Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
06/2004
06/01/2004US6744089 Self-aligned lateral-transistor DRAM cell structure
06/01/2004US6744087 Non-volatile memory using ferroelectric gate field-effect transistors
06/01/2004US6744084 Two-transistor pixel with buried reset channel and method of formation
06/01/2004US6744083 Submicron MOSFET having asymmetric channel profile
06/01/2004US6744082 Static pass transistor logic with transistors with multiple vertical gates
06/01/2004US6744080 Method of manufacturing a bipolar transistor of double-polysilicon, heterojunction-base type and corresponding transistor
06/01/2004US6744079 Optimized blocking impurity placement for SiGe HBTs
06/01/2004US6744078 Heterojunction structure with a charge compensation layer formed between two group III-V semiconductor layers
06/01/2004US6744072 Substrates having increased thermal conductivity for semiconductor structures
06/01/2004US6744071 Nitride semiconductor element with a supporting substrate
06/01/2004US6744070 Thin film transistor and liquid crystal display device
06/01/2004US6744069 Semiconductor device and its manufacturing method
06/01/2004US6744065 Single electron devices
06/01/2004US6743738 Dopant precursors and processes
06/01/2004US6743720 Method of manufacturing a portion of a memory by selectively etching to remove metal nitride or metal oxynitride extrusions
06/01/2004US6743709 Embedded metal nanocrystals
06/01/2004US6743704 Method of manufacturing a semiconductor device
06/01/2004US6743703 Power diode having improved on resistance and breakdown voltage
06/01/2004US6743700 Semiconductor film, semiconductor device and method of their production
06/01/2004US6743691 Semiconductor device and method for fabricating the same
06/01/2004US6743689 Method of fabrication SOI devices with accurately defined monocrystalline source/drain extensions
06/01/2004US6743688 High performance MOSFET with modulated channel gate thickness
06/01/2004US6743687 Abrupt source/drain extensions for CMOS transistors
06/01/2004US6743686 Sacrificial polysilicon sidewall process and rapid thermal spike annealing for advance CMOS fabrication
06/01/2004US6743685 Semiconductor device and method for lowering miller capacitance for high-speed microprocessors
06/01/2004US6743684 Method to produce localized halo for MOS transistor
06/01/2004US6743683 Polysilicon opening polish
06/01/2004US6743682 Method of manufacturing a semiconductor device
06/01/2004US6743681 Methods of Fabricating Gate and Storage Dielectric Stacks having Silicon-Rich-Nitride
06/01/2004US6743680 Process for manufacturing transistors having silicon/germanium channel regions
06/01/2004US6743676 Method of forming a floating gate in a flash memory device
06/01/2004US6743675 Floating gate memory fabrication methods comprising a field dielectric etch with a horizontal etch component
06/01/2004US6743670 High dielectric constant materials forming components of DRAM such as deep-trench capacitors and gate dielectric (insulators) for support circuits
06/01/2004US6743668 Process for forming a metal oxy-nitride dielectric layer by varying the flow rate of nitrogen into the chamber
06/01/2004US6743667 Method of manufacturing an active matrix type device
06/01/2004US6743666 Selective thickening of the source-drain and gate areas of field effect transistors
06/01/2004US6743662 Silicon-on-insulator wafer for RF integrated circuit
06/01/2004US6743649 Semiconductor device and manufacturing method thereof
06/01/2004US6743406 Gradually advancing silicon anode into hydrofluoric acid and hydrogen peroxide etchant solution; creating electrical current density to; immersing anode in dilute hydrofluoric acid solution; separating nanoparticles
06/01/2004US6742762 Display device having a pixel portion
05/2004
05/27/2004WO2004044992A1 Double gate semiconductor device having separate gates
05/27/2004WO2004044990A1 One transistor dram cell structure and method for forming
05/27/2004WO2004044989A1 Grounded gate and isolation techniques for reducing dark current in cmos image sensors
05/27/2004WO2004044988A1 High gain bipolar transistor
05/27/2004WO2004044984A2 Chip-scale schottky device
05/27/2004WO2004044983A1 Semiconductor device and method therefor
05/27/2004WO2004044980A2 Hermetically encapsulated component and waferscale method for the production thereof
05/27/2004WO2004044973A1 Planarizing gate material to improve gate critical dimension in semiconductor devices
05/27/2004WO2004034468A9 Flash memory array with increased coupling between floating and control gates
05/27/2004WO2004019373A3 Nanocrystal electron device
05/27/2004WO2004006315A3 Semiconductor capacitor and mosfet fitted therewith
05/27/2004WO2004001808A3 Method and system for atomic layer removal and atomic layer exchange
05/27/2004WO2003094200A3 Low voltage high density trench-gated power device with uniformly doped channel and its edge termination technique
05/27/2004WO2003069658B1 Strained si based layer made by uhv-cvd, and devices therein
05/27/2004WO2003034500A3 Trench-gate semiconductor devices and their manufacture
05/27/2004WO2003023863A3 Trench-gate semiconductor devices and their manufacture
05/27/2004WO2003015152A3 Method of manufacturing a semiconductor non-volatile memory
05/27/2004WO2003001584A8 A non-self-aligned sige heterojunction bipolar transistor
05/27/2004US20040102915 Failure analysis vehicle
05/27/2004US20040102053 Surface modification method
05/27/2004US20040102052 Semiconductor device and its manufacturing method
05/27/2004US20040102047 Semiconductor device fabrication method
05/27/2004US20040102026 Lateral doped channel
05/27/2004US20040102021 Method for microfabricating structures using silicon-on-insulator material
05/27/2004US20040102012 Semiconductor device having silicide film and manufacturing method thereof
05/27/2004US20040102010 Reliable high voltage gate dielectric layers using a dual nitridation process
05/27/2004US20040102009 Method for removing contaminants on a substrate
05/27/2004US20040102008 Nonvolatile semiconductor memory device and manufacturing method thereof
05/27/2004US20040102007 Vertical floating gate transistor
05/27/2004US20040102005 Method of manufacturing a semiconductor device
05/27/2004US20040102002 Memory cell with tight coupling
05/27/2004US20040101999 Manufacturing method of semiconductor device
05/27/2004US20040101998 Variable quality semiconductor film substrate
05/27/2004US20040101990 Flexural plate wave systems
05/27/2004US20040101987 Method of fabrication of electronic devices using microfluidic channels
05/27/2004US20040101625 Nitrogen passivation of interface states in SiO2/SiC structures
05/27/2004US20040100826 Method for operating nor type flash memory device including sonos cells
05/27/2004US20040100822 Four-bit non-volatile memory transistor and array
05/27/2004US20040100752 Variable capacitor element and integrated circuit having variable capacitor element
05/27/2004US20040100605 Liquid crystal display device and method of fabricating the same
05/27/2004US20040100431 Active matrix substrate and display
05/27/2004US20040100340 Hybrid n+ and p+ gate-doped voltage variable capacitors to improve linear tuning range in voltage controlled oscillators
05/27/2004US20040100306 Two transistor nor device
05/27/2004US20040100202 Light emitting device, driving method for the same and electronic apparatus
05/27/2004US20040100172 Wire basket
05/27/2004US20040099966 Novel field effect transistor and method of fabrication
05/27/2004US20040099964 Use of hafnium silicon oxynitride as the cap layer of the sidewall spacer
05/27/2004US20040099940 Semiconductor device having clips for connecting to external elements
05/27/2004US20040099932 Thin GaAs die with copper back-metal structure
05/27/2004US20040099929 Diodes; multilayer chips; semiconductors; gradient dope concentration
05/27/2004US20040099926 Semiconductor device, display device, and light-emitting device, and methods of manufacturing the same
05/27/2004US20040099923 Transistor having compensation zones enabling a low on-resistance and a high reverse voltage
05/27/2004US20040099922 Semiconductor device including power MOSFET and peripheral device
05/27/2004US20040099920 Apparatus for determining temperature of an active pixel imager and correcting temperature induced variations in an imager
05/27/2004US20040099918 Electronic device substrate structure and electronic device
05/27/2004US20040099915 Silicon nitride film, and semiconductor device and method of manufacturing the same
05/27/2004US20040099914 Eeprom with source line voltage stabilization mechanism
05/27/2004US20040099910 Multilayer stacks; support substrates, etching barriers, semiconductor; reduced leakage current
05/27/2004US20040099909 Micro-electro mechanical systems (MEMS) device using silicon on insulator (SOI) wafer, and method of fabricating and grounding the same
05/27/2004US20040099905 Power semiconductor devices having laterally extending base shielding regions that inhibit base reach-through and schottky rectifying flyback diodes