Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2008
04/30/2008DE102007037079A1 Formulation for use in generation of electrical conductive or optical coatings, comprises silver metal particles, solvent, dispersion agent and additives
04/30/2008DE102007011837A1 Integrated circuit e.g. dynamic RAM, for use in e.g. personal digital assistant, has gate-stack with resistive switching element whose conductivity is changed for changing on-resistance of semiconductor-transistor
04/30/2008DE102006050627A1 Integrated circuit positioning device, has cover unit for partially covering housing and/or holder by material preferably thermoplastic material, where cover unit comprises two forming wheels for bilateral pressing of material on housing
04/30/2008DE102006050338A1 Semiconductor component i.e. insulated gate bipolar transistor, has drift zone including region that passes through region of semiconductor component in polarity of charge carriers and another region in reverse polarity
04/30/2008DE102006050087A1 Semiconductor body for use in diode and transistor such as FET and bi-polar transistor, has connecting line for contacting semiconductor region, where conductivity per unit of length of connecting line changes from value to another value
04/30/2008DE102006049488A1 Flat, fragile silicon substrate e.g. silicon wafer, treatment e.g. rinsing and drying treatment, device for semiconductor and solar industry, has side guiding device gripping edge of substrates and provided with side guiding rollers
04/30/2008DE102006049324A1 Halbleiterkörper und Verfahren zum Testen eines Halbleiterkörpers Semiconductor body and method for testing a semiconductor body
04/30/2008DE102006048906A1 Verfahren zur Stabilisierung und Funktionalisierung von porösen metallischen Schichten A process for the stabilization and functionalization of porous metallic layers
04/30/2008DE102006043113B3 Verfahren zur Bearbeitung einer Struktur eines Halbleiter-Bauelements und Struktur in einem Halbleiter-Bauelement A method for processing a structure of a semiconductor device and structure in a semiconductor device
04/30/2008DE102006035596B4 Verfahren und Anordnung zur Durchführung eines Ätz- oder Reinigungsschrittes Method and apparatus for performing an etching or cleaning step
04/30/2008DE102004061349B4 Verfahren zum Herstellen eines MOS-Feldeffekttransistors A method of manufacturing a MOS field effect transistor
04/30/2008DE102004054566B4 Verfahren und Vorrichtung zum Einebnen einer Halbleiterscheibe sowie Halbleiterscheibe mit verbesserter Ebenheit Method and apparatus for planarizing a semiconductor wafer and semiconductor wafer with improved flatness
04/30/2008DE102004040046B4 Herstellungsverfahren für einen Grabenkondensator mit einem Isolationskragen, der über einen vergrabenen Kontakt einseitig mit einem Substrat elektrisch verbunden ist, insbesondere für eine Halbleiterspeicherzelle, und entsprechender Grabenkondensator Manufacturing method for a grave capacitor with an insulation collar, which is electrically connected through a buried contact on one side with a substrate, in particular for a semiconductor memory cell, and the appropriate capacitor grave
04/30/2008DE102004027691B4 Verfahren zum Herstellen eines Steges aus einem Halbleitermaterial A method of manufacturing a web made of a semiconductor material
04/30/2008DE10055711B4 Verfahren zur Herstellung von Grabenkondensatoren A process for producing capacitors grave
04/30/2008CN201054347Y Underlay supporter suitable for etching high horizontal-vertical ratio structure
04/30/2008CN201054346Y A mechanical structure for taking solid crystal for solid crystal processing machine
04/30/2008CN201054345Y A wafer top push system for solid crystal processing machine
04/30/2008CN101171895A Printed wiring board
04/30/2008CN101171894A Printed wiring board
04/30/2008CN101171893A Circuit substrate connection structure and circuit substrate connection method
04/30/2008CN101171826A Plotting point data acquisition method and device, and plotting method and device
04/30/2008CN101171694A Nitride semiconductor element and production method therefor
04/30/2008CN101171690A Ultrascalable vertical MOS transistor with planar contacts
04/30/2008CN101171683A Multi-chip module and method of manufacture
04/30/2008CN101171682A Metal-insulator-metal capacitor manufactured using etchback
04/30/2008CN101171681A Activated carbon selective epitaxial process
04/30/2008CN101171680A Electrostatic breakdown protection circuit and semiconductor integrated circuit device provided with same
04/30/2008CN101171679A Semiconductor integrated circuit
04/30/2008CN101171678A Semiconductor device, power supply device, and information processing device
04/30/2008CN101171677A Flip-attached and underfilled semiconductor device and method
04/30/2008CN101171676A Substrate storage container and method of producing the same
04/30/2008CN101171675A Bonding sheet sticking equipment and method
04/30/2008CN101171674A Junction-isolated vias
04/30/2008CN101171673A Method for resist strip in presence of regular low k and/or porous low k dielectric materials
04/30/2008CN101171672A Leadframe, coining tool, and method
04/30/2008CN101171671A Integrated circuit and method of manufacture
04/30/2008CN101171670A Composition for copper wiring polishing and method of polishing surface of semiconductor integrated circuit
04/30/2008CN101171669A Thin film resistor head structure and method for reducing head resistivity variance
04/30/2008CN101171668A Exposure apparatus, exposure method and device manufacturing method
04/30/2008CN101171667A Projection optical system, exposure apparatus and exposure method
04/30/2008CN101171666A Stabilized photoresist structure for etching process
04/30/2008CN101171665A Method of fabrication of AI/GE bonding in a wafer packaging environment and a product produced therefrom
04/30/2008CN101171551A Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist
04/30/2008CN101171549A Reticle alignment and overlay for multiple reticle process
04/30/2008CN101171379A Ink jet application for carbon nanotubes
04/30/2008CN101171363A Conductive barrier layer, especially an alloy of ruthenium and tantalum and sputter deposition thereof
04/30/2008CN101170878A Method for manufacturing print circuit board
04/30/2008CN101170159A Carbon filament memory and fabrication method
04/30/2008CN101170155A A line welder with LED bug detection device
04/30/2008CN101170153A Color temperature control method for LED white power tube
04/30/2008CN101170152A Heat radiation method for LED high-power tube wafer
04/30/2008CN101170137A Medium hole carbon pole of dye sensitized solar battery and its making method
04/30/2008CN101170136A Junction field effect tube and method of manufacturing the same
04/30/2008CN101170135A Non volatile memory device possessing charge trapping layer and its manufacture method
04/30/2008CN101170134A Full consumption Air_A1N_SOI MOSFETs part structure and its making method
04/30/2008CN101170132A Modifiable gate stack memory element
04/30/2008CN101170130A Single-wall carbon nanotube heterojunction and method of manufacturing the same, semiconductor device and method of manufacturing the same
04/30/2008CN101170129A Horizontal PNP transistor and its making technology method
04/30/2008CN101170128A Horizontal PNP type audion and its making method
04/30/2008CN101170127A Semiconductor device and its manufacture method
04/30/2008CN101170126A Semiconductor structure and its manufacture method
04/30/2008CN101170125A High color saturation full color organic EL display device and its making method
04/30/2008CN101170122A Non-volatile multi-bit memory device, its manufacture method and operation method
04/30/2008CN101170121A Bistable programmable resistance type random access memory
04/30/2008CN101170120A Phase change memory cells with dual access devices
04/30/2008CN101170118A Image sensor encapsulation, image sensor module and their making method
04/30/2008CN101170116A A programmable non volatile memory unit, array and its making method
04/30/2008CN101170115A A non volatile memory structure and its making method
04/30/2008CN101170114A Nonvolatile semiconductor memory device and method of producing the same
04/30/2008CN101170113A Non volatile memory with insulation structure and its making method
04/30/2008CN101170112A Semiconductor device and its manufacture method
04/30/2008CN101170109A Semiconductor device and manufacturing method thereof
04/30/2008CN101170107A Method of manufacturing a white light emitting organic EL device
04/30/2008CN101170106A Laminate chip packages and its manufacture method and system
04/30/2008CN101170105A Optical device module, fabrication method thereof, optical device unit and fabrication method thereof
04/30/2008CN101170097A Semiconductor device and method for manufacturing same
04/30/2008CN101170092A Method of producing semiconductor device, mounting structure body, electro-optical device and electronic apparatus
04/30/2008CN101170091A Semiconductor device, wiring of semiconductor device, and method of forming wiring
04/30/2008CN101170090A 半导体装置及其制造方法 Semiconductor device and manufacturing method
04/30/2008CN101170089A A contact structure with flexible protruding block and testing area and its making method
04/30/2008CN101170086A Method for preparing thin film transistor substrate
04/30/2008CN101170085A Thin film transistor array base plate and its making method
04/30/2008CN101170084A Base plate structure and technology for thin film transistor array
04/30/2008CN101170083A Making method for contact hole blocking layer in the flash technology
04/30/2008CN101170082A Making technology method for flash memory
04/30/2008CN101170081A Method for manufacturing dynamic random access memory
04/30/2008CN101170080A Manufacturing method for an integrated semiconductor structure
04/30/2008CN101170079A Semiconductor structure forming method
04/30/2008CN101170078A Manufacturing method of high voltage semiconductor device
04/30/2008CN101170077A Method for manufacturing a resistor random access memory with reduced active area and reduced contact areas
04/30/2008CN101170076A Making method for organic EL part and image display system
04/30/2008CN101170075A Wafer dividing method and apparatus
04/30/2008CN101170074A A method for improving ultra-deep sub-micro MOSFET radiation-resisting performance
04/30/2008CN101170073A Method of manufacturing semiconductor integrated circuit device
04/30/2008CN101170072A 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof
04/30/2008CN101170071A Semiconductor package and method of forming wire loop of semiconductor package
04/30/2008CN101170070A Positioning method for semiconductor chip suspending arm encapsulation
04/30/2008CN101170069A Hole opening method for high-aligning degree welding prevention layer
04/30/2008CN101170068A Method for making buffering layer on the base material