Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/1988
10/18/1988CA1243404A1 High speed data acquisition utilizing multiplex charge transfer device
10/18/1988CA1243389A1 Thin film photovoltaic solar cell and method of making the same
10/18/1988CA1243388A1 Impurity band conduction semiconductor devices
10/18/1988CA1243250A1 Liquid replenishing apparatus
10/12/1988EP0286428A2 Method of fabricating a junction field effect transistor
10/12/1988EP0286274A1 Reagent source for molecular beam epitaxy
10/12/1988EP0286272A2 High contrast, positive photoresist developer containing alkanolamine
10/12/1988EP0286182A1 Method of manufacturing a semiconductor device comprising a titanium disilicide layer
10/12/1988EP0286181A2 A method of manufacturing a semiconductor device having a layered structure
10/12/1988EP0286121A2 Nonvolatile semiconductor memory device
10/12/1988EP0286117A1 Bipolar Transistor
10/12/1988EP0286097A2 Method of forming silicon dioxide glass films
10/12/1988EP0286086A2 Electron beam drawing method
10/12/1988EP0286039A2 Determination of potassium ions in fluids
10/12/1988EP0286031A2 Ultrasonic wire bonding method
10/12/1988EP0286018A2 Exposure mask for materials coated with a photosensitive layer
10/12/1988EP0285930A1 Mesfet device formed on a semi-insulative substrate
10/12/1988EP0285840A2 Epitaxy installation
10/12/1988EP0285834A1 Allyltellurides and their use in the MOCVD growth of group II-VI epitaxial films
10/12/1988EP0285820A2 Method and structure for identifying non-functional chip connect pads
10/12/1988EP0285797A2 Process for obtaining resist structures
10/12/1988EP0285718A2 Method of forming protective cover of pin grid array
10/12/1988EP0285668A1 Thin film formation apparatus
10/12/1988EP0285620A1 Low resistance electrical interconnection for synchronous rectifiers
10/12/1988EP0148820B1 Electronic circuit chip connection assembly and method
10/12/1988CN87107592A Semiconductor device having semiconductor region in which band gap being continueously graded
10/12/1988CN87102147A Chemical ni-plating and chemical corrosion process for silicon element
10/11/1988US4777641 Method and apparatus for alignment
10/11/1988US4777519 Charge transfer device
10/11/1988US4777516 Monolithic integration of light emitting elements and driver electronics
10/11/1988US4777374 Pattern position detecting method and apparatus for detecting the position of an alignment direction of a wafer target pattern
10/11/1988US4777372 Right angle driving
10/11/1988US4777371 Glass ceramic with high quartz structure
10/11/1988US4777369 Electron beam lithographic method
10/11/1988US4777150 Process for the formation of a refractory metal silicide layer on a substrate for producing interconnection
10/11/1988US4777149 Platinum diffusion near pn diode junction as lifetime killer
10/11/1988US4777147 Channels in silicon-on-insulator layer
10/11/1988US4777146 Fabrication process involving semi-insulating material
10/11/1988US4777119 Method for developing poly(methacrylic anhydride) resists
10/11/1988US4777115 Photopolymerizable composition containing an ethylene terpolymer
10/11/1988US4777060 Multilayer-metal core, dielectric, and conductor
10/11/1988US4776978 Method of controlling the sintering of metal particles
10/11/1988US4776971 Gallium arsenide single crystals with low dislocation density and high purity
10/11/1988US4776925 Method of forming dielectric thin films on silicon by low energy ion beam bombardment
10/11/1988US4776922 Formation of variable-width sidewall structures
10/11/1988US4776747 High speed integrated circuit handler
10/11/1988US4776745 Substrate handling system
10/11/1988US4776744 Systems and methods for wafer handling in semiconductor process equipment
10/11/1988US4776743 Lead-frame separating apparatus
10/11/1988US4776316 Wafering device and method of using same
10/11/1988US4776087 For forming a shielded transmission line
10/11/1988CA1243134A1 Method of planarizing the surface of a semiconductor device, in which silicon nitride is used as isolating material
10/11/1988CA1243133A1 Method of manufacturing a semiconductor device, in which a double layer-consisting of poly si and a silicide-present on a layer of silicon oxide is etched in a plasma
10/11/1988CA1243132A1 Semiconductor device electrode and contact structure
10/11/1988CA1243131A1 Self-registration method of manufacturing a semiconductor device
10/11/1988CA1243130A1 Distributed field effect transistor structure
10/11/1988CA1243129A1 Method of controlling forward voltage across schottky diode
10/11/1988CA1243112A1 Charge-coupled semiconductor device with dynamic control
10/11/1988CA1242992A1 Cathode assembly with localized profiling capabilities
10/11/1988CA1242959A1 Method for growing an oxide layer on a silicon surface
10/11/1988CA1242920A1 Process for producing negative copies by means of a material based on 1,2-quinone diazides
10/06/1988WO1988007767A1 Charge-coupled device with dual layer electrodes
10/06/1988WO1988007763A1 Improved density semicustom integrated circuit chip
10/06/1988WO1988007760A1 Method of manufacture of a uniphase ccd
10/06/1988WO1988007759A1 Thin film deposition process
10/06/1988WO1988007757A1 Method of determining end point of cleaning in an apparatus for manufacturing semiconductor devices
10/06/1988WO1988007598A1 An apparatus and process for edge-defined, film-fed crystal growth
10/06/1988WO1988007487A1 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
10/06/1988WO1988007263A3 Apparatus for dry processing a semiconductor wafer
10/06/1988WO1988007096A3 Epitaxial installation
10/05/1988EP0285520A1 Method for conveying secret keys to security modules and user cards in a data-processing network
10/05/1988EP0285445A2 Electric circuit having superconducting multilayered structure and manufacturing method for same
10/05/1988EP0285440A2 Diffusion resistor circuit
10/05/1988EP0285410A1 Forming metal interconnects on uneven substrates
10/05/1988EP0285358A2 Process for producing compound semiconductor and semiconductor device using compound semiconductor obtained by same
10/05/1988EP0285264A2 A method of placing blocks on a carrier
10/05/1988EP0285245A1 Device fabrication involving planarization
10/05/1988EP0285239A2 Low deflection force sensitive pick
10/05/1988EP0285206A1 Process for making a field effect transistor type semiconductor device
10/05/1988EP0285160A2 Fluorine-containing aromatic compound, process for preparing the same and use thereof
10/05/1988EP0285129A2 Dry etching method
10/05/1988EP0285127A2 Circuit substrate comprising nitride type ceramics, method for preparing it, and metallizing composition for use in it
10/05/1988EP0285090A2 Method for removal of the residue of a sawing-aid from discs
10/05/1988EP0285074A2 Pressure-contact type semiconductor device
10/05/1988EP0285066A1 Process for the attack of the surface of a piece of indium phosphide
10/05/1988EP0285051A2 Method for bonding integrated circuit chips
10/05/1988EP0285033A2 Prohibition circuit upon power-on event
10/05/1988EP0285015A2 Diode-FET logic circuitry
10/05/1988EP0284979A2 Integrated circuit for driving inductive loads
10/05/1988EP0284936A2 TTL-compatible cell for CMOS integrated circuits
10/05/1988EP0284885A1 Silicon carbide diffusion furnace components with an impervious coating thereon
10/05/1988EP0284867A2 Dry etching apparatus using surface magnetic field confinement of plasma
10/05/1988EP0284862A1 Integrated circuit and process and apparatus for testing it
10/05/1988EP0284840A2 Method for forming uniform layers of material
10/05/1988EP0284820A2 Electrically connecting member, and electric circuit member and electric circuit device with the connecting member
10/05/1988EP0284818A1 Method and device for layer bonding
10/05/1988EP0284817A1 Method for making semiconductor components
10/05/1988EP0284795A2 Anisotropic etch process for tungsten metallurgy
10/05/1988EP0284794A1 Refractory metal - titanium nitride conductive structures and processes for forming the same
10/05/1988EP0284693A2 Low temperature, plasma method of making plasma deposited coatings