| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 03/03/2015 | US8967368 Apparatus for processing electronic devices |
| 03/03/2015 | US8967367 Article transport facility |
| 03/03/2015 | US8967222 Lead wire connection apparatus and connection method of semiconductor cells |
| 03/03/2015 | US8967167 Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
| 03/03/2015 | US8967082 Plasma processing apparatus and gas supply device for plasma processing apparatus |
| 03/03/2015 | US8967081 Device and process for chemical vapor phase treatment |
| 03/03/2015 | US8967080 Top plate of microwave plasma processing apparatus, plasma processing apparatus and plasma processing method |
| 03/03/2015 | US8966750 Method of manufacturing a multilayered printed wiring board |
| 03/03/2015 | US8966749 Manufacturing method for protection circuit module of secondary battery |
| 03/03/2015 | US8966730 Method of manufacturing a sensor network incorporating stretchable silicon |
| 03/03/2015 | US8966729 Method for manufacturing piezoelectric actuator |
| 02/26/2015 | WO2015027235A1 System and method for black silicon etching utilizing thin fluid layers |
| 02/26/2015 | WO2015027200A1 Broadband and wide field angle compensator |
| 02/26/2015 | WO2015027141A1 Improved silicide formation by improved sige faceting |
| 02/26/2015 | WO2015027110A1 Method and system for high speed height control of a substrate surface within a wafer inspection system |
| 02/26/2015 | WO2015027088A1 Multi-model metrology |
| 02/26/2015 | WO2015027026A1 Ultra high void volume polishing pad with closed pore structure |
| 02/26/2015 | WO2015026985A1 Method and apparatus for suppressing metal-gate cross-diffusion in semiconductor technology |
| 02/26/2015 | WO2015026942A1 Qualifying patterns for microlithography |
| 02/26/2015 | WO2015026855A1 Metrology tool with combined xrf and saxs capabilities |
| 02/26/2015 | WO2015026699A1 Engineered substrates having mechanically weak structures and associated systems and methods |
| 02/26/2015 | WO2015026614A1 Polishing pad with porous interface and solid core, and related apparatus and methods |
| 02/26/2015 | WO2015026506A1 Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process |
| 02/26/2015 | WO2015026491A1 Apparatus for impurity layered epitaxy |
| 02/26/2015 | WO2015026445A1 Variable frequency microwave (vfm) processes and applications in semiconductor thin film fabrications |
| 02/26/2015 | WO2015026390A1 Self-aligned interconnects formed using subtractive techniques |
| 02/26/2015 | WO2015026371A1 High resistance layer for iii-v channel deposited on group iv substrates for mos transistors |
| 02/26/2015 | WO2015026342A1 Method and structure to contact tight pitch conductive layers with guided vias |
| 02/26/2015 | WO2015026288A1 Connection pads for a fingerprint sensing device |
| 02/26/2015 | WO2015026265A1 Method of producing epitaxial layer of binary semiconductor material |
| 02/26/2015 | WO2015026230A1 Twin-assembly of diverging semiconductor processing systems |
| 02/26/2015 | WO2015026057A1 Plasma reactor |
| 02/26/2015 | WO2015026034A1 Semiconductor device |
| 02/26/2015 | WO2015026004A1 Power supply member and substrate treatment apparatus |
| 02/26/2015 | WO2015026003A1 Gas supply member and substrate treatment apparatus |
| 02/26/2015 | WO2015025922A1 Mask blank, mask blank with negative resist film, phase shift mask, and method for producing patterned body using same |
| 02/26/2015 | WO2015025889A1 Substrate treatment method and substrate treatment device |
| 02/26/2015 | WO2015025867A1 Semiconductor adhesive |
| 02/26/2015 | WO2015025859A1 Radiation-sensitive resin composition, method for forming resist pattern, radiation-sensitive acid generating agent, acid diffusion control agent and compound |
| 02/26/2015 | WO2015025852A1 Polishing head and polishing processing device |
| 02/26/2015 | WO2015025809A1 Oxidation device |
| 02/26/2015 | WO2015025808A1 Method for securing fiber, fiber-securing-structure body secured to fiber holding member, laser device provided with said fiber-securing-structure body, exposure device, and inspection device |
| 02/26/2015 | WO2015025784A1 Levitation transportation device |
| 02/26/2015 | WO2015025754A1 Diode device and method for producing same |
| 02/26/2015 | WO2015025753A1 Esd protection function-equipped thin-film capacitor device and method for producing same |
| 02/26/2015 | WO2015025723A1 Solid-state imaging element and electronic device |
| 02/26/2015 | WO2015025699A1 Indicator used in electronic device manufacturing apparatus and method for designing and/or managing the apparatus |
| 02/26/2015 | WO2015025674A1 Process substrate with crystal orientation mark, crystal orientation detection method, and crystal orientation mark reading device |
| 02/26/2015 | WO2015025665A1 Coating liquid to be applied over resist pattern and method for forming reverse pattern |
| 02/26/2015 | WO2015025661A1 Sheet for sealing and method for manufacturing semiconductor device |
| 02/26/2015 | WO2015025637A1 Photoelectric conversion device and method for manufacturing same |
| 02/26/2015 | WO2015025632A1 Manufacturing method for silicon carbide semiconductor device |
| 02/26/2015 | WO2015025628A1 Semiconductor device manufacturing method |
| 02/26/2015 | WO2015025625A1 Silicon carbide semiconductor device and manufacturing method for same |
| 02/26/2015 | WO2015025584A1 Gas purge device and gas purge method |
| 02/26/2015 | WO2015025469A1 Two-side polishing method for wafer |
| 02/26/2015 | WO2015025462A1 Bonded wafer manufacturing method |
| 02/26/2015 | WO2015025448A1 Silicon wafer heat treatment method |
| 02/26/2015 | WO2015025441A1 Semiconductor integrated circuit device |
| 02/26/2015 | WO2015025422A1 Semiconductor device |
| 02/26/2015 | WO2015025410A1 Substrate storing container |
| 02/26/2015 | WO2015025349A1 Field effect compound semiconductor device |
| 02/26/2015 | WO2015025314A1 Photovoltaic cell and method of fabricating the same |
| 02/26/2015 | WO2015024956A1 Drying device for use in a lithography system |
| 02/26/2015 | WO2015024786A1 Method for separating substrates and semiconductor chip |
| 02/26/2015 | WO2015024762A1 Substrate treatment device |
| 02/26/2015 | WO2015024597A1 Method for wire bonding and device produced thereby |
| 02/26/2015 | WO2015024559A1 Method for producing polycrystalline silicon layers of uniform thickness provided with 3d-structures |
| 02/26/2015 | WO2015024502A1 Manufacturing method for reverse conducting insulated gate bipolar transistor |
| 02/26/2015 | WO2015024478A1 Self-aligned gate contact structure |
| 02/26/2015 | WO2015024384A1 Method for reducing leakage current of floating buried layer semiconductor device |
| 02/26/2015 | WO2015024365A1 Method for extracting time constant of gate dielectric layer trap of semiconductor device |
| 02/26/2015 | WO2015024350A1 Display substrate, manufacturing method of same, and display device |
| 02/26/2015 | WO2015024339A1 Substrate drying device and substrate cleaning system |
| 02/26/2015 | WO2015024337A1 Array substrate, manufacturing method of same, and display device |
| 02/26/2015 | WO2015024325A1 Thin film transistor, array substrate and manufacturing method thereof, and display device |
| 02/26/2015 | WO2015024321A1 Method for preventing metal lines in organic light emitting diode display device from short-circuiting |
| 02/26/2015 | WO2015024320A1 Method for preventing metal lines in organic light emitting diode display device from short-circuiting |
| 02/26/2015 | WO2014205121A9 Front opening wafer container with weight ballast |
| 02/26/2015 | US20150056892 Polishing pad with porous interface and solid core, and related apparatus and methods |
| 02/26/2015 | US20150056823 Laser processing method and laser processing apparatus |
| 02/26/2015 | US20150056822 Compositions and methods using same for flowable oxide deposition |
| 02/26/2015 | US20150056821 Method for Forming SiOCH Film Using Organoaminosilane Annealing |
| 02/26/2015 | US20150056820 Systems and methods of solvent temperature control for wafer coating processes |
| 02/26/2015 | US20150056819 Variable frequency microwave (vfm) processes and applications in semiconductor thin film fabrications |
| 02/26/2015 | US20150056817 Semiconductor device manufacturing method |
| 02/26/2015 | US20150056816 Semiconductor device manufacturing method and computer-readable storage medium |
| 02/26/2015 | US20150056815 Gcib etching method for adjusting fin height of finfet devices |
| 02/26/2015 | US20150056814 Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process |
| 02/26/2015 | US20150056813 Self-assembled monolayer for pattern formation |
| 02/26/2015 | US20150056812 Method of Semiconductor Integrated Circuit Fabrication |
| 02/26/2015 | US20150056811 Stacked structure body and pattern formation method |
| 02/26/2015 | US20150056810 Method for semiconductor cross pitch doubled patterning process |
| 02/26/2015 | US20150056809 Double patterning method |
| 02/26/2015 | US20150056808 Method of etching silicon oxide film |
| 02/26/2015 | US20150056807 Semiconductor device and manufacturing method thereof |
| 02/26/2015 | US20150056806 Interconnect structure with enhanced reliability |
| 02/26/2015 | US20150056805 Methods of forming semiconductor device using bowing control layer |
| 02/26/2015 | US20150056804 Bottom-up plating of through-substrate vias |
| 02/26/2015 | US20150056803 Tungsten feature fill |