| Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710) |
|---|
| 06/17/2004 | DE4229022B4 Innenwirkendes Schleifwerkzeug und Herstellungsverfahren Inner-action grinding tool and manufacturing processes |
| 06/17/2004 | DE10255652A1 Grinding pad for wet-chemical grinding of a substrate surface comprises a polymer matrix consisting of polymers with repetition units and incorporating embedded abrasive particles |
| 06/16/2004 | EP1071538B1 Method and apparatus for repairing optical discs |
| 06/15/2004 | US6749714 Polishing body, polisher, polishing method, and method for producing semiconductor device |
| 06/15/2004 | US6749485 Hydrolytically stable grooved polishing pads for chemical mechanical planarization |
| 06/10/2004 | WO2004049417A1 Polishing pad and method for manufacturing semiconductor device |
| 06/10/2004 | WO2004048473A1 Curable emulsions and abrasive articles therefrom |
| 06/10/2004 | WO2004048033A1 Grinding method and grinding device |
| 06/10/2004 | WO2003099496A3 Rotary foam sanding tool and method for manufacture |
| 06/10/2004 | US20040110456 Nonwoven fabric for buffing applications |
| 06/10/2004 | US20040108063 Method and polishing pad design enabling improved wafer removal from a polishing pad in a CMP process |
| 06/09/2004 | EP1341643A4 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same |
| 06/09/2004 | DE10356669A1 Material-abrading lapping or machining tool especially for processing semiconductor wafers, has working surface divided into surface elements by mutually crossing grooves |
| 06/08/2004 | US6746317 Methods and apparatuses for making and using planarizing pads for mechanical and chemical mechanical planarization of microelectronic substrates |
| 06/08/2004 | US6746311 Polishing pad with release layer |
| 06/08/2004 | US6745631 Using planar ultrasound sensor; forming relational image |
| 06/03/2004 | WO2004046216A1 Method of fabricating polyurethane foam with micro pores and polishing pad tehrefrom |
| 06/03/2004 | WO2004045805A1 Rotary abrasive material |
| 06/03/2004 | US20040106367 Fixed abrasive polishing pad |
| 06/03/2004 | US20040106357 Polishing pad for in-situ endpoint detection |
| 05/27/2004 | WO2004043648A1 Polishing apparatus |
| 05/27/2004 | US20040102574 Stable for a long time, and that may be dried and cured to provide polyurethanes with good physical properties |
| 05/27/2004 | US20040102141 Polishing pad with window for planarization |
| 05/27/2004 | US20040102137 Polishing pad for planarization |
| 05/27/2004 | US20040102049 Method and system to provide material removal and planarization employing a reactive pad |
| 05/25/2004 | US6739962 Polishing pads and methods relating thereto |
| 05/25/2004 | US6739947 In situ friction detector method and apparatus |
| 05/20/2004 | US20040097175 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates |
| 05/19/2004 | EP1419853A1 Apparatus and method for in-situ endpoint detection and monitoring for chemical mechanical polishing operations |
| 05/19/2004 | EP1326508B1 Unitary brush having abrasive coated bristles and method of making the same |
| 05/19/2004 | DE19845166B4 Rotationswerkzeug in der Ausführungsform einer Ringscheibe zur Oberflächenbearbeitung Rotary tool in the embodiment of a washer for surface treatment |
| 05/19/2004 | DE10110526B4 Vorrichtung zur Feinbearbeitung durch Schleifen, Läppen oder Polieren Apparatus for finishing by grinding, lapping and polishing |
| 05/18/2004 | US6736709 Grooved polishing pads for chemical mechanical planarization |
| 05/12/2004 | EP1417703A1 Chemical mechanical polishing pad having holes and/or grooves |
| 05/12/2004 | CN1494987A Lapping pad containing embedded liquid trace component and its production method |
| 05/12/2004 | CN1494984A Sander for polishing cloth and polishing cloth sanding method using said sander |
| 05/12/2004 | CN1494983A Polishing mattress and multilayer polishing mattress |
| 05/06/2004 | US20040087250 Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates |
| 05/06/2004 | EP1415764A2 Fastener for a surface treatment article and quick release system |
| 05/05/2004 | CN1494734A Polishing element, CMP polishing device and production method for semiconductor device |
| 05/04/2004 | US6730140 Injection molding |
| 05/04/2004 | US6729950 Chemical mechanical polishing pad having wave shaped grooves |
| 05/04/2004 | US6729838 Automated barrel panel transfer and processing system |
| 04/29/2004 | US20040082289 Conductive polishing article for electrochemical mechanical polishing |
| 04/29/2004 | DE202004002905U1 Werkzeug zur Bearbeitung von Oberflächen, Kantenbereichen und Konturen Tool for machining surfaces, edge areas and contours |
| 04/29/2004 | DE10296621T5 Polierkissen und System Polishing pad and system |
| 04/28/2004 | EP1412131A1 Method for fabricating polishing pad using laser beam and mask |
| 04/28/2004 | EP1412129A1 Method for fabricating chemical mechanical polishing pad using laser |
| 04/28/2004 | CN2613343Y Disc for polishing |
| 04/28/2004 | CN2613342Y Roller for removing metal burr |
| 04/27/2004 | US6726555 Tool carrier |
| 04/27/2004 | US6726528 Polishing pad with optical sensor |
| 04/21/2004 | EP1409201A1 Fixed abrasive articles with wear indicators |
| 04/21/2004 | EP0949986B1 Method for the production of optical quality surfaces on glass |
| 04/20/2004 | US6722955 Buckup plate assembly for grinding system |
| 04/20/2004 | US6722249 Method of fabricating a polishing pad having an optical window |
| 04/15/2004 | US20040072516 Polishing pad having a grooved pattern for use in chemical mechanical polishing apparatus |
| 04/15/2004 | US20040072507 Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
| 04/15/2004 | US20040072506 Fixed abrasive article for use in modifying a semiconductor wafer |
| 04/15/2004 | US20040072502 Subpad support with a releasable subpad securing element and polishing apparatus including the subpad support |
| 04/14/2004 | EP1408538A1 Polishing element, cmp polishing device and productions method for semiconductor device |
| 04/14/2004 | CN1489508A FIxed abrasive article for use in modifying semiconductor wafer |
| 04/08/2004 | WO2004028745A1 Polishing pad for planarization |
| 04/08/2004 | WO2004028744A1 Polishing pad with window for planarization |
| 04/08/2004 | WO2002064315A8 Polishing disk with end-point detection port |
| 04/08/2004 | DE10338682A1 Surface treatment brush finishing tool has bristles of different length |
| 04/07/2004 | CN1487965A Thermoplastic polyurethane foam, process for production thereof and polishing pads made of the foam |
| 04/07/2004 | CN1487867A Catalytic reactive pad for metal CMP |
| 04/07/2004 | CN1145201C Abrasive sheet |
| 04/06/2004 | US6716092 Providing a polishing pad having a layer of adhesive that covers substantially an entire surface of the pad, and curing selected portions of the adhesive layer to reduce adhesive strength of the layer |
| 04/01/2004 | US20040063387 Through-pad slurry delivery for chemical-mechanical polish |
| 03/31/2004 | CN1486234A 擦拭膜 Wipe the film |
| 03/30/2004 | US6713413 Nonwoven buffing or polishing material having increased strength and dimensional stability |
| 03/30/2004 | US6712681 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same |
| 03/25/2004 | WO2004024393A1 A polishing pad support that improves polishing performance and longevity |
| 03/25/2004 | WO2004024392A1 Measuring the surface properties of polishing pads using ultrasonic reflectance |
| 03/25/2004 | WO2004024391A1 Novel finishing pad design for multidirectional use |
| 03/25/2004 | US20040058630 Chemical mechanical polishing pad having holes and or grooves |
| 03/25/2004 | US20040058629 Apparatus for processing substantially planar workpieces |
| 03/24/2004 | EP1400312A1 Sanding disc having pleated flaps with circumferential recesses |
| 03/24/2004 | CN1484568A Polishing disk with end-point detection port |
| 03/24/2004 | CN1484566A Crosslinked polyethylene polishing pad for chemical mechnical polishing polishing apparatus and polishing method |
| 03/23/2004 | US6709317 Method and apparatus for uniformly planarizing a microelectronic substrate |
| 03/18/2004 | WO2004022283A1 Optical disk polishing device |
| 03/18/2004 | WO2003009965A3 Cutlery polishing apparatus |
| 03/18/2004 | US20040054023 Having uniform foam structure; pads useful for polishing applications for semiconductor wafers and the like with high accuracy and high efficiency |
| 03/18/2004 | US20040053570 Novel finishing pad design for multidirectional use |
| 03/18/2004 | US20040053569 Buffing disc for cleaning hubs |
| 03/18/2004 | US20040053562 Method for securing a polishing pad to a platen for use in chemical-mechanical polishing of wafers |
| 03/18/2004 | US20040053042 Wiping film |
| 03/18/2004 | US20040053007 Used for transporting square or rectangular substrates, such as a glass substrate for a display or the like; substrate is used for producing a display panel of, for example, a liquid crystal display device; nonwarping, dustless |
| 03/17/2004 | EP1084009B1 Cmp pad conditioner arrangement and method therefor |
| 03/16/2004 | US6706383 Polishing pad support that improves polishing performance and longevity |
| 03/16/2004 | US6705934 Polishing pad |
| 03/16/2004 | US6705928 Through-pad slurry delivery for chemical-mechanical polish |
| 03/11/2004 | WO2004021426A1 Polishing pad, polishing plate hole cover, polishing apparatus, polishing method, and method for manufacturing semiconductor device |
| 03/11/2004 | WO2003038862A3 Pads for cmp and polishing substrates |
| 03/11/2004 | US20040048564 Polishing pads and methods relating thereto |
| 03/11/2004 | US20040048562 Polishing pads and methods relating thereto |
| 03/11/2004 | US20040048560 Polishing tool |