Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2012
07/18/2012CN102592975A Method for reducing P/N node capacitance and electricity leakage of P type coating source process
07/18/2012CN102592974A Preparation method for high-K medium film
07/18/2012CN102592973A Transfer method of large area graphene
07/18/2012CN102592972A Cleaning method of solar battery silicon chip
07/18/2012CN102592971A Semiconductor device and method of manufacturing thereof
07/18/2012CN102592970A Substrate processing method and substrate processing apparatus
07/18/2012CN102592969A Coating method, coating device, and storage medium
07/18/2012CN102592968A Method for producing multilayer metal-silicon nitride-metal capacitor
07/18/2012CN102592967A Semiconductor device and method for fabricating same
07/18/2012CN102592966A Semiconductor device and preparation method thereof
07/18/2012CN102592965A Washing method in semiconductor process
07/18/2012CN102592964A Method for transferring graphene film to substrate
07/18/2012CN102592963A Automated gas pulse etching method, device and system
07/18/2012CN102592962A Integrated manufacturing equipment and integrated manufacturing method of semiconductor assembly
07/18/2012CN102592961A Wafer feeding and arranging machine
07/18/2012CN102592934A Ion source device for ultra-shallow junction injection
07/18/2012CN102592166A Signal transmission device, electronic device, and signal transmission method
07/18/2012CN102591160A Rinse solution for lithography
07/18/2012CN102591157A Exposure method and exposure apparatus
07/18/2012CN102591139A Photoetching method of superfine structure
07/18/2012CN102591138A Double-light-resistance wall and preparation method thereof
07/18/2012CN102591136A Pellicle film and a pellicle for EUV application, and a method for manufacturing the film
07/18/2012CN102591135A Monitoring method for graphic changes caused by lens heating during continuous exposure
07/18/2012CN102591080A Thin film transistor (TFT) liquid crystal display, substrate and manufacture method of the substrate
07/18/2012CN102586890A Device for preparing black silicon
07/18/2012CN102586889A Method for smoothing nitride substrate
07/18/2012CN102586779A Liquid-separation type wet etching device for silicon wafer
07/18/2012CN102586748A P-type electric-conducting Sb mixed SnO2 film and stannic oxide homogeneous pn junction containing film and preparation methods thereof
07/18/2012CN102585765A Cmp研磨剂以及衬底的研磨方法 Cmp abrasive polishing method and substrate
07/18/2012CN102585760A Resin composition and semiconductor devices made by using the same
07/18/2012CN102585737A Radiation-curable adhesive composition and adhesive sheet
07/18/2012CN102585722A Adhesive tape for manufacturing electronic component
07/18/2012CN102585704A Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same
07/18/2012CN102585516A Composition for forming silica based insulating layer, method for manufacturing composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layer
07/18/2012CN102585445A Plastic packaging material for preparing green and environment-friendly diode and injection moulding method
07/18/2012CN102582954A Transportation pallet
07/18/2012CN102582670A Safety masking plate carrying cart
07/18/2012CN102581494A Method of cutting object to be processed
07/18/2012CN102122606B Wafer-level package micro-ball automatic collection, supply and circulation equipment
07/18/2012CN102110607B P-channel metal oxide semiconductor (PMOS) silicon substrate sinking process
07/18/2012CN102097482B Integrated double longitudinal channel SOI LDMOS (silicon on insulator laterally double diffusion metal oxide semiconductor) device unit
07/18/2012CN102095888B Heat-type wind-speed and wind-direction sensor with heat insulation structure and preparation method thereof
07/18/2012CN102064094B Large thickness oxidation layer field plate structure and manufacturing method thereof
07/18/2012CN102054858B Amorphous ternary high-K gate dielectric material and preparation method thereof
07/18/2012CN102034810B Array base plate and manufacturing method thereof
07/18/2012CN102027154B Sputtering method
07/18/2012CN102017065B Tools and methods for processing microelectronic workpices using process chamber designs that easily transition between open and closed modes of operation
07/18/2012CN101996985B Light-emitting diode (LED) encapsulation structure capable of positioning heat-conducting adhesive material and manufacturing method thereof
07/18/2012CN101996934B Method for manufacturing semiconductor device
07/18/2012CN101996873B Oxide layer and method for manufacturing grid electrode of flash memory containing same
07/18/2012CN101990699B Vertical boat for heat treatment and method for heat treatment of silicon wafer using the same
07/18/2012CN101989616B Transistor and fabrication method thereof
07/18/2012CN101989592B Packaging substrate as well as manufacturing method
07/18/2012CN101978487B Device for transmitting substrate and end effector
07/18/2012CN101978486B Methods and apparatuses for determining thickness of a conductive layer
07/18/2012CN101973011B Crystal curing press head applied to electronic tag back-off encapsulation equipment
07/18/2012CN101971292B Cathode electrode for plasma cvd and plasma cvd apparatus
07/18/2012CN101969026B Electrode preparation method based on ink jet printing and laser interference exposure
07/18/2012CN101960560B Methods of smoothing oxide spacer
07/18/2012CN101958243B Method and system for etching wafer back
07/18/2012CN101952971B Method for manufacturing a solar cell with a surface-passivating dielectric double layer, and corresponding solar cell
07/18/2012CN101946314B Method and device for conveying and rotating impact-sensitive panels in ultra clean rooms
07/18/2012CN101946308B Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
07/18/2012CN101939823B Ethane implantation with a dilution gas
07/18/2012CN101939816B Chip supply pallet and chip supply apparatus
07/18/2012CN101930929B Manufacturing method of packaging base plate provided with side surface lines
07/18/2012CN101924169B Package structure of optical chip and manufacturing method thereof
07/18/2012CN101924122B Active matrix/organic light emitting display and manufacturing method thereof
07/18/2012CN101924096B Through-silicon via structure and a process for forming the same
07/18/2012CN101924006B Shield usable in a sputtering plasma reactor
07/18/2012CN101919056B Memory cell that employs a selectively fabricated carbon nano-tube reversible resistance-switching element formed over a bottom conductor and methods of forming the same
07/18/2012CN101911263B Method of etching a high aspect ratio contact
07/18/2012CN101911256B Laser anneal method and device
07/18/2012CN101903975B Information processing device, information processing method
07/18/2012CN101903285B Method of component assembly on a substrate
07/18/2012CN101894764B Semiconductor structure and manufacture method thereof
07/18/2012CN101894761B Substrate for open window type ball grid array package structure and manufacturing method thereof
07/18/2012CN101894756B Groove formation method, metal wire formation method, photoetching method and equipment
07/18/2012CN101887866B Manufacturing method of shallow trench isolation structure
07/18/2012CN101887194B Electrode equipment and detection method
07/18/2012CN101882571B III nitride semiconductor crystal, III nitride semiconductor device, and light emitting device
07/18/2012CN101872721B Apparatus and method for confined area planarization
07/18/2012CN101868566B Process for producing single crystal SiC substrate and single crystal SiC substrate produced by the process
07/18/2012CN101866853B Substrate processing apparatus
07/18/2012CN101861637B Method for picking up semiconductor chips from a wafer table and method for mounting removed semiconductor chips on a substrate
07/18/2012CN101859726B Method for improving MOSFET STI dislocation
07/18/2012CN101855712B Plasma etching chamber
07/18/2012CN101855704B Semiconductor device, substrate with single-crystal semiconductor thin film and methods for manufacturing same
07/18/2012CN101853873B Square switching device of memory device and method for forming the same
07/18/2012CN101853778B Method and system of stacking and aligning a plurality of integrated circuits
07/18/2012CN101849276B Device and device manufacturing method
07/18/2012CN101845620B Multi-cavity chemical vapor deposition p-i-n coating device by pulse heating
07/18/2012CN101842886B Methods for fabricating sub-resolution alignment marks on semiconductor structures and semiconductor structures including same
07/18/2012CN101826445B Device and method for removing impurities in pipeline and furnace tube
07/18/2012CN101803472B Plasma processing device
07/18/2012CN101802977B System for processing subject to be processed and method for controlling the system
07/18/2012CN101800239B Display apparatus, manufacturing method of display apparatus, and electronic device
07/18/2012CN101800205B Semiconductor package and method of packaging the same
07/18/2012CN101790786B Mounting table structure, and treating apparatus
07/18/2012CN101777295B Detection line wiring method and manufacturing method of OLED (Organic Light Emitting Diode) display