Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2012
07/17/2012US8223330 Nanostructures and lithographic method for producing highly sensitive substrates for surface-enhanced spectroscopy
07/17/2012US8223289 Electro-optical device and method for manufacturing the same
07/17/2012US8223248 Image sensor module having a semiconductor chip, a holder and a coupling member
07/17/2012US8222945 Semiconductor integrated circuit device
07/17/2012US8222750 Aligned nanotube bearing composite material
07/17/2012US8222744 Semiconductor device and manufacturing method of the semiconductor device
07/17/2012US8222739 System to improve coreless package connections
07/17/2012US8222738 Semiconductor device, and manufacturing method therefor
07/17/2012US8222737 BGA semiconductor device having a dummy bump
07/17/2012US8222733 Semiconductor device package
07/17/2012US8222726 Semiconductor device package having a jumper chip and method of fabricating the same
07/17/2012US8222723 Electric module having a conductive pattern layer
07/17/2012US8222720 Semiconductor device and manufacturing method thereof
07/17/2012US8222716 Multiple leadframe package
07/17/2012US8222708 Image sensor and method of fabricating the same
07/17/2012US8222707 Semiconductor package structure and package method thereof
07/17/2012US8222706 Semiconductor device
07/17/2012US8222702 CMOS diodes with dual gate conductors, and methods for forming the same
07/17/2012US8222701 P-channel MOS transistor and semiconductor integrated circuit device
07/17/2012US8222700 Protection circuit and operating method thereof
07/17/2012US8222696 Semiconductor device having buried oxide film
07/17/2012US8222693 Trench-gate transistors and their manufacture
07/17/2012US8222687 Nonvolatile semiconductor storage device and method of manufacture thereof
07/17/2012US8222686 Semiconductor integrated circuit device and a method of manufacturing the same
07/17/2012US8222684 Method of manufacturing a semiconductor integrated circuit using a selective disposal spacer technique and semiconductor integrated circuit manufactured thereby
07/17/2012US8222680 Double and triple gate MOSFET devices and methods for making same
07/17/2012US8222678 Semiconductor structure
07/17/2012US8222673 Self-aligned embedded SiGe structure and method of manufacturing the same
07/17/2012US8222659 Semiconductor light-emitting device and method for manufacturing the same
07/17/2012US8222655 Semiconductor light-emitting device and process for producing the same
07/17/2012US8222649 Semiconductor device and method of manufacturing the same
07/17/2012US8222643 Method of manufacturing thin film transistor, thin film transistor, and display unit
07/17/2012US8222640 Display device and electronic device having the display device, and method for manufacturing thereof
07/17/2012US8222636 Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
07/17/2012US8222627 Process for manufacturing a copper compatible chalcogenide phase change memory element and corresponding phase change memory element
07/17/2012US8222618 Method and apparatus for processing a microsample
07/17/2012US8222570 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
07/17/2012US8222569 Heat-treating apparatus, heat-treating method and storage medium
07/17/2012US8222163 Method of flattening a recess in a substrate and fabricating a semiconductor structure
07/17/2012US8222162 Batch processing method for forming structure including amorphous carbon film
07/17/2012US8222161 Substrate processing apparatus and semiconductor devices manufacturing method
07/17/2012US8222160 Metal containing sacrifice material and method of damascene wiring formation
07/17/2012US8222159 Manufacturing method of semiconductor device
07/17/2012US8222158 Electronic device, method of manufacturing the same, display and sensor
07/17/2012US8222157 Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof
07/17/2012US8222156 Method and apparatus for processing a substrate using plasma
07/17/2012US8222155 Selectivity control in a plasma processing system
07/17/2012US8222154 Fin and finFET formation by angled ion implantation
07/17/2012US8222153 Textured single crystal
07/17/2012US8222152 Method for fabricating hole pattern
07/17/2012US8222151 Double patterning strategy for contact hole and trench in photolithography
07/17/2012US8222150 Method of manufacturing semiconductor device, template, and method of creating pattern inspection data
07/17/2012US8222149 Method for photoresist pattern removal
07/17/2012US8222148 Method of manufacturing a semiconductor device
07/17/2012US8222147 Semiconductor device with stop layers and fabrication method using ceria slurry
07/17/2012US8222146 Semiconductor device with a line and method of fabrication thereof
07/17/2012US8222145 Method and composition for chemical mechanical planarization of a metal-containing substrate
07/17/2012US8222144 Method for manufacturing semiconductor device, and polishing apparatus
07/17/2012US8222143 Reworking method for integrated circuit devices
07/17/2012US8222142 Semiconductor device and method for manufacturing semiconductor device
07/17/2012US8222141 Method for producing an organometallic layer
07/17/2012US8222140 Pitch division patterning techniques
07/17/2012US8222139 Chemical mechanical polishing (CMP) processing of through-silicon via (TSV) and contact plug simultaneously
07/17/2012US8222138 Method and structure of a thick metal layer using multiple deposition chambers
07/17/2012US8222136 Method of forming contacts for a semiconductor device
07/17/2012US8222135 Increasing reliability of copper-based metallization structures in a microstructure device by using aluminum nitride
07/17/2012US8222134 Self-aligned barrier layers for interconnects
07/17/2012US8222133 Manufacturing method of semiconductor device
07/17/2012US8222132 Fabricating high-K/metal gate devices in a gate last process
07/17/2012US8222131 Methods of forming an image sensor
07/17/2012US8222130 High voltage device
07/17/2012US8222129 Method for manufacturing solar cell
07/17/2012US8222128 Method for introducing impurities and apparatus for introducing impurities
07/17/2012US8222127 Methods of forming structures having nanotubes extending between opposing electrodes and structures including same
07/17/2012US8222126 Laser irradiation apparatus and method for manufacturing semiconductor device
07/17/2012US8222125 Plasma deposition of amorphous semiconductors at microwave frequencies
07/17/2012US8222124 Method for manufacturing SIMOX wafer and SIMOX wafer
07/17/2012US8222123 Method for reuse of wafers for growth of vertically-aligned wire arrays
07/17/2012US8222122 Method of forming nonvolatile memory device
07/17/2012US8222121 Fiducial scheme adapted for stacked integrated circuits
07/17/2012US8222120 Method of dicing wafer using plasma
07/17/2012US8222119 Apparatus and method of temperature control during cleaving processes of thick materials
07/17/2012US8222118 Wafer backside grinding with stress relief
07/17/2012US8222117 SOI substrate and method for manufacturing SOI substrate
07/17/2012US8222116 Method for manufacturing semiconductor device
07/17/2012US8222115 Method of forming a high capacitance diode
07/17/2012US8222114 Manufacturing approach for collector and a buried layer of bipolar transistor
07/17/2012US8222113 Method of forming MOS device
07/17/2012US8222112 Method for manufacturing NAND memory cells
07/17/2012US8222111 Simultaneous formation of a top oxide layer in a silicon-oxide-nitride-oxide-silicon (SONOS) transistor and a gate oxide in a metal oxide semiconductor (MOS)
07/17/2012US8222110 Method for fabricating semiconductor device with vertical transistor having a second active pillar formed over a first active pillar
07/17/2012US8222109 Method of fabricating semiconductor device
07/17/2012US8222108 Method of making a trench MOSFET having improved avalanche capability using three masks process
07/17/2012US8222107 Method for producing semiconductor element
07/17/2012US8222106 Nonvolatile semiconductor memory device, method of fabricating the nonvolatile semiconductor memory device and process of writing data on the nonvolatile semiconductor memory device
07/17/2012US8222104 Three dimensional integrated deep trench decoupling capacitors
07/17/2012US8222103 Semiconductor device with embedded low-K metallization
07/17/2012US8222102 Methods of forming field effect transistors, pluralities of field effect transistors, and DRAM circuitry comprising a plurality of individual memory cells
07/17/2012US8222101 Method of fabricating a MOS transistor having a gate insulation layer with a lateral portion and a vertical portion
07/17/2012US8222100 CMOS circuit with low-k spacer and stress liner
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