Patents
Sitemap › H05 - Electric techniques not otherwise provided for › H05H - Plasma technique; Production of accelerated electrically- charged particles or of neutrons; Production or acceleration of neutral molecular or atomic beams › H05H 1 - Generating plasma; Handling plasma
Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
11/2010
11/11/2010US20100285319 Method for fabrication of transparent gas barrier film using plasma surface treatment and transparent gas barrier film fabricated thereby
11/11/2010US20100285237 Nanolayer deposition using bias power treatment
11/11/2010US20100284793 Method of electrical discharge surface repair of a variable vane trunnion
11/11/2010US20100284088 Dichroic filters formed using silicon carbide based layers
11/11/2010US20100283132 ECR-plasma source and methods for treatment of semiconductor structures
11/11/2010US20100282693 Filtration membranes
11/11/2010US20100282597 Method for controlling plasma density distribution in plasma chamber
11/10/2010EP1796442B1 Plasma processing system
11/10/2010CN101884253A Method and apparatus for alignment of components of a plasma arc torch
11/10/2010CN101882647A Movable holder for silicon-based film solar cells
11/10/2010CN101882646A Deposition clamp of film solar cell
11/10/2010CN101882567A Plasma processing apparatus and high frequency short-circuit apparatus
11/10/2010CN101463763B Magnetically stabilized plasma flow ignition generator
11/10/2010CN101083868B Preionization igniting device based atmosphere pressure discharging cold plasma generators
11/10/2010CN101048029B Microwave plasma processing apparatus, method for manufacturing microwave plasma processing apparatus and plasma processing method
11/10/2010CN101035405B Plasma treatment device
11/10/2010CN101022693B Cleaning method for substrate processing chamber and substrate processing chamber
11/10/2010CN101002508B Microwave plasma nozzle with enhanced plume stability and heating efficiency
11/09/2010US7831008 Microwave-powered pellet accelerator
11/09/2010US7829159 Method of forming organosilicon oxide film and multilayer resist structure
11/09/2010US7829158 forming a tantalum containing multilayer film, using a radio frequency power to perform plasma enhanced atomic layer deposition; semiconductor integrated circuit; forming tantalum, tantalum nitride, tantalum carbonitride
11/09/2010US7829157 Methods of making multilayered, hydrogen-containing thermite structures
11/09/2010US7829156 Method and apparatus for producing biaxially oriented thin films
11/09/2010US7828927 Plasma processing device
11/04/2010WO2010127344A2 In-situ plasma/laser hybrid scheme
11/04/2010WO2010127229A2 Electrically isolated gas cups for plasma transfer arc welding torches, and related methods
11/04/2010WO2010126806A1 Detecting and preventing instabilities in plasma processes
11/04/2010WO2010103497A3 Plasma torch with a lateral injector
11/04/2010WO2010087648A3 Inductively coupled plasma-generating source electrode and substrate-processing apparatus comprising same
11/04/2010WO2010085109A3 Antenna for inductively coupled plasma generation, inductively coupled plasma generator, and method of driving the same
11/04/2010WO2010051233A3 Adjustable gas distribution apparatus
11/04/2010US20100279029 Method for coating nanometer particles
11/04/2010US20100279028 Methods and arrangements for managing plasma confinement
11/04/2010US20100279027 System And Method For Applying Abrasion-Resistant Coatings
11/04/2010US20100277843 High-frequency power supply system
11/04/2010US20100276391 Inductively coupled plasma reactor having rf phase control and methods of use thereof
11/04/2010US20100276072 CNT-Infused Fiber and Method Therefor
11/04/2010DE102010016301A1 Plasma generator for e.g. treatment of syringe needle, has electrode correction ring whose hole adjusts position of rod-shaped electrode when chamber is lowered so that rod-shaped electrode is placed in central axis of cylindrical electrode
11/04/2010DE102010005799A1 Hochfrequenz Leistungsregelungssystem RF power control system
11/04/2010DE102009019422A1 Generating plasma by magnetron, comprises supplying electrical energy in pulse form to magnetron, changing strength of electric field maintaining magnetron discharge, and changing strength of magnetic field penetrating through magnetron
11/04/2010CA2760612A1 In-situ plasma/laser hybrid scheme
11/03/2010EP2245912A2 Multiple phase rf power for electrode of plasma chamber
11/03/2010EP2245911A1 Dielectric barrier discharge pump apparatus and method
11/03/2010EP2244810A2 Method for destroying no<sb>2</sb>by microwave plasma at atmospheric pressure
11/03/2010CN101878677A Nozzle with exposed vent passage
11/03/2010CN101877312A Plasma processing apparatus
11/03/2010CN101552182B Marginal ring mechanism used in semiconductor manufacture technology
11/03/2010CN101405845B Surface processing apparatus
11/03/2010CN101014222B Generator of cleaning the surface of a material coated with an organic substance
11/02/2010US7824743 depositing metallic titanium nitride layer on surface of dielectric material and apertures during a first PVD process, depositing titanium nitride retarding layer on the metallic titanium nitride layer during a second PVD process, depositing aluminum seed layer on exposed portions of titanium nitride
11/02/2010US7824742 coated by means of plasma coating, plasma produced by microwaves or high frequency; covering layer provides belt with increased chemical or scratch resistance or reduces abrasion thereof; suitable monomers for plasma coating are tetrafluorethylene,1,2-difluorethylene, acetylene, hexamethyldisiloxane
11/02/2010US7824600 polyethylene, polypropylene or polybutylene films is first treated on a surface by means of an atmospheric pressure plasma before being stretched transversally or simultaneously across the width, then film is additionally subjected to a 2nd treatment by a corona or flame after stretching; surface tension
11/02/2010US7823537 Plasma generator
10/2010
10/28/2010WO2010123590A1 Combustion flame-plasma hybrid reactor systems, chemical reactant sources and related methods
10/28/2010WO2010122459A2 Method and apparatus for high aspect ratio dielectric etch
10/28/2010WO2010090846A3 Particle reduction treatment for gas delivery system
10/28/2010US20100273326 Method for purifying unsaturated fluorocarbon compound, method for forming fluorocarbon film, and method for producing semiconductor device
10/28/2010US20100273277 Rapid thermal processing systems and methods for treating microelectronic substrates
10/28/2010US20100273261 Methods for producing synthetic surfaces that mimic collagen coated surfaces for cell cultue
10/28/2010US20100272617 Falling film plasma reactor
10/28/2010US20100270141 Detecting and Preventing Instabilities in Plasma Processes
10/28/2010CA2797221A1 Combustion flame-plasma hybrid reactor systems, chemical reactant sources and related methods
10/27/2010CN101874292A Apparatus and method for controlling edge performance in an inductively coupled plasma chamber
10/27/2010CN101871099A Plasma uniformity control by gas diffuser curvature
10/27/2010CN101179005B Exhaust air system, semi-conductor manufacturing installation for manufacturing thin film by the same and method thereof
10/26/2010US7820007 Silicon electrode plate for plasma etching with superior durability
10/21/2010WO2010120569A2 Conjugated icp and ecr plasma sources for wide ribbon ion beam generation and control
10/21/2010WO2010119947A1 Plasma processing apparatus
10/21/2010WO2010074792A3 Fusion neutron source for breeding applications
10/21/2010WO2010073223A4 High-performance plasma torch
10/21/2010US20100266785 Intermediate transfer member, method for manufacturing intermediate transfer member and image-forming apparatus
10/21/2010US20100264115 Placing bed structure, treating apparatus using the structure, and method for using the apparatus
10/21/2010US20100263796 Plasma Processing Apparatus
10/21/2010US20100263795 Device for processing welding wire
10/21/2010DE102009017647A1 Ionenquelle zum Erzeugen eines Partikelstrahls, Elektrode für eine Ionenquelle sowie Verfahren zum Einleiten eines zu ionisierenden Gases in eine Ionenquelle Ion source for generating a particle beam, an electrode for an ion source as well as methods for introducing a gas to be ionized in an ion source
10/21/2010DE102009016932A1 Kühlrohre, Elektrodenaufnahmen und Elektrode für einen Lichtbogenplasmabrenner sowie Anordnungen aus denselben und Lichtbogenplasmabrenner mit denselben Cooling tubes, electrodes and electrode recordings for a plasma arc torch as well as arrangements for the same and arc plasma torch with the same
10/20/2010EP2242092A1 Plasma processing method and plasma processing system
10/20/2010EP2241651A1 Plasma processing apparatus
10/20/2010EP2241166A1 Method for operating a plasma burner and plasma burner
10/20/2010EP2241165A1 Method for manufacturing a multi_layer stack structure with improved wvtr barrier property
10/20/2010EP2241164A1 Nuclear energy converter
10/20/2010CN201611977U 一种交叉型转移弧等离子喷枪 One kind of crossover transferred arc plasma torch
10/20/2010CN101477944B Plasma processing apparatus, electrode for plasma processing apparatus, and electrode manufacturing method
10/19/2010CA2449529C Method and apparatus for underwater decomposition of organic content of electrically conductive aqueous waste solutions
10/14/2010WO2010117971A2 Grounded confinement ring having large surface area
10/14/2010WO2010117970A2 Multifrequency capacitively coupled plasma etch chamber
10/14/2010WO2010117969A2 Modulated multi-frequency processing method
10/14/2010WO2010117964A2 Method for low-k dielectric etch with reduced damage
10/14/2010WO2010116112A2 Production method with thermal projection of a target
10/14/2010WO2010116110A1 Layer produced by spraying a target including at least one molybdenum powder compound
10/14/2010WO2010115397A2 Cooling pipes, electrode holders and electrode for an arc plasma torch and assemblies made thereof and arc plasma torch comprising the same
10/14/2010WO2010088267A3 Method and apparatus for etching
10/14/2010WO2010071785A3 Plasma confinement structures in plasma processing systems
10/14/2010WO2009110226A9 High frequency antenna unit and plasma processing apparatus
10/14/2010US20100261008 Gas barrier film and method of producing the same
10/14/2010US20100260947 Method and apparatus of plasma treatment
10/14/2010US20100258247 Atmospheric pressure plasma generator
10/14/2010DE102009016701A1 Prozesskammer mit modulierter Plasmaversorgung Process chamber with modulated plasma supply
10/14/2010DE102009016360A1 High-power surface processing device for use in printing machine, has transport device formed by rotating metal strap i.e. stainless steel strap, and designed, such that it is inert against thermal effect of plasma processing of sheet
10/14/2010DE102009002278A1 Device for producing e.g. non-thermal plasma, for treatment of e.g. chronic wounds, has plasma and ultrasonic effective areas arranged next to each other, and three electrodes for generating plasma and ultrasonic pulses
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