Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
08/2010
08/03/2010CA2477960C Method and device for compressing a substance by impact and plasma cathode thereto
07/2010
07/29/2010WO2010085109A2 Antenna for inductively coupled plasma generation, inductively coupled plasma generator, and method of driving the same
07/29/2010WO2010084779A1 Plasma processing apparatus
07/29/2010WO2010084778A1 Plasma processing apparatus
07/29/2010WO2010084777A1 Plasma processing apparatus
07/29/2010WO2010084655A1 Plasma processing apparatus
07/29/2010WO2010054112A3 Plasma resistant coatings for plasma chamber components
07/29/2010WO2010048084A3 Electrode and power coupling scheme for uniform process in a large-area pecvd chamber
07/29/2010US20100189923 Method of forming hardmask by plasma cvd
07/29/2010US20100188000 Closed electron drift thruster
07/29/2010US20100187999 Radiofrequency plasma generation device
07/29/2010US20100187091 Continuous Methods for Treating Liquids and Manufacturing Certain Constituents (e.g., Nanoparticles) in Liquids, Apparatuses and Nanoparticles and Nanoparticle /Liquid Solution(s) Therefrom
07/29/2010US20100186670 Plasma formation region control apparatus and plasma processing apparatus
07/29/2010DE102009006484A1 Vorrichtung zum Modifizieren der Oberflächen von Bahn-, Platten- und Bogenware mit einer Einrichtung zur Erzeugung eines Plasmas Means for modifying the surfaces of rail, plate and sheet form having a device for generating a plasma
07/29/2010DE102009006016A1 Verfahren und Vorrichtung zur Detektion von ionisierbaren Gasen, insbesondere organischen Molekülen, vorzugsweise Kohlenwasserstoffen Method and device for the detection of ionizable gases, in particular organic molecules, preferably hydrocarbons
07/29/2010DE102009004968A1 Beam generator for generating bundled plasma beam for treating and cleaning work piece surfaces, has hollow cylindrical casing immediately surrounding pin electrode, and voltage source applying voltage between pin- and annular electrodes
07/29/2010DE10141844B4 Hochfrequenz-Anpassungseinheit RF matching unit
07/28/2010EP2210456A2 Method and generator circuit for production of plasmas by means of radio-frequency excitation
07/28/2010EP2210455A2 Electrode for a plasma burner
07/28/2010EP1269529B1 Method for improving uniformity and reducing etch rate variation of etching polysilicon
07/28/2010CN1997773B Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
07/28/2010CN1890019B Method of reducing NOx in diesel engine exhaust
07/28/2010CN1754409B Plasma processing system
07/28/2010CN101790276A Plasma generating device and method thereof
07/28/2010CN101427353B Silicon etching method
07/28/2010CN101335192B Substrate processing apparatus and shower head
07/28/2010CN101236891B Plasma processing device
07/28/2010CN101170052B Apparatus for controlling plasma etching process
07/27/2010US7763328 Method of depositing a thermal barrier by plasma torch
07/27/2010US7763231 carbon plasma generation; stabilization; deposits; electrical resistance heating; electron beam vaporization of hydrocarbon feedstock
07/27/2010US7762209 Plasma processing apparatus
07/22/2010WO2010082577A1 Plasma processing equipment
07/22/2010WO2010082561A1 Apparatus and method for producing plasma
07/22/2010WO2010082327A1 Plasma processing equipment and plasma generation equipment
07/22/2010WO2010081436A1 Anode of arc plasma generator and arc plasma generator
07/22/2010WO2010062579A3 Process kit having reduced erosion sensitivity
07/22/2010WO2010048076A3 Plasma source for chamber cleaning and process
07/22/2010US20100183857 Optical Article Coated with an Antireflection Coating Comprising a Sublayer Partially Formed under Ion Assistance and Manufacturing Process
07/22/2010US20100183827 Plasma processing apparatus and plasma processing method
07/22/2010US20100181915 apparatus for magnetic and electrostatic confinement of plasma
07/22/2010DE202009012491U1 Düse für einen flüssigkeitsgekühlten Plasmabrenner sowie Plasmabrennerkopf mit derselben Nozzle for a liquid-cooled plasma torch and plasma torch head with the same
07/22/2010DE112008001868T5 Schweißbare, bruchfeste Co-basierende Legierung, Auftragsverfahren und Komponenten Weldable, break-resistant Co-based alloy, application methods and components
07/22/2010DE102009010498A1 Multi-nozzle, tubular plasma deposition burner for producing preforms as semi-finished products for optical fibers, has means for feeding a dopant using a precursor gas and perpendicular orientation of the burner gas longitudinal axis
07/22/2010DE102007043955B4 Vorrichtung zur Verminderung der Beaufschlagung eines Flächenabschnitts durch positiv geladene Ionen und Ionenbeschleunigeranordnung Apparatus for reducing the impingement of a surface portion by positively charged ions and ion accelerating structure
07/21/2010EP2209354A2 Generator for generating a bundled plasma jet
07/21/2010EP2208404A1 Transient plasma ball generation system at long distance
07/21/2010EP2208221A1 Apparatus for surface-treating wafer using high-frequency inductively-coupled plasma
07/21/2010CN1909760B Vacuum reaction chamber and processing method
07/21/2010CN101785370A Device for the treatment of surfaces with a plasma generated by an electrode over a solid dielectric via a dielectrically impeded gas discharge
07/21/2010CN101784155A Plasma bipolar exciting electrode
07/21/2010CN101784154A Arc plasma generator and anode thereof
07/21/2010CN101312122B Workpiece processing apparatus
07/20/2010US7758929 Keep high in-plane uniformity of plasma processing by varying impedance on an electrode side of the plasma generated in the process vessel to frequency of a radio-frequency power source;etching semiconductor wafers; efficiency
07/20/2010US7758731 High voltage, alternating current; pulsed direct current; fluid flow of dielectric over electrode
07/15/2010WO2010080423A2 Combined wafer area pressure control and plasma confinement assembly
07/15/2010WO2010080421A2 Controlling ion energy distribution in plasma processing systems
07/15/2010WO2010080420A2 Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
07/15/2010WO2010079351A2 Plasma microreactor apparatus, sterilisation unit and analyser
07/15/2010WO2010059357A3 Extended chamber liner for improved mean time between cleanings of process chambers
07/15/2010WO2010048120A3 Method and apparatus for automated application of hardfacing material to drill bits
07/15/2010WO2010045538A3 Methods and apparatus for rapidly responsive heat control in plasma processing devices
07/15/2010WO2010042860A3 Rf return path for large plasma processing chamber
07/15/2010WO2009062205A4 Nozzle head with increased shoulder thickness
07/15/2010US20100178437 Apparatus for Generating Gas Having Extremely Low Oxygen Concentration, Processing System and Thin Film Depositing Method Therewith, and Inert Gas Generated as Such
07/15/2010US20100178435 Methods and systems for manufacturing polycrystalline silicon and silicon-germanium solar cells
07/15/2010US20100178234 Multilayer substrate and method for producing the same, diamond film and method for producing the same
07/15/2010US20100176313 Extreme ultraviolet light source
07/15/2010US20100175987 A surface dielectric barrier discharge plasma unit and a method of generating a surface plasma
07/15/2010US20100175488 Sample Chamber and Method for the Production Thereof
07/14/2010EP2206418A1 Method for operating a plasma burner and plasma burner
07/14/2010EP2206417A1 Method and device for treatment or coating of surfaces
07/14/2010CN201528464U Novel atmospheric pressure jet flow cold plasma generator
07/14/2010CN1906822B Electric discharge device and air cleaner
07/14/2010CN101778526A Crossed transferred-arc plasma torch
07/14/2010CN101778525A Pneumatic rotary air plasma jet source
07/13/2010US7755300 Method and apparatus for preventing instabilities in radio-frequency plasma processing
07/13/2010US7754996 Method and apparatus for alignment of components of a plasma arc torch
07/13/2010US7754294 Plasma enhanced chemical vapor deposition; better control over surface standing wave effects and film thickness uniformity for silicon-containing films such as silicon nitride and silicon oxide
07/13/2010US7754275 providing a liquid containing a functional material in a region surrounded by a bank includes forming a groove extending along the periphery of the region, providing the liquid in the region, and drying the liquid to form the film; uniformity
07/13/2010CA2442356C A combined type cathode and a plasma ignition device using the same
07/08/2010WO2010078131A2 Method and apparatus for automated application of hardfacing material to rolling cutters of hybrid-type earth boring drill bits, hybrid drill bits comprising such hardfaced steel-toothed cutting elements, and methods of use thereof
07/08/2010WO2010077138A1 Apparatus and method for treating an object
07/08/2010WO2010076909A1 Power supply for dual-mode plasma torch
07/08/2010US20100173098 Method for producing electrode for non-aqueous electrolyte secondary battery
07/08/2010US20100173097 Marine antifoulant coating
07/08/2010US20100171425 Electrode for a plasma generator
07/08/2010US20100171050 Method for regenerating a surface of an optical element in an xuv radiation source, and xuv radiation source
07/08/2010DE102009025964A1 Lange lineare Mikrowellenplasmaquelle mit höhenregulierbarem rechteckigem Wellenleiter als Plasmareaktor Long linear microwave plasma source with höhenregulierbarem rectangular waveguide as a plasma reactor
07/08/2010CA2748507A1 Method and apparatus for automated application of hardfacing material to rolling cutters of hybrid-type earth boring drill bits, hybrid drill bits comprising such hardfaced steel-toothed cutting elements, and methods of use thereof
07/07/2010EP2205049A1 Apparatus and method for treating an object
07/07/2010CN201522986U 放电设备 Discharge Equipment
07/07/2010CN101772992A Abnormal discharge suppressing device for vacuum apparatus
07/07/2010CN101772253A Plasma generating device
07/07/2010CN101772252A Plasma excitation power supply
07/07/2010CN101770943A inductive plasma doping
07/07/2010CN101770922A Capacitance coupling type radiofrequency plasma source
07/06/2010US7749574 high speed atomic layer deposition of silica, by exposing substrates to silicon precursors, oxidizers and catalysts, at low temperatures
07/06/2010US7749353 High aspect ratio etch using modulation of RF powers of various frequencies
07/01/2010WO2010074464A2 High-voltage circuit insertion-type discharge element
07/01/2010WO2010073578A1 Plasma generating apparatus and plasma processing apparatus
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