H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/1988
11/15/1988	US4785188 Primary particle beam irradiation apparatus and method of irradiation thereof
11/15/1988	US4785187 Alignment device
11/15/1988	US4785177 Kinematic arrangement for the micro-movements of objects
11/15/1988	US4785156 Soldering method using localized heat source
11/15/1988	US4784975 Increased stability and dielectrics
11/15/1988	US4784974 Bonding, soldering alloy lead frame to glass or ceramic base
11/15/1988	US4784973 Titanium oxynitride as metallurgic barrier
11/15/1988	US4784972 Method of joining beam leads with projections to device electrodes
11/15/1988	US4784971 Process for manufacturing semiconductor BICMOS device
11/15/1988	US4784970 Forming grooves in wafer, filling with dielectric, joining wafers, thinning doping, and electroconductive overcoating
11/15/1988	US4784969 Method of manufacturing a semiconductor memory device
11/15/1988	US4784967 Method for fabricating a field-effect transistor with a self-aligned gate
11/15/1988	US4784966 Masking segment of polysilicon, etching, doping
11/15/1988	US4784965 Source drain doping technique
11/15/1988	US4784964 Masking, doping, rapid heating to activate
11/15/1988	US4784963 Method for light-induced photolytic deposition simultaneously independently controlling at least two different frequency radiations during the process
11/15/1988	US4784874 Vapor deposition semiconductor films
11/15/1988	US4784872 Multilayer semiconductor, hermetic sealing
11/15/1988	US4784723 Method for producing a single-crystalline layer
11/15/1988	US4784721 Integrated thin-film diaphragm; backside etch
11/15/1988	US4784720 Reactive ion etching, passivation
11/15/1988	US4784719 Dry etching procedure
11/15/1988	US4784718 Method for manufacturing semiconductor device
11/15/1988	US4784481 Transmitted and/or incident light microscope
11/15/1988	US4784377 Apparatus for locating and supporting ceramic substrates
11/15/1988	US4784310 Method for screen printing solder paste onto a substrate with device premounted thereon
11/15/1988	CA1244969A1 Method for diffusing p-type material using boron disks
11/15/1988	CA1244968A1 Method of joining semiconductor substrates
11/15/1988	CA1244967A1 Dielectrically isolated semiconductor devices
11/15/1988	CA1244966A1 Schottky-gate field effect transistor with trapezoidal gate
11/15/1988	CA1244964A1 Microwave method of making semiconductor members
11/10/1988	DE3814432A1 Thin-film resistor and method for fabricating it
11/10/1988	DE3714521A1 Method of growing indium phosphide epitaxially by material transfer between adjacent surfaces in the fabrication of semiconductor lasers
11/09/1988	EP0290305A1 CMOS integrated circuit having a top-side substrate contact and method for making same
11/09/1988	EP0290271A2 Superconducting circuit board and process of manufacturing it
11/09/1988	EP0290268A2 Method of forming a bipolar transistor
11/09/1988	EP0290222A2 A multilayer interconnection system for multichip high performance semiconductor packaging
11/09/1988	EP0290218A2 Apparatus for retaining wafers
11/09/1988	EP0290069A1 A method of etching a semiconductor body
11/09/1988	EP0290066A1 Test method for LCD elements
11/09/1988	EP0289963A1 Apparatus for, and methods of, obtaining the movement of a substance to a substrate
11/09/1988	EP0289885A1 Aperture system for production of several partical probes with changeable cross-section
11/09/1988	EP0289794A2 RC circuit
11/09/1988	EP0289642A1 Erasable electro-optic storage disk
11/09/1988	EP0289595A1 Multilayer resist structure
11/09/1988	EP0289534A1 Process for forming mos integrated circuit devices.
11/09/1988	EP0289507A1 Method of forming single crystal silicon using spe seed and laser crystallization
11/09/1988	CN88102316A Test method for lcd elements
11/09/1988	CN87103188A Voltage-controlled semiconductor variodenser
11/08/1988	US4783767 Static RAM with divided word-line structure
11/08/1988	US4783766 Block electrically erasable EEPROM
11/08/1988	US4783763 Field-programmable device with buffer between programmable circuit
11/08/1988	US4783749 Basic cell realized in the CMOS technique and a method for the automatic generation of such a basic cell
11/08/1988	US4783722 Interboard connection terminal and method of manufacturing the same
11/08/1988	US4783695 Multichip integrated circuit packaging configuration and method
11/08/1988	US4783693 Driver element for inductive loads
11/08/1988	US4783692 CMOS gate array
11/08/1988	US4783642 Hybrid integrated circuit substrate and method of manufacturing the same
11/08/1988	US4783620 Constant voltage circuit having an operation-stop function
11/08/1988	US4783605 Logic circuit made of biomaterials such as protein films
11/08/1988	US4783597 Ion implant apparatus
11/08/1988	US4783428 Depositing epoxy layers and lead frame on heat sink and curing
11/08/1988	US4783427 Process for fabricating quantum-well devices
11/08/1988	US4783426 Method of making a Group II-VI compound semiconductor device by solution growth
11/08/1988	US4783424 Radiating electromagnetic energy to fuse polycrystalline silicon layer; etching, dopes
11/08/1988	US4783423 Fabrication of a semiconductor device containing deep emitter and another transistor with shallow doped region
11/08/1988	US4783422 Oxidation, making opening, vapor deposition and anisotropic etching
11/08/1988	US4783379 Critical temperature; alternating layers; alarms, protective devices
11/08/1988	US4783371 Photomask material
11/08/1988	US4783368 High heat conductive insulated substrate and method of manufacturing the same
11/08/1988	US4783361 Wear resistance, ultraviolet filter-hydrocarbon protective coating
11/08/1988	US4783358 Ceramic wiring substrate
11/08/1988	US4783348 Method and apparatus for depositing monomolecular layers on a substrate
11/08/1988	US4783343 Method for supplying metal organic gas and an apparatus for realizing same
11/08/1988	US4783248 Method for the production of a titanium/titanium nitride double layer
11/08/1988	US4783238 Planarized insulation isolation
11/08/1988	US4783235 Avoidance of supercooling and impurity precipitation by lowering pulling speed; liquid encapsulated czochralski
11/08/1988	US4783225 Wafer and method of working the same
11/08/1988	US4783147 Active matrix display screen without spurious transistor
11/08/1988	US4782787 Apparatus for laser-induced chemical vapor deposition
11/08/1988	US4782785 System for producing semiconductor layer structures by way of epitaxial growth
11/08/1988	US4782589 Process of connecting lead frame to a semi-conductor device and a device to effect same
11/08/1988	CA1244560A1 Method of annealing a compound semiconductor substrate
11/08/1988	CA1244559A1 Fabrication method for forming a self-aligned contact window and connection in an epitaxial layer and device structures employing the method
11/08/1988	CA1244558A1 Method of severing smaller area semiconductor devices from a large area of coated semiconductor
11/08/1988	CA1244529A1 Depletion mode fet logic system
11/08/1988	CA1244521A1 Apparatus for photomask repair
11/08/1988	CA1244294A1 Carrier film with conductive adhesive for dicing of semiconductor wafers
11/03/1988	WO1988008659A1 Method and apparatus for processing with plasma
11/03/1988	WO1988008616A1 A method of fabricating a high density masked programmable read-only memory
11/03/1988	WO1988008512A1 Non-contact high resolution displacement measurement technique
11/03/1988	WO1988008439A1 PROTECTIVE COATING OF THE TYPE SiCxNyOzHt, OBTAINED BY PLASMA TREATMENT
11/03/1988	WO1988008363A1 Wafering device and method of using same
11/03/1988	WO1988008360A1 Process for manufacturing a structured ceramic film or a ceramic object composed of such films
11/03/1988	DE3813701A1 Method for producing a lead frame for semiconductor devices
11/02/1988	EP0289421A2 Non-contact sensing and controlling of spacing between a depositing tip and each selected depositing location on a substrate
11/02/1988	EP0289402A1 Protective coating of the SiCxNyOzHt-type obtained by plasma treatment
11/02/1988	EP0289343A1 Heterojunction bipolar transistors
11/02/1988	EP0289277A2 An electron beam head
11/02/1988	EP0289274A2 Via connections in integrated circuits

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