Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2005
08/04/2005US20050167715 Substrate for electronic devices, manufacturing method therefor, and electronic device
08/04/2005US20050167714 Wiring layer structure for ferroelectric capacitor
08/04/2005US20050167713 Ferroelectric capacitor and method of production of same
08/04/2005US20050167712 Ferroelectric film, ferroelectric memory, and piezoelectric element
08/04/2005US20050167711 Photodiode with ultra-shallow junction for high quantum efficiency CMOS image sensor and method of formation
08/04/2005US20050167708 Optimized photodiode process for improved transfer gate leakage
08/04/2005US20050167707 Solid state image sensing device and manufacturing and driving methods thereof
08/04/2005US20050167706 MOS transistor and method for producing a MOS transistor structure
08/04/2005US20050167701 Method for fabrication of semiconductor device
08/04/2005US20050167700 Conductive structure for microelectronic devices and methods of fabricating such structures
08/04/2005US20050167699 Variable resistance element, method of manufacturing the element, memory containing the element, and method of driving the memory
08/04/2005US20050167698 Semiconductor device
08/04/2005US20050167697 High voltage switching devices and process for forming same
08/04/2005US20050167696 Silicon nitride insulating substrate for power semiconductor module
08/04/2005US20050167695 Semiconductor device containing dielectrically isolated pn junction for enhanced breakdown characteristics
08/04/2005US20050167694 Semiconductor device
08/04/2005US20050167692 Semiconductor substrate, method of manufacturing the semiconductor substrate, semiconductor device and pattern forming method
08/04/2005US20050167686 Nitride semiconductor thin film and method for growing the same
08/04/2005US20050167683 Sapphire/gallium nitride laminate having reduced bending deformation
08/04/2005US20050167681 Electrode layer, light emitting device including the same, and method of forming the electrode layer
08/04/2005US20050167679 Submount and semiconductor device
08/04/2005US20050167678 Lighting system
08/04/2005US20050167677 Image display unit
08/04/2005US20050167676 Process for producing a semiconductor light-emitting device
08/04/2005US20050167675 Lighting system
08/04/2005US20050167674 Semiconductor device and method of manufacturing thereof
08/04/2005US20050167673 Thin-film transistor and method of fabricating the same
08/04/2005US20050167672 Semiconductor thin film and semiconductor device
08/04/2005US20050167670 Array substrate with a low wire impedance and method of making the same
08/04/2005US20050167669 Thin film transistor array panel and method of manufacturing the same
08/04/2005US20050167668 Nonvolatile semiconductor memory and manufacturing method for the same
08/04/2005US20050167667 Semiconductor integrated circuit
08/04/2005US20050167666 Active matrix substrate, method of manufacturing the same, and display device
08/04/2005US20050167665 Active matrix substrate, method of manufacturing the same, and display device
08/04/2005US20050167664 Thyristor-based SRAM
08/04/2005US20050167663 Semiconductor thin film crystallization method
08/04/2005US20050167662 Active matrix panel with two thin film transistors to a pixel
08/04/2005US20050167661 Lithography evaluating method, semiconductor device manufacturing method and program medium
08/04/2005US20050167660 Capacitor with a dielectric including a self-organized monolayer of an organic compound
08/04/2005US20050167657 Multi-bit magnetic memory cells
08/04/2005US20050167654 Ion recoil implantation and enhanced carrier mobility in CMOS device
08/04/2005US20050167653 Semiconductor device including a superlattice with regions defining a semiconductor junction
08/04/2005US20050167652 Gate-induced strain for MOS performance improvement
08/04/2005US20050167651 Controlled alignment catalytically grown nanostructures
08/04/2005US20050167650 Transistor having multiple channels
08/04/2005US20050167649 Semiconductor device including a superlattice and adjacent semiconductor layer with doped regions defining a semiconductor junction
08/04/2005US20050167647 Thermal interface material and method for manufacturing same
08/04/2005US20050167646 Nanosubstrate with conductive zone and method for its selective preparation
08/04/2005US20050167634 comprising a solution of hydrofluoric acid and hydrogen peroxide, used to remove residues
08/04/2005US20050167618 Light source device and exposure equipment using the same
08/04/2005US20050167617 Method of generating extreme ultraviolet radiation
08/04/2005US20050167615 Charged beam writing apparatus and writing method
08/04/2005US20050167607 Multipole field-producing apparatus in charged-particle optical system and aberration corrector
08/04/2005US20050167573 Semiconductor device and manufacturing method thereof
08/04/2005US20050167554 Kinematic pin with shear member and substrate carrier for use therewith
08/04/2005US20050167473 Method for producing wedge-wedge wire connection
08/04/2005US20050167471 Bonding method, bonding apparatus and bonding program
08/04/2005US20050167470 Bonding pattern discrimination method, bonding pattern discrimination device and bonding pattern discrimination program
08/04/2005US20050167422 Ceramics heater for semiconductor production system
08/04/2005US20050167421 Heater unit
08/04/2005US20050167404 Semiconductor manufacturing device
08/04/2005US20050167400 System and method for decapsulating an encapsulated object
08/04/2005US20050167399 in semiconductor using an aluminum source in the presence of a chlorine-containing gases, that are capable of anisotropic etching of high aspect ratio features in accordance with masking patterns
08/04/2005US20050167398 Vacuum processing apparatus and control method therefor
08/04/2005US20050167397 Critical dimension control in a semiconductor fabrication process
08/04/2005US20050167394 Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme
08/04/2005US20050167318 Cassette for substrate
08/04/2005US20050167312 Composite substrate carrier
08/04/2005US20050167280 Method of forming a metal-containing layer over selected regions of a semiconductor substrate
08/04/2005US20050167279 Forming a first and second electrically conductive materials semiconductor substrate; flowing electrical current; selectively oxidizing first electrically conductive material relative to second electrically conductive material during the flowing of telectrical current to form stable oxide layer
08/04/2005US20050167278 Methods of forming capacitor constructions
08/04/2005US20050167277 forming capacitor which has a thicker platinum substance on the first electrically conductive material relative to the substance on the second electrically conductive material; selectively deposition
08/04/2005US20050167275 Method and apparatus for fluid processing a workpiece
08/04/2005US20050167272 includes providing substrates, then forming patterned layers on the substrates, and electroforming to form stamps having predetermined shapes without cutting
08/04/2005US20050167262 Passive bipolar arc control system and method
08/04/2005US20050167052 Plasma processing device and baffle plate thereof
08/04/2005US20050167050 Dry etching apparatus and dry etching method
08/04/2005US20050167049 Vacuum processing apparatus and control method therefor
08/04/2005US20050167048 Pad conditioning head for CMP process
08/04/2005US20050167036 Method for holding substrate in vacuum, method for manufacturing liquid crystal display device, and device for holding substrate
08/04/2005US20050167002 Recycling of a wafer comprising a multi-layer structure after taking-off a thin layer
08/04/2005US20050167001 Process for producing highly doped semiconductor wafers, and dislocation-free highly doped semiconductor wafers
08/04/2005US20050166849 Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder
08/04/2005US20050166848 Wafer holder and semiconductor manufacturing apparatus
08/04/2005US20050166845 Method of heating a substrate in a variable temperature process using a fixed temperature chuck
08/04/2005US20050166844 High reflectivity atmospheric pressure furnace for preventing contamination of a work piece
08/04/2005US20050166840 Loading and extraction of modular belt carriers of electronic components
08/04/2005US20050166836 Vapor-phase epitaxial apparatus and vapor phase epitaxial method
08/04/2005US20050166835 Vapor phase growth method for al-containing III-V group compound semiconductor, and method and device for producing al-containing IIl-V group compound semiconductor
08/04/2005US20050166834 Rare earth-oxides, rare earth-nitrides, rare earth-phosphides and ternary alloys with silicon
08/04/2005US20050166745 Cutting device with a pair of cutting means
08/04/2005DE4313980B4 Integrierte Hybridschaltung und Verfahren zu deren Herstellung A hybrid integrated circuit, and processes for their preparation
08/04/2005DE19922291B4 Verfahren zur Herstellung eines Halbleiterbauelements A process for producing a semiconductor device
08/04/2005DE19841528B4 Verfahren und Gerät zum Erzeugen von Halbleiterbelichtungsdaten A method and apparatus for producing semiconductor exposure data
08/04/2005DE19636751B4 Verfahren zum Herstellen einer Phasenschiebemaske A method of manufacturing a phase shifting mask
08/04/2005DE10392912T5 Werkstück-Einspannvorrichtung mit Temperatursteuerbaueinheit mit Abstandshaltern zwischen Schichten, die einen Zwischenraum für thermoelektrische Module schaffen Workpiece chuck with Temperatursteuerbaueinheit with spacers between layers, creating a space for thermoelectric modules
08/04/2005DE10392870T5 Halbleitervorrichtung und Verfahren zur Herstellung derselben A semiconductor device and method of manufacturing the same
08/04/2005DE10392636T5 Methode zur Verkapselung eines elektronischen Bauelements mit einer Folienschicht Method for encapsulating an electronic component with a film layer
08/04/2005DE10392519T5 System zur Abscheidung eines Films auf einem Substrat unter Verwendung eines Gas-Precursors mit niedrigem Dampfdruck A system for depositing a film on a substrate using a gas precursor with a low vapor pressure
08/04/2005DE10392392T5 Hartmaskenprozess für Speicherbauelement ohne Bitleitungskurzschlüsse Hard mask process for memory device without Bitleitungskurzschlüsse