| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 01/27/2011 | US20110018443 Plasma generating apparatus |
| 01/26/2011 | EP2276915A2 Non-thermal plasma particulate reduction systems and methods of use thereof |
| 01/26/2011 | EP1130948B1 Inner-electrode plasma processing apparatus and method of plasma processing |
| 01/26/2011 | CN201726585U Microwave surface wave plasma torch |
| 01/26/2011 | CN201726584U Plasma arc gun |
| 01/26/2011 | CN201726583U Plasma discharge electrode and odor gas treatment device provided with the same |
| 01/26/2011 | CN201726582U Needle-shaped low-temperature plasma generator |
| 01/26/2011 | CN201724320U Air disinfection purification central air conditioner |
| 01/26/2011 | CN1832655B Coaxial low-temp plasma material processor |
| 01/26/2011 | CN101960928A Rotational antenna and semiconductor device including the same |
| 01/26/2011 | CN101960927A Nuclear energy converter |
| 01/26/2011 | CN101960566A Method and apparatus for etching silicon-containing films |
| 01/26/2011 | CN101959361A Plasma processing apparatus |
| 01/26/2011 | CN101956154A Ultralow-voltage plasma spraying equipment |
| 01/26/2011 | CN101954324A Plasma spray gun used for low-pressure plasma spraying |
| 01/26/2011 | CN101296554B Plasma processing device and electric pole plate thereof |
| 01/26/2011 | CN101227790B Plasma jet apparatus |
| 01/26/2011 | CN101227789B Capacitor block discharge circuit |
| 01/26/2011 | CN101064238B Plasma reactor apparatus with independent capacitive and toroidal plasma sources |
| 01/26/2011 | CN101043784B Hybrid plasma reactor |
| 01/26/2011 | CN101018444B Magnetic and electrostatic confinement of plasma in a field reversed configuration |
| 01/25/2011 | US7875867 Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams |
| 01/25/2011 | US7875323 liquid crystal display made by forming a conductive layer on a base substrate, then a buffer layer comprising a polymer-like carbon thin film, an alignment layer on the buffer layer; and having a non-contact type vertical alignment layer capable of preventing a deterioration of light transmittance |
| 01/20/2011 | WO2011008703A2 Plasma processing chamber with enhanced gas delivery |
| 01/20/2011 | WO2011008596A2 Plasma reactor with uniform process rate distribution by improved rf ground return path |
| 01/20/2011 | WO2011008595A2 Plasma reactor with rf generator and automatic impedance match with minimum reflected power-seeking control |
| 01/20/2011 | WO2011007830A1 Film-forming apparatus |
| 01/20/2011 | WO2011007663A1 Irradiation device |
| 01/20/2011 | WO2010091365A3 Plasma source with integral blade and method for removing materials from substrates |
| 01/20/2011 | US20110014398 Film deposition apparatus and film deposition method |
| 01/20/2011 | US20110011729 Method and apparatus for inductive amplification of ion beam energy |
| 01/20/2011 | DE102009027785A1 Plasma keyhole welding of a workpiece using a process gas, comprises temporally changing the gas volume flow rate and/or gas composition of the process gas during a welding process as a function of a basic condition of the welding process |
| 01/20/2011 | DE102009027784A1 Welding plasma keyhole of workpiece, involves generating plasma beam by using welding electrode, where welding electrode is impinged with gas composition |
| 01/19/2011 | EP2276328A1 Microwave plasma processing device |
| 01/19/2011 | EP2274961A1 Plasma enhanced chemical vapor deposition of barrier coatings |
| 01/19/2011 | EP1390558B1 Penning discharge plasma source |
| 01/19/2011 | CN201718111U Plasma processing equipment |
| 01/19/2011 | CN201715634U Cleaning room provided with athermal plasma air-sterilization purifier |
| 01/19/2011 | CN101953236A Top board of microwave plasma processing device, plasma processing device and plasma processing method |
| 01/19/2011 | CN101953235A Dielectric barrier discharge pump apparatus and method |
| 01/19/2011 | CN101952931A Filament electrical discharge ion source |
| 01/19/2011 | CN101556037B Circular heat-conserving energy-saving multi-purpose utilization environment protecting device |
| 01/19/2011 | CN101431009B Shower plate and substrate processing apparatus |
| 01/19/2011 | CN101036420B Microwave plasma processing apparatus |
| 01/18/2011 | US7872207 Cascade source and a method for controlling the cascade source |
| 01/18/2011 | US7871679 not encumbered with noble gas inclusions and is a deposition product from a noble-gas-free getter metal alloy plasma; high take-up capacity for residual gases and permits a high number of pumping cycles before the volume is filled with reactive residual gases; alloy of titanium, zirconium and vanadium |
| 01/18/2011 | US7871678 Method of increasing the reactivity of a precursor in a cyclic deposition process |
| 01/18/2011 | US7871677 photo-excitation with ultraviolet radiation from low pressure mercury lamp; cost efficiency |
| 01/18/2011 | US7871676 Activation energy from impinging high energy ion flux; kinetic energy rather than thermal energy drives the reaction of gases; plasma power modulation or wafer bias; low temperature; higher density, superior purity and adhesion |
| 01/18/2011 | CA2541163C Method for making an infused composite |
| 01/13/2011 | WO2011006156A2 Method and apparatus to laser ablation-laser induced breakdown spectroscopy |
| 01/13/2011 | WO2011006109A2 High efficiency low energy microwave ion/electron source |
| 01/13/2011 | WO2011006018A2 Apparatus and method for plasma processing |
| 01/13/2011 | WO2011005135A1 Internal combustion engine |
| 01/13/2011 | WO2011004816A1 Microwave plasma-treatment apparatus and dielectric plate |
| 01/13/2011 | WO2011004621A1 Vacuum processing apparatus |
| 01/13/2011 | WO2010127344A3 In-situ plasma/laser hybrid scheme |
| 01/13/2011 | WO2010120569A3 Conjugated icp and ecr plasma sources for wide ribbon ion beam generation and control |
| 01/13/2011 | WO2010117971A3 Grounded confinement ring having large surface area |
| 01/13/2011 | WO2010117970A3 Multifrequency capacitively coupled plasma etch chamber |
| 01/13/2011 | WO2010117969A3 Modulated multi-frequency processing method |
| 01/13/2011 | WO2010117964A3 Method for low-k dielectric etch with reduced damage |
| 01/13/2011 | WO2010115110A3 Plasma processing apparatus |
| 01/13/2011 | WO2010111055A3 Anchoring inserts, electrode assemblies, and plasma processing chambers |
| 01/13/2011 | WO2010107843A3 Reactor lid assembly for vapor deposition |
| 01/13/2011 | WO2010107842A3 Showerhead for vapor deposition |
| 01/13/2011 | WO2010107835A3 Vapor deposition reactor system and methods thereof |
| 01/13/2011 | WO2010102161A3 Inductively coupled plasma reactor having rf phase control and methods of use thereof |
| 01/13/2011 | US20110008404 Modification Of Biomaterials With Microgel Films |
| 01/13/2011 | US20110008217 Method and apparatus for on-site nitrate production for a water processing system |
| 01/13/2011 | US20110008025 Method and apparatus for generating compound plasma, and electro-thermal cooking apparatus using the compound plasma |
| 01/13/2011 | US20110007289 Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method |
| 01/13/2011 | US20110006463 Gas delivery system with constant overpressure relative to ambient to system with varying vacuum suction |
| 01/13/2011 | US20110006040 Methods for Plasma Processing |
| 01/13/2011 | US20110006039 Plasma generating electrode assembly |
| 01/13/2011 | US20110005461 Methods and systems for plasma deposition and treatment |
| 01/13/2011 | US20110005454 Plasma Reactor, and Method for the Production of Monocrystalline Diamond Layers |
| 01/13/2011 | DE112008003378T5 Schichtbildende Behandlungsschablone, Plasma-CVD-Vorrichtung, Metallplatte und Osmiumschicht-Bildungsverfahren Film-forming treatment jig, plasma CVD apparatus, metal plate and osmium-forming method |
| 01/12/2011 | EP2273855A2 Hybrid plasma generating device and method, and electrically heated cooking devices using hybrid plasma |
| 01/12/2011 | EP2272586A1 Plasma reactor |
| 01/12/2011 | CN201709015U Plasma generator of double-channel carrier wind |
| 01/12/2011 | CN201709014U Plasma generator adopting parallel and cooling mode |
| 01/12/2011 | CN1675730B Electrostatic fluid accelerator and method for control of a fluid flow |
| 01/12/2011 | CN101945529A Electrode device and apparatus for generating plasma |
| 01/12/2011 | CN101945528A Insert chip and plasma torch |
| 01/12/2011 | CN101945527A Slab-type full-sealing low-temperature plasma excitation source based on DBD (Dielectric Barrier Discharge) technology |
| 01/12/2011 | CN101943441A Plasma air disinfecting and purifying air conditioner |
| 01/12/2011 | CN101650230B Multifunctional probe for plasma diagnosis |
| 01/12/2011 | CN101567635B Improved radio-frequency power supply for plasma discharge at atmospheric pressure |
| 01/12/2011 | CN101515545B Plasma processing apparatus and plasma processing method |
| 01/12/2011 | CN101441983B Plasma confinement apparatus and semiconductor processing equipment applying the same |
| 01/12/2011 | CN101370959B Sputtering method and sputtering system |
| 01/12/2011 | CN101296553B Plasma processing apparatus |
| 01/12/2011 | CN101056495B RF plasma supply device |
| 01/11/2011 | US7869556 Method and device for the operation of a plasma device |
| 01/11/2011 | US7867579 Method for forming carbon protective film and method for producing magnetic recording medium, magnetic recording medium and magnetic recording/reproducing apparatus |
| 01/11/2011 | US7867578 Method for depositing an amorphous carbon film with improved density and step coverage |
| 01/11/2011 | US7867457 Plasma reactor for the production of hydrogen-rich gas |
| 01/11/2011 | US7866188 PCVD apparatus with a choke defined within a microwave applicator |
| 01/06/2011 | WO2011002804A2 Methods and apparatus to predict etch rate uniformity for qualification of a plasma chamber |