Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2010
07/20/2010US7759155 Optical data transceivers
07/20/2010US7759154 Ultrashallow photodiode using indium
07/20/2010US7759153 Method of fabricating electric field sensor having electric field shield
07/20/2010US7759152 MEMS thermal actuator and method of manufacture
07/20/2010US7759151 Solid state imaging apparatus, imaging apparatus and solid state imaging apparatus manufacturing method
07/20/2010US7759150 Nanorod sensor with single-plane electrodes
07/20/2010US7759149 Gallium nitride-based semiconductor stacked structure
07/20/2010US7759148 Method for manufacturing semiconductor optical device
07/20/2010US7759146 Method of making high efficiency UV VLED on metal substrate
07/20/2010US7759145 Process for producing light-emitting diode element emitting white light
07/20/2010US7759144 Package for a semiconductor light emitting device
07/20/2010US7759143 System and method for separating and packaging integrated circuits
07/20/2010US7759142 Quantum well MOSFET channels having uni-axial strain caused by metal source/drains, and conformal regrowth source/drains
07/20/2010US7759141 Method of manufacturing display device
07/20/2010US7759140 Light-emitting device and method of manufacturing the same
07/20/2010US7759139 Method for manufacturing silicon device
07/20/2010US7759138 Silicon microchannel plate devices with smooth pores and precise dimensions
07/20/2010US7759137 Flip chip interconnection structure with bump on partial pad and method thereof
07/20/2010US7759136 Critical dimension (CD) control by spectrum metrology
07/20/2010US7759135 Method of forming a sensor node module
07/20/2010US7759053 forming an aluminum-comprising conductive metal line over a semiconductor substrate, exposing conductive line to a solution comprising an inorganic acid ( H3PO4 or H2SO4 ) hydrogen peroxide and a carboxylic acid buffering agent ( diammonium citrate, ammonium oxalate)
07/20/2010US7759052 Thioacetal product of acrolein-methyl methacrylate copolymer and ethanethiol; high refractive index; useful in a damascene process and in an immersion lithography process using ArF
07/20/2010US7759051 Laser mask and method of crystallization using the same
07/20/2010US7759029 High reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, comprising scattering structures for scattering and absorbing radiation
07/20/2010US7759025 transparent substrate, half-tone film provided on a part on which light-shielding pattern is to be formed and a part on which semi-light shielding pattern is to be formed, where semi-light shielding pattern includes first and second light shielding patterns, second having smaller dimensions than first
07/20/2010US7759021 Multi-transmission phase mask and exposure method using the same
07/20/2010US7758970 ceramic base and a metallic member bonded together through an Au solder; a barrier layer interposed between, comprising chromium (Cr) which protects against or suppresses the diffusion of a metal into the solder material; semiconductor manufacturing
07/20/2010US7758927 Laser-induced fabrication of metallic interlayers and patterns in polyimide films
07/20/2010US7758926 Amorphous silicon deposition for sequential lateral solidification
07/20/2010US7758920 Thin dielectrical films containing silicon on a wafer target substrate by chemical vapor deposition; selectively supplying a purge gas, a first process gas of a silane, and a second process gas selected from a nitriding gas, an oxynitriding gas, and an oxidizing gas alternately
07/20/2010US7758913 an aromatic silane derivative as primer layer, first protective layer is acrylonitrile-styrene copolymer; a second protective layer is a highly chlorinated polymer;
07/20/2010US7758791 Find mold and method for regenerating fine mold
07/20/2010US7758763 Plasma for resist removal and facet control of underlying features
07/20/2010US7758739 Methods of producing structures for electron beam induced resonance using plating and/or etching
07/20/2010US7758731 High voltage, alternating current; pulsed direct current; fluid flow of dielectric over electrode
07/20/2010US7758718 Reduced electric field arrangement for managing plasma confinement
07/20/2010US7758699 Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition
07/20/2010US7758698 Dual top gas feed through distributor for high density plasma chamber
07/20/2010US7757930 Fabrication method of semiconductor integrated circuit device
07/20/2010US7757633 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma
07/20/2010US7757363 Support system for semiconductor wafers
07/20/2010CA2409435C Wireless radio frequency technique design and method for testing of integrated circuits and wafers
07/20/2010CA2338271C Laser delivery system and method for photolithographic mask repair
07/15/2010WO2010081151A2 Memory cell having dielectric memory element
07/15/2010WO2010081127A2 Adhesives and binders for electro-optic displays
07/15/2010WO2010081084A2 Polishing pads for chemical mechanical planarization and/or other polishing methods
07/15/2010WO2010081009A2 Systems, apparatus and methods for making an electrical connection to a robot and electrical end effector thereof
07/15/2010WO2010081003A2 Systems, apparatus and methods for moving substrates
07/15/2010WO2010080997A1 Electrostatic end effector apparatus, systems and methods for transporting susbtrates
07/15/2010WO2010080988A2 A method for fabricating thin touch sensor panels
07/15/2010WO2010080983A2 Robot systems, apparatus and methods for transporting substrates in electronic device manufacturing
07/15/2010WO2010080789A2 Spin-on spacer materials for double- and triple-patterning lithography
07/15/2010WO2010080758A1 Substrate planarization with imprint materials and processes
07/15/2010WO2010080732A2 Scatterometry metrology target design optimization
07/15/2010WO2010080655A2 Spacer formation for array double patterning
07/15/2010WO2010080654A2 Profile and cd uniformity control by plasma oxidation treatment
07/15/2010WO2010080595A2 Illumination methods and systems for laser scribe detection and alignment in thin film solar cell fabrication
07/15/2010WO2010080590A2 High temperature electrostatic chuck bonding adhesive
07/15/2010WO2010080495A1 Slurry composition containing non-ionic polymer and method for use
07/15/2010WO2010080423A2 Combined wafer area pressure control and plasma confinement assembly
07/15/2010WO2010080421A2 Controlling ion energy distribution in plasma processing systems
07/15/2010WO2010080390A2 Condensible gas cooling system
07/15/2010WO2010080358A2 Edge film removal process for thin film solar cell applications
07/15/2010WO2010080331A2 Electroless depositions from non-aqueous solutions
07/15/2010WO2010080318A2 Memory cells, methods of forming dielectric materials, and methods of forming memory cells
07/15/2010WO2010080296A2 Lateral mosfet with substrate drain connection
07/15/2010WO2010080277A1 Method and structure for integrating capacitor-less memory cell with logic
07/15/2010WO2010080276A2 Metal-insulator-semiconductor tunneling contacts
07/15/2010WO2010080275A2 Bump stress mitigation layer for integrated circuits
07/15/2010WO2010080252A1 Gap maintenance for opening to process chamber
07/15/2010WO2010080229A1 Microelectromechanical device with isolated microstructures and method of producing same
07/15/2010WO2010080216A2 Precursor addition to silicon oxide cvd for improved low temperature gapfill
07/15/2010WO2010080194A1 Configurable pressure vessel
07/15/2010WO2010080079A1 Memristor devices configured to control bubble formation
07/15/2010WO2010080069A2 Techniques for maintaining a substrate processing system
07/15/2010WO2010080002A2 Method for preparing nanowires of phase change materials
07/15/2010WO2010079842A1 Higher-order silane composition and method for producing substrate with film
07/15/2010WO2010079831A1 Method for manufacturing semiconductor package, method for encapsulating semiconductor, and solvent-borne semiconductor encapsulating epoxy resin composition
07/15/2010WO2010079823A1 Semiconductor device
07/15/2010WO2010079820A1 Photocurable transfer sheet, and method for forming uneven pattern using same
07/15/2010WO2010079816A1 Semiconductor device and manufacturing method therefor
07/15/2010WO2010079812A1 Mold-releasing film and method for manufacturing light emitting diode
07/15/2010WO2010079766A1 Plasma processing apparatus
07/15/2010WO2010079756A1 Plasma processing apparatus
07/15/2010WO2010079753A1 Plasma processing apparatus
07/15/2010WO2010079746A1 Testing apparatus
07/15/2010WO2010079740A1 Plasma processing apparatus
07/15/2010WO2010079738A1 Plasma processing apparatus and plasma cvd film-forming method
07/15/2010WO2010079658A1 Laser beam working machine
07/15/2010WO2010079657A1 Defect observation method and device using sem
07/15/2010WO2010079639A1 Semiconductor light emitting device and method for manufacturing same
07/15/2010WO2010079633A1 Wire bonding apparatus and wire bonding method
07/15/2010WO2010079632A1 Bidirectionally movable table
07/15/2010WO2010079581A1 Thin film transistor and method for manufacturing same
07/15/2010WO2010079573A1 Field effect transistor, method for manufacturing same, and biosensor
07/15/2010WO2010079544A1 Semiconductor device and method for manufacturing same
07/15/2010WO2010079543A1 Semiconductor device producing method
07/15/2010WO2010079542A1 Semiconductor device and method for manufacturing same
07/15/2010WO2010079389A1 Semiconductor device and method of manufacturing a semiconductor device
07/15/2010WO2010079157A1 Structure and method of forming metal interconnect structures in ultra low-k dielectrics