Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2010
11/25/2010WO2010134435A1 Ferromagnetic tunnel junction structure and magnetoresistive element using same
11/25/2010WO2010134417A1 Tantalum sputtering target
11/25/2010WO2010134415A1 Semiconductor device and method of producing same
11/25/2010WO2010134403A1 Semiconductor integrated circuit, circuit test system, circuit test unit, and circuit test method
11/25/2010WO2010134378A9 Magnetic memory element and storage device using same
11/25/2010WO2010134378A1 Magnetic memory element and storage device using same
11/25/2010WO2010134371A1 Electronic component element
11/25/2010WO2010134346A1 Film-forming method and film-forming apparatus
11/25/2010WO2010134344A1 Silicon carbide semiconductor device and method for manufacturing same
11/25/2010WO2010134334A1 Semiconductor substrate, electronic device, semiconductor substrate manufacturing method, and electronic device manufacturing method
11/25/2010WO2010134267A1 Semiconductor device
11/25/2010WO2010134264A1 Device for designing semiconductor integrated circuits, and data processing method and control program thereof
11/25/2010WO2010134234A1 Method of producing flexible semiconductor device
11/25/2010WO2010134231A1 Semiconductor device and method for manufacturing same
11/25/2010WO2010134230A1 Semiconductor device and method for manufacturing same
11/25/2010WO2010134185A1 Cleaning liquid and cleaning method
11/25/2010WO2010134184A1 Fine-processing agent and fine-processing method
11/25/2010WO2010134181A1 Structure having chip mounted thereon and module provided with the structure
11/25/2010WO2010134176A1 Method for forming uneven pattern
11/25/2010WO2010134126A1 Plasma apparatus
11/25/2010WO2010133989A2 Arrangements and methods for improving bevel etch repeatability among substrates
11/25/2010WO2010133923A1 Semiconductor device comprising an isolation trench including semiconductor islands
11/25/2010WO2010133869A1 Semiconductor device contacts
11/25/2010WO2010133787A1 Method for etching a material in the presence of solid particles
11/25/2010WO2010133683A1 Carrier for a silicon block and method for producing such a carrier and arrangement
11/25/2010WO2010133550A1 Method for coating a semiconductor substrate by electrodeposition
11/25/2010WO2010133400A1 Redundant metal barrier structure for interconnect applications
11/25/2010WO2010114232A3 Rocker door valve for semiconductor-manufacturing equipment
11/25/2010WO2010110546A3 Slit type supersonic nozzle and surface treatment device having the same
11/25/2010WO2010108480A3 METHOD FOR APPLYING A Zn(S, O) BUFFER LAYER TO A SEMICONDUCTOR SUBSTRATE BY CHEMICAL BATH DEPOSITION
11/25/2010WO2010104274A3 Lead frame and method for manufacturing the same
11/25/2010WO2010101423A3 Lift pin, and wafer-processing apparatus comprising same
11/25/2010WO2010101369A3 Gas distribution apparatus, and substrate-processing apparatus comprising same
11/25/2010WO2010098558A3 Probe block
11/25/2010WO2010095901A3 Method for forming thin film using radicals generated by plasma
11/25/2010WO2010093567A3 Method for fabricating a semiconductor device having a lanthanum-family-based oxide layer
11/25/2010WO2010092482A3 Migration and plasma enhanced chemical vapor deposition
11/25/2010WO2010091245A8 Scribe-line through silicon vias
11/25/2010WO2010091205A3 Ground return for plasma processes
11/25/2010WO2010091025A3 Metrology and inspection suite for a solar production line
11/25/2010WO2010090493A3 Cleaning apparatus for solar panel
11/25/2010WO2010090489A3 Method for manufacturing insulated conductive pattern and laminate
11/25/2010WO2010088503A3 A technique for processing a substrate
11/25/2010WO2010088499A3 Crimped solder on a flexible circuit board
11/25/2010WO2010088348A3 Methods for forming conformal oxide layers on semiconductor devices
11/25/2010WO2010088274A3 Device, system, and method for multidirectional ultraviolet lithography
11/25/2010WO2010022977A3 Method for soldering contact wires to solar cells
11/25/2010US20100298966 Substrate processing system, substrate detecting apparatus, and substrate detecting method
11/25/2010US20100298965 Led array
11/25/2010US20100298962 Information processing apparatus, manufacturing apparatus, and device manufacturing method
11/25/2010US20100298679 Semiconductor based analyte sensors and methods
11/25/2010US20100297863 Electrical contactor, especially wafer level contactor, using fluid pressure
11/25/2010US20100297857 Substrate connecting connector and semiconductor device socket, cable connector, and board-to-board connector having substrate connecting connector
11/25/2010US20100297856 Pulse train annealing method and apparatus
11/25/2010US20100297855 Device processing method
11/25/2010US20100297854 High throughput selective oxidation of silicon and polysilicon using plasma at room temperature
11/25/2010US20100297853 Method for purifying acetylene gas for use in semiconductor processes
11/25/2010US20100297852 Method of forming line/space patterns
11/25/2010US20100297851 Compositions and methods for multiple exposure photolithography
11/25/2010US20100297850 Selective self-aligned double patterning of regions in an integrated circuit device
11/25/2010US20100297849 Plasma etching method for etching an object
11/25/2010US20100297848 Etching of tungsten selective to titanium nitride
11/25/2010US20100297847 Method of forming sub-lithographic features using directed self-assembly of polymers
11/25/2010US20100297846 Method of manufacturing a semiconductor device and substrate processing apparatus
11/25/2010US20100297845 Method for fabricating semiconductor device
11/25/2010US20100297844 Integrated circuit system with through silicon via and method of manufacture thereof
11/25/2010US20100297843 Method for Forming Vias in a Semiconductor Substrate and a Semiconductor Device having the Semiconductor Substrate
11/25/2010US20100297842 Conductive bump structure for semiconductor device and fabrication method thereof
11/25/2010US20100297841 Method for providing a redistribution metal layer in an integrated circuit
11/25/2010US20100297840 Method for fabricating semiconductor device
11/25/2010US20100297839 Method of fabricating semiconductor device having multiple gate insulating layer
11/25/2010US20100297838 Independently accessed double-gate and tri-gate transistors in same process flow
11/25/2010US20100297837 Implantation using a hardmask
11/25/2010US20100297836 Plasma doping apparatus and method, and method for manufacturing semiconductor device
11/25/2010US20100297835 Methods for fabricating copper indium gallium diselenide (cigs) compound thin films
11/25/2010US20100297834 Method for reducing dielectric overetch using a dielectric etch stop at a planar surface
11/25/2010US20100297833 Complexes of carbon nanotubes and fullerenes with molecular-clips and use thereof
11/25/2010US20100297832 Semiconductor device manufacturing method, substrate processing apparatus, substrate manufacturing method
11/25/2010US20100297831 Laser processing method for semiconductor wafer
11/25/2010US20100297830 Laser processing method for semiconductor wafer
11/25/2010US20100297829 Method of Temporarily Attaching a Rigid Carrier to a Substrate
11/25/2010US20100297828 Method for fabricating a semiconductor on insulator type substrate
11/25/2010US20100297827 Method for manufacturing semiconductor device
11/25/2010US20100297826 Method of Manufacturing Nonvolatile Memory Device
11/25/2010US20100297825 Passive Components in the Back End of Integrated Circuits
11/25/2010US20100297824 Memory structure with reduced-size memory element between memory material portions
11/25/2010US20100297823 Method for angular doping of source and drain regions for odd and even nand blocks
11/25/2010US20100297822 Methods of forming capacitor structures, methods of forming threshold voltage implant regions, and methods of implanting dopant into channel regions
11/25/2010US20100297821 Method of manufacturing semiconductor device
11/25/2010US20100297820 Embedded Semiconductor Device Including Planarization Resistance Patterns and Method of Manufacturing the Same
11/25/2010US20100297819 Trench DRAM Cell with Vertical Device and Buried Word Lines
11/25/2010US20100297818 Semiconductor Devices Having pFET with SiGe Gate Electrode and Embedded SiGe Source/Drain Regions and Methods of Making the Same
11/25/2010US20100297817 Method for manufacturing thin film transistor
11/25/2010US20100297816 Nanowire mesh device and method of fabricating same
11/25/2010US20100297815 Transistor Layout for Manufacturing Process Control
11/25/2010US20100297814 Electronic system modules and method of fabrication
11/25/2010US20100297813 Semiconductor package with position member
11/25/2010US20100297812 Method for stacking serially-connected integrated circuits and multi-chip device made from same
11/25/2010US20100297811 Semiconductor device and method of manufacturing the same
11/25/2010US20100297810 Power Semiconductor Device and Method for Its Production
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