Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2012
07/11/2012CN102569098A Semiconductor packaging piece and semiconductor packaging method
07/11/2012CN102569097A Semiconductor device and method of forming openings through insulating layer over encapsulant for enhanced adhesion of interconnect structure
07/11/2012CN102569096A Integrated circuit packaging system with Pad connection and method of manufacture thereof
07/11/2012CN102569095A Method for preparing LTCC (low-temperature co-fired ceramic) substrate with channels
07/11/2012CN102569094A Method for reducing gate-induced drain leakage of semiconductor device
07/11/2012CN102569093A A method and a structure for enhancing electrical insulation and dynamic performance of MIS structures
07/11/2012CN102569092A Method for producing a gate electrode structure
07/11/2012CN102569091A Preparation method of Gate-last 1TDRAM
07/11/2012CN102569090A Method for forming NMOS (N-channel Metal Oxide Semiconductor) transistor
07/11/2012CN102569089A Semiconductor device forming method
07/11/2012CN102569088A Semiconductor device structure and method for manufacturing same
07/11/2012CN102569087A Metal oxide semiconductor (MOS) transistor and manufacturing method thereof
07/11/2012CN102569086A Semiconductor device and formation method thereof
07/11/2012CN102569085A Method for manufacturing metal oxide semiconductor (MOS) tube
07/11/2012CN102569084A P-type high-concentration doped silicon and technology for preparing P-channel MOS (Metal Oxide Semiconductor) pipe of BCD (Bipolar, Complementary Metal-Oxide-Semiconductor and Double-Diffusion Metal-Oxide-Semiconductor) products
07/11/2012CN102569083A Method for forming metal-oxide semiconductor with high potassium (K) metal gate
07/11/2012CN102569082A Method for manufacturing embedded germanium-silicon strain PMOS (P-channel Metal Oxide Semiconductor) structure
07/11/2012CN102569081A Method for manufacturing strain semiconductor device structure
07/11/2012CN102569080A Method for producing N-channel metal-oxide-semiconductor (NMOS) device
07/11/2012CN102569079A Preparation method of dual-grid LDMOS (laterally diffused metal oxide semiconductor) with self-aligned metal silicification technology
07/11/2012CN102569078A Flash memory unit forming method
07/11/2012CN102569077A Method for manufacturing source/drain region of semiconductor device
07/11/2012CN102569076A Semiconductor device and manufacturing method thereof
07/11/2012CN102569075A LDMOS (laterally diffused metal oxide semiconductor) device and manufacture method thereof
07/11/2012CN102569074A Surrounding-gate field effect transistor fabrication method
07/11/2012CN102569073A Manufacturing method of semiconductor apparatus
07/11/2012CN102569072A Method for preparing p type germanium nano-wire field-effect transistor with stable electric characteristics by depositing molybdenum oxide
07/11/2012CN102569071A Manufacturing method of gallium nitride transistor
07/11/2012CN102569070A Method for manufacturing MIS (Metal-Insulator-Semiconductor) capacitor
07/11/2012CN102569069A SiGe-heterojunction bipolar transistor (HBT) and preparation method thereof
07/11/2012CN102569068A Method for improving impurity concentration distribution of impurity injection type polysilicon emitter
07/11/2012CN102569067A Method for manufacturing planar high-voltage ultrafast soft recovery diode
07/11/2012CN102569066A Manufacturing method for gate controlled diode semiconductor device
07/11/2012CN102569065A Acid washing process of diode chip
07/11/2012CN102569064A Method of making a transparent conductive oxide layer and a photovoltaic device
07/11/2012CN102569063A Method for manufacturing semiconductor device
07/11/2012CN102569062A Reactive ion etching method of SOG (Spin-On Glass) layer and photoresist layer
07/11/2012CN102569061A Radiation hardening material with insulation buried layer and preparation method of radiation hardening material
07/11/2012CN102569060A Composition for forming a silica layer, method of manufacturing the composition, silica layer prepared using the composition, and method of manufacturing the silica layer
07/11/2012CN102569059A Improved solar cell surface felting method
07/11/2012CN102569058A Corrosion agent composition used for ohmic contact layer
07/11/2012CN102569057A Optical device wafer processing method
07/11/2012CN102569056A Optical device wafer processing method
07/11/2012CN102569055A Adjustment method of SiC (silicon carbide) single crystal flatness by wet etching
07/11/2012CN102569054A Preparation method of T-shaped grid
07/11/2012CN102569053A Method for forming high-dielectric constant metal grid
07/11/2012CN102569052A Device structure conducive to eliminating U-shaped nickel silicide and corresponding technology thereof
07/11/2012CN102569051A Method for depositing tunneling oxide layer of silicon-silicon oxide-silicon nitride-silicon oxide-silicon (SONOS) memory
07/11/2012CN102569050A Forming method of metal grid electrode
07/11/2012CN102569049A Manufacture method of metal grid electrode
07/11/2012CN102569048A Forming method of self-aligned metal silicide
07/11/2012CN102569047A Method for preparing T-shaped gate on InP (indium phosphide) substrate
07/11/2012CN102569046A Method for fabricating T-shaped gate on InP substrate
07/11/2012CN102569045A 60V high-voltage laser diode P-channel metal oxide semiconductor (LDPMOS) structure and manufacturing method thereof
07/11/2012CN102569044A Manufacture method of diode SF chip
07/11/2012CN102569043A Method of manufacturing light emitting diode
07/11/2012CN102569042A Process for preparing ultrathin gradient ZrGeN/CuGe composite barrier layer with high thermal stability
07/11/2012CN102569041A Monitoring method of selective extension process
07/11/2012CN102569040A Method for manufacturing semiconductor device structure
07/11/2012CN102569039A Rapid annealing method for ohmic contact of metal and silicon carbide
07/11/2012CN102569038A Method for manufacturing patterned substrate
07/11/2012CN102569037A Method for improving multi-time photoetching repeatability of metal-insulator-metal capacitance layer
07/11/2012CN102569036A Silicon wafer cleaning technology
07/11/2012CN102569035A Method for reworking wafer after interruption of back metallization process
07/11/2012CN102569034A Method for growing of InAs nanowire on naturally oxidized Si substrate
07/11/2012CN102569033A Preparation method of small-size density-controllable silicon nanodot array
07/11/2012CN102569032A Method for manufacturing inductance element by overlapping multiple layers of metalized thin films
07/11/2012CN102569031A Method for carrying out bonding epitaxial wafer and silicon wafer by indium (In)
07/11/2012CN102569030A Thin film forming method and thin film forming apparatus
07/11/2012CN102569029A Method of apply binding agent pattern to base by using writing nozzle capable of moving along predetermined route
07/11/2012CN102569028A Epitaxial structure having a sacrificial layer and method for making the same
07/11/2012CN102569027A Method for controlling size of germanium nanometer microstructure
07/11/2012CN102569026A Manufacturing method of device and planarization process
07/11/2012CN102569025A Epitaxial substrate, semiconductor light emitting element using the same and manufacturing process
07/11/2012CN102569024A Drying method and drying equipment after grinding and cleaning TSV (Temperature Safety Valve) through hole
07/11/2012CN102569023A Cleaning method for reducing metal corrosion
07/11/2012CN102569022A Cleaning method after tungsten chemical-mechanical polishing
07/11/2012CN102569021A Method for reducing galvanic electricity corrosion of metal
07/11/2012CN102569020A Method and device for removing cut oxidation films of 8-inch wafers
07/11/2012CN102569019A Dielectric film etching method and shallow trench isolation forming method
07/11/2012CN102569018A Manufacturing method of semiconductor element
07/11/2012CN102569017A Method of stripping hot melt etch resists from semiconductors
07/11/2012CN102569016A Vacuum processing apparatus
07/11/2012CN102569015A Etching liquid replenishing device, etching liquid replenishing method and wet etching equipment with etching liquid replenishing device
07/11/2012CN102569014A Method for changing menu during beam indexing
07/11/2012CN102569013A System and method for detecting wafer stress
07/11/2012CN102569012A Method for preventing wafer active area from being scratched
07/11/2012CN102569011A Wafer treatment system and wafer treatment method
07/11/2012CN102569010A Wafer cleaning device
07/11/2012CN102569009A Process data acquisition method, device and system
07/11/2012CN102569008A Hydrofluoric acid disposal system
07/11/2012CN102566527A Method for realizing transmission control platformization of semiconductor manufacturing equipment front end module
07/11/2012CN102566328A Method for improving edge development effect of wafer
07/11/2012CN102566297A Photoetching system
07/11/2012CN102566284A Test method for temperature evenness of hot plate
07/11/2012CN102566282A Hardmask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern
07/11/2012CN102566273A Positive photosensitive resin composite and method for forming pattern
07/11/2012CN102566258A Double imprint method
07/11/2012CN102566188A Display device structure, display panel structure of electrophoretic display device, and method for manufacturing display device
07/11/2012CN102566185A Liquid crystal panel, liquid crystal display device and manufacturing method thereof