Patents
Sitemap › B24 - Grinding; Polishing › B24D - Tools for grinding, buffing or sharpening › B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710)
01/2006
01/25/2006CN2753513Y Poloshing wheel
01/24/2006US6989117 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same
01/24/2006US6988942 Conductive polishing article for electrochemical mechanical polishing
01/24/2006CA2441383C Polishing pad and system
01/19/2006US20060014477 Polishing pad with flow modifying groove network
01/19/2006US20060014476 Method of fabricating a window in a polishing pad
01/18/2006EP1615749A1 Polishing pad with a window
01/18/2006CN2751972Y Polishing product for processing base material
01/18/2006CN2751971Y Automatic supplying liquid polisher
01/18/2006CN2751970Y Two-station polishing machine
01/18/2006CN1237582C Abrasive cloth, polishing device and method for manufacturing semiconductor device
01/17/2006US6986703 Apparatus for processing substantially planar workpieces
01/12/2006WO2005110675A3 Polishing pad
01/12/2006DE102005022221A1 Lamellae grinding tool, has lamella extending radially outwards from core, where part of lamellae exhibits fibrous web material that has grinding core and reinforcing strengthening material is connected with fibrous web material
01/10/2006US6984163 Polishing pad with high optical transmission window
01/04/2006EP1397230B1 Abrasive sheet having slots for dust extraction, surface finishing machine and support for said abrasive sheet
12/2005
12/29/2005WO2005123336A2 Electrochemical-mechanical polishing system
12/29/2005US20050287940 Inlaid polishing pad and method of producing the same
12/29/2005US20050284770 A multilayer pad having a ring-shaped upper polish layer and replaceable conductive layer; attaching to exterior power source; controlling the rate of copper material removal from printed circuits, determining each polishing time in each zone; tools for making semiconductors
12/28/2005CN1712187A Polishing seat with concave structure for improving mixed tail trace
12/28/2005CN1233508C Grooved polishing pads and methods of use
12/27/2005US6979701 Thermoplastic polyurethane foam, process for production thereof and polishing pads made of the foam
12/27/2005US6979248 Conductive polishing article for electrochemical mechanical polishing
12/22/2005WO2005120775A1 Planarization of a heteroepitaxial layer
12/22/2005US20050282479 Polishing pad having grooves configured to promote mixing wakes during polishing
12/22/2005US20050282478 Flap wheel and method
12/22/2005US20050282474 Powered paint preparation tool, kit and method
12/22/2005US20050282470 Continuous contour polishing of a multi-material surface
12/22/2005DE202005016671U1 Grinding segment for rotatable grinding wheel, has adhesive tape fastened on to supporting device by gluing, where replacement of grinding component fastened with backing material by gluing is ensured by adhesive tape
12/21/2005EP1607182A1 Flap wheel
12/21/2005EP1607179A1 Apparatus and method for removing a CMP polishing pad from a platen
12/21/2005CN1709721A Powered paint preparation tool, kit and method
12/21/2005CN1709645A Flap wheel and method
12/20/2005US6976910 Polishing pad
12/15/2005WO2005118223A1 Polishing pad with oscillating path groove network
12/15/2005US20050277368 Apparatus and method for removing a cmp polishing pad from a platen
12/15/2005US20050276967 Surface textured microporous polishing pads
12/15/2005US20050274627 Electrochemical-mechanical polishing system
12/14/2005EP1429647B1 Method for sanitation of covered floors and cleaning pad
12/13/2005US6974372 Polishing pad having grooves configured to promote mixing wakes during polishing
12/13/2005US6974364 Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates
12/08/2005DE202005012918U1 Portable powered polishing tool, with a pneumatic or electric motor to rotate an input shaft, has drive take-off wheels to rotate an inner and an outer polishing disk in opposite directions
12/07/2005EP1601497A1 Cmp pad with composite transparent window
12/07/2005EP1360034B1 Fixed abrasive article for use in modifying a semiconductor wafer
12/07/2005CN1230282C Flexible abrasive product and method of making and using the same
12/01/2005WO2005113198A2 Abrasive cleaning device
12/01/2005US20050266776 Polishing pad with oscillating path groove network
12/01/2005US20050266771 Polishing pad with window
12/01/2005US20050263406 Polishing pad for electrochemical mechanical polishing
12/01/2005US20050262773 Flexible abrasive product and method of making and using the same
12/01/2005DE202004010125U1 Lamellae grinding tool, has lamella extending radially outwards from core, where part of lamellae exhibits fibrous web material that has grinding core and reinforcing strengthening material is connected with fibrous web material
11/2005
11/30/2005EP1600260A1 Chemical mechanical polishing pad
11/30/2005CN1702840A Polishing pad for electrochemical mechanical polishing
11/30/2005CN1701919A Chemical mechanical polishing pad
11/29/2005US6969304 Method of polishing semiconductor wafer
11/29/2005US6969300 Automated processing unit for a working station
11/24/2005WO2005110675A2 Polishing pad
11/24/2005US20050260942 Chemical mechanical polishing pad
11/24/2005US20050260941 Bristle brush for concrete sanding
11/24/2005US20050260940 Abrasive cleaning device
11/24/2005US20050260937 Method of probe tip shaping and cleaning
11/24/2005US20050260929 Chemical mechanical polishing pad and chemical mechanical polishing method
11/23/2005EP1597024A1 Method of manufacturing a fixed abrasive material
11/23/2005CN1701096A Curable emulsions and abrasive articles therefrom
11/22/2005US6966823 Buffing head and method for reconditioning an optical disc
11/17/2005US20050255802 Grinding member
11/17/2005US20050255794 Polishing pad
11/16/2005EP1595647A2 Grinding tool
11/16/2005EP1594656A1 Polishing article for electro-chemical mechanical polishing
11/15/2005US6964604 Fiber embedded polishing pad
11/15/2005US6964603 Fiber flocked dental polishing tips
11/15/2005US6964601 Method for securing a polishing pad to a platen for use in chemical-mechanical polishing of wafers
11/10/2005US20050250431 Single-layer polishing pad and method of producing the same
11/10/2005US20050250424 Polishing pad, method of manufacturing glass substrate for use in data recording medium using the pad, and glass substrate for use in data recording medium obtained by using the method
11/09/2005EP1593459A1 Grinding method
11/08/2005US6962524 Conductive polishing article for electrochemical mechanical polishing
11/03/2005WO2005104199A1 Polishing pad for semiconductor wafer, polishing multilayered body for semiconductor wafer having same, and method for polishing semiconductor wafer
11/03/2005WO2005102606A1 Nonwoven abrasive articles and methods
11/03/2005WO2005102604A1 Abrasive cloth and method for preparing nano-fiber structure
11/03/2005WO2004076127A8 Method of manufacturing a fixed abrasive material
11/03/2005US20050241094 Applicator pad and related methods
11/03/2005CA2564138A1 Abrasive cloth and method for producing nanofiber structure
11/02/2005EP1591197A1 Grinding method and grinding device
11/02/2005EP1590127A1 Pad constructions for chemical mechanical planarization applications
11/02/2005CN2737501Y Polising product for processing base material
11/01/2005US6960120 CMP pad with composite transparent window
10/2005
10/27/2005WO2005099963A1 Low surface energy cmp pad
10/27/2005WO2005099962A1 Polishing pad comprising hydrophobic region and endpoint detection port
10/27/2005DE102004022968B3 Driving plate in particular for laminated driving wheels has receiving hole for drive shaft, flexible support around a ring shoulder whose surface has a ring groove for the support
10/25/2005US6958002 Polishing pad with flow modifying groove network
10/20/2005US20050233683 Machining apparatus and machining method of work end face, roller and roller bearing
10/19/2005EP1586418A1 Rotary abrasive material
10/19/2005EP1299210B1 Polishing pad grooving method and apparatus
10/19/2005EP1284842B1 Polishing pads for chemical mechanical planarization
10/19/2005CN1684799A Polishing pad for planarization
10/19/2005CN1684798A Polishing pad with window for planarization
10/19/2005CN1224082C Polishing element, CMP polishing device and production method for semiconductor device
10/18/2005US6955587 Grooved polishing pad and method
10/13/2005WO2005095058A1 Grinding head for a grinding device
10/13/2005WO2005042810A3 Membrane -mediated electropolishing
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