| Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710) |
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| 04/21/2005 | WO2005035194A2 Stacked pad and method of use |
| 04/21/2005 | WO2005035187A2 Polishing and buffing pad |
| 04/21/2005 | US20050085174 Rotary abrasive material |
| 04/21/2005 | US20050085169 Polishing pad for use in chemical - mechanical palanarization of semiconductor wafers and method of making same |
| 04/21/2005 | US20050081317 Method for temporary attachment of a bonnet onto a high-speed foam buff pad |
| 04/20/2005 | EP1524078A2 Working system using brush tool |
| 04/20/2005 | EP1347862B1 Flexible abrasive product and method of making and using the same |
| 04/20/2005 | EP1318891B1 Polishing pad comprising particulate polymer and crosslinked polymer binder |
| 04/20/2005 | EP1294536B1 Base-pad for a polishing pad |
| 04/20/2005 | EP1292428B1 A multi-zone grinding and/or polishing sheet |
| 04/20/2005 | EP1189730B1 Abrasive processing apparatus and method employing encoded abrasive product |
| 04/20/2005 | CN1607082A Working system using brush tool |
| 04/19/2005 | CA2310285C Foam buffing pad of individual string-like members and method of manufacture thereof |
| 04/14/2005 | WO2005032765A1 Polishing pad with recessed window |
| 04/14/2005 | US20050079806 Polishing pad |
| 04/14/2005 | US20050079805 Fiber embedded polishing pad |
| 04/13/2005 | EP1522385A2 Polishing Pad |
| 04/13/2005 | CN1606133A Resilient polishing pad for chemical mechanical polishing |
| 04/12/2005 | US6878039 Polishing pad window for a chemical-mechanical polishing tool |
| 04/06/2005 | CN1195606C Wing sand wheel |
| 04/05/2005 | US6876454 Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations |
| 04/05/2005 | US6875099 Polishing tool and a composition for producing said tool |
| 04/05/2005 | US6875096 Chemical mechanical polishing pad having holes and or grooves |
| 04/05/2005 | US6875090 Apparatus for finishing optical surfaces, including a pad compensation device |
| 04/05/2005 | US6875078 Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations |
| 03/31/2005 | WO2005028157A1 A polishing pad for chemical mechanical polishing |
| 03/31/2005 | US20050070216 Resilient polishing pad for chemical mechanical polishing |
| 03/31/2005 | US20050070214 Uniform fluid distribution and exhaust system for a chemical-mechanical planarization device |
| 03/31/2005 | DE19629286B4 Polierkissen und Poliervorrichtung The polishing pad and polishing apparatus |
| 03/30/2005 | EP1518646A2 Resilient polishing pad for chemical mechanical polishing |
| 03/24/2005 | US20050064802 Polishing pad with window |
| 03/24/2005 | US20050064056 A surface treating web with a fastener attached, a detector for positioning of the fastener on the surface treating web, and using a laser to cut the surface treating web around the fastener to provide a surface treating article including the fastener; coated abrasive disks |
| 03/24/2005 | US20050060943 Polishing pad with recessed window |
| 03/24/2005 | US20050060829 Polishing and buffing pad |
| 03/24/2005 | DE4029600B4 Spanabhebendes Endbearbeitungswerkzeug und Verfahren zum Herstellen desselben The same chip-removing finishing tool and method for producing |
| 03/23/2005 | EP1284841B1 Grooved polishing pads for chemical mechanical planarization |
| 03/23/2005 | CN1193863C Conditioner for polishing pad and method for manufacturing the same |
| 03/22/2005 | US6869350 Forming the polishing surface without cutting or skiving parallel to the polishing surface |
| 03/22/2005 | US6869349 Reciprocating rotary sander |
| 03/22/2005 | US6869343 Turning tool for grooving polishing pad, apparatus and method of producing polishing pad using the tool, and polishing pad produced by using the tool |
| 03/17/2005 | WO2005023491A1 Tool for machining surfaces, edge areas and contours |
| 03/17/2005 | WO2005023487A1 Polishing pad, and method and apparatus for producing same |
| 03/17/2005 | US20050059329 Abrasive materials |
| 03/17/2005 | US20050055885 Polishing pad for chemical mechanical polishing |
| 03/17/2005 | DE102004014254B4 Polierscheibe Buff |
| 03/16/2005 | EP1513652A1 Polishing pad with optical sensor |
| 03/16/2005 | CN1192906C Printing plate support for lithographic printing and producing method thereof |
| 03/15/2005 | US6866572 Plated grinding tool |
| 03/15/2005 | US6866560 Method for thinning specimen |
| 03/10/2005 | US20050054275 Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates |
| 03/09/2005 | EP1512168A2 Subpad having robust, sealed edges |
| 03/09/2005 | CN1592955A Method of machining semiconductor wafer-use polishing pad and semiconductor wafer-use polishing pad |
| 03/08/2005 | US6863774 Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same |
| 03/08/2005 | US6863596 Abrasive article |
| 03/02/2005 | EP1509365A1 Cylindric drum with sanding elements |
| 03/02/2005 | EP1509364A1 Microporous polishing pad |
| 03/02/2005 | EP1303381B1 Grooved polishing pads and methods of use |
| 03/01/2005 | US6860802 Polishing pads for chemical mechanical planarization |
| 03/01/2005 | US6860793 Window portion with an adjusted rate of wear |
| 03/01/2005 | US6860791 Polishing pad for in-situ endpoint detection |
| 02/24/2005 | WO2005016597A1 Polishing pad having edge surface treatment |
| 02/22/2005 | US6857943 Burr removal apparatus |
| 02/22/2005 | US6857941 Multi-phase polishing pad |
| 02/17/2005 | WO2004065063A3 Rotary sanding tool |
| 02/17/2005 | US20050037696 Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates |
| 02/15/2005 | US6855034 Polishing pad for semiconductor wafer and laminated body for polishing of semiconductor wafer equipped with the same as well as method for polishing of semiconductor wafer |
| 02/15/2005 | CA2354595C Grinding disc with backup pad |
| 02/10/2005 | US20050032464 Polishing pad having edge surface treatment |
| 02/09/2005 | EP1504846A1 Polishing plate with a polishing cloth that does adhere only horizontally to the holder |
| 02/09/2005 | CN1579014A Method and pad for polishing wafer |
| 02/09/2005 | CN1577029A Large-size substrate |
| 02/08/2005 | US6851152 Substrate cleaning apparatus |
| 02/03/2005 | WO2005009681A1 Process for mirror-finishing edge of recording media disk raw plate |
| 02/03/2005 | US20050026557 Grinding wheel in combination with a grinding ring |
| 02/03/2005 | US20050026556 Grinding wheel having a fixing unit |
| 02/02/2005 | EP1502704A1 Grinding wheel having a fixing unit |
| 02/02/2005 | CN1572422A 抛光垫 Polishing pad |
| 02/02/2005 | CN1187165C Brush roll and its brush device |
| 02/01/2005 | US6848976 Chemical mechanical polishing with multiple polishing pads |
| 02/01/2005 | US6848974 Polishing pad for semiconductor wafer and polishing process using thereof |
| 01/27/2005 | US20050020190 Flexible abrasive product and method of making and using the same |
| 01/27/2005 | US20050020189 Flexible abrasive product and method of making and using the same |
| 01/27/2005 | US20050020082 Polishing pads for chemical mechanical planarization |
| 01/26/2005 | EP1499477A1 Cylindric drum with replaceable grinding elements |
| 01/26/2005 | CN1569399A 抛光垫和化学机械抛光方法 Chemical mechanical polishing pad and polishing method |
| 01/26/2005 | CN1569398A Polishing pad and method of polishing a semiconductor wafer |
| 01/25/2005 | US6846226 Burr removal apparatus |
| 01/25/2005 | US6846225 Selective chemical-mechanical polishing properties of a cross-linked polymer and specific applications therefor |
| 01/20/2005 | WO2005005100A1 Viscoelastic polisher and polishing method using the same |
| 01/20/2005 | US20050014455 Method and pad for polishing wafer |
| 01/20/2005 | US20050013972 Large-size substrate |
| 01/19/2005 | EP1498775A2 Large-size substrate for photolithographic applications |
| 01/18/2005 | US6843712 Polymer pad material selected from urethane, carbonate, amide, sulfone, vinyl chloride, acrylate, methacrylate, vinyl alcohol, ester and acrylamide; polishing layer is porous, formed without cutting to the polishing surface |
| 01/18/2005 | US6843711 Chemical mechanical polishing pad having a process-dependent groove configuration |
| 01/13/2005 | DE3920972B4 Drehbares Abreibwerkzeug Rotating Abreibwerkzeug |
| 01/12/2005 | CN2670056Y Vertical abrasive cloth wheel |
| 01/12/2005 | CN1565048A Polishing pad for CMP, method for polishing substrate using it and method for producing polishing pad for CMP |
| 01/12/2005 | CN1562570A Method for polishing wheet from sisal fiber |
| 01/11/2005 | US6840849 Mounting device for coated abrasive finishing articles |
| 01/11/2005 | US6840848 Bushings and abrasive wheel therewith |