Patents
Patents for B24D 13 - Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor (4,710)
09/2006
09/27/2006CN1836844A Abrasive cloth/paper wheel and manufacturing process thereof
09/26/2006US7112125 Polishing cloth, polishing apparatus and method of manufacturing semiconductor devices
09/21/2006WO2006097141A1 Methods and tool for maintenance of hard surfaces, and a method for manufacturing such a tool
09/20/2006EP1702714A1 Method for maintenance of hard surfaces
09/20/2006EP1701820A1 Hand machine tool with clamping device
09/20/2006CN2818073Y Connected sandcloth wheel
09/19/2006US7108597 Polishing pad having grooves configured to promote mixing wakes during polishing
09/14/2006DE102005010876A1 Circular grinding disc has rear face with ribbed air intake ducts discharging through outlets
09/13/2006EP1699595A1 Buffing ball made of foam material
09/13/2006CN2815604Y Electric-pheumatic adjustable flexible polishing tool
09/13/2006CN1830627A Water-based polishing pads and methods of manufacture
09/13/2006CN1274465C Sander for polishing cloth and polishing cloth sanding method using said sander
09/12/2006US7104868 Turning tool for grooving polishing pad, apparatus and method of producing polishing pad using the tool, and polishing pad produced by using the tool
09/08/2006WO2006093670A2 Polishing pad for use in polishing work pieces
09/06/2006EP1698432A2 Polishing disc for a finishing tool for finishing optical surfaces especially eyeglass lenses
09/06/2006EP1499477B1 Cylindric drum with replaceable grinding elements
09/06/2006CN1273267C Catalytic reactive pad for metal CMP
09/05/2006USRE39262 Polishing apparatus including turntable with polishing surface of different heights
09/05/2006US7101501 Single-layer polishing pad and method producing the same
09/05/2006US7101275 Resilient polishing pad for chemical mechanical polishing
08/2006
08/31/2006US20060194527 Multiple cutting edged sanding wheel
08/31/2006US20060194523 Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
08/31/2006US20060194522 Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
08/30/2006EP1694466A1 A polishing pad for chemical mechanical polishing
08/30/2006EP1294968B1 Method of making nonwoven fabric for buffing applications
08/29/2006US7097550 Chemical mechanical polishing pad
08/29/2006US7097549 Polishing pad
08/29/2006US7097543 Burr removal apparatus
08/24/2006WO2006089293A1 Customized polishing pads for cmp and methods of fabrication and use thereof
08/24/2006DE10322496B4 Vorrichtung zur automatischen Reinigung und Konditionierung von bei Polierprozessen eingesetzten Poliertüchern Apparatus for automatically cleaning and conditioning of polishing cloths used in polishing processes
08/24/2006CA2598272A1 Customized polishing pads for cmp and methods of fabrication and use thereof
08/23/2006EP1691659A1 Disposable scrubbing product
08/23/2006EP1138438B1 Polishing pad and polishing device
08/22/2006CA2218245C Abrasive brush and filaments
08/17/2006US20060183818 Coating for a smoothing and/or polishing element, particularly a grinding wheel, grinding wheel provided with said coating, process for obtaining said coating and process for realising said grinding wheel
08/17/2006US20060183412 Polishing pad
08/17/2006US20060183392 Polishing and buffing pad
08/16/2006EP1690633A1 Sanding device
08/16/2006EP1689560A1 Composite abrasive bodies
08/16/2006CN1269615C Lapping pad containing embedded liquid trace component and its production method
08/15/2006US7090570 Chemical mechanical polishing apparatus and methods using a polishing surface with non-uniform rigidity
08/10/2006US20060178096 Subpad support with a releasable subpad securing element and polishing apparatus including the subpad support
08/10/2006DE102004014179B4 Polierkissen mit Überwachungsfunktionalität Polishing pad with monitoring functionality
08/09/2006EP1688061A1 Rotary tool
08/09/2006CN1816420A Process for mirror-finishing edge of recording media disk raw plate
08/09/2006CN1268470C Method and apparatus for plating and polishing a semiconductor substrate
08/08/2006US7086932 Polishing pad
08/03/2006US20060172669 Hand machine tool with clamping device
08/02/2006EP1685281A2 Membrane -mediated electropolishing
08/02/2006EP1684945A1 Sanding element
08/01/2006US7083501 Methods and apparatus for the chemical mechanical planarization of electronic devices
07/2006
07/27/2006WO2006011914A3 Elevator ceiling ventilation cavity
07/27/2006US20060166610 Optical disk polishing device
07/27/2006DE102006000766A1 CMP Kissen, das eine radial abwechselnde Rillensegmentkonfiguration aufweist CMP pad having a radially alternating grooves segment configuration
07/26/2006EP1682300A1 A cutting tool
07/26/2006CN1809445A Polishing pad for electrochemical-mechanical polishing
07/25/2006US7081047 Bristle brush for concrete sanding
07/25/2006US7081043 Molded abrasive brush and methods of using for manufacture of printed circuit boards
07/20/2006WO2006076060A1 A thermoplastic chemical mechanical polishing pad and method of manufacture
07/20/2006WO2006039436A3 Pad design for electrochemical mechanical polishing
07/20/2006US20060160480 Flapped grinding disk
07/20/2006US20060160470 Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates
07/20/2006DE10296621B4 Polierkissen und System Polishing pad and system
07/19/2006EP1681151A2 A core drill and processing machines using same
07/19/2006CN1805826A Multi-layer polishing pad material for cmp
07/18/2006US7077733 Subpad support with a releasable subpad securing element and polishing apparatus including the subpad support
07/18/2006US7077721 Pad assembly for electrochemical mechanical processing
07/13/2006WO2006072324A1 Clamping device comprising a centring device on a grinding spindle rotor, and rotary part comprising one such centring device
07/13/2006US20060154568 Multilayer polishing pad and method of making
07/13/2006DE102005059547A1 CMP Polierkissen, das Rillen angeordnet aufweist, um eine Verwendung eines Poliermediums zu verbessern CMP polishing pad having arranged the grooves in order to improve a use of a polishing medium
07/13/2006DE102005059545A1 CMP Kissen, das eine überlappende abgestufte Rillenanordnung aufweist CMP pad having an overlapping stepped groove arrangement
07/13/2006DE102004063858A1 Polieren von Wafer mit in schaumplastomergebundenem Korn Polishing of wafers in schaumplastomergebundenem grain
07/12/2006EP1536920B1 Polishing pad
07/12/2006EP1509365B1 Cylindric drum with sanding elements
07/12/2006CN1802237A Polishing pad having edge surface treatment
07/11/2006US7074115 Polishing pad
07/06/2006US20060148381 Pad assembly for electrochemical mechanical processing
07/04/2006US7070480 Method and apparatus for polishing substrates
06/2006
06/29/2006US20060137170 Turning tool for grooving polishing pad, apparatus and method of producing polishing pad using the tool, and polishing pad produced by using the tool
06/29/2006DE202006006691U1 Stripping-, smoothing- grinding or polishing brush, comprises bristles in holder with abrasive sheets which are optionally longer or shorter than bristles
06/28/2006CN1795545A Production method for semiconductor wafer
06/28/2006CN1795080A A brush module for a grinding brush
06/28/2006CN1795075A Viscoelastic polisher and polishing method using the same
06/28/2006CN1261983C Chemical mechanical polishing pad having holes and or grooves
06/28/2006CN1261281C Cylinder-like abrasive wheel
06/27/2006US7066808 Aircraft cabin multi-differential pressure control system
06/27/2006US7066801 Method of manufacturing a fixed abrasive material
06/27/2006US7066800 Conductive polishing article for electrochemical mechanical polishing
06/21/2006CN1791490A Substrate polishing apparatus
06/15/2006US20060128280 Grinding method and grinding device
06/15/2006US20060128271 Polishing pad for semiconductor wafer and laminated body for polishing of semiconductor wafer equipped with the same as well as method for polishing of semiconductor wafer
06/15/2006US20060125133 Polishing pad containing embedded liquid microelements and method of manufacturing the same
06/14/2006EP1667816A1 Polishing pad with recessed window
06/14/2006CN2787379Y Soft polishing wheel
06/14/2006CN1787894A Gas nozzle for a welding torch, welding torch having a produced patina layer; cleaning device for a welding torch having bristles made of a soft elastic material and abrasive grains embedded in these
06/13/2006US7059951 Polishing pad, method of manufacturing glass substrate for use in data recording medium using the pad, and glass substrate for use in data recording medium obtained by using the method
06/13/2006US7059948 Articles for polishing semiconductor substrates
06/13/2006US7059936 Low surface energy CMP pad
06/13/2006US7059007 Industrial brush
06/07/2006EP1666230A1 Non-woven body and its forming method
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