Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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10/05/2011 | CN102208337A Silicon-base compound substrate and manufacturing method thereof |
10/05/2011 | CN102208336A Technical method for forming alternately arranged P type and N type semiconductor thin layers |
10/05/2011 | CN102208335A Method and apparatus for template surface treatment, and pattern forming method |
10/05/2011 | CN102208334A Method for preparing local oxidization termination ring of semiconductor device |
10/05/2011 | CN102208333A Plasma etching method |
10/05/2011 | CN102208332A Thick nitride semiconductor structures with interlayer structures and methods of fabricating thick nitride semiconductor structures |
10/05/2011 | CN102208331A Crystal growth method and substrate manufacturing method |
10/05/2011 | CN102208330A Method for forming fine pattern |
10/05/2011 | CN102208329A Substrate treatment apparatus and substrate treatment method |
10/05/2011 | CN102208328A Defective product resection fixture |
10/05/2011 | CN102208327A Device and method for managing semiconductor cleaning solution |
10/05/2011 | CN102208322A Plasma processing apparatus and semiconductor device manufacturing method |
10/05/2011 | CN102207693A Heating device and heating method |
10/05/2011 | CN102207682A Resist coating method, resist coating device, and method for manufacturing photomask plate and photomask using the resist coating method |
10/05/2011 | CN102207675A Photo mask and manufacturing method thereof |
10/05/2011 | CN102207655A Array substrate and manufacturing method thereof, and liquid crystal display device |
10/05/2011 | CN102207654A Transflective fringe-field-switching-type liquid crystal display panel and manufacturing method |
10/05/2011 | CN102206799A Surface passivation method for germanium-based MOS (Metal Oxide Semiconductor) device substrate |
10/05/2011 | CN102206559A Cleaning composition, cleaning process, and process for producing semiconductor device |
10/05/2011 | CN102206469A Adhesive tape for wafer processing |
10/05/2011 | CN102206465A Method of chemical mechanical polishing a substrate with polishing composition adapted to enhance silicon oxide removal |
10/05/2011 | CN102206098A Ceramic copper-clad substrate and preparation method thereof |
10/05/2011 | CN102205911A Substrate processing apparatus, conversion method and load-shifting method |
10/05/2011 | CN102205562A Cutting device and cutting method |
10/05/2011 | CN102205540A Substrate transport hand and substrate transport robot |
10/05/2011 | CN102205522A Gas path positive pressure system used for chemico-mechanical polishing and chemico-mechanical polishing equipment |
10/05/2011 | CN102205521A Method for polishing a semiconductor wafer |
10/05/2011 | CN102205520A Method for the double-side polishing of a semiconductor wafer |
10/05/2011 | CN102205470A Filling composition, semiconductor device including the same, and method of fabricating the semiconductor device |
10/05/2011 | CN102205468A Device and method for etching silver syrup on electronic product |
10/05/2011 | CN102205296A Coating device |
10/05/2011 | CN101894796B Method for utilizing laser scribing to cleave tube core of gallium nitride-based laser |
10/05/2011 | CN101894736B Coating developing machine |
10/05/2011 | CN101866932B Voltage modulation mid-wavelength and long-wavelength two-color quantum well infrared detector and manufacturing method thereof |
10/05/2011 | CN101866868B Monitoring method of semiconductor process |
10/05/2011 | CN101863447B Method for manufacturing sloped sidewall silicon dioxide structure by adopting photoetching and dry etching |
10/05/2011 | CN101853833B Embedded basic island and multi-convex point basic island lead framework and first-etching last-plating method thereof |
10/05/2011 | CN101840901B Lead frame structure of static release ring without paddle and production method thereof |
10/05/2011 | CN101831628B Method for growing high-quality In ingredient enriched InGaN thin film material |
10/05/2011 | CN101826546B Resistor conversion memory cell limited by nano-scale side wall and manufacturing method thereof |
10/05/2011 | CN101826525B NOR type flash memory structure with double ion implantation and manufacturing method thereof |
10/05/2011 | CN101819923B Method for manufacturing polysilicon nanometer thin film strain resistor |
10/05/2011 | CN101800167B Method for preparing metal-oxide-semiconductor capacitor on germanium substrate |
10/05/2011 | CN101789401B CMOS (Complementary Metal-Oxide-Semiconductor Transistor) and manufacture method thereof |
10/05/2011 | CN101789376B VDMOS and preparation method thereof |
10/05/2011 | CN101789371B Cleaning method of semiconductor component |
10/05/2011 | CN101789362B Plasma processing device and processing method thereof |
10/05/2011 | CN101777491B Method for opening contact hole |
10/05/2011 | CN101770947B Poly(p-phenylene benzobisoxazole) fiber surface-processing method |
10/05/2011 | CN101770931B Method for removing organic particle impurities on wafer surface |
10/05/2011 | CN101764083B Formation method of barrier layer |
10/05/2011 | CN101764075B Monitoring method of backside defect of wafer and system thereof |
10/05/2011 | CN101752298B Manufacturing method for metal interconnecting structure |
10/05/2011 | CN101752267B Chip scale package structure of CMOS (complementary metal-oxide-semiconductor) image sensor and packaging method |
10/05/2011 | CN101752266B Chip scale package structure of CMOS (complementary metal-oxide-semiconductor) image sensor and packaging method |
10/05/2011 | CN101743630B Mos transistors for thin soi integration and methods for fabricating the same |
10/05/2011 | CN101740424B Manufacturing process for a chip package structure |
10/05/2011 | CN101740410B Manufacturing process for a chip package structure |
10/05/2011 | CN101740333B Incineration treatment method |
10/05/2011 | CN101728264B Method for controlling source/drain junction capacitance and method for forming PMOS transistor |
10/05/2011 | CN101728252B Method for forming flash memory grid electrode and flash memory |
10/05/2011 | CN101721821B Radiofrequency receiving chip and method for manufacturing same |
10/05/2011 | CN101714543B Ceramic substrate for three-dimensional packaging of multi-chip system and packaging method thereof |
10/05/2011 | CN101689521B Method and apparatus for monitoring vias in a semiconductor fab |
10/05/2011 | CN101689495B Polishing apparatus |
10/05/2011 | CN101685776B Method for improving ohmic contact of ZnO film |
10/05/2011 | CN101673718B Semiconductor device, method of manufacturing thereof, circuit board and electronic apparatus |
10/05/2011 | CN101651116B Method for forming contact hole |
10/05/2011 | CN101651099B Method for removing photoresist layer |
10/05/2011 | CN101647106B Surface-hydrophobicized film, material for formation of surface-hydrophobicized film, wiring layer, semiconductor device and process for producing semiconductor device |
10/05/2011 | CN101630678B Luminous device and method for manufacturing same |
10/05/2011 | CN101625974B Method for forming dielectric layer on quick heat treatment semiconductor substrate by adopting high-energy electromagnetic radiation |
10/05/2011 | CN101621037B Tft sas memory unit structure |
10/05/2011 | CN101621016B Method and system for detecting defects in manufacture of integrated circuit |
10/05/2011 | CN101600540B Polishing pad and process for production of polishing pad |
10/05/2011 | CN101599419B Forming method of groove |
10/05/2011 | CN101593690B Laminated dielectric layer forming method and metal foredielectric layer forming method |
10/05/2011 | CN101593686B Metal grid forming method |
10/05/2011 | CN101593684B Polysilicon gate, semiconductor device and formation method thereof |
10/05/2011 | CN101593674B Forming method of semiconductor substrate and manufacturing method of solar cell |
10/05/2011 | CN101593668B Method for monitoring gluing developing equipment |
10/05/2011 | CN101589473B Nanowire-based transparent conductors and applications thereof |
10/05/2011 | CN101587836B Dry etching method for removing silicon nitride film |
10/05/2011 | CN101582431B Thin film transistor (TFT) array substrate and manufacture method thereof |
10/05/2011 | CN101577252B Shallow trench isolation structure and method for forming same |
10/05/2011 | CN101577230B Manufacturing method of semiconductor device |
10/05/2011 | CN101562143B Method for manufacturing a semiconductor device, method and structure for mounting the semiconductor device |
10/05/2011 | CN101546135B Charged-particle beam writing method and charged-particle beam writing apparatus |
10/05/2011 | CN101546134B Electron beam writing apparatus and method |
10/05/2011 | CN101533799B Semiconductor device and method for manufacturing the same |
10/05/2011 | CN101523566B bonding method of chips and chips stacking pieces |
10/05/2011 | CN101510505B Ion implantation method and apparatus |
10/05/2011 | CN101499436B Method for improving breakdown voltage between two adjacent N traps |
10/05/2011 | CN101488545B Surface roughening method for LED substrate |
10/05/2011 | CN101488464B Method for forming an encapsulated device and structure |
10/05/2011 | CN101459199B Semiconductor device and method of fabricating the same |
10/05/2011 | CN101459037B Substrate rack control device, substrate rack mobility control method and sediment apparatus |
10/05/2011 | CN101458180B Method for preprocessing TEM example and carrying out TEM test for example |
10/05/2011 | CN101452854B Method for producing MOS device |
10/05/2011 | CN101439492B Polysilicon finishing method capable of improving performance of relief polishing |