Patents
Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710)
12/2000
12/14/2000DE10015418A1 Abrasive work piece, useful as an abrasive or polishing disk, comprises an abrasive material bonded to a substrate by means of a polyurethane adhesive.
12/13/2000EP1058597A1 Fan-folded abrasive disk
12/13/2000CN1276750A Method for sanding surfaces on items
12/12/2000US6159089 Grinding system
12/12/2000US6159088 Polishing pad, polishing apparatus and polishing method
12/07/2000WO2000073020A1 Abrasive processing apparatus and method employing encoded abrasive product
12/06/2000EP1057853A1 Urethane molded product for polishing pad and method for making same
12/06/2000EP1057590A1 Consumable polishing element, specially for finishing optical glasses
12/06/2000EP1015176A4 Improved polishing pads and methods relating thereto
12/05/2000US6155910 Method and article for the production of optical quality surfaces on glass
11/2000
11/30/2000WO2000059681B1 Cmp pad conditioner arrangement and method therefor
11/30/2000DE19921464A1 Method for mechanical sanding and lacquering of wooden work pieces; involves sanding work pieces in several stages to remove all free fibres, before lacquering work pieces in single step
11/28/2000US6152806 Concentric platens
11/15/2000EP1051283A1 Method for sanding surfaces on items
11/14/2000US6146258 Abrasive cleaning apparatus
11/14/2000US6146250 Process for forming a semiconductor device
11/09/2000WO2000066327A1 Grinding disc with backup pad
11/09/2000DE19920651A1 Rotierendes Maschinen-Schleifwerkzeug Rotating machines grinding tool
11/08/2000EP1050377A2 Rotating machine grinding tool
11/07/2000US6142859 Polishing apparatus
11/07/2000US6142858 Backup pad for abrasive articles
11/02/2000EP1048404A2 Method and apparatus for optical polishing
11/02/2000EP1011919A4 Improved polishing pads and methods relating thereto
10/2000
10/31/2000US6139402 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
10/31/2000US6138317 Rotary surface treatment tool
10/25/2000EP1046466A2 Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles
10/24/2000US6136043 Forming an elastomeric material into a polishing pad having a planar surface; and dyeing pad with at least one dye to color the elastomeric material with a color that extends from the planar surface to a pad depth; use in determining wear life
10/24/2000US6135856 Apparatus and method for semiconductor planarization
10/12/2000WO2000059681A1 Cmp pad conditioner arrangement and method therefor
10/12/2000WO2000059680A1 Polishing body, polisher, polishing method, and method for producing semiconductor device
10/11/2000EP1042105A1 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
10/10/2000US6129620 Honing tool and method of making
10/10/2000US6129609 Method for achieving a wear performance which is as linear as possible and tool having a wear performance which is as linear as possible
10/05/2000DE19913747A1 Cleaning device for interiors of tubes etc. has turning main part with rotating brushes adjusted relative to it by centrifugal force
10/05/2000DE19910306A1 Vorrichtung zur Befestigung eines rotatorisch anzutreibenden Werkzeugs Device for fastening a rotationally driven tool
10/03/2000US6126533 Molded abrasive brush
10/03/2000US6126532 A polishing pad containing sintered polyurethane polishing pad substrate, a bottom surface including skin layer, a backing sheet, and an adhesive used for the grinding, lapping, shaping and polishing of semiconductor wafers
09/2000
09/27/2000EP1037729A1 Backup pad for abrasive articles, and method of use
09/27/2000EP1037728A1 Surface treatment article having a quick release fastener
09/27/2000CN1268080A Cutting edge rounding method and apparatus
09/26/2000US6123609 Polishing machine with improved polishing pad structure
09/20/2000EP1036523A1 Brush for the surface treatment of materials
09/20/2000EP1035949A1 Foam buffing pad of individual string-like members and method of manufacture thereof
09/20/2000EP1035945A1 Manufacturing a memory disk or semiconductor device using an abrasive polishing system, and polishing pad
09/20/2000EP0652917B1 Abrasive grain, method of making same and abrasive products
09/19/2000US6120366 Chemical-mechanical polishing pad
09/19/2000US6120353 Polishing method for semiconductor wafer and polishing pad used therein
09/14/2000WO2000053372A1 Device for fastening a tool which is driven in a rotatory manner
09/13/2000CN1266393A Rotary bristle tool with preferentially oriented bristles
09/12/2000US6117000 Polishing pad for a semiconductor substrate
09/06/2000CN1265618A Improved polishing pads and methods relating thereto
09/05/2000US6114247 Polishing cloth for use in a CMP process and a surface treatment thereof
08/2000
08/29/2000US6110294 Apparatus and method for cleaning semiconductor wafer
08/29/2000US6110027 Grinding body and a fastening device
08/29/2000US6108856 Molded pad driver
08/24/2000WO2000048790A1 Method for making an abrasive article and abrasive articles thereof
08/24/2000WO2000048788A1 Polishing pad and process for forming same
08/22/2000US6106754 The use of sintered thermoplastic particles to enhance polishing performance.
08/22/2000US6106661 Polishing pad having a wear level indicator and system using the same
08/22/2000US6106371 Effective pad conditioning
08/22/2000US6106368 Polishing method for preferentially etching a ferrule and ferrule assembly
08/22/2000US6105197 Centering system for buffing pad
08/15/2000US6102786 Polishing apparatus including turntable with polishing surface of different heights
08/10/2000WO2000032353A3 A polishing machine and method
08/09/2000EP1025958A2 A rotatable grinding or polishing tool, an apparatus with such a tool and a method for grinding or polishing
08/09/2000EP1024925A1 A polishing apparatus for forming aspheric surfaces
08/09/2000EP1024924A2 Apparatus and method for cleaning and finishing
08/08/2000US6099394 Polishing system having a multi-phase polishing substrate and methods relating thereto
08/03/2000DE19963106A1 Method and appliance for rotary machining head involves center core, ring of plates, strip inserted through guide slots, holder, and forward thrust, rotor and tapping arrangements
08/01/2000US6095910 Surface treatment article having a quick release fastener
08/01/2000US6095902 For polishing silicon semiconductor substrates
07/2000
07/27/2000WO2000044035A1 Semiconductor fabrication method and system
07/27/2000WO2000043159A1 Improved polishing pads and methods relating thereto
07/27/2000DE19902804A1 Lifetime self-indicate polishing pad for chemical mechanical polisher comprises a pad with body having multicolored indicate layers with a top surface
07/25/2000US6093085 Apparatuses and methods for polishing semiconductor wafers
07/25/2000US6092253 Flexible-leaf substrate edge cleaning apparatus
07/20/2000DE19901749A1 Chemical-mechanical wafer polishing pad has angle and depth of curved grooves, which are calculated by boundary layer effect of streamlined groove function, used to design optimum structure for polishing pad
07/19/2000EP1019949A1 Apparatus and method for cleaning semiconductor wafer
07/19/2000EP1019221A1 Abrasive disk
07/18/2000US6090475 Polishing pads useful in determining an end to the useful wear life thereof through different color layers
07/18/2000US6089966 Surface polishing pad
07/18/2000US6089965 Polishing pad
07/13/2000WO2000010761A3 Automated barrel panel transfer and processing system
07/12/2000EP1018404A2 Abrasive brush
07/12/2000CN2386919Y Polisher
07/06/2000WO2000038884A1 Fan-folded abrasive disk
07/06/2000WO2000038883A1 Rotating disk for machining material surfaces
07/05/2000EP1015176A1 Improved polishing pads and methods relating thereto
07/04/2000US6081959 Buffer centering system
06/2000
06/28/2000EP1011926A1 Rotary bristle tool with preferentially oriented bristles
06/28/2000EP1011925A1 A method for manufacturing a sweeper or abrasive element and such element
06/28/2000EP1011922A1 Polishing pad for a semiconductor substrate
06/28/2000EP1011919A1 Improved polishing pads and methods relating thereto
06/28/2000CN2384742Y Improved grinding medium structure
06/28/2000CN1258241A Polishing pad for semi-conductor substrate
06/27/2000US6080671 Process of chemical-mechanical polishing and manufacturing an integrated circuit
06/27/2000US6080047 Procedure for the surface treatment of petrous materials
06/22/2000WO2000035634A1 Improved grinding disc
06/21/2000EP1009588A1 Polishing pad and method for making polishing pad with elongated microcolumns
06/21/2000EP0843523B1 Rotary brush with segmented fiber segments
1 ... 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 ... 48