive article for use in modifying a semiconductor wafer
09/26/2002US20020137450 Polishing pad having a grooved pattern for use in chemical mechanical polishing apparatus
09/26/2002US20020137440 Polishing apparatus
09/26/2002US20020137432 Surface treatment disks for rotary tools
09/26/2002US20020137431 Methods and apparatus for polishing and planarization
09/26/2002CA2441930A1 Sanding disc for smoothing drywalls
09/24/2002US6454634 Polishing pads for chemical mechanical planarization
09/24/2002US6454633 Polishing pads of flocked hollow fibers and methods relating thereto
09/19/2002US20020132573 Sanding disc
09/19/2002US20020132572 Integrally molded brush and method for making the same
09/18/2002EP1240075A2 Method for protecting underwater surfaces against pollution due to fouling, and brush and coating agent used therewith
09/18/2002CN2511438Y Polishing wheel of angular grinder
09/18/2002CN2511437Y Sector wheel of angular grinder
09/17/2002US6450863 Method and apparatus for uniformly planarizing a microelectronic substrate
09/12/2002US20020127958 Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
09/12/2002US20020127955 Method and apparatus for uniformly planarizing a microelectronic substrate
09/12/2002US20020127862 Polishing pad for use in chemical - mechanical palanarization of semiconductor wafers and method of making same
09/12/2002US20020127496 Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
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