Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03B - Apparatus or arrangements for taking photographs or for projecting or viewing them; Apparatus or arrangements employing analogous techniques using waves other than optical waves; Accessories therefor › G03B 27 - Photographic printing apparatus
Patents for G03B 27 - Photographic printing apparatus (25,157)
06/2010
06/15/2010US7738080 Stage apparatus, method for controlling the same, exposure apparatus, and method for manufacturing device
06/15/2010US7738079 Radiation beam pulse trimming
06/15/2010US7738078 Optimized mirror design for optical direct write
06/15/2010US7738077 Patterning device utilizing sets of stepped mirrors and method of using same
06/15/2010US7738076 Exposure apparatus and device manufacturing method
06/15/2010US7738075 Lithographic attribute enhancement
06/15/2010US7738074 Lithographic apparatus and device manufacturing method
06/15/2010US7737421 Electron beam exposure apparatus and method for cleaning the same
06/15/2010US7736005 Stereoscopic display device and method
06/15/2010US7735974 Mobile telephone with an internal inkjet printhead arrangement and an optical sensing arrangement
06/10/2010WO2010007426A3 Method and system for producing a pepper's ghost
06/10/2010US20100143832 Lithographic apparatus and device manufacturing method
06/10/2010US20100143521 Method for Expelling Gas Positioned Between a Substrate and a Mold
06/10/2010US20100141926 Optical system,exposure system, and exposure method
06/10/2010US20100141925 Scanner model representation with transmission cross coefficients
06/10/2010US20100141924 Substrate holder, stage apparatus, and exposure apparatus with first support part provided in a suction space and second support part
06/10/2010US20100141923 Stage apparatus and aligner
06/10/2010US20100141922 Illumination optical apparatus, exposure apparatus, and device manufacturing method
06/10/2010US20100141921 Optical system, exposure system, and exposure method
06/10/2010US20100141920 Device and Method for Transmission Image Sensing
06/10/2010US20100141919 Exposing apparatus for fabricating process of flat panel display device
06/10/2010US20100141918 Lithographic apparatus and device manufacturing method
06/10/2010US20100141917 Method and system for indirect determination of local irradiance in an optical system
06/10/2010US20100141916 Lithographic apparatus and device manufacturing method with double exposure overlay control
06/10/2010US20100141915 Lithographic apparatus and device manufacturing method
06/10/2010US20100141914 Lithographic apparatus and positioning apparatus
06/10/2010US20100141913 Exposure apparatus and device manufacturing method
06/10/2010US20100141912 Exposure apparatus and measuring device for a projection lens
06/10/2010US20100141911 Exposure apparatus and device manufacturing method
06/10/2010US20100141910 Member with a cleaning surface and a method of removing contamination
06/10/2010US20100141909 Radiation system and lithographic apparatus
06/09/2010CN101361022B Polarized, multicolor led-based illumination source
06/08/2010US7734217 Sheet post-processing apparatus with protection cover
06/08/2010US7734098 Face detecting apparatus and method
06/08/2010US7733548 Image reading apparatus
06/08/2010US7733538 Image reading apparatus
06/08/2010US7733463 Lithographic apparatus and device manufacturing method
06/08/2010US7733462 Exposure apparatus and exposure method
06/08/2010US7733461 Exposure apparatus
06/08/2010US7733460 Aligner and self-cleaning method for aligner
06/08/2010US7733459 Lithographic apparatus and device manufacturing method
06/08/2010US7732110 Method for exposing a substrate and lithographic projection apparatus
06/08/2010US7732109 Through active compensation by an exposure tool such as the system 600, based on an effective focus and exposure dose determined from a critical dimension and a side-wide angle measured by scatterometry-based optical critical dimension technology; for semiconductor manufacture
06/03/2010US20100136796 Substrate holding member, immersion type exposure device and method of fabricating semiconductor device
06/03/2010US20100136468 Diffraction order measurement
06/03/2010US20100134779 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
06/03/2010US20100134778 Calibration method for a lithographic apparatus
06/03/2010US20100134777 Diaphragm changing device
06/03/2010US20100134776 High repetition pulse power source and exposure device with high repetition power source
06/03/2010US20100134775 Exposure apparatus and device manufacturing method
06/03/2010US20100134774 Calibration methods and devices useful in semiconductor photolithography
06/03/2010US20100134773 Apparatus and method to control vacuum at porous material using multiple porous materials
06/03/2010US20100134772 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
06/03/2010US20100134771 Coupling apparatus, exposure apparatus, and device fabricating method
06/03/2010US20100134770 Exposure apparatus and method for manufacturing device
06/03/2010US20100134769 Lithographic apparatus and device manufacturing method
06/03/2010US20100134768 Projection exposure system for microlithography
06/02/2010CN101408715B Conveying device and photo processing device equipped therewith
06/02/2010CN101118374B Document reading apparatus and method of calculating position adjustment amount
06/01/2010US7729019 Image reading system and image reading program
06/01/2010US7728956 Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data
06/01/2010US7728955 Lithographic apparatus, radiation supply and device manufacturing method
06/01/2010US7728954 Reflective loop system producing incoherent radiation
06/01/2010US7728953 Exposure method, exposure system, and substrate processing apparatus
06/01/2010US7728952 Method and system for closing plate take-over in immersion lithography
06/01/2010US7728951 Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus
06/01/2010US7726891 Substrate processing apparatus and substrate processing method
05/2010
05/27/2010US20100129742 Method for a lithographic apparatus
05/27/2010US20100129741 Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device
05/27/2010US20100129739 Surface Position Detection Apparatus, Exposure Apparatus, and Exposure Method
05/27/2010US20100129607 Photopolymer Stamp Manufacturing Process and Preparation System and Photopolymer Stamp Dies
05/27/2010US20100128242 Bonding Silicon Silicon Carbide to Glass Ceramics
05/27/2010US20100128241 Lithographic apparatus provided with a swap bridge
05/27/2010US20100128240 Chromatically corrected objective and projection exposure apparatus including the same
05/27/2010US20100128239 Exposure method and exposure apparatus
05/27/2010US20100128238 Frequency Selective Iterative Learning Control System and Method for Controlling Errors in Stage Movement
05/27/2010US20100128237 Driving apparatus, exposure apparatus, and device manufacturing method
05/27/2010US20100128236 Image forming apparatus and light intensity correction method
05/27/2010US20100128235 Lithographic apparatus and device manufacturing method
05/26/2010CN201489261U Two-way moving automatic locking and buffering singe- and double-line paper feeding device of double-line paper roller sleeve
05/26/2010CN201489260U Plain screen printing plate printing-down scale
05/26/2010CN1989452B Extreme ultraviolet reticle protection device and method
05/26/2010CN1776521B Manuscript press board automatic opening-closing device and office equipment with same
05/26/2010CN101194207B Environmental control in a reticle SMIF pod
05/25/2010US7724922 Inter-step plate image inspection for printing prepress
05/25/2010US7724370 Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell
05/25/2010US7724351 Lithographic apparatus, device manufacturing method and exchangeable optical element
05/25/2010US7724350 Immersion exposure apparatus and device manufacturing method
05/25/2010US7724349 Device arranged to measure a quantity relating to radiation and lithographic apparatus
05/25/2010US7724348 Exposure apparatus and method, and device manufacturing method
05/25/2010US7724272 Print unit
05/25/2010US7722267 Substrate processing apparatus
05/20/2010US20100124724 Projection exposure apparatus, method for calibrating measurement criterion of displacement measurement unit, and method for manufacturing device
05/20/2010US20100123891 Scanning exposure apparatus and device manufacturing method
05/20/2010US20100123890 Lithographic apparatus and control system
05/20/2010US20100123889 Super-resolution lithography apparatus and method based on multi light exposure method
05/20/2010US20100123888 Exposure apparatus and method of manufacturing device
05/20/2010US20100123887 Method for a lithographic apparatus
05/20/2010US20100123886 Lithographic Apparatus and Device Manufacturing Method
05/20/2010US20100123885 Large area nanopatterning method and apparatus
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